公开(公告)号：US3694687A

公开(公告)日：1972-09-26

申请号：US3694687D

申请日：1970-08-12

Applicant: COLUMBIA BROADCASTING SYST INC

Inventor： GLENN WILLIAM ELLIS

IPC: H01J3/10 ,  H01J37/063 ,  H01J37/065 ,  H01J29/74 ,  H01J29/02 ,  H01J29/82

CPC classification number: H01J37/063 ,  H01J3/10 ,  H01J37/065

Abstract: In an electron gun, an anode structure in which the electron beam aperture is defined by four mutually insulated anode segments which may be energized to provide beam centering. In a preferred embodiment, the anode segments are shaped to intercept the beam if it is off-center, and are returned to ground potential through respective resistors thereby being operative automatically to center the beam.

Abstract translation: 在电子枪中，阳极结构中电子束孔由四个相互绝缘的阳极段限定，阳极段可被激励以提供光束对中。 在一个优选实施例中，如果阳极段偏心，则阳极段被成形为截取光束，并且通过相应的电阻器返回到接地电位，从而自动地使光束中心。

公开(公告)号：US3245794A

公开(公告)日：1966-04-12

申请号：US23378062

申请日：1962-10-29

Applicant: IHILCO CORP

Inventor： CONLEY JAMES W

IPC: C23F1/02 ,  G03B27/53 ,  H01J3/10

CPC classification number: G03B27/53 ,  C23F1/02 ,  H01J3/10 ,  Y10S438/948

公开(公告)号：WO98052205A1

公开(公告)日：1998-11-19

申请号：PCT/NO1998/000144

申请日：1998-05-11

IPC: A61N5/06 ,  H01J20060101 ,  H01J3/10

CPC classification number: A61N5/062 ,  A61N2005/0632 ,  A61N2005/0644

Abstract: A device for irradiating a limited, defined area where uniform and intense irradiation is obtained of a sharply defined light field (7) of variable size, the light from a halogen lamp (1) or similar incoherent light source being directed by means of an elliptical mirror (2) towards one end surface (3) of a transparent rod (4) whose opposite end surface (6) is thereby uniformly irradiated and is imaged by a lens (7) in the area (9) which has to be irradiated.

Abstract translation: 一种用于照射限定的限定区域的装置，其中获得了具有可变尺寸的明确定义的光场（7）的均匀和强烈照射，来自卤素灯（1）或类似非相干光源的光通过椭圆形 反射镜（2）朝向透明杆（4）的一个端面（3），其相反的端面（6）由此被均匀地照射，并且通过透镜（7）在必须被照射的区域（9）中成像。

公开(公告)号：WO02103337A3

公开(公告)日：2003-07-03

申请号：PCT/JP0205786

申请日：2002-06-11

Applicant: EBARA CORP ,  NAKASUJI MAMORU ,  KATO TAKAO ,  NOJI NOBUHARU ,  SATAKE TOHRU ,  MURAKAMI TAKESHI ,  WATANABE KENJI

Inventor： NAKASUJI MAMORU ,  KATO TAKAO ,  NOJI NOBUHARU ,  SATAKE TOHRU ,  MURAKAMI TAKESHI ,  WATANABE KENJI

IPC: G01N23/225 ,  H01J3/02 ,  H01J3/10 ,  H01J37/04 ,  H01J37/06 ,  H01J37/063 ,  H01J37/073 ,  H01J37/12 ,  H01J37/147 ,  H01J37/28 ,  H01J37/317 ,  H01L21/66 ,  H01J37/26

CPC classification number: H01J3/10 ,  B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J3/021 ,  H01J37/063 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/3174 ,  H01J2237/06316 ,  H01J2237/2817

Abstract: An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.

Abstract translation: 电子束装置，其中从具有阴极和阳极的电子枪发射的电子束被聚焦并照射到样品上，并且从样品发出的二次电子被引导到检测器中，该装置还包括用于优化照射的装置 从电子枪发射到样品上的电子束的优化装置可以是设置在电子枪附近的两级偏转器，其偏转并引导沿特定方向发射的电子束以与光学器件对准 电子束装置的轴方向，由于在所述阴极的晶体取向中具有更高水平的特定晶体取向的事实，在特定方向上发射的电子束相对于光轴成一定角度 电子束发射与光轴方向不对准。

