公开(公告)号：AU2003234794A1

公开(公告)日：2003-11-11

申请号：AU2003234794

申请日：2003-05-12

Applicant: JSR CORP

Inventor： HANAMURA MASAAKI ,  YOKOYAMA YASUAKI ,  BESSHO NOBUO

IPC: B24B37/04 ,  B24B45/00 ,  C09J11/00 ,  C09J201/00 ,  C09J5/00 ,  C09J7/00 ,  H01L21/304 ,  H01L21/301

Abstract: The present invention relates to a method of temporarily and firmly fixing two solids to each other and to a composition used in the method, which is a method of temporarily fixing, comprising temporarily fixing the two solids to each other with a liquid crystal compound or a composition comprising the liquid crystal compound. This method is used for a method of temporarily fixing a pad for chemical mechanical polishing, for example, to polish a wafer for a semiconductor device fixed on a surface of a base plate, when one solid is a pad for chemical mechanical polishing of a wafer for a semiconductor device and the other is a base plate to fix the pad.

公开(公告)号：CA2414760A1

公开(公告)日：2003-06-21

申请号：CA2414760

申请日：2002-12-19

Applicant: JSR CORP

Inventor： KUMANO ATSUSHI ,  BESSHO NOBUO ,  YAMADA KENJI ,  KONNO KEIJI

IPC: C08F2/44 ,  C08F291/00 ,  C08G59/68 ,  G02B1/04 ,  G02B3/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  G02F1/19 ,  G02B1/00 ,  C09K3/00 ,  G02B6/18

Abstract: A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.

公开(公告)号：CA2408217A1

公开(公告)日：2002-11-12

申请号：CA2408217

申请日：2002-03-08

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  YAMADA KENJI ,  BESSHO NOBUO ,  KUMANO ATSUSHI

IPC: G02B1/04 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G02B3/00 ,  G02B6/00 ,  C08L81/00 ,  C08L85/00 ,  C08L83/04 ,  G02B6/12

Abstract: A composition which can be changed in refractive index by a simple method to give a refractive-index pattern and an optical material in each of which the resultant difference in refractive index is significantly large and is stabl e regardless of conditions of use thereafter; and a method of forming the pattern or optical material. The composition comprises (A) a decomposable compound, (B) a hydrolyzate of an alkoxide such as tetrabutoxytitanium, tetramethoxyzirconium, tetramethoxygermanium, or tetramethoxysilane or of a halide such as tetrachlorosilane, and (C) a radiation-sensitive decomposer. The composition is sensitive to a radiation.

公开(公告)号：AU8015701A

公开(公告)日：2002-03-13

申请号：AU8015701

申请日：2001-08-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/36 ,  C08L101/00 ,  G02B3/00 ,  G02B6/12 ,  G03H1/02

Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

公开(公告)号：AU2001280157B2

公开(公告)日：2005-08-11

申请号：AU2001280157

申请日：2001-08-24

Applicant: JSR CORP

Inventor： SHIMOKAWA TSUTOMU ,  KUMANO ATSUSHI ,  BESSHO NOBUO ,  NISHIMURA ISAO ,  YAMADA KENJI

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F007/004 ,  G03H001/02 ,  G02B006/12 ,  G02B005/18 ,  G02B003/00 ,  C08L101/00 ,  C08L083/14 ,  G03F007/36

Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

公开(公告)号：DE69531268D1

公开(公告)日：2003-08-21

申请号：DE69531268

申请日：1995-05-17

Applicant: JSR CORP ,  SHARP KK

Inventor： MIZUSHIMA SHIGEAKI ,  WATANABE NORIKO ,  IWAGOE HIROKO ,  MAKINO SEIJI ,  KAWAMURA SIGEO ,  TSUDA YUSUKE ,  BESSHO NOBUO

IPC: G02F1/1337 ,  C08G73/10

Abstract: A liquid crystal aligning agent comprising a polyamic acid containing an aliphatic and/or alicyclic hydrocarbon group and a polyimide containing an aliphatic and/or alicyclic hydrocarbon group; and a liquid crystal display device using the liquid crystal aligning agent. This liquid crystal aligning agent gives a liquid crystal aligning film which has good liquid crystal aligning property and in which pretilt angle can be changed by radiation with a small energy and which is suitable for domain-divided alignment type liquid crystal display having a wide view angle.

公开(公告)号：AU2258302A

公开(公告)日：2002-06-24

申请号：AU2258302

申请日：2001-12-06

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G03F7/38 ,  G03F7/36

Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) astabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.

公开(公告)号：EP1235104A4

公开(公告)日：2008-10-01

申请号：EP01958481

申请日：2001-08-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G02B3/00 ,  G02B6/12 ,  G03F7/36 ,  G03H1/02

CPC classification number: C08L83/14 ,  C08L67/00 ,  C08L69/00 ,  C09D183/06 ,  G02B1/045 ,  G02B5/1857 ,  G02B6/124 ,  G03F7/001 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0757 ,  C08L2666/02 ,  C08L2666/28

Abstract: A composition having a refractive index sensitively changeable by a radiation which comprises (A) a decomposable compound, (B) a non-decomposable compound having a refractive index lower than that of the decomposable compound (A), (C) a radiation-sensitive decomposing agent, and (D) a stabilizer. The irradiation of the composition with a radiation ray via a mask decomposes the above (C) and (A) components in a irradiated portion, resulting in the occurrence of the difference in refractive index between an irradiated portion and a non-irradiated portion, which leads to the formation of a pattern having regions of different refractive indexes.

公开(公告)号：AT498634T

公开(公告)日：2011-03-15

申请号：AT02028496

申请日：2002-12-19

Applicant: JSR CORP

Inventor： YAMADA KENJI ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  KONNO KEIJI

IPC: C08F2/44 ,  C08F291/00 ,  C08G59/68 ,  G02B1/04 ,  G02B3/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075

Abstract: A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.

公开(公告)号：AU2002323913B2

公开(公告)日：2007-10-18

申请号：AU2002323913

申请日：2002-12-20

Applicant: JSR CORP

Inventor： BESSHO NOBUO ,  KUMANO ATSUSHI ,  YAMADA KENJI ,  KONNO KEIJI

IPC: G03F7/004 ,  C08F2/44 ,  C08F283/12 ,  C08F291/00 ,  C08G59/68 ,  C09D151/08 ,  G02B1/04 ,  G02B3/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075

Abstract: A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.