公开(公告)号：JP2009194384A

公开(公告)日：2009-08-27

申请号：JP2009024480

申请日：2009-02-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS

IPC: H01L21/027

CPC classification number: G03F7/70758 ,  G03F7/707 ,  G03F7/70725 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To improve the positioning accuracy and/or settling time of a substrate supported by a movable support or an exchangeable object such as a patterning device. SOLUTION: The movable support is configured to hold the exchangeable object. The support includes a movable structure configured to be movable relative to a reference object, an object holder configured to be movable relative to the movable structure and hold the exchangeable object, an actuator configured to move the movable structure relative to the reference object, and a minimum stroke actuator configured to move the object holder relative to the movable structure. The stiffness of the minimum stroke actuator is substantially larger than at least a degree of stiffness of the actuator. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提高由可移动支撑件或诸如图案形成装置的可更换物体支撑的基板的定位精度和/或稳定时间。 解决方案：可移动支撑件被配置为保持可更换物体。 所述支撑件包括被构造成相对于参考物体可移动的可移动结构，被配置为相对于所述可移动结构可移动并保持所述可更换物体的物体保持器，构造成相对于所述参考物体移动所述可移动结构的致动器， 最小行程致动器被配置为相对于可移动结构移动物体保持器。 最小行程致动器的刚度基本上大于致动器的至少一定程度的刚度。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009156862A

公开(公告)日：2009-07-16

申请号：JP2008273658

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER PASCH ENGELBERTUS ANTO

IPC: G01B11/00 ,  G01D5/38 ,  G03F7/20 ,  H01L21/027

CPC classification number: G01D5/38 ,  G03F9/7015 ,  G03F9/7049 ,  G03F9/7084 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a measurement system easy to manufacture a grating or a pattern. SOLUTION: The measurement system includes a sensor arranged to cooperate with a first pattern arranged on a structure of the measurement system to determine a first positional quantity of the sensor relative to the structure, and arranged to cooperate with a second pattern arranged on the structure to determine a second position quantity of the sensor relative to the structure, wherein the first and the second patterns are arranged on different surfaces of the structure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供容易制造光栅或图案的测量系统。 解决方案：测量系统包括传感器，布置成与布置在测量系统的结构上的第一图案配合，以确定传感器相对于结构的第一位置量，并且被布置成与布置在其上的第二图案配合 确定传感器相对于结构的第二位置量的结构，其中第一和第二图案布置在结构的不同表面上。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009130355A

公开(公告)日：2009-06-11

申请号：JP2008290448

申请日：2008-11-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  GEERKE JOHAN HENDRIK ,  DE PEE JOOST ,  BEIJERS CLEMENTIUS ANDREAS JOH ,  OUDE NIJHUIS MARCO HENDRIKUS H ,  DEBIESME FRANCOIS XAVIER

IPC: H01L21/027

CPC classification number: G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide an improved lithographic apparatus, where vibration in a projection system or another module of the equipment caused by displacement is reduced.
SOLUTION: The lithographic apparatus includes: an illumination system for attaching conditions to radial beams; a support for supporting a patterning device capable of giving a pattern to a section of the radial beams to form the patterning radial beams; a substrate table for holding a substrate; and the projection system for projecting the patterning radial beams onto a target portion of the substrate. The apparatus also includes: a sensor arranged to detect the vibration of the projection system in use; an actuator arranged to exert a force to the projection system in use; and the projection system for converting an output signal of the sensor to an actuator input signal in use so that vibration of the projection system is reduced by controlling the actuator by an input signal arranged to exert the force to the projection system during operation.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种改进的光刻设备，其中减少了由位移引起的设备的投影系统或其他模块中的振动。 解决方案：光刻设备包括：用于将条件附接到径向光束的照明系统; 用于支撑图案形成装置的支撑件，其能够向所述径向梁的一部分提供图案以形成所述图案化径向梁; 用于保持衬底的衬底台; 以及用于将图案化的径向光束投影到基板的目标部分上的投影系统。 该装置还包括：传感器，布置成检测投影系统在使用中的振动; 致动器，布置成在使用中向所述投影系统施加力; 以及用于将传感器的输出信号转换为使用中的致动器输入信号的投影系统，以便通过在操作期间通过布置成向投影系统施加力的输入信号控制致动器来减小投影系统的振动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009127861A

公开(公告)日：2009-06-11

申请号：JP2008290443

申请日：2008-11-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAM ,  BOSCHKER STIJN

IPC: F16F15/02 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/709 ,  F16F7/1005 ,  F16F15/02

Abstract: PROBLEM TO BE SOLVED: To provide a combination of a structure and two or more active damping systems capable of improving overall damping performance of a combination of the plurality of active damping systems. SOLUTION: This combination of a structure and two or more damping system is an active damping system assembly damping vibration of at least a part of the structure, and includes a sensor measuring a positional amount of interface mass attached to the structure, and a plurality of active dampers each including an actuator applying force to the interface mass depending on a signal supplied by the sensor. Each of the plurality of active damping systems is connected to the interface mass. This structure can be formed into a projection system of a lithography device. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供能够改善多个主动阻尼系统的组合的总体阻尼性能的结构和两个或更多个主动阻尼系统的组合。 解决方案：结构和两个或更多个阻尼系统的组合是主动阻尼系统组件阻尼结构的至少一部分的振动，并且包括测量附接到结构的界面质量的位置量的传感器，以及 多个有源阻尼器，每个有源阻尼器包括致动器根据传感器提供的信号向接口质量施力。 多个主动阻尼系统中的每一个连接到界面质量块。 该结构可以形成为光刻设备的投影系统。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008141165A

