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公开(公告)号：KR100322234B1
公开(公告)日：2002-02-07
申请号：KR1019990031105
申请日：1999-07-29
IPC: C08G69/02
Abstract: 본발명은아세탈또는이의고리화유도체를측쇄로포함하는폴리아미드중합체와감광성내열절연체조성물에관한것으로서, 더욱상세하게는빛에의해감광된부분은현상액에의해용해되고, 빛을받지않은부분은남아있다가후공정인가열공정에의해내열성고분자로전환이가능한기능을가진아세탈또는이의고리화유도체를측쇄로포함하는신규폴리아미드중합체와, 상기한폴리아미드중합체와소량의광산발생제가함유되어있어패시베이션막(passivation layer), 완충막(buffer coat) 또는복합다층인쇄회로기판의층간절연막등으로의사용이가능한감광성내열절연체조성물에관한것이다.
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公开(公告)号：KR100435517B1
公开(公告)日：2004-06-10
申请号：KR1020010051727
申请日：2001-08-27
Abstract: PURPOSE: An acid liable polyamide polymer and a photosensitive heat resisting insulator composition containing the polymer are provided, which are improved in the photosensitivity, the resolution, the mechanical properties and the flatness of coating. CONSTITUTION: The acid liable polyamide polymer has a repeating unit represented by the formula 1, and contains an acetal or carbonate side group as an acid liable group and a terminal group containing an acetylene group, wherein Ar1 is a tetravalent aromatic group; Ar2 is a divalent aromatic group; R1 and R2 are the same or different each other and are an acid liable group comprising carbonate or acetal; T1 and T2 are the same or different each other and are a terminal group comprising acetylene group; and m and n are an integer of 5-100, respectively. The acid liable polyamide polymer can be a homopolymer or a copolymer according to the combination of Ar1 and Ar2. The photosensitive heat resisting insulator composition comprises the polyamide polymer; and 0.3-15 wt% of a photoacid generator.
Abstract translation: 目的：提供一种酸敏聚酰胺聚合物和含有该聚合物的光敏耐热绝缘体组合物，其光敏性，分辨率，机械性能和涂层的平整度得到改善。 组成：酸性聚酰胺聚合物具有由式1表示的重复单元，并且包含作为酸性可
能基团的缩醛或碳酸酯侧基和含有乙炔基的端基，其中Ar 1是四价芳族基团; Ar2是二价芳族基团; R1和R2彼此相同或不同，并且是包含碳酸酯或缩醛的酸性可逆基团; T1和T2彼此相同或不同，并且是包含乙炔基的端基; m和n分别是5-100的整数。 根据Ar 1和Ar 2的组合，酸性聚酰胺聚合物可以是均聚物或共聚物。 该光敏耐热绝缘体组合物包含聚酰胺聚合物; 和0.3-15重量％的光酸产生剂。-
公开(公告)号：KR1020010004433A
公开(公告)日：2001-01-15
申请号：KR1019990025080
申请日：1999-06-29
IPC: C08G73/10
Abstract: PURPOSE: A positive and photosensitive and heat-resistant low dielectric composition is disclosed to solve known troubles such as an increase of dielectric constant caused from -OH, a reduction of heat-resistance, etc. and to enhance the photosensitivity. CONSTITUTION: A photosensitive and heat-resistant low dielectric composition contains a polyamide polymer including a specific carbonate branch chain represented by formula 1. The polyamide polymer is characterized in that it comprises a particular polyamide structure synthesized from quaternary aromatic diamine compounds including -OH or alkyloxy carbonyloxy group (-OCOOR) as an acid sensitive radical and dicarboxyl acid and its derivatives. The particular molecular structure leads the polyamide polymer to form a positive and photosensitive heat-resistant low dielectric composition when it is combined with light acid generating agent.
