公开(公告)号：KR2020000018396U

公开(公告)日：2000-10-16

申请号：KR2019990004365

申请日：1999-03-18

Applicant: 삼성전자주식회사

Inventor： 고용균 ,  임광신

IPC: H01L21/02

Abstract: 본고안은화학약품을사용하는반도체제조장치로부터화학약품의샘플을추출하기위한샘플추출장치에관한것이다. 본고안의샘플추출장치는바디, 도어, 작업부재그리고배기부재를구비한다. 상기바디에는화학약품을추출하기위한밀폐된영역이형성되고, 반도체제조장치로부터화학용액이공급되는라인을상기밀폐된영역으로삽입시키기위한밀폐가능한적어도하나이상의유입구를갖는다. 상기도어는상기바디의일면에개폐가가능하도록결합된다. 상기작업부재는외부로부터상기바디의내부로밀폐되도록결합되고, 작업자가상기밀폐된영역에서상기라인으로부터화학용액을용기에추출하는작업을외부에서가능하도록한다. 그리고상기배기부재는상기바디에설치되고, 상기화학약품의추출시 발생되는유해가스를여과하여외부로배기시킨다. 이와같은구성을갖는샘플추출장치에의하면, 샘플링시에발생하는유해가스를여과하여배기하기때문에유해가스에의한오염및 안전사고를방지할수 있다. 또한, 외부환경에의한영향을줄일수 있으므로샘플에대한오염도줄일수 있다.

公开(公告)号：KR100252222B1

公开(公告)日：2000-04-15

申请号：KR1019970039311

申请日：1997-08-19

Applicant: 삼성전자주식회사

Inventor： 고용균 ,  길준잉 ,  전상문

IPC: C07B63/00 ,  C07B63/02

CPC classification number: C07C29/76 ,  C07C31/10

Abstract: PURPOSE: A method for purifying the isopropyl alcohol for the preparation of semiconductor device is provided, to improve the moisture removing efficiency by eight times. CONSTITUTION: The method comprises the steps of removing the ions contained in the waste isopropyl alcohol which is used in the preparation of semiconductor device; removing metal component from the isopropyl alcohol; removing moisture from the isopropyl alcohol; and removing particles from the isopropyl alcohol. The ions are removed by passing the waste isopropyl alcohol through an ion removing medium; the metal components are removed by heating the isopropyl alcohol and cooling the vaporized alcohol, thereby separating metal component and alcohol. The moisture is removed by heating the isopropyl alcohol under vacuum with passing it through a moisture removing filter; and the particles are removed by passing the isopropyl alcohol through a polyethylene membrane filter.

Abstract translation: 目的：提供用于制备半导体器件的异丙醇的纯化方法，以提高八次除湿效率。 构成：该方法包括去除用于制备半导体器件的废异丙醇中含有的离子的步骤; 从异丙醇中除去金属组分; 从异丙醇中除去水份; 并从异丙醇中除去颗粒。 通过将废异丙醇通过离子去除介质除去离子; 通过加热异丙醇并冷却汽化的醇来除去金属成分，从而分离金属成分和醇。 通过在真空下加热异丙醇通过除湿过滤器除去水分; 并且通过使异丙醇通过聚乙烯膜过滤器除去颗粒。