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公开(公告)号：KR100543094B1
公开(公告)日：2006-01-20
申请号：KR1020050044043
申请日：2005-05-25
Applicant: 제일모직주식회사
Abstract: 본 발명은 신규한 기능성 디아민 및 이를 사용하여 제조된 액정 배향막에 관한 것으로, 보다 상세하게는 상기 기능성 디아민, 방향족 고리형 디아민, 지방족 고리형 산이무수물 및 방향족 고리형 산이무수물을 이용하여 폴리아믹산을 제조하여 고내열성, 가시광선 영역에서의 고투과성, 우수한 배향특성 및 높은 전압보전율을 가지며, 선경사각의 조절이 용이한 액정 배향막을 제공한다.
액정 배향막, 폴리아믹산 폴리이미드, 선경사각, 전압보전율-
公开(公告)号：KR100519650B1
公开(公告)日：2005-10-07
申请号：KR1019990003985
申请日：1999-02-05
Applicant: 제일모직주식회사
IPC: C08G73/10
Abstract: 본 발명은 균질한 점도를 갖는 폴리아믹산의 제조방법이 제공되는 것으로 다이안하이드라이드와 다이아민을 용매존재하에 반응시킴에 있어 건조된 다이안하이드라이드에 함수량이 조절된 용매에 건조된 다이아민을 용해시킨 용액을 조절된 투입시간에 투입반응시키는 것을 특징으로하여 소기한 수준의 점도를 가지면서 균질한 점도를 갖는 폴리아믹산을 제조할수 있는 이점이 있다.
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公开(公告)号：KR100514005B1
公开(公告)日：2005-09-09
申请号：KR1020020054877
申请日：2002-09-11
Applicant: 제일모직주식회사
IPC: C08G73/02 , C07C211/54 , C07C217/82 , G03G5/06
Abstract: 본 발명은 신규한 기능성 디아민 및 이를 사용하여 제조된 액정 배향막에 관한 것으로, 보다 상세하게는 상기 기능성 디아민, 방향족 고리형 디아민, 지방족 고리형 산이무수물 및 방향족 고리형 산이무수물을 이용하여 폴리아믹산을 제조하여 고내열성, 가시광선 영역에서의 고투과성, 우수한 배향특성 및 높은 전압보전율을 가지며, 선경사각의 조절이 용이한 액정 배향막을 제공한다.
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公开(公告)号：KR1020040023201A
公开(公告)日：2004-03-18
申请号：KR1020020054877
申请日：2002-09-11
Applicant: 제일모직주식회사
IPC: C08G73/02 , C07C211/54 , C07C217/82 , G03G5/06
Abstract: PURPOSE: A novel functional diamine compound, a polyamic acid prepared by using the diamine compound, a liquid crystal alignment layer prepared by using the polyamic acid and a liquid crystal display device containing the liquid crystal alignment layer are provided, to improve heat resistance, transmittance at visible light range, alignment characteristic and voltage holding ratio. CONSTITUTION: The diamine compound is represented by the formula 1, wherein A is H or a methyl group; B is -O-, -COO-, -CONH-, -OCO- or a single bond; and C is a linear, branched or cyclic alkyl group of C1-C20, an arylalkyl or alkylaryl group of C7-C30, or a cholesterol group of C16-C40; and the functional group can be substituted with a fluorinated alkyl group of C1-C20. The polyamic acid is prepared by copolymerizing the diamine compound of the formula 1, an aliphatic cyclic acid dianhydride, an aromatic cyclic acid dianhydride and optionally an aromatic cyclic diamine. Preferably the polyamic acid is represented by the formula 6.
Abstract translation: 目的：提供新型功能二胺化合物，使用二胺化合物制备的聚酰胺酸，使用聚酰胺酸制备的液晶取向层和含有液晶取向层的液晶显示装置，以提高耐热性，透光率 在可见光范围，对准特性和电压保持率。 构成：二胺化合物由式1表示，其中A为H或甲基; B是-O - ， - COO - ， - CONH - ， - OCO-或单键; C为C1-C20，C7-C30的芳烷基或烷基芳基或C16-C40的胆固醇基团的直链，支链或环状烷基; 该官能团可以被C1-C20的氟化烷基取代。 聚酰胺酸通过使式1的二胺化合物，脂族环状酸酐，芳香族环状酸酐和任选的芳香族环状二胺共聚来制备。 优选地，聚酰胺酸由式6表示。
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公开(公告)号：KR100382795B1
公开(公告)日：2003-07-12
申请号：KR1019970077057
申请日：1997-12-29
Applicant: 제일모직주식회사
Inventor： 오재민
Abstract: PURPOSE: A co-crosslinking compound for a photosensitive polyimide composition and a photosensitive polyimide composition are provided, to improve the crosslinking density of a polyimide composition and to reduce shrinkage after curing. CONSTITUTION: The co-crosslinking compound is represented by the formula I or II, wherein R1 is an aliphatic hydrocarbon group of C2-C20, and n is an integer of 1-20. The photosensitive polyimide composition comprises 100 parts by weight of a polyimide precursor solution; 1-20 parts by weight of the co-crosslinking compound of the formula I or II; and optionally a photoinitiator, an intensifier, a polymerization inhibitor and/or a colloidal inorganic additive.
