公开(公告)号：US07474729B2

公开(公告)日：2009-01-06

申请号：US11510615

申请日：2006-08-28

Applicant: Kwon-ha Yoon ,  Kyong-woo Kim

Inventor： Kwon-ha Yoon ,  Kyong-woo Kim

IPC: G21K7/00

CPC classification number: G21K7/00 ,  G21K2201/06 ,  H05G2/008

Abstract: A soft X-ray microscope includes a table (10); a housing (20) installed to the upper side of the table (10) and having a partition (22); a light source chamber (30) installed lower than the partition (22) of the housing (20) to project a light to liquid jetted under a high pressure to generate plasma; a mirror chamber (40), installed above the partition (22) of the housing (20), in which first and second mirror (410 and 430) are respectively installed to upper and lower sides of a holder (420) for storing a living sample, the soft X-ray generated by the plasma generated in the light source chamber (30) illuminates the living sample, and the soft X-ray penetrated the living sample is amplified to obtain an image in an image capturing chamber; and an image capturing chamber (50) installed to the upper side of the housing (20) to amplify a light image signal amplified through the mirror chamber (40) and to capture the light image on an external screen to allow distinguishing the light image from exterior.

Abstract translation: 软X射线显微镜包括台（10）; 安装在所述工作台（10）的上侧并具有隔板（22）的壳体（20）; 光源室（30），其安装在所述壳体（20）的隔板（22）的下方，以将在高压下喷射的液体投射到液体中以产生等离子体; 安装在所述壳体（20）的隔板（22）上方的反射镜室（40），其中第一和第二反射镜（410和430）分别安装在用于储存活体的保持器（420）的上侧和下侧 样品中，由光源室（30）中产生的等离子体产生的软X射线照射活体样品，并且穿透活体样品的软X射线被放大，以在摄像室中获得图像; 以及安装到所述壳体（20）的上侧的图像捕获室（50），以放大通过所述镜室（40）放大的光图像信号，并将所述光图像捕获到外部屏幕上以允许将所述光图像与 外观。

公开(公告)号：US20070292680A1

公开(公告)日：2007-12-20

申请号：US11808703

申请日：2007-06-12

Applicant: Hajime Nakayama ,  Susumu Sugiyama

Inventor： Hajime Nakayama ,  Susumu Sugiyama

IPC: G11B11/105

CPC classification number: G02B5/3091 ,  G02F1/1335 ,  G02F2201/50 ,  G21K2201/06 ,  Y10T428/26

Abstract: An optical film having a value of 1.6 or more, wherein the value is obtained by dividing a larger value by a smaller value of the maximum X-ray diffraction intensity within a range 2θ=10 to 40° in a longitudinal direction of the film and the maximum X-ray diffraction intensity within a range 2θ=10 to 40° in a direction approximately vertical to the longitudinal direction of the film, and an optical film having a value of 1.3 or more, wherein the value is obtained by dividing a larger value by a smaller value of a tensile elastic modulus in a longitudinal direction of the film and a tensile elastic modulus in a direction approximately vertical to the longitudinal direction of the film.

Abstract translation: 一种值为1.6以上的光学膜，其特征在于，通过在膜的长度方向上将最大X射线衍射强度的较大值除以2θ= 10〜40°的范围内的较大值来获得， 在与膜长度方向大致垂直的方向上的2θ= 10〜40°的范围内的最大X射线衍射强度和1.3以上的光学膜，其中，通过将较大的 通过在膜的纵向方向上的拉伸弹性模量值较小的值和在与膜的纵向方向大致垂直的方向上的拉伸弹性模量的值。

公开(公告)号：US20070183581A1

公开(公告)日：2007-08-09

申请号：US11700152

申请日：2007-01-31

Applicant: Bjorn Heismann ,  Eckhard Hempel ,  Stefan Popescu

Inventor： Bjorn Heismann ,  Eckhard Hempel ,  Stefan Popescu

IPC: G03F1/00 ,  G21K1/00

CPC classification number: A61B6/06 ,  A61B6/00 ,  A61B6/032 ,  A61B6/4014 ,  A61B6/4092 ,  A61B6/4233 ,  A61B6/4266 ,  A61B6/4291 ,  A61B6/4441 ,  A61B6/484 ,  G03B42/02 ,  G21K2201/06 ,  G21K2207/005

Abstract: A focus/detector system of an X-ray apparatus is disclosed for generating projective or tomographic phase contrast recordings. In at least one embodiment, the system includes a beam source, including a focus and a focus-side source grating, arranged in the beam path to generate a field of ray-wise coherent X-rays; and a grating/detector arrangement having a phase grating with grating lines arranged parallel to the source grating for generating an interference pattern and a detector having a multiplicity of detector elements arranged flat for measuring the radiation intensity behind the phase grating. Further, the detector elements are formed by a multiplicity of elongate detection strips, which are aligned parallel to the grating lines of the phase grating. Furthermore, at least one embodiment also relates to the use of this focus/detector system in an X-ray system for generating projective recordings or in C-arc equipment or a CT system, and/or to a method for generating projective and tomographic X-ray recordings of a subject.