Abstract translation: 目的：公开了一种正性和感光和耐热低介电组合物，以解决已知的麻烦，例如由-OH引起的介电常数的增加，耐热性降低等，并提高光敏性。 构成：感光和耐热低介电组合物含有聚酰胺聚合物，其包括由式1表示的特定碳酸酯支链。聚酰胺聚合物的特征在于其包含由包括-OH或烷氧基的季芳族二胺化合物合成的特定聚酰胺结构 羰基氧基（-OCOOR）作为酸敏感基团和二羧酸及其衍生物。 当与轻质酸产生剂结合时，特定的分子结构导致聚酰胺聚合物形成正和感光耐热低电介质组合物。
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公开(公告)号：KR1020030018153A
公开(公告)日：2003-03-06
申请号：KR1020010051727
申请日：2001-08-27
CPC classification number: G03F7/0387 , G03F7/0226 , G03F7/0233 , G03F7/037 , G03F7/0392 , G03F7/0751 , G03F7/38
Abstract: PURPOSE: An acid liable polyamide polymer and a photosensitive heat resisting insulator composition containing the polymer are provided, which are improved in the photosensitivity, the resolution, the mechanical properties and the flatness of coating. CONSTITUTION: The acid liable polyamide polymer has a repeating unit represented by the formula 1, and contains an acetal or carbonate side group as an acid liable group and a terminal group containing an acetylene group, wherein Ar1 is a tetravalent aromatic group; Ar2 is a divalent aromatic group; R1 and R2 are the same or different each other and are an acid liable group comprising carbonate or acetal; T1 and T2 are the same or different each other and are a terminal group comprising acetylene group; and m and n are an integer of 5-100, respectively. The acid liable polyamide polymer can be a homopolymer or a copolymer according to the combination of Ar1 and Ar2. The photosensitive heat resisting insulator composition comprises the polyamide polymer; and 0.3-15 wt% of a photoacid generator.
Abstract translation: 目的：提供含有聚合物的耐酸聚酰胺聚合物和含有聚合物的感光耐热绝缘体组合物，其改善了光敏性，分辨率，机械性能和涂层的平整度。 构成：酸性聚酰胺聚合物具有式1表示的重复单元，含有作为酸性基团的缩醛或碳酸酯侧基和含有乙炔基的末端基，其中Ar1为四价芳香族基团; Ar2是二价芳族基团; R1和R2彼此相同或不同，是含有碳酸酯或缩醛的酸性基团; T1和T2彼此相同或不同，并且是包含乙炔基的末端基团; m和n分别为5-100的整数。 耐酸的聚酰胺聚合物可以是根据Ar1和Ar2的组合的均聚物或共聚物。 感光耐热绝缘体组合物包含聚酰胺聚合物; 和0.3-15重量％的光酸产生剂。
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公开(公告)号：KR100316735B1
公开(公告)日：2001-12-12
申请号：KR1019990025080
申请日：1999-06-29
IPC: C08G73/10
Abstract: 본발명은카르보네이트측쇄를포함하는폴리아미드중합체와감광성내열절연체조성물에관한것으로서, 더욱상세하게는빛에의해감광된부분은현상액에의해용해되고, 빛을받지않은부분은남아있다가후공정인가열공정에의해내열성고분자로전환이가능한기능을가진신규카르보네이트측쇄를포함하는폴리아미드중합체와, 상기한폴리아미드중합체와소량의광산발생제를함유시켜패시베이션막(passivation layer), 완충막(buffer coat) 또는복합다층인쇄회로기판의층간절연막등으로의사용이가능한감광성내열절연체조성물에관한것이다.
