公开(公告)号：JP2000109341A

公开(公告)日：2000-04-18

申请号：JP28029498

申请日：1998-10-01

Applicant: JSR CORP

Inventor： YAMASHITA TAKANORI ,  OKAMOTO KENJI ,  TAKAHASHI SHIRO ,  UDAGAWA TADAHIKO

IPC: B44C1/16 ,  B29D7/01 ,  C03C8/10 ,  C03C8/16 ,  C03C17/04 ,  C03C17/23 ,  C08J7/02 ,  C08K3/08 ,  C08K5/10 ,  C08K5/5419 ,  C08L101/00 ,  C09D7/12 ,  H01J9/02 ,  H01J11/22 ,  H01J11/24 ,  H01J11/34 ,  H01J11/36 ,  H01J11/38 ,  H01J11/42 ,  H01J11/44 ,  H01J29/00 ,  H01J11/02

Abstract: PROBLEM TO BE SOLVED: To obtain a composition capable of appropriately forming a constituent element of a plasma display panel by kneading inorganic particles with a bonding resin and a plasticizer selected from aliphatic dibasic acid esters and propylene glycol fatty acid esters. SOLUTION: This composition contains inorganic particles, a bonding resin, preferably an acrylic resin and a plasticizer selected from compounds of formulae I and II. In the formula I, R1 and R4 are each 1-30C alkyl, R2 and R3 are each 1-30C alkylene, (m) is 0-5 and (n) is 1-10. In the formula II, R5 is 1-30C alkyl or alkenyl. The content of the bonding resin is preferably 5-80 pts.wt. based on 100 pts.wt. inorganic particles. The content of the plasticizer is preferably 0.1-20 pts.wt. based on 100 pts.wt. inorganic particles. The composition usually contains a solvent. The content of the solvent is preferably

公开(公告)号：JPH11283495A

公开(公告)日：1999-10-15

申请号：JP9844498

申请日：1998-03-26

Applicant: JSR CORP

Inventor： MASUKO HIDEAKI ,  OKAMOTO KENJI ,  YAMASHITA TAKANORI ,  NEMOTO HIROAKI ,  BESSHO NOBUO

IPC: H01J9/02 ,  B05D1/32 ,  B05D5/06 ,  H01J17/49

Abstract: PROBLEM TO BE SOLVED: To form a high definition pattern to improve workability when an electrode constituting each display cell of a plasma display panel is fixed. SOLUTION: An antireflective film forming paste layer 31 formed on a support film 32 is transferred to a board 11, a conductive paste layer 41 formed on another support film 42 is transferred to the antireflective film forming paste layer 31 and a resist layer 51 is formed on the conductive paste layer 41. The resist layer 51 is exposed to form a latent image of a resist pattern and developed to make the resist pattern obvious. The conductive paste layer 41 and the antireflective film forming paste layer 31 are etched to form a pattern thereof corresponding to the resist pattern and the pattern is fired. An electrode is formed by the above-described processes.