Abstract translation: 公开了用于产生投影或层析相位对比记录的X射线装置的焦点/检测器系统。 在至少一个实施例中，系统包括布置在光束路径中以产生射线相干X射线场的束源，包括焦点和焦点侧源光栅; 以及具有相位光栅的光栅/检测器装置，其具有平行于源光栅布置的光栅线，用于产生干涉图案;以及检测器，具有平坦布置的多个检测器元件，用于测量相位光栅后面的辐射强度。 此外，检测器元件由多个细长的检测条形成，其平行于相位光栅的光栅线排列。 此外，至少一个实施例还涉及在X射线系统中用于产生投影记录或在C弧设备或CT系统中使用该焦点/检测器系统和/或用于产生投影和断层X的方法 录音的主题。

公开(公告)号：US07109503B1

公开(公告)日：2006-09-19

申请号：US11067099

申请日：2005-02-25

Applicant: Norbert R. Bowering ,  Bjorn A. M. Hansson ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Alexander I. Ershov ,  William N. Partlo

Inventor： Norbert R. Bowering ,  Bjorn A. M. Hansson ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Alexander I. Ershov ,  William N. Partlo

IPC: G01J1/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

Abstract translation: 公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。 在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。 管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。 在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。 在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

公开(公告)号：US20060141267A1

公开(公告)日：2006-06-29

申请号：US11357800

申请日：2006-02-16

Applicant: Takahiro Okura ,  Kazuya Shimizu ,  Masakazu Takei

Inventor： Takahiro Okura ,  Kazuya Shimizu ,  Masakazu Takei

IPC: B32B17/06 ,  B32B15/04 ,  B32B19/00 ,  B22F3/26 ,  B32B9/00

CPC classification number: C23C14/081 ,  C23C14/0021 ,  C23C14/0694 ,  C23C14/08 ,  C23C14/083 ,  C23C14/10 ,  C23C14/14 ,  C23C14/32 ,  C30B23/02 ,  C30B29/02 ,  G02B5/0858 ,  G21K1/06 ,  G21K2201/06 ,  Y10T428/12174 ,  Y10T428/12736 ,  Y10T428/12896 ,  Y10T428/12993 ,  Y10T428/31678

Abstract: The metal film of the present invention is a dense film of a single crystal that has very low surface roughness and very good crystal orientation because an arithmetic mean roughness of the surface is not larger than 2 nm and a (111) peak intensity of X-ray diffraction is not less than 20 times the sum of all other peaks. Also the metal oxide film of the present invention is a dense film that includes less oxygen defects and almost no voids therein because a content of a non-oxidized metal is not higher than 1 mole % of a metal component that constitutes the metal oxide and a packing density is 0.98 or higher.

公开(公告)号：US07064806B2

公开(公告)日：2006-06-20

申请号：US10768896

申请日：2004-01-30

Applicant: Toshihiko Tsuji

Inventor： Toshihiko Tsuji

IPC: G03B27/54 ,  G03B27/72

CPC classification number: G03F7/702 ,  G21K2201/06

Abstract: An exposure apparatus includes an illumination optical system for illuminating a reflection mask that forms a pattern, by using light from a light source, wherein the illumination optical system includes a field stop that defines an illuminated area on the reflection mask, and has an opening, and an imaging system for introducing the light from the opening in the field stop into the reflection mask, the imaging system being a coaxial optical system, wherein a principal ray of the imaging system at a side of the reflection mask forming an inclination angle to a common axis of the coaxial optical system, the inclination angle being approximately equal to an angle between a principal ray of the projection optical system at the side of the reflection mask and a normal to a surface of the reflection mask.

Abstract translation: 曝光装置包括：照明光学系统，用于通过使用来自光源的光照射形成图案的反射掩模，其中所述照明光学系统包括限定所述反射掩模上的照明区域的场停止件，并且具有开口， 以及成像系统，用于将来自所述场停止件中的开口的光引入所述反射掩模中，所述成像系统是同轴光学系统，其中，所述成像系统在所述反射掩模侧的主光线形成与所述反射掩模的倾斜角度 同轴光学系统的公共轴，倾斜角度近似等于投影光学系统在反射掩模侧面的主光线与反射掩模表面法线之间的角度。

公开(公告)号：US20050269529A1

公开(公告)日：2005-12-08

申请号：US11174442

申请日：2005-06-29

Applicant: Alexander Ershov ,  William Marx ,  Norbert Bowering ,  Bjorn Hansson ,  Oleh Khodykin ,  Igor Fomenkov ,  William Partlo

Inventor： Alexander Ershov ,  William Marx ,  Norbert Bowering ,  Bjorn Hansson ,  Oleh Khodykin ,  Igor Fomenkov ,  William Partlo

