公开(公告)号：US20060108322A1

公开(公告)日：2006-05-25

申请号：US10993451

申请日：2004-11-19

Applicant: Wei Wu ,  Zhiyong Li

Inventor： Wei Wu ,  Zhiyong Li

IPC: B44C1/22 ,  B32B27/00 ,  C08L33/00 ,  B32B3/00

CPC classification number: B81C1/0046 ,  B81B2207/07 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y30/00

Abstract: A lift-off material for use in fabricating a nanostructure. The lift-off material includes a first material adapted to, and present in an amount sufficient to provide a predetermined amount of mechanical strength to the nanostructure during fabrication; and a second material adapted to, and present in an amount sufficient to provide a predetermined solubility to the lift-off material.

Abstract translation: 用于制造纳米结构的剥离材料。 剥离材料包括第一材料，其适于并且以足以在制造期间向纳米结构提供预定量的机械强度的量存在; 以及第二材料，其适于并且以足以向剥离材料提供预定溶解度的量存在。

公开(公告)号：US20050212178A1

公开(公告)日：2005-09-29

申请号：US10851113

申请日：2004-05-24

Applicant: Chin-Chung Nien ,  Ta-Chuan Liu ,  Hong Hocheng

Inventor： Chin-Chung Nien ,  Ta-Chuan Liu ,  Hong Hocheng

IPC: B29C59/02 ,  B81C1/00 ,  B81C99/00 ,  G03F7/00 ,  H05K3/00

CPC classification number: G03F7/0002 ,  B81C1/0046 ,  B81C99/0065 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y40/00

Abstract: The present invention relates to a capacitive measurement method and system for a nanoimprint process, which arranges a plurality of electrode plates on both the backside of the master mold and the surface of the supporting base carrying the wafer substrate to form a plurality of capacitive structures. By monitoring the capacitance variation signal caused by the continuous variations in the thickness and the material properties of the resist during the imprint process, the status of the resist can be monitored and recorded, which is used as the references for determining the timing to demold in the nanoimprint process and for maintaining the flatness of the resist. Accordingly, the nanoimprint process can be automated easier and the quality and the throughput of of the nanometer scaled imprint product can be improved.

Abstract translation: 本发明涉及一种用于纳米压印工艺的电容测量方法和系统，其在主模的背面和承载晶片衬底的支撑基体的表面上布置多个电极板以形成多个电容结构。 通过监测由压印过程中厚度的连续变化和抗蚀剂的材料特性引起的电容变化信号，可以监测和记录抗蚀剂的状态，作为确定脱模时间的参考 纳米压印工艺和用于保持抗蚀剂的平整度。 因此，纳米压印工艺可以更容易自动化，并且能够提高纳米压印产品的质量和生产量。

公开(公告)号：US20030209314A1

公开(公告)日：2003-11-13

申请号：US10436657

申请日：2003-05-13

Inventor： Lingjie J. Guo ,  Xing Cheng

IPC: B32B031/00

CPC classification number: B81C1/00119 ,  B01L3/502707 ,  B01L3/502715 ,  B01L2200/12 ,  B01L2300/0681 ,  B01L2300/0896 ,  B01L2400/0418 ,  B01L2400/0421 ,  B01L2400/086 ,  B81B2201/058 ,  B81B2203/0338 ,  B81C2201/0153 ,  B82Y30/00 ,  G01N2021/058 ,  Y10S977/78 ,  Y10S977/84 ,  Y10S977/882

Abstract: A method of forming nanofluidic enclosed channels includes providing a first substrate having a layer of a first material disposed thereon. A plurality of nanoscale slots is formed along a second substrate using nanolithography, etching, or other disclosed techniques. The first substrate is then bonded to the second substrate such that the layer of the first material on the first substrate is adjacent the plurality of slots on the second substrate to define a plurality of enclosed nanofluidic channels therethrough.

