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公开(公告)号:AU2668900A
公开(公告)日:2000-09-14
申请号:AU2668900
申请日:2000-02-02
Applicant: BASF AG , BASF COATINGS AG
Inventor: OTT GUNTHER , ROCKRATH ULRIKE , MEISENBURG UWE , BAUMGART HUBERT , SCHWALM REINHOLD , BECK ERICH , KONIGER RAINER , PAULUS WOLFGANG , BINDER HORST , BLUM RAINER
IPC: C09D5/02
Abstract: The invention relates to a powder-slurry that can be hardened by actinic radiation or by thermal means, comprising (I) components containing functional groups (A) which render them hardenable by actinic radiation and components containing complementary functional groups (B) which render them thermally hardenable, in a weight ratio of 50:1 to 1:50 and/or comprising (II) components containing the functional groups (A) and (B) which render them thermally hardenable and hardenable by actinic radiation in a molar ratio of 100:1 to 1:100.
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公开(公告)号:CA2339735A1
公开(公告)日:2000-02-17
申请号:CA2339735
申请日:1999-08-04
Applicant: BASF AG
Inventor: BLUM RAINER , BINDER HORST , KELLER PETER
IPC: C08J5/00 , C08F2/46 , C08F8/00 , C08F299/00 , C08F299/06 , C08G18/32 , C08G18/67 , C08G59/14 , C09D5/00 , C09D5/03 , C09D129/10 , C09D157/06 , C09D175/16 , C09J129/10 , C09J157/06 , C08F299/02
Abstract: The invention relates to radiation-hardening and/or heat-hardening substance s and preparations with an oligomer or polymer basic structure, comprising at least one terminal or lateral vinyl ether group (a) and at least one group ( b) that is different from said vinyl ether groups (a) and co-reacts with said groups (a), whereby, on average, at least one vinyl ether group (a) and one co- reactive group (b) are present for each oligomer or polymer molecule. The invention also relates to preparations containing the inventive material and to the uses of said preparation in or as a binder for liquid enamelling systems, coating powders, or as or in adhesives, casting agents and impregnating agents for electronics or electro-technics and for the producti on of shaped bodies.
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公开(公告)号:DE59309790D1
公开(公告)日:1999-10-28
申请号:DE59309790
申请日:1993-01-23
Applicant: BASF AG
Inventor: BINDER HORST , SCHWALM REINHOLD , FUNHOFF DIRK
IPC: G03F7/004 , C08L61/10 , G03F7/039 , H01L21/027
Abstract: The invention relates to a radiation-sensitive mixture essentially comprising (a) a water-insoluble binder or binder mixture, and (b) a compound which forms a strong acid on irradiation, where component (a) is a phenolic resin all or some of whose phenolic hydroxyl groups have been replaced by groups (IA) or (IB) in which R , R and R are alkyl radicals, or R together with R forms a ring, and X is CH2, O, S, SO2 or NR . This radiation-sensitive mixture is suitable for the production of relief structures.
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公开(公告)号:DE59208837D1
公开(公告)日:1997-10-09
申请号:DE59208837
申请日:1992-03-19
Applicant: BASF AG
Inventor: SCHWALM REINHOLD DR , BINDER HORST , FUNHOFF DIRK DR
IPC: C08K5/42 , C08K5/51 , G03F7/004 , G03F7/039 , H01L21/027
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公开(公告)号:DE59402794D1
公开(公告)日:1997-06-26
申请号:DE59402794
申请日:1994-02-25
Applicant: BASF AG
Inventor: FUNHOFF DIRK DR , SCHWALM REINHOLD DR , BINDER HORST
IPC: C08K5/375 , C08K5/42 , C09D125/02 , C09D125/18 , C09D143/04 , G03F7/004 , G03F7/029 , G03F7/032 , G03F7/039 , H01L21/027
Abstract: The invention relates to positive-working, radiation-sensitive mixtures essentially comprising (a1) an organic binder containing acid-labile groups which is insoluble in water, but becomes soluble in aqueous alkaline solutions on treatment with acid, or (a2.1) a polymeric binder which is insoluble in water, but soluble in aqueous alkaline solutions and (a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by treatment with acid, and (b) an organic compound which produces an acid on exposure to actinic radiation and which additionally contain (c) a strongly basic, organic compound containing hydroxyl, alkoxy or phenoxy anions. These mixtures are suitable for the production of relief structures of improved contrast.