IPC: G03F7/20 ,  G01J1/00

CPC classification number: B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

Abstract translation: 公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。 在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。 在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。 在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。 在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

公开(公告)号：US20050057737A1

公开(公告)日：2005-03-17

申请号：US10768896

申请日：2004-01-30

Applicant: Toshihiko Tsuji

Inventor： Toshihiko Tsuji

IPC: G03B27/54 ,  G03F7/20 ,  G21K1/00 ,  H01L21/027

CPC classification number: G03F7/702 ,  G21K2201/06

Abstract: An exposure apparatus includes an illumination optical system for illuminating a reflection mask that forms a pattern, by using light from a light source, wherein the illumination optical system includes a field stop that defines an illuminated area on the reflection mask, and has an opening, and an imaging system for introducing the light from the opening in the field stop into the reflection mask, the imaging system being a coaxial optical system, wherein a principal ray of the imaging system at a side of the reflection mask forming an inclination angle to a common axis of the coaxial optical system, the inclination angle being approximately equal to an angle between a principal ray of the projection optical system at the side of the reflection mask and a normal to a surface of the reflection mask.

Abstract translation: 曝光装置包括：照明光学系统，用于通过使用来自光源的光照射形成图案的反射掩模，其中所述照明光学系统包括限定所述反射掩模上的照明区域的场停止件，并且具有开口， 以及成像系统，用于将来自所述场停止件中的开口的光引入所述反射掩模中，所述成像系统是同轴光学系统，其中，所述成像系统在所述反射掩模侧的主光线形成与所述反射掩模的倾斜角度 同轴光学系统的公共轴，倾斜角度近似等于投影光学系统在反射掩模侧面的主光线与反射掩模表面法线之间的角度。

公开(公告)号：US06195410B1

公开(公告)日：2001-02-27

申请号：US09491956

申请日：2000-01-26

Applicant: Webster C. Cash, Jr.

Inventor： Webster C. Cash, Jr.

IPC: G01N2306

CPC classification number: G01N23/04 ,  G21K2201/06

Abstract: An interferometer that uses plane mirrors at grazing incidence to create interference fringes in the extreme ultraviolet and x-ray portions of the spectrum. X-ray interferometry has historically been implemented through narrow band, diffractive systems that split the wavefront. By using two separate optical channels at grazing incidence to create interference from two areas of the wavefront, this system has broad band response and much higher efficiency. The interferometer has applications to telescopes, microscopes and spectrometers in the extreme ultraviolet and x-ray, and high contrast imaging in the visible.

Abstract translation: 使用平面镜在掠射入射处的干涉仪在光谱的极紫外和X射线部分产生干涉条纹。 历史上，X射线干涉测量是通过分裂波前的窄带衍射系统实现的。 通过在掠射入射处使用两个独立的光学通道来产生来自波前两个区域的干扰，该系统具有宽带响应和更高的效率。 该干涉仪可用于望远镜，显微镜和光谱仪中的极紫外和X射线以及可见光的高对比度成像。

公开(公告)号：US5882369A

公开(公告)日：1999-03-16

申请号：US702721

申请日：1996-11-04

Applicant: Anders Rindby ,  Bengt Stocklassa ,  Sture Larsson ,  Per Engstrom

Inventor： Anders Rindby ,  Bengt Stocklassa ,  Sture Larsson ,  Per Engstrom

IPC: G21K1/00 ,  B22D25/02 ,  B29C53/22 ,  C03B17/04 ,  C03B19/02 ,  C03B23/047 ,  C03B23/207 ,  G21K1/06 ,  C03B23/04 ,  B29C55/00

CPC classification number: C03B19/025 ,  B22D25/02 ,  B29C53/22 ,  C03B17/04 ,  C03B19/02 ,  C03B23/047 ,  C03B23/207 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067 ,  Y10S65/08

Abstract: A method for producing at least one capillary in a moldable material. The capillary has a large length in relation to its cross-section. A closed cavity is created within the moldable material and the material is stretched in at least one direction so that the cavity forms a substantially elliptical or parabolic capillary whose length is large in relationship to its cross-section. The material may be heated before stretching so that the cavity is expanded and shaped into an essentially spherical form. Suitable materials for the practice of the invention include glass, plastic, quartz, silicon, or metal.

Abstract translation: PCT No.PCT / SE95 / 00227 Sec。 371日期：1996年11月4日 102（e）日期1996年11月4日PCT提交1995年3月3日PCT公布。 公开号WO95 / 23770 日期1995年9月8日一种用于在可模制材料中生产至少一种毛细管的方法。 毛细管相对于其横截面具有大的长度。 在可模制材料内产生闭合腔，并且材料在至少一个方向上被拉伸，使得空腔形成基本上椭圆或抛物线的毛细管，其长度与其横截面相关。 材料可以在拉伸之前被加热，使得空腔膨胀并成形为基本上球形。 用于实施本发明的合适材料包括玻璃，塑料，石英，硅或金属。