43.
    发明专利
    未知

    公开(公告)号:DE59309790D1

    公开(公告)日:1999-10-28

    申请号:DE59309790

    申请日:1993-01-23

    Applicant: BASF AG

    Abstract: The invention relates to a radiation-sensitive mixture essentially comprising (a) a water-insoluble binder or binder mixture, and (b) a compound which forms a strong acid on irradiation, where component (a) is a phenolic resin all or some of whose phenolic hydroxyl groups have been replaced by groups (IA) or (IB) in which R , R and R are alkyl radicals, or R together with R forms a ring, and X is CH2, O, S, SO2 or NR . This radiation-sensitive mixture is suitable for the production of relief structures.

    45.
    发明专利
    未知

    公开(公告)号:DE59402794D1

    公开(公告)日:1997-06-26

    申请号:DE59402794

    申请日:1994-02-25

    Applicant: BASF AG

    Abstract: The invention relates to positive-working, radiation-sensitive mixtures essentially comprising (a1) an organic binder containing acid-labile groups which is insoluble in water, but becomes soluble in aqueous alkaline solutions on treatment with acid, or (a2.1) a polymeric binder which is insoluble in water, but soluble in aqueous alkaline solutions and (a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by treatment with acid, and (b) an organic compound which produces an acid on exposure to actinic radiation and which additionally contain (c) a strongly basic, organic compound containing hydroxyl, alkoxy or phenoxy anions. These mixtures are suitable for the production of relief structures of improved contrast.

    46.
    发明专利
    未知

    公开(公告)号:DE19533607A1

    公开(公告)日:1997-03-13

    申请号:DE19533607

    申请日:1995-09-11

    Applicant: BASF AG

    Abstract: Positive-working radiation-sensitive mixt. is based on (a) polymer(s) contg. acid-labile gps., which are insol. in water and rendered soluble in aq. alkaline soln. by acid; (b) organic photo-acid(s); and (c) other organic cpd(s)., in which (a) comprises 35-70 mole-% 4-hydroxystyrene units (I), 30-50 mole-% 4-tetrahydropyran-2-yloxystyrene units (II) and 0-15 mole-% 4-vinylcyclohexanol units (III); (b) is 2-methyl-4-hydroxy-5-isopropyl-phenyl-dimethylsulphonium triflate (IV); and (c) is an organic ammonium deriv. (V) of (IV) or an analogue. In the formulae, R', R", R'" = 1-4 C alkyl; or R', R" = CH2 gps. linked to a 5-membered ring.

    RADIATION-SENSITIVE MIXTURE FOR PHOTOSENSITIVE COATING MATERIALS

    公开(公告)号:CA1332031C

    公开(公告)日:1994-09-20

    申请号:CA570471

    申请日:1988-06-27

    Applicant: BASF AG

    Abstract: Disclosed is a radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility is an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

    49.
    发明专利
    未知

    公开(公告)号:DE58906471D1

    公开(公告)日:1994-02-03

    申请号:DE58906471

    申请日:1989-05-10

    Applicant: BASF AG

    Abstract: The invention relates to positive-and negative-working radiation-sensitive mixtures and to processes for the formation of relief patterns. The radiation-sensitive mixtures contain a polymeric binder and an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid, and one additional grouping which forms a strong acid under the action of radiation, the polymeric binders used being reaction products of polymers containing phenolic hydroxyl groups with dihydropyran or alkyl vinyl ethers. These radiation-sensitive mixtures are particularly suitable for the formation of relief patterns.

    50.
    发明专利
    未知

    公开(公告)号:DE3817011A1

    公开(公告)日:1989-11-30

    申请号:DE3817011

    申请日:1988-05-19

    Applicant: BASF AG

    Abstract: The invention relates to a radiation-sensitive mixture and to a process for the formation of relief patterns. … The radiation-sensitive mixture contains… a) a polymeric binder which is insoluble in water and soluble in aqueous-alkaline solutions, and… b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation,… the polymeric binder (a) containing 5 to 40 mol% of monomer units with copolymerised or co-condensed … … groupings or … … groupings introduced by a polymer-analogous reaction, with the proviso that the radical R contains 5 to 9 carbon atoms.

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