公开(公告)号：JP2007171572A

公开(公告)日：2007-07-05

申请号：JP2005369301

申请日：2005-12-22

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  TAKAMOTO EIJI ,  MINOWA TAKAKI

IPC: G03F7/027 ,  G02B3/00 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition having high radiation sensitivity and a development margin that achieves formation of a preferable pattern feature even a developing time exceeds the optimum developing time in a developing process, and capable of forming a patterned thin film with excellent adhesiveness, and to provide an interlayer insulating film and a microlens formed from the composition. SOLUTION: The radiation-sensitive resin composition contains: a copolymer of an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, an epoxy group-containing unsaturated compound, a phenolic skeleton-containing unsaturated compound, and an unsaturated compound except the above described compounds; and a 1, 2-quinone diazide compound. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供即使在显影时间中也能够形成优选图案特征的具有高辐射敏感性和显影边缘的辐射敏感性组合物超过显影过程中的最佳显影时间，并且能够形成 具有优异粘合性的图案化薄膜，并提供由该组合物形成的层间绝缘膜和微透镜。 解决方案：辐射敏感性树脂组合物包含：不饱和羧酸和/或不饱和羧酸酐的共聚物，含环氧基的不饱和化合物，含酚骨架的不饱和化合物和不饱和化合物，除了 上述化合物; 和1,2-醌二叠氮化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006343709A

公开(公告)日：2006-12-21

申请号：JP2005262997

申请日：2005-09-09

Applicant: JSR CORP

Inventor： ISHIKAWA MASAYOSHI ,  HANAMURA MASAAKI ,  SHIRAKI SHINJI ,  KAJITA TORU

IPC: G03F7/033 ,  G02B3/00 ,  G03F7/004 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition capable of forming microlenses excellent in thickness, resolution, pattern shape, heat resistance, transparency, heat discoloration resistance, solvent resistance, and also capable of having good storage stability. SOLUTION: The radiation sensitive resin composition comprises: (A) an alkali-soluble copolymer obtained by polymerizing 100 wt.%, in total, of 10-50 wt.% of a polymerizable unsaturated compound (a) having an acidic functional group, 20-60 wt.% of a polymerizable unsaturated compound (b) having an alicyclic hydrocarbon group but not having an acidic functional group and 5-40 wt.% of another polymerizable unsaturated compound (c); (B) a polymerizable unsaturated compound including a polymerizable unsaturated compound having an alicyclic hydrocarbon group but not having an acidic functional group as an essential component; and (C) a photopolymerization initiator. COPYRIGHT: (C)2007,JPO&INPIT

公开(公告)号：JP2006301240A

公开(公告)日：2006-11-02

申请号：JP2005121978

申请日：2005-04-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  TAKAMOTO EIJI ,  MITANI KOJI ,  MINOWA TAKAKI

IPC: G02F1/1337 ,  C08F220/00 ,  G03F7/004 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is suitably used for simultaneously forming protrusions and spacers of a vertically aligned liquid crystal display element. SOLUTION: The radiation-sensitive resin composition for forming the protrusions and/or the spacers for the vertical alignment liquid crystal display element contains a copolymer [A] of an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride (a1), an unsaturated compound containing at least a skeleton selected from a group of a tetrahydrofuran skeleton, a furan skeleton, a tetrahydropyran skeleton, a pyran skeleton, a lactone skeleton, an oxyethylene skeleton with two to ten repeating units, and an oxypropylene skeleton with two to ten repeating units (a2), and an olefinically unsaturated compound (a3) other than (a1) and (a2); and a 1,2-quinone diazide compound [B]. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决的问题：提供适合用于同时形成垂直排列的液晶显示元件的突起和间隔物的辐射敏感性树脂组合物。 解决方案：用于形成用于垂直取向液晶显示元件的突起和/或间隔物的辐射敏感性树脂组合物含有不饱和羧酸和/或不饱和羧酸酐（a1）的共聚物[A] 含有至少选自四氢呋喃骨架，呋喃骨架，四氢吡喃骨架，吡喃骨架，内酯骨架，具有2〜10个重复单元的氧化乙烯骨架的骨架的不饱和化合物和具有2个以上的氧化丙烯骨架 至重复单元（a2）和（a1）和（a2）以外的烯属不饱和化合物（a3）。 和1,2-醌二叠氮化合物[B]。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2014186300A

