公开(公告)号：BR0115898A

公开(公告)日：2003-11-04

申请号：BR0115898

申请日：2001-11-26

Applicant: ESSILOR INT

Inventor： HELMSTETTER YVON ,  BERNHARD JEAN-DANIEL ,  ARROUY FREDERIC

IPC: B32B7/02 ,  C23C14/06 ,  G02B1/11 ,  G02B1/00

Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF 2 ( 4, 4 '), preparing the surface of the thus coated substrate, and depositing an outer MgF 2 layer ( 5 ) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.

公开(公告)号：FR2838529A1

公开(公告)日：2003-10-17

申请号：FR0204727

申请日：2002-04-16

Applicant: ESSILOR INT

Inventor： CADO HERVE ,  ARROUY FREDERIC ,  HELMSTETTER YVON

IPC: G02B5/04 ,  G02B5/30 ,  G02B27/00 ,  G02B27/01 ,  G02B27/28 ,  G02B1/04 ,  G02B1/08 ,  G02C7/12

Abstract: A polarization separator comprises a substrate provided with a pile of alternate layers of PrTiO3 and a material with a lower refractive index. The thickness of these layers (e1, e2) satisfy relationships between their respective refractive indices (n1, n2) and a considered wavelength (lambda): (a) e1 = (lambda x sq. rt.(n1 squared + n2 squared))/(4 x n1 squared); (b) e2 = (lambda x sq. rt.(n1 squared + n2 squared))/(4 x n2 squared). Independent claims are also included for: (a) a method for the fabrication of this polarization separator; (b) an ophthalmic lens with inserts for projecting an image incorporating this polarization separator; (c) a device for projecting an image incorporating this lens. The second material used in the pile of alternate layers is silicon dioxide (claimed).

公开(公告)号：FR2817267B1

公开(公告)日：2003-08-29

申请号：FR0015334

申请日：2000-11-28

Applicant: ESSILOR INT

Inventor： HELMSTETTER YVON ,  BERNHARD JEAN DANIEL ,  ARROUY FREDERIC

IPC: B32B7/02 ,  C23C14/06 ,  G02B1/11 ,  C23C14/08

Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF 2 ( 4, 4 '), preparing the surface of the thus coated substrate, and depositing an outer MgF 2 layer ( 5 ) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.

公开(公告)号：CA2429150A1

公开(公告)日：2002-06-06

申请号：CA2429150

申请日：2001-11-26

Applicant: ESSILOR INT

Inventor： HELMSTETTER YVON ,  BERNHARD JEAN-DANIEL ,  ARROUY FREDERIC

IPC: B32B7/02 ,  C23C14/06 ,  G02B1/11 ,  G02B1/00

Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150 ~C, comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4'), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.