Abstract translation: 形成纳流体封闭通道的方法包括提供具有设置在其上的第一材料层的第一基底。 使用纳米光刻，蚀刻或其它公开的技术沿着第二基板形成多个纳米级槽。 然后将第一衬底接合到第二衬底，使得第一衬底上的第一材料层与第二衬底上的多个槽相邻以限定穿过其中的多个封闭的纳米流体通道。

公开(公告)号：US09934973B2

公开(公告)日：2018-04-03

申请号：US15538564

申请日：2015-12-22

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

Inventor： Stefan Landis ,  Nicolas Posseme ,  Sebastien Barnola ,  Thibaut David ,  Lamia Nouri

IPC: H01L21/266 ,  C23C14/48 ,  C23C14/04 ,  H01L21/3065 ,  H01L21/306 ,  B81C1/00 ,  H01L33/00 ,  H01L33/22 ,  H01L31/18 ,  H01L31/0392 ,  G03F7/00

CPC classification number: H01L21/266 ,  B81C1/00103 ,  B81C1/0046 ,  B81C1/00587 ,  B81C2201/0136 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y40/00 ,  C23C14/042 ,  C23C14/48 ,  G03F7/0002 ,  H01L21/30604 ,  H01L21/30608 ,  H01L21/3065 ,  H01L21/3086 ,  H01L21/31111 ,  H01L21/31144 ,  H01L31/02363 ,  H01L31/0392 ,  H01L31/1852 ,  H01L33/007 ,  H01L33/20 ,  H01L33/22 ,  Y02E10/50

Abstract: The invention relates in particular to a method for producing subsequent patterns in an underlying layer (120), the method comprising at least one step of producing prior patterns in a carbon imprintable layer (110) on top of the underlying layer (120), the production of the prior patterns involving nanoimprinting of the imprintable layer (110) and leave in place a continuous layer formed by the imprintable layer (110) and covering the underlying layer (120), characterized in that it comprises the following step: at least one step of modifying the underlying layer (120) via ion implantation (421) in the underlying layer (120), the implantation (421) being carried out through the imprintable layer (110) comprising the subsequent patterns, the parameters of the implantation (421) being chosen in such a way as to form, in the underlying layer (120), implanted zones (122) and non-implanted zones, the non-Implanted zones defining the subsequent patterns and having a geometry that is dependent on the prior patterns.

公开(公告)号：US20170372904A1

公开(公告)日：2017-12-28

申请号：US15538564

申请日：2015-12-22

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

Inventor： Stephan LANDIS ,  Nicolas POSSEME ,  Sebastien BARNOLA ,  Thibaut DAVID ,  Lamia NOURI

IPC: H01L21/266 ,  C23C14/04 ,  C23C14/48 ,  H01L21/306 ,  H01L21/3065 ,  H01L33/22 ,  G03F7/00 ,  H01L31/0392 ,  H01L31/18 ,  H01L33/00 ,  B81C1/00

CPC classification number: H01L21/266 ,  B81C1/00103 ,  B81C1/0046 ,  B81C1/00587 ,  B81C2201/0136 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y40/00 ,  C23C14/042 ,  C23C14/48 ,  G03F7/0002 ,  H01L21/30604 ,  H01L21/30608 ,  H01L21/3065 ,  H01L21/3086 ,  H01L21/31111 ,  H01L21/31144 ,  H01L31/02363 ,  H01L31/0392 ,  H01L31/1852 ,  H01L33/007 ,  H01L33/20 ,  H01L33/22 ,  Y02E10/50

Abstract: The invention relates in particular to a method for producing subsequent patterns in an underlying layer (120), the method comprising at least one step of producing prior patterns in a carbon imprintable layer (110) on top of the underlying layer (120), the production of the prior patterns involving nanoimprinting of the imprintable layer (110) and leave in place a continuous layer formed by the imprintable layer (110) and covering the underlying layer (120), characterized in that it comprises the following step: at least one step of modifying the underlying layer (120) via ion implantation (421) in the underlying layer (120), the implantation (421) being carried out through the imprintable layer (110) comprising the subsequent patterns, the parameters of the implantation (421) being chosen in such a way as to form, in the underlying layer (120), implanted zones (122) and non-implanted zones, the non-Implanted zones defining the subsequent patterns and having a geometry that is dependent on the prior patterns.

