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公开(公告)号：US09958791B2
公开(公告)日：2018-05-01
申请号：US15032507
申请日：2014-10-13
Applicant: ASML Netherlands B.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Stefan Hunsche , Markus Gerardus Martinus Maria Van Kraaij
CPC classification number: G03F7/70683 , G03F7/213 , G03F7/22 , G03F7/70466 , G03F7/70616 , G03F7/70633
Abstract: Disclosed is an inspection apparatus for use in lithography. It comprises a support for a substrate carrying a plurality of metrology targets; an optical system for illuminating the targets under predetermined illumination conditions and for detecting predetermined portions of radiation diffracted by the targets under the illumination conditions; a processor arranged to calculate from said detected portions of diffracted radiation a measurement of asymmetry for a specific target; and a controller for causing the optical system and processor to measure asymmetry in at least two of said targets which have different known components of positional offset between structures and smaller sub-structures within a layer on the substrate and calculate from the results of said asymmetry measurements a measurement of a performance parameter of the lithographic process for structures of said smaller size. Also disclosed are substrates provided with a plurality of novel metrology targets formed by a lithographic process.
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公开(公告)号：US09927726B2
公开(公告)日：2018-03-27
申请号：US15023075
申请日：2014-09-11
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Patricius Aloysius Jacobus Tinnemans , Arie Jeffrey Den Boef , Justin Lloyd Kreuzer , Simon Gijsbert Josephus Mathijssen
CPC classification number: G03F9/7069 , G01B9/02011 , G01B9/02015 , G01B11/272 , G01B2290/70 , G03F9/7049 , G03F9/7088
Abstract: Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.
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公开(公告)号：US09857703B2
公开(公告)日：2018-01-02
申请号：US15328194
申请日：2015-07-07
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Arie Jeffrey Den Boef , Justin Lloyd Kreuzer , Patricius Aloysius Jacobus Tinnemans
CPC classification number: G03F9/7088 , G03F9/7065 , G03F9/7069
Abstract: An alignment sensor for a lithographic apparatus is arranged and constructed to measure an alignment of a movable part of the lithographic apparatus in respect of a stationary part of the lithographic apparatus. The alignment sensor comprises a light source configured to generate a pulse train at a optical wavelength and a pulse repetition frequency, a non-linear optical element, arranged in an optical propagation path of the pulse train, the non-linear optical element configured to transform the pulse train at the optical wavelength into a transformed pulse train in an optical wavelength range, an optical imaging system configured to project the transformed pulse train onto an alignment mark comprising a diffraction grating; a detector to detect a diffraction pattern as diffracted by the diffraction grating, and a data processing device configured to derive alignment data from the detected diffraction pattern as detected by the detector.
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公开(公告)号：US09778025B2
公开(公告)日：2017-10-03
申请号：US14421434
申请日：2013-07-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Erik Willem Bogaart , Patricius Aloysius Jacobus Tinnemans , Arie Jeffrey Den Boef
IPC: G01B11/00 , G03B27/32 , G03B27/54 , G03B27/74 , G01B11/14 , G03F7/20 , G03F9/00 , G01B9/02 , G01B11/27
CPC classification number: G01B11/14 , G01B9/02 , G01B11/27 , G03F7/70058 , G03F7/70625 , G03F7/70633 , G03F9/7069 , G03F9/7088
Abstract: A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of an alignment target comprising a periodic structure. An illumination optical system for focusing radiation into a spot on said structure. An asymmetry detection optical system receives a share of positive and negative orders of radiation diffracted by the periodic structure, and forms first and second images of said spot on first and second detectors respectively, wherein said negative order radiation is used to form the first image and said positive order radiation is used to form the second image. A processor for processing together signals from said first and second detectors representing intensities of said positive and negative orders to produce a measurement of asymmetry in the periodic structure. The asymmetry measurement can be used to improve accuracy of the position read by the alignment sensor.
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55.发明申请POSITION MEASURING APPARATUS, POSITION MEASURING METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权位置测量装置，位置测量方法，平面设备和装置制造方法公开(公告)号：US20150219438A1
公开(公告)日：2015-08-06
申请号：US14427287
申请日：2013-09-20
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Arie Jeffrey Den Boef , Justin Lloyd Kreuzer , Simon Gijsbert Josephus Mathijssen , Gerrit Johannes Nijmeijer , J. Christian Swindal , Patricius Aloysius Jacobus Tinnemans , Richard Johannes Franciscus Van Haren
CPC classification number: G01B11/002 , G03F7/70775 , G03F9/7003 , G03F9/7049 , G03F9/7088 , H01L22/12
Abstract: An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.