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Patent Agency Ranking6.发明公开
公开(公告)号：KR1020010011635A
公开(公告)日：2001-02-15
申请号：KR1019990031105
申请日：1999-07-29
IPC: C08G69/02
CPC classification number: C08G69/02 , C08L77/00 , C08L2201/02
Abstract: PURPOSE: A novel polyamide polymer capable of preventing an increase of a dielectric constant by the remaining hydroxyl group and having high heat resistance by transforming a hydroxyl group produced by pyrolysis of acetal or a side chain of its cyclic derivatives by heating a patterned exposed section to a thermally stable benzoxazole group and photosensitive heat resistant insulator composition are provided, which are useful as a layer insulation film of a passivation layer of semiconductors, a buffer coat or composite multilayer PCP. CONSTITUTION: A polyamide polymer having an intrinsic viscosity of 0.1 to 2.5 dL/g contains the formula 1 as a repeating unit and a photosensitive heat resistant insulator composition contains 0.3 to 20% by weight of a photoacid generator based on the polyamide. A concentration of an acid sensitive group (-OR1 or -OR2) is 3 to 70%. The photoacid generator is a material for generating an acid by absorbing light in an area of long wavelength (more than 300nm) as compared to an absorbing area of polyamide
Abstract translation: 目的：一种新型的聚酰胺聚合物，其能够通过将图案化的曝光部分加热而将通过热解乙缩醛或其环状衍生物的侧链产生的羟基转化为具有高残留羟基并且具有高耐热性的介电常数 提供了热稳定的苯并恶唑基和感光耐热绝缘体组合物，其可用作半导体钝化层，缓冲涂层或复合多层PCP的层绝缘膜。 构成：特性粘度为0.1〜2.5dL / g的聚酰胺聚合物含有式1作为重复单元，感光耐热性绝缘体组合物含有0.3〜20重量％的基于聚酰胺的光致酸发生剂。 酸敏感基团（-OR1或-OR2）的浓度为3〜70％。 光致酸发生器是通过吸收长波长（大于300nm）的区域中的光而与聚酰胺的吸收区域相比产生酸的材料
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公开(公告)号：KR100927704B1
公开(公告)日：2009-11-18
申请号：KR1020070127112
申请日：2007-12-07
Applicant: 제일모직주식회사
IPC: C09K19/56 , C08L79/08 , G02F1/1337
Abstract: 본 발명은 38 dyn/cm 이상 40 dyn/cm 이하의 표면에너지를 가지는 제1 폴리아믹산, 및 40 dyn/cm 초과 55 dyn/cm 이하의 표면에너지를 가지는 제2 폴리아믹산을 포함하는 액정 배향제를 제공한다.
상기 액정 배향제는 내화학성, 안정된 액정 수직 배향력, 전기광학 특성, 및 잔상에 대한 신뢰성이 우수하고, 공정성이 우수하다.
액정배향제, 액정배향막, 폴리아믹산, 폴리이미드, 선경사각, 전기광학특성, 액정배향성, 액정배향력, 잔상, 신뢰성Abstract translation: 提供液晶取向剂以确保优异的耐化学性，稳定的液晶垂直取向能力和用于后像的可靠性，以及优异的可加工性。 液晶取向剂包含表面能为38-40达因/厘米或更低的第一聚酰胺酸和表面能为40-55达因/厘米或更低的第二聚酰胺酸。 第一聚酰胺酸和第二聚酰胺酸由任何一种四羧酸酐和任何一种二胺制备。 酸酐选自脂族环酸酐，芳族酸二酐及其组合。 二胺选自芳族二胺，由化学式1表示的官能二胺及其组合。
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公开(公告)号：KR1020090060000A
公开(公告)日：2009-06-11
申请号：KR1020070127124
申请日：2007-12-07
Applicant: 제일모직주식회사
IPC: C09K19/56
CPC classification number: G02F1/133723 , C09K19/56 , G02F1/133788 , Y10T428/1005 , Y10T428/1018 , Y10T428/1023
Abstract: A liquid crystal photoaligment agent is provided to ensure excellent liquid crystal orientation, voltage holding rate, pretilt angle, and residual DC as well as good printability, washing stability and anti-fouling property, and to perform liquid crystal uniaxial orientation. A liquid crystal photoaligment agent comprises a polyamic acid copolymer consisting of a repeating unit represented by chemical formula 1 and a repeating unit represented by chemical formula 2; a polyimide copolymer consisting of a repeating unit represented by chemical formula 3 and a repeating unit represented by chemical formula 4; and any one copolymer selected from the group consisting of their combinations. In chemical formulas 1 -4, R1, R3, R5 and R7, are independently a tetravalent organic group induced from acid dianhydride selected from the group consisting of aliphatic ring type tetracarboxylic anhydride and aromatic acid dianhydride.