公开(公告)号：US20150239172A1

公开(公告)日：2015-08-27

申请号：US14431348

申请日：2013-09-27

Applicant: NORTH CAROLINA STATE UNIVERSITY

Inventor： Thomas A. Dow ,  Erik Zdanowicz ,  Alexander Sohn ,  Ron Scattergood ,  William John Nowak, JR.

IPC: B29C59/02 ,  B29C33/42 ,  H01L31/0232 ,  B29C33/38

CPC classification number: B29C59/022 ,  B29C33/3878 ,  B29C33/424 ,  B29C2059/023 ,  B29K2995/0018 ,  B29K2995/0093 ,  B29L2011/00 ,  B29L2031/7562 ,  B81C99/0025 ,  B81C2201/0153 ,  B82Y40/00 ,  H01L31/02325

Abstract: The subject matter described herein relates to methods and systems for fast imprinting of nanometer scale features in a workpiece. According to one aspect, a system for producing nanometer scale features in a workpiece is disclosed. The system includes a die having a surface with at least one nanometer scale feature located thereon. A first actuator moves the die with respect to the workpiece such that the at least one nanometer scale feature impacts the workpiece and imprints a corresponding at least one nanometer scale feature in the workpiece.

Abstract translation: 本文所述的主题涉及用于在工件中快速压印纳米尺度特征的方法和系统。 根据一个方面，公开了一种用于在工件中制造纳米尺度特征的系统。 该系统包括具有位于其上的具有至少一个纳米级特征的表面的管芯。 第一致动器相对于工件移动模具，使得至少一个纳米尺度特征冲击工件并在工件中压印相应的至少一个纳米尺度特征。

公开(公告)号：US08636937B2

公开(公告)日：2014-01-28

申请号：US12083829

申请日：2005-10-20

Applicant: Fengxiang Zhang ,  Hong Yee Low

Inventor： Fengxiang Zhang ,  Hong Yee Low

IPC: B29C59/02

CPC classification number: B29C59/02 ,  B81C99/0085 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T428/24479

Abstract: A method for forming hierarchical patterns on an article by nanoimprinting is disclosed. The method includes using a first mold to form a primary pattern on the article at a first temperature and a first pressure, the first temperature and the first pressure being able to reduce the elastic modulus of the article; and using a second mold to form a second pattern on the primary pattern at a second temperature that is below the article's glass transition temperature, the forming of the second pattern being at a second pressure.

Abstract translation: 公开了一种通过纳米压印在文章上形成分层图案的方法。 该方法包括使用第一模具在第一温度和第一压力下在制品上形成主要图案，第一温度和第一压力能够降低制品的弹性模量; 并且使用第二模具在低于制品的玻璃化转变温度的第二温度下在初级图案上形成第二图案，第二图案的形成处于第二压力。

公开(公告)号：US08613879B2

公开(公告)日：2013-12-24

申请号：US12223198

申请日：2007-01-24

Applicant: Micah James Atkin

Inventor： Micah James Atkin

IPC: B29C59/02

CPC classification number: B01L3/502707 ,  B01L2200/12 ,  B01L2300/0816 ,  B01L2300/0887 ,  B29C59/022 ,  B32B38/00 ,  B32B38/0008 ,  B32B38/162 ,  B32B39/00 ,  B32B2038/1891 ,  B32B2310/0831 ,  B32B2310/14 ,  B32B2425/00 ,  B32B2457/08 ,  B81C1/0046 ,  B81C2201/0153

Abstract: A method of forming a stamped feature (P) on a substrate (S) includes: applying a plurality of stamping tool segments (32, 40a, 40b, 40c, 50, 60, 70, 80, 92) to at least one surface of the substrate. An arrangement (30, 90) for forming a stamped feature (P) on a substrate (S) includes a plurality of stamping tool segments (32, 40a, 40b, 40c, 50, 60, 70, 80, 92) that actuatable individually, in concert in groups of more than one, or combinations thereof.

