公开(公告)号：AU2003234794A1

公开(公告)日：2003-11-11

申请号：AU2003234794

申请日：2003-05-12

Applicant: JSR CORP

Inventor： HANAMURA MASAAKI ,  YOKOYAMA YASUAKI ,  BESSHO NOBUO

IPC: B24B37/04 ,  B24B45/00 ,  C09J11/00 ,  C09J201/00 ,  C09J5/00 ,  C09J7/00 ,  H01L21/304 ,  H01L21/301

Abstract: The present invention relates to a method of temporarily and firmly fixing two solids to each other and to a composition used in the method, which is a method of temporarily fixing, comprising temporarily fixing the two solids to each other with a liquid crystal compound or a composition comprising the liquid crystal compound. This method is used for a method of temporarily fixing a pad for chemical mechanical polishing, for example, to polish a wafer for a semiconductor device fixed on a surface of a base plate, when one solid is a pad for chemical mechanical polishing of a wafer for a semiconductor device and the other is a base plate to fix the pad.

公开(公告)号：EP1522567A4

公开(公告)日：2005-11-16

申请号：EP03728056

申请日：2003-05-12

Applicant: JSR CORP

Inventor： YOKOYAMA YASUAKI ,  BESSHO NOBUO ,  HANAMURA MASAAKI

IPC: B24B37/04 ,  B24B45/00 ,  C09J11/00 ,  C09J5/00 ,  C09J7/00 ,  C09J201/00 ,  H01L21/301 ,  H01L21/304

CPC classification number: B24B37/042 ,  B24B37/30 ,  H01L21/6835 ,  H01L2221/68327 ,  H01L2221/6834 ,  Y10T428/1059

Abstract: The present invention relates to a method of temporarily and firmly fixing two solids to each other and to a composition used in the method, which is a method of temporarily fixing, comprising temporarily fixing the two solids to each other with a liquid crystal compound or a composition comprising the liquid crystal compound. This method is used for a method of temporarily fixing a pad for chemical mechanical polishing, for example, to polish a wafer for a semiconductor device fixed on a surface of a base plate, when one solid is a pad for chemical mechanical polishing of a wafer for a semiconductor device and the other is a base plate to fix the pad.

公开(公告)号：JP2013210606A

公开(公告)日：2013-10-10

申请号：JP2012278080

申请日：2012-12-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： GUANG ZHAO REN ,  HANAMURA MASAAKI ,  YAMATO FUTOSHI ,  SHIMOYAMA YUJI ,  TAKEKAWA JUN ,  MIZUNO HIKARI ,  SAKO AKARI ,  SAKURAI TOMOHIKO

IPC: G03F7/023 ,  C08F212/06 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resin composition capable of forming a cured film excellent in extensibility, a polymer suitable as a component contained in the composition, a cured film formed from the composition, and an electronic part having the cured film.SOLUTION: A resin composition contains (A) a polymer having a structural unit represented by the formula (a1) and a structural unit represented by the formula (a2), and (F) a solvent.

Abstract translation: 要解决的问题：为了提供能够形成延展性优异的固化膜的树脂组合物，适合作为组合物中所含的成分的聚合物，由该组合物形成的固化膜，以及具有固化膜的电子部件。 树脂组合物含有（A）具有由式（a1）表示的结构单元的聚合物和由式（a2）表示的结构单元和（F）溶剂。

公开(公告)号：JP2012027480A

公开(公告)日：2012-02-09

申请号：JP2011187393

申请日：2011-08-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MINOWA TAKAKI ,  SHIRATO KAORI ,  HANAMURA MASAAKI ,  MATOBA TAKUMI ,  KOIDE TOSHIYUKI

IPC: G03F7/075 ,  C08F2/44 ,  G02B5/20 ,  G02B5/22 ,  G02F1/1335 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a novel radiation sensitive composition for forming a colored layer having excellent adhesiveness to a substrate and solvent resistance, which imparts pixels and a black matrix free from generation of development residue even when the luminous energy of exposure is low.SOLUTION: A radiation sensitive composition for forming a colored layer contains (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, (D) a photopolymerization initiator and (E) a siloxane oligomer obtained by hydrolyzing an alkoxy silane expressed by formula (1) and formula (2). In the formulae, Rrepresents a substituent containing at least one functional group selected from a group consisting of an oxiranyl group, oxetanyl group, episulfide group, vinyl group, allyl group, (meth)acryloyl group, carboxyl group, hydroxyl group, mercapto group, isocyanate group, amino group, ureido group and styryl group.