公开(公告)日：2014-10-02

申请号：JP2013238814

申请日：2013-11-19

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SAKURAI TOMOHIKO ,  HANAMURA MASAAKI

IPC: G03F7/023 ,  C08J3/24 ,  G03F7/038 ,  H01L21/027

CPC classification number: G03F7/0226 ,  C08F8/12 ,  C09D125/18 ,  G03F7/0236 ,  G03F7/0381 ,  G03F7/0387 ,  G03F7/40 ,  C08F212/14 ,  C08F212/08 ,  C08F2220/325

Abstract: PROBLEM TO BE SOLVED: To achieve enhancing curability of a resin composition and a photosensitive composition suitably used for forming a surface protective film and an interlayer insulator which electronic parts and the like have, and reducing an internal stress remaining on a board when forming a cured film on the board using the composition.SOLUTION: There is provided a photosensitive composition containing (A) a resin having a phenolic hydroxyl group, (B1) a crosslinking agent having at least two oxazoline groups, (B2) a crosslinking agent having at least two groups represented by -CHOR, where R is a hydrogen atom, an alkyl group or an acetyl group having 1 to 10 carbon atoms, and (C) a photosensitive acid generator.

Abstract translation: 要解决的问题：为了提高树脂组合物和适合用于形成电子部件等的表面保护膜和层间绝缘体的感光性组合物的固化性，并且在形成固化时降低板上剩余的内部应力 使用该组合物的板上的薄膜。提供了一种光敏组合物，其含有（A）具有酚羟基的树脂，（B1）具有至少两个恶唑啉基的交联剂，（B2）至少具有交联剂 由-CHOR表示的两个基团，其中R是氢原子，具有1至10个碳原子的烷基或乙酰基，和（C）光敏酸产生剂。

公开(公告)号：JP2013209607A

公开(公告)日：2013-10-10

申请号：JP2012128954

申请日：2012-06-06

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HIRO AKIHITO ,  HANAMURA MASAAKI ,  YAMATO FUTOSHI ,  SHIMOYAMA YUJI ,  TAKEKAWA JUN ,  MIZUNO HIKARI ,  SAKO AKARI ,  SAKURAI TOMOHIKO

IPC: C08L63/00 ,  C08G59/62 ,  C08K5/00 ,  C08K5/151 ,  C08K5/28 ,  G03F7/023 ,  G03F7/038 ,  H01L21/027 ,  H05K1/03

CPC classification number: C08G59/3209 ,  C08F12/22 ,  C08F212/14 ,  C08L25/18 ,  C08F212/08 ,  C08K5/04

Abstract: PROBLEM TO BE SOLVED: To provide: a resin composition capable of forming a cured film excellent in elongation property; a polymer suitable as a constituting component of the composition; a cured film formed from the composition; and electronic parts having the cured film.SOLUTION: A resin composition contains: (A) a polymer having a structural unit represented by formula (a1) and having a hydroxyl group, and a structural unit represented by formula (a2) and having a cationically polymerizable group; and (F) a solvent.

Abstract translation: 要解决的问题：提供：能够形成伸长性优异的固化膜的树脂组合物; 适合作为组合物的组成成分的聚合物; 由该组合物形成的固化膜; 和具有固化膜的电子部件。溶液：树脂组合物含有：（A）具有由式（a1）表示的结构单元并具有羟基的聚合物和由式（a2）表示的具有阳离子性的结构单元 可聚合基团 和（F）溶剂。