Abstract translation: 在衬底（S）上形成冲压特征（P）的方法包括：将多个冲压工具段（32,50a，40b，40c，50,60,70,80,92）施加到至少一个表面 底物。 用于在衬底（S）上形成冲压特征（P）的装置（30,90）包括多个单独致动的冲压工具段（32,50a，40b，40c，50,60,70,80,92） ，多于一个的组合，或其组合。

公开(公告)号：US08409488B2

公开(公告)日：2013-04-02

申请号：US10562014

申请日：2004-06-22

Applicant: Tormen Massimo

Inventor： Tormen Massimo

IPC: B29C55/00

CPC classification number: G03F7/0002 ,  B29C33/02 ,  B81C99/0085 ,  B81C2201/0153 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00

Abstract: A lithographic process for forming a pattern in relief (20) on a mass (10) of polymeric material comprises the steps of: preparing the mass (10) of polymeric material and a die (12) having a surface region (14) facing towards the mass (10) of polymeric material and which reproduces in negative the pattern in relief (20); heating the die (12) and putting the mass (10) of polymeric material into contact with the die (12) in any temporal sequence, in such a way that the part of the mass (10) of polymeric material in contact with the surface zone (14) is subject to softening; and separating the die (12) from the mass (10) of polymeric material on the surface of which the pattern in relief (20) has been formed. The heating of at least one part of the die (12) is obtained by generation of thermal energy upon dissipation of another form of energy in at least one region (16) of the die (12).

Abstract translation: 用于在聚合物材料（10）上形成浮雕（20）中的图案的平版印刷工艺包括以下步骤：制备聚合物材料块（10）和模具（12），所述模具（12）具有面向 聚合物材料的质量（10）并且以凹凸（20）的形式呈现为负值; 加热模具（12）并将聚合材料的质量块（10）以任何时间顺序与模具（12）接触，使得聚合材料质量（10）的与表面接触的部分 区域（14）容易软化; 以及将模具（12）与形成有凹凸图案（20）的表面上的聚合材料块（10）分离。 模具（12）的至少一部分的加热通过在模具（12）的至少一个区域（16）中消散另一形式的能量时产生热能而获得。

公开(公告)号：US20100169042A1

公开(公告)日：2010-07-01

申请号：US12600527

申请日：2008-04-02

Applicant: Yuki Aritsuka ,  Morihisa Hoga

Inventor： Yuki Aritsuka ,  Morihisa Hoga

IPC: G06F15/00

CPC classification number: G01B21/20 ,  B81C99/0065 ,  B81C2201/0153 ,  B81C2201/0198 ,  G03F1/84

Abstract: A system for measuring a shape, includes an external storage unit storing tolerances of first and second shape factors defining a design shape of a measuring object; a first measuring tool measuring the first shape factor of the measuring object to obtain measurement data; and a measurement processing unit determining a shape of the measuring object. The measurement processing unit includes; a comparison module comparing the measurement data of the first shape factor with the tolerance of the first shape factor; a verification module composing a predicted shape using the measurement data and verifying whether the predicted shape is formed as a figure; a calculation module calculating predicted data of the second shape factor from the predicted shape; and a determination module determining a measurement shape by comparing the predicted data with the tolerance of the second shape factor.

Abstract translation: 一种用于测量形状的系统，包括存储限定测量对象的设计形状的第一和第二形状因子的公差的外部存储单元; 第一测量工具，测量测量对象的第一形状因子以获得测量数据; 以及测量处理单元，确定测量对象的形状。 测量处理单元包括： 将所述第一形状因子的测量数据与所述第一形状系数的公差进行比较的比较模块; 使用所述测量数据构成预测形状的验证模块，并验证所述预测形状是否形成为图形; 计算模块，根据所述预测形状计算所述第二形状因子的预测数据; 以及确定模块，通过将预测数据与第二形状因子的公差进行比较来确定测量形状。