Abstract translation: 要解决的问题：提供一种用于形成对基材具有优异粘附性和耐溶剂性的着色层的新型辐射敏感组合物，即使当曝光的能量发生曝光时，其赋予像素和黑矩阵也不产生显影残留物 低。 解决方案：用于形成着色层的辐射敏感组合物含有（A）着色剂，（B）碱溶性树脂，（C）多官能单体，（D）光聚合引发剂和（E）硅氧烷低聚物 通过水解由式（1）和式（2）表示的烷氧基硅烷获得。 在式中，R 1 表示含有至少一个选自环氧乙烷基，氧杂环丁烷基，环硫基，乙烯基，烯丙基的官能团的取代基，（ 甲基）丙烯酰基，羧基，羟基，巯基，异氰酸酯基，氨基，脲基和苯乙烯基。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011145653A

公开(公告)日：2011-07-28

申请号：JP2010252365

申请日：2010-11-10

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  HANAMURA MASAAKI

IPC: G03F7/004 ,  C08F220/24 ,  C08G77/18 ,  G03F7/075

Abstract: PROBLEM TO BE SOLVED: To provide: a positive radiation-sensitive composition which is based on polysiloxane, allows formation of an interlayer insulation film having high flatness or evenness of thickness without application irregularity, and has excellent radiation-sensitivity and development margin; the interlayer insulating film formed of the composition; and a method of forming the interlayer insulation film. SOLUTION: The positive radiation-sensitive composition includes a copolymer compound having a structural unit derived from: [A] a siloxane polymer; [B] a quinone-diazide compound; and [C] a polymer compound having (c1) alkyl fluoride (meta)acrylate monomer, (c2) (meta)acrylate monomer including oxyalkylene group in its side chain, and (c3) siloxane group. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供：基于聚硅氧烷的正性辐射敏感性组合物，可以形成具有高平坦度或均匀度的层间绝缘膜，而不施加不规则性，并且具有优异的辐射敏感性和显影余量 ; 由该组合物形成的层间绝缘膜; 以及形成层间绝缘膜的方法。 阳离子敏感性组合物包括具有衍生自：[A]硅氧烷聚合物的结构单元的共聚物化合物; [B]醌二叠氮化合物; 和[C]具有（c1）烷基氟（甲基）丙烯酸酯单体，（c2）（甲基）丙烯酸酯单体（其侧链中包含氧化烯基）的聚合物化合物和（c3）硅氧烷基。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011002517A

公开(公告)日：2011-01-06

申请号：JP2009143673

申请日：2009-06-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  UEDA JIRO ,  FUJIOKA MASAYASU

IPC: G03F7/075 ,  G03F7/004 ,  G03F7/023 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a polysiloxane based positive radiation sensitive composition which can form an interlayer insulation film having superior radiation sensitivity melt flow-proofness, high heat resistance, transparency or the like.SOLUTION: The positive radiation sensitive composition includes [A] siloxane polymer being a hydrolyzable silane compound and/or its hydrolysis condensate, [B] a bissilane compound of structure coupled with a 1C-6C alkylene group, a phenylene group and 1, 4-dialkyl phenylene group, and [C] a quinonediazide compound.

Abstract translation: 要解决的问题：提供可形成具有优异的辐射敏感性熔体流动性，高耐热性，透明性等的层间绝缘膜的基于聚硅氧烷的正辐射敏感组合物。解决方案：正辐射敏感组合物包括[A] 硅氧烷聚合物是可水解的硅烷化合物和/或其水解缩合物，[B]结构为与1C-6C亚烷基，亚苯基和1,4-二烷基亚苯基结合的双硅烷化合物和[C]醌二叠氮化合物 。

公开(公告)号：JP2009223293A

公开(公告)日：2009-10-01

申请号：JP2009004674

申请日：2009-01-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HANAMURA MASAAKI ,  YOSHIDA SHIN ,  ARITOME ISAO ,  KINOSHITA YOSHINORI

IPC: G03F7/075 ,  C08F290/06 ,  C08F299/08 ,  G02B5/20 ,  G02F1/1333 ,  G02F1/1335 ,  G03F7/004 ,  G03F7/023 ,  G03F7/20 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition having high radiation sensitivity and such a development margin as to form a good pattern shape even by development for over an optimum developing time in a developing step, the composition easily forming a patterned thin film excellent in adhesion and being suitable for forming an interlayer dielectric or microlenses. SOLUTION: The radiation-sensitive resin composition includes a polysiloxane having a polymerizable unsaturated bond and a 1,2-quinonediazide compound. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有高辐射敏感性和这种显影余量的辐射敏感组合物，即使在显影步骤中的最佳显影时间下通过显影形成良好图案形状，组合物容易形成 图案化的薄膜具有优异的粘附性并适于形成层间电介质或微透镜。 解决方案：辐射敏感性树脂组合物包括具有可聚合不饱和键的聚硅氧烷和1,2-醌二叠氮化合物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006308612A

公开(公告)日：2006-11-09

申请号：JP2005127255

申请日：2005-04-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MINOWA TAKAKI ,  TAKAMOTO EIJI ,  HANAMURA MASAAKI ,  MITANI KOJI