公开(公告)号：JP2011138116A

公开(公告)日：2011-07-14

申请号：JP2010268203

申请日：2010-12-01

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ONUMA YUUKI ,  ARAI MASAFUMI ,  MATSUOKA HITOMI ,  HANAMURA MASAAKI

IPC: G03F7/023 ,  C08F220/32 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a positive radiation sensitive resin composition which excels in application property and radiation sensitivity, provides good pattern form and can form an interlayer insulating film having excellent heat resistance, solvent resistance, light transmittance, dry-etching resistance, and the interlayer insulating film obtained from the composition and a method for forming the film. SOLUTION: The radiation sensitive resin composition is a positive radiation sensitive resin composition containing [A] an alkali-soluble resin, [B] 1,2-quinone diazide compound, and [C] a compound represented by the general formula (1), and is achieved by the interlayer insulating film made thereof and method of forming them. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供优异的施加性能和辐射敏感性的正型辐射敏感性树脂组合物，提供良好的图案形式，并且可以形成具有优异的耐热性，耐溶剂性，透光率，干法蚀刻的层间绝缘膜 电阻和由该组合物获得的层间绝缘膜和形成膜的方法。 解决方案：辐射敏感性树脂组合物是含有[A]碱溶性树脂，[B] 1,2-醌二叠氮化合物和[C]通式（ 1），并且通过由其制成的层间绝缘膜及其形成方法来实现。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011123450A

公开(公告)日：2011-06-23

申请号：JP2009283497

申请日：2009-12-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  ICHINOHE DAIGO

IPC: G03F7/075 ,  C08G77/04 ,  G03F7/004 ,  G03F7/023 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a polysiloxane based positive radiation sensitive composition which can form an interlayer insulation film having superior storage stability, radiation sensitivity, and melt flow-proofness, and high various performance such as surface hardness, refractive index, heat resistance, transparency, or low dielectric property.
SOLUTION: The positive radiation sensitive composition includes [A] polysiloxane, [B] photoacid generator or photobase generator, and [C] metal chelate compound. Preferably, [A] polysiloxane is polysiloxane obtained by hydrolysis condensation of hydrolyzable silane compound under presence of [C] metal chelate compound, and [B] photoacid generator contains quinonediazide.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种可以形成具有优异的储存稳定性，辐射敏感性和熔体流动性的层间绝缘膜的聚硅氧烷基的正性辐射敏感性组合物，以及各种性能如表面硬度，折射率， 耐热性，透明性或低介电性。 解决方案：正辐射敏感组合物包括[A]聚硅氧烷，[B]光酸产生剂或光碱产生剂和[C]金属螯合物。 优选地，[A]聚硅氧烷是通过在[C]金属螯合物存在下水解缩合可水解硅烷化合物获得的聚硅氧烷，[B]光酸产生剂含有醌二叠氮化物。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010134311A

公开(公告)日：2010-06-17

申请号：JP2008311789

申请日：2008-12-08

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ARAI MASAFUMI ,  HANAMURA MASAAKI

IPC: G03F7/023 ,  C08F220/32 ,  G02B3/00 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high sensitivity to radiation, capable of forming an interlayer dielectric having adhesion, high heat resistance, resolution, high transmittance and high reliability, capable of forming a microlens having high transmittance and a good melt figure when the composition is used for forming a microlens, and having excellent storage stability.
SOLUTION: The radiation-sensitive resin composition contains (A) a copolymer and (B) a 1,2-quinonediazide compound, wherein the copolymer (A) contains a copolymer produced through a step of polymerizing monomers containing (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride and (a2) an epoxy group-containing unsaturated compound in the presence of a compound expressed by formula (1). In formula (1), Z
1 and Z
2 each independently represents a benzyl group which may be substituted with an alkyl group having 4 to 18 C.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供能够形成具有粘合性，高耐热性，分辨率，高透射率和高可靠性的层间电介质的能够对辐射具有高灵敏度的辐射敏感性树脂组合物，能够形成具有高的透光性的微透镜 当组合物用于形成微透镜时具有良好的透光率和良好的熔体图形，并且具有优异的储存稳定性。 解决方案：辐射敏感性树脂组合物含有（A）共聚物和（B）1,2-醌二叠氮化合物，其中共聚物（A）含有通过聚合单体制备的共聚物，所述共聚物含有（a1） 不饱和羧酸和/或不饱和羧酸酐和（a2）在式（1）表示的化合物存在下的含环氧基的不饱和化合物。 在式（1）中，Z 1 和Z 2 各自独立地表示可被具有4至18个C的烷基取代的苄基。 （C）2010，JPO＆INPIT