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公开(公告)号:DE19533607A1
公开(公告)日:1997-03-13
申请号:DE19533607
申请日:1995-09-11
Applicant: BASF AG
Inventor: SCHWALM REINHOLD DR , FUNHOFF DIRK DR , BINDER HORST
IPC: G03F7/004 , G03F7/039 , H01L21/027 , G03F7/00
Abstract: Positive-working radiation-sensitive mixt. is based on (a) polymer(s) contg. acid-labile gps., which are insol. in water and rendered soluble in aq. alkaline soln. by acid; (b) organic photo-acid(s); and (c) other organic cpd(s)., in which (a) comprises 35-70 mole-% 4-hydroxystyrene units (I), 30-50 mole-% 4-tetrahydropyran-2-yloxystyrene units (II) and 0-15 mole-% 4-vinylcyclohexanol units (III); (b) is 2-methyl-4-hydroxy-5-isopropyl-phenyl-dimethylsulphonium triflate (IV); and (c) is an organic ammonium deriv. (V) of (IV) or an analogue. In the formulae, R', R", R'" = 1-4 C alkyl; or R', R" = CH2 gps. linked to a 5-membered ring.
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47.
公开(公告)号:CA1338178C
公开(公告)日:1996-03-26
申请号:CA600065
申请日:1989-05-18
Applicant: BASF AG
Inventor: SCHWALM REINHOLD , BINDER HORST
IPC: G03F7/023 , C08F8/00 , C08F12/22 , C08G8/28 , C08G8/36 , C08K5/372 , C08L25/18 , C08L61/08 , C09D125/18 , C09D161/08 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/38 , H01L21/027
Abstract: Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also an additional group which upon irradiation forms a strong acid, the polymeric binders being reaction products of polymers that contain phenolic hydroxyl groups with dihydropyran or with alkyl vinyl ethers.
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公开(公告)号:CA1332031C
公开(公告)日:1994-09-20
申请号:CA570471
申请日:1988-06-27
Applicant: BASF AG
Inventor: SCHWALM REINHOLD , BOETTCHER ANDREAS , BINDER HORST
Abstract: Disclosed is a radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility is an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.
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公开(公告)号:DE58906471D1
公开(公告)日:1994-02-03
申请号:DE58906471
申请日:1989-05-10
Applicant: BASF AG
Inventor: SCHWALM REINHOLD DR , BINDER HORST
IPC: G03F7/023 , C08F8/00 , C08F12/22 , C08G8/28 , C08G8/36 , C08K5/372 , C08L25/18 , C08L61/08 , C09D125/18 , C09D161/08 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/38 , H01L21/027
Abstract: The invention relates to positive-and negative-working radiation-sensitive mixtures and to processes for the formation of relief patterns. The radiation-sensitive mixtures contain a polymeric binder and an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid, and one additional grouping which forms a strong acid under the action of radiation, the polymeric binders used being reaction products of polymers containing phenolic hydroxyl groups with dihydropyran or alkyl vinyl ethers. These radiation-sensitive mixtures are particularly suitable for the formation of relief patterns.
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公开(公告)号:DE3817011A1
公开(公告)日:1989-11-30
申请号:DE3817011
申请日:1988-05-19
Applicant: BASF AG
Inventor: SCHWALM REINHOLD DR , BINDER HORST
IPC: G03F7/023 , C08L61/08 , G03F7/004 , G03F7/039 , H01L21/027
Abstract: The invention relates to a radiation-sensitive mixture and to a process for the formation of relief patterns. … The radiation-sensitive mixture contains… a) a polymeric binder which is insoluble in water and soluble in aqueous-alkaline solutions, and… b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation,… the polymeric binder (a) containing 5 to 40 mol% of monomer units with copolymerised or co-condensed … … groupings or … … groupings introduced by a polymer-analogous reaction, with the proviso that the radical R contains 5 to 9 carbon atoms.
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