公开(公告)号：RU2462782C1

公开(公告)日：2012-09-27

申请号：RU2011122946

申请日：2011-06-08

Applicant: KUMAKHOV MURADIN ABUBEKIROVICH

Inventor： KUMAKHOV MURADIN ABUBEKIROVICH ,  TEGAEV RAMAZAN ISAEVICH

IPC: H01J3/10

Abstract: Заявленнаягруппаизобретенийотноситсяк средствамдляпреобразованияпучковускоренныхзаряженныхчастици направляющейструктуредляускоренныхзаряженныхчастиц. Способпредусматриваетиспользованиенаправляющейструктуры, содержащейканалдлятранспортированиячастицисходногопучка, имеющийпрямуюпродольнуюосьи стенкуизматериала, способногок электризациизарядомтогожезнака, чтои частицыисходногопучка, ивнутреннююповерхностьстенкив видетелавращения; каналсужаетсяв направленииотвходак выходу. Особенностьюизобретенийявляетсято, чтообразующейуказаннойповерхностиявляетсядугагладкойкривойс выпуклостью, обращеннойв сторону, противоположнуюпродольнойоси. Приэтомнаименьшийрадиус R кривизныуказаннойдугисвязанс наибольшейэнергиейЕ изарядом Q частицпучкасоотношением: E/Q

公开(公告)号：HU0003015A2

公开(公告)日：2001-01-29

申请号：HU0003015

申请日：1998-05-11

Applicant: PHOTOCURE ASA

Inventor： STEEN HARALD B

IPC: A61N5/06 ,  H01J20060101 ,  H01J3/10

Abstract: A device for irradiating a limited, defined area where uniform and intense irradiation is obtained of a sharply defined light field (7) of variable size, the light from a halogen lamp (1) or similar incoherent light source being directed by means of an elliptical mirror (2) towards one end surface (3) of a transparent rod (4) whose opposite end surface (6) is thereby uniformly irradiated and is imaged by a lens (7) in the area (9) which has to be irradiated.

公开(公告)号：PL336944A1

公开(公告)日：2000-07-17

申请号：PL33694498

申请日：1998-05-11

Applicant: PHOTOCURE ASA

Inventor： STEEN HARALD B

IPC: A61N5/06 ,  H01J20060101 ,  H01J3/10

Abstract: A device for irradiating a limited, defined area where uniform and intense irradiation is obtained of a sharply defined light field (7) of variable size, the light from a halogen lamp (1) or similar incoherent light source being directed by means of an elliptical mirror (2) towards one end surface (3) of a transparent rod (4) whose opposite end surface (6) is thereby uniformly irradiated and is imaged by a lens (7) in the area (9) which has to be irradiated.

公开(公告)号：DE2801338C2

公开(公告)日：1983-02-03

申请号：DE2801338

申请日：1978-01-13

Applicant: HUGHES AIRCRAFT CO., 90230 CULVER CITY, CALIF., US

Inventor： OZDEMIR, FAIK S., THOUSAND OAKS, CALIF., US ,  LOPER, DALL D., FRESNO, CALIF., US

IPC: H01L29/812 ,  H01J37/304 ,  H01L21/027 ,  H01L21/338 ,  H01L23/544 ,  H01L21/283 ,  H01L29/76 ,  H01J3/10

公开(公告)号：DE2702444B2

公开(公告)日：1980-02-14

申请号：DE2702444

申请日：1977-01-20

Applicant: SIEMENS AG, 1000 BERLIN UND 8000 MUENCHEN

Inventor： LISCHKE, BURKHARD, DR.-ING. ,  OELMANN, ANDREAS, DR.-ING. ,  FROSIEN, JUERGEN, DIPL.- ING.

IPC: H01L21/027 ,  H01J37/30 ,  H01J37/304 ,  H01J3/10 ,  H01L21/31

Abstract: An improved charged-particle beam optical apparatus for imaging a first mask including a plurality of apertures on a specimen to be irradiated. The mask is uniformly illuminated by a beam through a plurality of condenser lenses and the apparatus includes means for adjusting the position of the mask relative to the specimen. A selected area of the specimen has an adjustment marking disposed thereon which is illuminated by a ray of charged particles from the beam passing through a test opening provided in the mask. The apparatus further includes means for detecting radiation emanating from the specimen. The improvement of the invention comprises the provision of a second mask, having at least one aperture which is alignable with the test opening in the first mask, mounted in the apparatus and movable into positions above and below the first mask for aligning the test opening and aperture in the first and second masks and covering the plurality of apertures in the first mask so as to permit charged particles from the beam to pass only through the test opening in the first mask and the aperture in the second mask.

公开(公告)号：DE2706631C3

公开(公告)日：1979-12-06

申请号：DE2706631

申请日：1977-02-16

Applicant: ATOMIC ENERGY OF CANADA LTD., OTTAWA

Inventor： MCKEOWN, JOSEPH, DEEP RIVER, ONTARIO (KANADA)

IPC: H01J23/10 ,  G01T1/29 ,  G21K1/04 ,  G21K1/093 ,  H05H7/18 ,  H05H7/00 ,  H01J23/09 ,  H01J3/10

Abstract: A charged particle beam position monitor having a resonant cavity which is excited in a first mode if the monitored beam passing through it is displaced along the x-axis, and is excited in a second mode orthogonal to the first if the monitored beam passing through it is displaced along the y-axis. These modes are tuned to the same frequency and may be independently detected. The X and Y coordinates of the beam are determined by the amplitude and phase of the detected first and second orthogonal modes respectively.