公开(公告)号：JPH0917718A

公开(公告)日：1997-01-17

申请号：JP16737695

申请日：1995-07-03

Applicant: CANON KK

Inventor： TAKEUCHI SEIJI ,  MIYAZAKI KYOICHI ,  HASEGAWA MASANORI ,  YOSHII MINORU

IPC: G02F1/13 ,  G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain an aligner for inexpensively manufacturing precision device. SOLUTION: An aligner has a transmission liquid crystal display 2 for displaying a circuit pattern, a wafer stage 9 for relatively moving a wafer 4 to be mounted and the display 2, a projection image-forming optical system 3 for projecting a pattern displayed on the display 2 on the wafer 4 to form an image, and a display control device 6 for changing the pattern being displayed on the display 2 in synchronization with the relative move between the display 2 and the wafer 4.

公开(公告)号：JPH0642914A

公开(公告)日：1994-02-18

申请号：JP21817292

申请日：1992-07-24

Applicant: CANON KK

Inventor： HASEGAWA MASANORI ,  YOSHII MINORU ,  SEKINE MASAYOSHI ,  MISHIMA SEIJI ,  OGURI NOBUAKI

IPC: G01B11/00 ,  G01B11/02

Abstract: PURPOSE:To obtain a displacement measuring apparatus which can detect displacement data of an article in the simple constitution with high accuracy. CONSTITUTION:The apparatus has a light source part 5, an optical member 4 which emits a beam of light from the light source part 5 as a linear beam, a reflecting mirror 3 for reflecting the linear beam form the optical member toward an object, and a detecting part 2 which detects the entering position of the reflecting light from the object onto a predetermined surface. These parts are set on the same stage. The displacement data of the object is obtained by using output signals from the detecting part 2.

公开(公告)号：JPH05217849A

公开(公告)日：1993-08-27

申请号：JP4797592

申请日：1992-02-04

Applicant: CANON KK

Inventor： NOSE TETSUSHI ,  HASEGAWA MASANORI ,  OZAWA KUNITAKA

IPC: G03F9/00 ,  G01B11/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To detect a relative positional deviation between a mask and a wafer with high accuracy by locating signals obtained from sensors of a detector corresponding to alignment systems of each pair so that they may be symmetric when locating two pairs of the alignment systems on a first substance surface and on a second substance surface. CONSTITUTION:A sensor 12 receives a first signal light flux 7a and a second signal light flux 7b. Here, a projected light flux L1 is first cast at the specified angle on alignment marks 71a and 71b on the surface of a mask 1 and then is transmitted and diffracted and after that, is reflected and diffracted on alignment patterns 72a and 72b on the surface of a wafer 2 and finally is cast on a light receiving surface of the sensor 12. In a signal processor 23 which receives a signal from the sensor 12, the location of the center of gravity of the alignment light flux cast on the surface of the sensor 12 in the surface of the sensor 12 is detected. Using the output signal from the sensor 12, the positional deviation of the mask 1 and of the wafer 2 is also detected by the signal processor 23. By this method, a very accurate alignment can be done.

公开(公告)号：JPH0540013A

公开(公告)日：1993-02-19

申请号：JP21924191

申请日：1991-08-05

Applicant: CANON KK

Inventor： NOSE TETSUSHI ,  SAITO KENJI ,  OSAWA MASARU ,  HASEGAWA MASANORI

IPC: G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66

Abstract: PURPOSE:To measure the double-printing slippage between two objects by using diffracted light. CONSTITUTION:Signal luminous fluxes are passed through and diffracted by a mask 1c after they are respectively made incident on alignment inspection patterns 21a', 21b', and 21c' on the surface of the mask 1c and respectively reflected and diffracted by alignment inspection patterns 22a, 22b, and 22c on the surface of a wafer 2. After reflection, the luminous fluxes are respectively made incident to prescribed positions of detecting sections 3 and 4 after passing through the mask 1c. The sections 3 and 4 detect the positions of the centers of gravity of the signal luminous fluxes made incident to their surfaces and detect the slippage DELTA between the first printed patterns 22a and 22b and second printed pattern 22c by using output signals about the positions of the centers of gravity.