Abstract translation: 提供了一种液晶光分解剂，以确保优异的液晶取向性，电压保持率，预倾角和残留DC，以及良好的印刷性，洗涤稳定性和防污性，并且进行液晶单轴取向。 液晶光致色剂包含由化学式1表示的重复单元和由化学式2表示的重复单元构成的聚酰胺酸共聚物。 由化学式3表示的重复单元和由化学式4表示的重复单元构成的聚酰亚胺共聚物; 和选自它们的组合的任何一种共聚物。 在化学式1-4中，R 1，R 3，R 5和R 7独立地是选自脂族环型四羧酸酐和芳族酸二酐的酸式二酸酐诱导的四价有机基团。
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公开(公告)号：KR1020090059989A
公开(公告)日：2009-06-11
申请号：KR1020070127112
申请日：2007-12-07
Applicant: 제일모직주식회사
IPC: C09K19/56 , C08L79/08 , G02F1/1337
Abstract: A liquid crystal alignment agent is provided to ensure excellent chemical resistance, stable liquid crystal vertical alignment power, and reliability for after image, as well as excellent processability. A liquid crystal alignment agent comprises a first polyamic acid having surface energy of 38-40 dyn/cm or less and a second polyamic acid having surface energy of 40-55 dyn/cm or less. The first polyamic acid and the second polyamic acid are prepared by any one tetracarboxylic anhydride and any one diamine. The acid anhydride is selected from the group consisting of aliphatic ring type acid anhydride, aromatic acid dianhydride and combinations thereof. The diamine is selected from the group consisting of aromatic diamine, functional diamine represented by chemical formula 1 and combinations thereof.
Abstract translation: 提供液晶取向剂，以确保优异的耐化学性，稳定的液晶垂直取向功率和后图像的可靠性，以及优异的加工性。 液晶取向剂包括具有38-40达因/厘米或更小的表面能的第一聚酰胺酸和表面能为40-55达因/厘米或更小的第二聚酰胺酸。 第一聚酰胺酸和第二聚酰胺酸由任何一种四羧酸酐和任何一种二胺制备。 酸酐选自脂族环型酸酐，芳族酸二酐及其组合。 二胺选自芳族二胺，由化学式1表示的官能二胺及其组合。
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公开(公告)号：KR100882586B1
公开(公告)日：2009-02-13
申请号：KR1020070106691
申请日：2007-10-23
Applicant: 제일모직주식회사
IPC: C09K19/56
CPC classification number: C09K19/56 , G02F1/133723 , G02F1/133788 , Y10T428/1005 , Y10T428/1018 , Y10T428/1023
Abstract: A liquid crystal photoalignment agent for a wide-viewing angle is provided to ensure excellent reliability related to after image, stable vertical alignment power and excellent crystal orientation, and to prevent the degradation of vertical alignment power due to liquid crystal dropping through one drop filling mode. A liquid crystal photoalignment agent comprises a polyamic acid indicated as the chemical formula 1, a polyimide polymer indicated as the chemical formula 2, and their combination, and a polyimide photopolymer indicated as the following chemical formula 3. In the chemical formula 1 -3, R1, R3 and R5, are independently alicyclic anhydride and tetravalent organic radical induced from the anhydride selected from the group consisting of aromatic acid dianhydride; R2 and R4 are independently divalent organic radical induced from an aromatic diamine; and R6 is a divalent organic radical induced from cumarine-based diamine, chalcone-based diamine and cinnamate-based diamine.
Abstract translation: 提供用于广视角的液晶光对准剂，以确保与后图像，稳定的垂直取向功率和优异的晶体取向相关的优异的可靠性，并且防止由于通过一滴灌注模式的液晶滴落导致的垂直取向功率的劣化 。 液晶光对准剂包括表示为化学式1的聚酰胺酸，化学式2表示的聚酰亚胺聚合物及其组合，以及下述化学式3表示的聚酰亚胺光聚合物。在化学式1-3中， R1，R3和R5独立地是从选自芳族酸二酐的酐中诱导的脂环酸酐和四价有机基团; R2和R4独立地是由芳族二胺引发的二价有机基团; 并且R6是由基于二氧化铈的二胺，查耳酮类二胺和肉桂酸酯类二胺诱发的二价有机基团。
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