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Patent Agency Ranking
公开(公告)号：KR1020030018153A
公开(公告)日：2003-03-06
申请号：KR1020010051727
申请日：2001-08-27
CPC classification number: G03F7/0387 , G03F7/0226 , G03F7/0233 , G03F7/037 , G03F7/0392 , G03F7/0751 , G03F7/38
Abstract: PURPOSE: An acid liable polyamide polymer and a photosensitive heat resisting insulator composition containing the polymer are provided, which are improved in the photosensitivity, the resolution, the mechanical properties and the flatness of coating. CONSTITUTION: The acid liable polyamide polymer has a repeating unit represented by the formula 1, and contains an acetal or carbonate side group as an acid liable group and a terminal group containing an acetylene group, wherein Ar1 is a tetravalent aromatic group; Ar2 is a divalent aromatic group; R1 and R2 are the same or different each other and are an acid liable group comprising carbonate or acetal; T1 and T2 are the same or different each other and are a terminal group comprising acetylene group; and m and n are an integer of 5-100, respectively. The acid liable polyamide polymer can be a homopolymer or a copolymer according to the combination of Ar1 and Ar2. The photosensitive heat resisting insulator composition comprises the polyamide polymer; and 0.3-15 wt% of a photoacid generator.
Abstract translation: 目的：提供含有聚合物的耐酸聚酰胺聚合物和含有聚合物的感光耐热绝缘体组合物，其改善了光敏性，分辨率，机械性能和涂层的平整度。 构成：酸性聚酰胺聚合物具有式1表示的重复单元，含有作为酸性基团的缩醛或碳酸酯侧基和含有乙炔基的末端基，其中Ar1为四价芳香族基团; Ar2是二价芳族基团; R1和R2彼此相同或不同，是含有碳酸酯或缩醛的酸性基团; T1和T2彼此相同或不同，并且是包含乙炔基的末端基团; m和n分别为5-100的整数。 耐酸的聚酰胺聚合物可以是根据Ar1和Ar2的组合的均聚物或共聚物。 感光耐热绝缘体组合物包含聚酰胺聚合物; 和0.3-15重量％的光酸产生剂。
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公开(公告)号：KR100360709B1
公开(公告)日：2003-01-24
申请号：KR1019970082336
申请日：1997-12-31
Applicant: 제일모직주식회사
IPC: C08G73/10
Abstract: PURPOSE: A siloxane polyimide precursor composition and its preparation method are provided, to improve the heat resistance, the mechanical properties and the adhesive strength. CONSTITUTION: The siloxane polyimide precursor composition is prepared by reacting the aliphatic siloxane-based diamine represented by the formula I, the aromatic tetracarboxylic acid dihydrate represented by the formula II and the aromatic diamine represented by H2N-R1-NH2 in an organic solvent, wherein X is an aromatic, alicyclic or aliphatic group having a tetravalent radical, and is selected from the group consisting of butane, pentane, hexane, cyclopentane, bicyclopentane, cyclopropane, methylcyclohexane, benzophenone, benzene, perylene, diphenylsulfone, biphenyl, naphthalene, pyridine, terphenyl, phenoxybenzene, hexafluoro bis(phenoxyphenyl)propane, and bis(phenoxyphenyl)propane.