IPC: G02F1/1339 ,  G02F1/1337 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is suitably used for simultaneously forming protrusions and spacers of a vertical alignment liquid crystal display element. SOLUTION: The radiation-sensitive resin composition for simultaneously forming the protrusions and the spacers for the vertical alignment liquid crystal display element contains: a copolymer [A] of an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride (a1), an epoxy group containing unsaturated compound (a2), an unsaturated compound (a3) expressed by a formula (1) (in the formula, R 1 is a hydrogen atom or a methyl group, R 2 , R 3 and R 4 are independently a hydrogen atom, a hydroxyl group, or a 1-6C alkyl or alkoxyl group, n is an integer of 0-6); and an olefinically unsaturated compound (a4) other than (a1), (a2) and (a3), and [B] a 1,2-quinone diazide compound. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供适合用于同时形成垂直取向液晶显示元件的突起和间隔物的辐射敏感性树脂组合物。 解决方案：用于同时形成突起的辐射敏感性树脂组合物和用于垂直取向液晶显示元件的间隔物包含：不饱和羧酸和/或不饱和羧酸酐（a1）的共聚物[A] ，含有不饱和化合物（a2）的环氧基，式（1）表示的不饱和化合物（a3）（式中，R SB> 1 为氢原子或甲基R SB > 2 ，R SB 3和R SB 4独立地是氢原子，羟基或1-6C烷基或烷氧基，n是整数 0-6）; 和（a1），（a2）和（a3）以外的烯属不饱和化合物（a4）和[B] 1,2-醌二叠氮化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2003347253A

公开(公告)日：2003-12-05

申请号：JP2002157059

申请日：2002-05-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： BESSHO NOBUO ,  HANAMURA MASAAKI ,  YOKOYAMA YASUAKI

IPC: B24B37/30 ,  H01L21/301 ,  H01L21/304 ,  B24B37/04

Abstract: PROBLEM TO BE SOLVED: To provide wafer fixing pellets and a semiconductor wafer processing method using the same wherein a semiconductor wafer is brought into close contact with a base such as a hard plate, an elastic carrier (packing material), or a wafer and fixed so as to be held when the wafer is processed, the wafer as a work is easily separated, a fixing agent layer attached to the wafer is easily removed, the wafer is easily cleaned, and the wafer as the work is kept free from contamination. SOLUTION: The wafer fixing pellets contain liquid crystal compounds. The pellets interposed between the semiconductor wafer and the base where the wafer is fixed are heated to be melted, and the wafer and the base are brought into close contact with each other and fixed with each other. After the exposed surface of the wafer is subjected to processing, the wafer is separated from the base and cleaned. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：为了提供使用其的晶片固定片和半导体晶片处理方法，其中半导体晶片与诸如硬板，弹性载体（包装材料）等的基底紧密接触，或 晶片固定，以便在晶片被处理时被保持，作为工件的晶片容易分离，容易除去附着在晶片上的固定剂层，晶片容易清洁，并且作为工件的晶片保持释放 从污染。 解决方案：晶片固定颗粒含有液晶化合物。 插入在半导体晶片和晶片固定的基板之间的芯片被加热熔化，使晶片和基座彼此紧密接触并彼此固定。 在对晶片的暴露表面进行处理之后，将晶片与基底分离并清洁。 版权所有（C）2004，JPO

公开(公告)号：JP2012168289A

公开(公告)日：2012-09-06

申请号：JP2011027834

申请日：2011-02-10

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KINOSHITA YOSHINORI ,  HANAMURA MASAAKI

IPC: G03F7/075 ,  C08G59/20 ,  C08G77/14 ,  G03F7/022 ,  G03F7/40

CPC classification number: C08G77/14 ,  C08G77/80 ,  C08L83/06 ,  C08L83/00

Abstract: PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive resin composition having a sufficient sensitivity, to provide an interlayer insulating film that uses the positive radiation-sensitive resin composition, has a superior melt flow resistance, heat resistance, and solvent resistance and has a superior voltage holding ratio, and to provide a formation method thereof.SOLUTION: The positive radiation-sensitive resin composition according to the present invention includes: [A1] polyorganosiloxane in which a content ratio of an organic group having an epoxy group out of organic groups bonded to silicon atom at a carbon atom is equal to or greater than 0 mol% but less than 50 mol% and [A2] polyorganosiloxane in which the content ratio of the same is equal to or greater than 50 mol% but less than 100 mol%.

Abstract translation: 要解决的问题：为了提供具有足够灵敏度的正性辐射敏感性树脂组合物，提供使用正性辐射敏感性树脂组合物的层间绝缘膜，具有优异的熔体流动阻力，耐热性和溶剂 并且具有优异的电压保持率，并提供其形成方法。 ＆lt; P＆gt;解决方案：根据本发明的正性辐射敏感性树脂组合物包括：[A1]在碳原子上与硅原子键合的有机基团中具有环氧基的有机基团的含量比相等的聚有机硅氧烷 以上且0摩尔％以上且50摩尔％以下的含量比为50摩尔％以下且[A2]聚有机硅氧烷的含量比例为50摩尔％以上且小于100摩尔％。 版权所有（C）2012，JPO＆INPIT