Abstract translation: 一种用于测量标记位置的装置，该装置包括使用由照明装置提供的辐射将辐射引导到标记上的物镜; 接收由标记衍射并被镜面反射的辐射的光学装置，其中所述光学装置被配置为提供第一图像和第二图像，所述第一图像通过相干地添加镜面反射辐射和正衍射级辐射而形成，并且所述第二图像 通过相干地加入镜面反射辐射和负衍射级辐射形成; 以及检测装置，用于检测第一和第二图像的辐射强度的变化，并计算标记在测量方向上的位置。
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Patent Agency Ranking
公开(公告)号：US11360399B2
公开(公告)日：2022-06-14
申请号：US17277353
申请日：2019-08-27
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus Goorden , Simon Reinald Huisman , Simon Gijsbert Josephus Mathijssen , Henricus Petrus Maria Pellemans
IPC: G03F7/20
Abstract: Disclosed is a metrology device (1600) configured to produce measurement illumination comprising a plurality of illumination beams, each of said illumination beams being spatially incoherent or pseudo-spatially incoherent and comprising multiple pupil points in an illumination pupil of the metrology device. Each pupil point in each one of said plurality of illumination beams has a corresponding pupil point in at least one of the other illumination beams of said plurality of illumination beams thereby defining multiple sets of corresponding pupil points, and the pupil points of each set of corresponding pupil points are spatially coherent with respect to each other.
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公开(公告)号：US11300883B2
公开(公告)日：2022-04-12
申请号：US16135197
申请日：2018-09-19
Applicant: ASML Netherlands B.V.
Inventor： Martin Jacobus Johan Jak , Simon Gijsbert Josephus Mathijssen , Kaustuve Bhattacharyya , Won-Jae Jang , Jinmoo Byun
IPC: G03F7/20
Abstract: A method to determine a patterning process parameter, the method comprising: for a target, calculating a first value for an intermediate parameter from data obtained by illuminating the target with radiation comprising a central wavelength; for the target, calculating a second value for the intermediate parameter from data obtained by illuminating the target with radiation comprising two different central wavelengths; and calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter.
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公开(公告)号：US11022900B2
公开(公告)日：2021-06-01
申请号：US16931002
申请日：2020-07-16
Applicant: ASML Netherlands B.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Stefan Hunsche , Markus Gerardus Martinus Maria Van Kraaij
Abstract: Disclosed is an inspection apparatus for use in lithography. It comprises a support for a substrate carrying a plurality of metrology targets; an optical system for illuminating the targets under predetermined illumination conditions and for detecting predetermined portions of radiation diffracted by the targets under the illumination conditions; a processor arranged to calculate from said detected portions of diffracted radiation a measurement of asymmetry for a specific target; and a controller for causing the optical system and processor to measure asymmetry in at least two of said targets which have different known components of positional offset between structures and smaller sub-structures within a layer on the substrate and calculate from the results of said asymmetry measurements a measurement of a performance parameter of the lithographic process for structures of said smaller size. Also disclosed are substrates provided with a plurality of novel metrology targets formed by a lithographic process.
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公开(公告)号：US10983361B2
公开(公告)日：2021-04-20
申请号：US15898394
申请日：2018-02-16
Applicant: ASML Netherlands B.V.
Abstract: A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning (558) the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element optimized (552) to diffract the alignment beam and the operating beam in the same (or a predetermined) direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (pIR) and a second periodic structure with a second pitch (pSXR). After alignment, the vacuum system is pumped down (562) and in operation the SXR operating beam is generated (564) by a high harmonic generation (HHG) optical source pumped by the IR alignment beam’ optical source.
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公开(公告)号：US10942460B2
公开(公告)日：2021-03-09
申请号：US16085000
申请日：2017-02-14
Applicant: ASML NETHERLANDS B.V.
Abstract: A method of determining positions of marks, the marks comprising periodic structures, at least some of the structures comprising periodic sub-structures, the sub-structures having a smaller period than the structures, the marks formed with positional offsets between the sub-structures and structures, the positional offsets caused by a combination of both known and unknown components, the method comprising illuminating a plurality of the marks with radiation having different characteristics, detecting radiation diffracted by the marks using one or more detectors which produce output signals, discriminating between constituent parts of the signals, the discriminating based on a variation of the signals as a function of spatial positions of the marks on a substrate, selecting at least one of the constituent parts of the signals, and using the at least one selected constituent part, and information relating to differences between the known components, to calculate a corrected position of at least one mark.
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