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公开(公告)号：KR1020020054541A
公开(公告)日：2002-07-08
申请号：KR1020000083662
申请日：2000-12-28
Applicant: 제일모직주식회사
CPC classification number: C08G73/10 , G02F1/13 , G02F1/1337
Abstract: PURPOSE: Provided is a polyimide resin produced by using new functional diamine monomers, which is used as a liquid crystal alignment film and excellent in photo-permeability and liquid crystal alignment. CONSTITUTION: The polyimide resin is produced by reacting dioxy tetrahydro furan-3-methyl cyclo hexane-1,2-dicarboxylic dianhydride, at least one diamine selected from the diamine group represented by the formula 1, and at least one diamine selected from the diamine group represented by the formula 2 to produce polyamic acid and then imidating the polyamic acid. The polyimide resin has an intrinsic viscosity of 0.5-1.5dL/g(measured at the concentration of 0.5g/dL in NMP solution and 30deg.C), a glass transition temperature of 230-350deg.C, and a stand inclination angle of 1-15 degree. In the formula, X is hydrogen atom or -O2CR, -CO2R, -NRR', -CONRR', -NCOR, -OCO2R, -OR, or -R, n and m are each an integer of 1-16, wherein R and R' are each hydrogen atom, C1-C18 aliphatic or aromatic hydrocarbon.
Abstract translation: 目的：提供通过使用新的功能性二胺单体制造的聚酰亚胺树脂，其用作液晶取向膜并且具有优异的光导率和液晶取向性。 构成：聚酰亚胺树脂通过二氧四氢呋喃-3-甲基环己烷-1,2-二羧酸二酐，至少一种选自由式1表示的二胺组成的二胺和至少一种选自二胺 由式2表示的基团以产生聚酰胺酸，然后酰亚胺化聚酰胺酸。 聚酰亚胺树脂的特性粘度为0.5-1.5dL / g（在NMP溶液中的浓度为0.5g / dL下测定，30℃），玻璃化转变温度为230〜350℃，倾斜角为 1-15度。 在该式中，X是氢原子或-O2CR，-CO 2 R，-NRR'，-CONRR'，-NCOR，-OCO 2 R，-OR或-R，n和m各自是1-16的整数，其中R 和R'各自为氢原子，C 1 -C 18脂族或芳族烃。
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公开(公告)号：KR100316735B1
公开(公告)日：2001-12-12
申请号：KR1019990025080
申请日：1999-06-29
IPC: C08G73/10
Abstract: 본발명은카르보네이트측쇄를포함하는폴리아미드중합체와감광성내열절연체조성물에관한것으로서, 더욱상세하게는빛에의해감광된부분은현상액에의해용해되고, 빛을받지않은부분은남아있다가후공정인가열공정에의해내열성고분자로전환이가능한기능을가진신규카르보네이트측쇄를포함하는폴리아미드중합체와, 상기한폴리아미드중합체와소량의광산발생제를함유시켜패시베이션막(passivation layer), 완충막(buffer coat) 또는복합다층인쇄회로기판의층간절연막등으로의사용이가능한감광성내열절연체조성물에관한것이다.
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60.发明公开
公开(公告)号：KR1020010011635A
公开(公告)日：2001-02-15
申请号：KR1019990031105
申请日：1999-07-29
IPC: C08G69/02
CPC classification number: C08G69/02 , C08L77/00 , C08L2201/02
Abstract: PURPOSE: A novel polyamide polymer capable of preventing an increase of a dielectric constant by the remaining hydroxyl group and having high heat resistance by transforming a hydroxyl group produced by pyrolysis of acetal or a side chain of its cyclic derivatives by heating a patterned exposed section to a thermally stable benzoxazole group and photosensitive heat resistant insulator composition are provided, which are useful as a layer insulation film of a passivation layer of semiconductors, a buffer coat or composite multilayer PCP. CONSTITUTION: A polyamide polymer having an intrinsic viscosity of 0.1 to 2.5 dL/g contains the formula 1 as a repeating unit and a photosensitive heat resistant insulator composition contains 0.3 to 20% by weight of a photoacid generator based on the polyamide. A concentration of an acid sensitive group (-OR1 or -OR2) is 3 to 70%. The photoacid generator is a material for generating an acid by absorbing light in an area of long wavelength (more than 300nm) as compared to an absorbing area of polyamide
Abstract translation: 目的：一种新型的聚酰胺聚合物，其能够通过将图案化的曝光部分加热而将通过热解乙缩醛或其环状衍生物的侧链产生的羟基转化为具有高残留羟基并且具有高耐热性的介电常数 提供了热稳定的苯并恶唑基和感光耐热绝缘体组合物，其可用作半导体钝化层，缓冲涂层或复合多层PCP的层绝缘膜。 构成：特性粘度为0.1〜2.5dL / g的聚酰胺聚合物含有式1作为重复单元，感光耐热性绝缘体组合物含有0.3〜20重量％的基于聚酰胺的光致酸发生剂。 酸敏感基团（-OR1或-OR2）的浓度为3〜70％。 光致酸发生器是通过吸收长波长（大于300nm）的区域中的光而与聚酰胺的吸收区域相比产生酸的材料
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