公开(公告)号：JP2009258652A

公开(公告)日：2009-11-05

申请号：JP2009019094

申请日：2009-01-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SUGI RYUJI ,  ICHINOHE DAIGO ,  UCHIIKE KAZUHIRO ,  HANAMURA MASAAKI

IPC: G03F7/033 ,  C08F2/38 ,  C08F8/30 ,  C08F20/04 ,  C08F22/04 ,  C08F290/00 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having an extremely little amount of a volatile component generated upon forming a spacer, and capable of responding to high-speed coating by a slit die coating method. SOLUTION: The radiation-sensitive resin composition contains: [A] a polymer having at least one group selected from carboxyl groups and carboxylic acid anhydride groups, and a group derived from a specified polyvalent thiol compound represented by pentaerythritol tetrakis(3-mercaptopropionate), and having a ratio (Mw/Mn) of 1.0 to 2.8, which is a ratio of a weight average molecular weight (Mw) in terms of polystyrene to a number average molecular weight (Mn) in terms of polystyrene measured by gel permeation chromatography; [B] a polymerizable unsaturated compound; and [C] a radiation-sensitive polymerization initiator. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种辐射敏感性树脂组合物，其在形成间隔物时产生极少量的挥发性成分，并且能够通过狭缝模涂法对高速涂布进行响应。 解决方案：辐射敏感性树脂组合物包含：[A]具有至少一个选自羧基和羧酸酐基团的基团的聚合物，以及由季戊四醇四（3- 巯基丙酸酯），并且以聚苯乙烯换算的以聚苯乙烯换算的重均分子量（Mw）与数均分子量（Mn）的比率（Mw / Mn）为1.0〜2.8，以凝胶测定的聚苯乙烯为单位的比例 渗透色谱; [B]可聚合不饱和化合物; 和[C]辐射敏感聚合引发剂。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008286936A

公开(公告)日：2008-11-27

申请号：JP2007130723

申请日：2007-05-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  UCHIIKE KAZUHIRO ,  IIJIMA TAKAHIRO ,  HAMADA KENICHI

IPC: G03F7/023 ,  C08F220/04 ,  C08F220/26 ,  G02B1/04 ,  G02B3/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high radiation sensitivity, having such a development margin as to form a good pattern profile even in a developing time exceeding the optimum developing time in a developing step, and capable of easily forming a patterned thin film excellent in adhesion. SOLUTION: The radiation-sensitive resin composition comprises: [A] a copolymer of (a1) at least one compound selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides, (a2) an unsaturated compound having at least one group selected from the group consisting of an oxiranyl group and an oxetanyl group, and (a3) an unsaturated compound other than the compounds (a1) and (a2); [B] a 1,2-quinonediazide compound; and [C] a compound having an alicyclic oxiranyl group but not having a carboxyl group. The radiation-sensitive resin composition is suitable for use particularly in the formation of an interlayer insulation film or microlenses. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高辐射敏感性的辐射敏感性树脂组合物，具有如此的显影余量，即使在显影步骤中超过最佳显影时间的显影时间也形成良好的图案图形，并且能够 容易地形成粘附性优异的图案化薄膜。 解决方案：辐射敏感性树脂组合物包含：[A]（a1）至少一种选自不饱和羧酸和不饱和羧酸酐的化合物的共聚物，（a2）至少具有不饱和羧酸 选自环氧乙烷基和氧杂环丁烷基的一个基团，和（a3）除化合物（a1）和（a2）之外的不饱和化合物; [B] 1,2-醌二叠氮化合物; 和[C]具有脂环族环氧乙烷基但不具有羧基的化合物。 辐射敏感性树脂组合物特别适用于形成层间绝缘膜或微透镜。 版权所有（C）2009，JPO＆INPIT