公开(公告)日：2008-06-19

申请号：JP2007237580

申请日：2007-09-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68 ,  H02K41/03

CPC classification number: G03F7/70758 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To provide a stage device arranged to reduce an influence of an electromagnetic motor on an electromagnetic actuator without employing a ferromagnetic shield. SOLUTION: In a stage device and a lithographic device provided with such a stage device, the stage device includes an electromagnetic motor arranged to move an object table, an electromagnetic actuator configured to position the object table, and a device constructed to supply an electric current to the stage device so that in use, the electric current will at least partially compensate the electromagnetic actuator for an influence of a stray magnetic field generated by the electromagnetic motor. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种台架装置，其布置成在不使用铁磁屏蔽的情况下减小电磁马达对电磁致动器的影响。 解决方案：在具有这种平台装置的舞台装置和光刻装置中，舞台装置包括布置成移动对象台的电磁电动机，被配置为定位对象台的电磁致动器以及被构造成供给的装置 电流到舞台装置，使得在使用中，电流将至少部分地补偿电磁致动器以影响由电磁马达产生的杂散磁场。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008091892A

公开(公告)日：2008-04-17

申请号：JP2007228805

申请日：2007-09-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  KLAASSEN FRANCISCUS ADRIANUS G

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03B27/58 ,  G03F7/70733 ,  G03F7/70758

Abstract: PROBLEM TO BE SOLVED: To provide a positioning device that virtually determines the position of first and second movable objects in a common operating zone. SOLUTION: A positioning device comprises a first coil assembly arranged next to the operating zone, a second coil assembly arranged on the opposite side of the operating zone, one or more first magnets arranged on the first movable object that work together with the first coil assembly, and one or more second magnets arranged on the second movable object that work together with the second coil assembly. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在公共操作区域中虚拟地确定第一和第二可移动物体的位置的定位装置。 解决方案：定位装置包括布置在操作区旁边的第一线圈组件，布置在操作区的相对侧上的第二线圈组件，布置在第一可移动对象上的一个或多个第一磁体，其与 第一线圈组件和布置在第二可移动物体上的一个或多个第二磁体，其与第二线圈组件一起工作。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008072112A

公开(公告)日：2008-03-27

申请号：JP2007232140

申请日：2007-09-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERWEIJ ANTONIE HENDRIK ,  BUIS EDWIN JOHAN ,  BUTLER HANS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70358 ,  G03F7/70208 ,  G03F7/70283

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for exposing the patterns of first and second pattering devices carried by one patterning device support on a substrate by single continuous scan operations. SOLUTION: The lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support first and second patterning devices, each patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the illumination system includes a radiation beam path adaptation device, and the adaptation device is configured to adapt a radiation beam path to allow the subsequent projections of the pattern of the first patterning device and the pattern of the second patterning device during the single scanning movement of the patterning device support. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，用于通过单次连续扫描操作将由一个图案形成装置支撑件携带的第一和第二图案装置的图案暴露在基板上。 解决方案：光刻设备包括：被配置为调节辐射束的照明系统; 支撑构造以支撑第一和第二图案形成装置，每个图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述照明系统包括辐射束路径自适应装置，并且所述自适应装置被配置为使辐射束路径适应于所述辐射束路径的后续投影 在图案形成装置支撑件的单次扫描运动期间，第一图案形成装置的图案和第二图案形成装置的图案。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006140495A

公开(公告)日：2006-06-01

申请号：JP2005326786

申请日：2005-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BUTLER HANS ,  BOOGAARTS MARTINUS GODEFRIDUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F9/7003 ,  G03F7/70725 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To perform a high-speed measurement without increasing an entrance length although a measuring sensor is meandered on a substrate to perform equi-spaced measurements in the uniform motion component, and a high-speed movement is required to shorten measuring time which inevitably requires a long entrance length and a broad space in measuring the height level of the substrate in a lithographic projection device to make a map. SOLUTION: The high-speed measurement is achieved by selecting a measured orbit in which relative movement of a measuring system MS and the substrate 4 is performed along predetermined measuring points, selecting accelerations and speeds of the correlated measuring system MS and substrate 4 as the functions of time, determining the timings of measured samples so as to take these measured samples at these predetermined points, and taking at least one measurement sample at a point at which the substrate 4 and measuring system MS are accelerated in a correlated manner, thereby enabling the high-speed measurement without increasing the entrance length. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：尽管测量传感器在基板上蜿蜒而在均匀运动分量中进行等间隔的测量，但是不增加入口长度来执行高速测量，并且需要高速运动 缩短测量时间，这不可避免地需要长的入口长度和广泛的空间来测量光刻投影设备中的基板的高度水平以制作地图。 解决方案：通过选择测量系统MS和基板4的相对运动沿预定测量点进行测量的轨道，选择相关测量系统MS和基板4的加速度和速度来实现高速测量 作为时间的函数，确定测量样本的定时，以便将这些测量样本置于这些预定点处，并且以相关的方式在基板4和测量系统MS加速的点处获取至少一个测量样本， 从而能够进行高速测量而不增加入口长度。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006024919A

公开(公告)日：2006-01-26

申请号：JP2005172487

申请日：2005-06-13

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BUTLER HANS

IPC: H01L21/68 ,  G03B27/58 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70758 ,  G03F7/70141 ,  G03F7/70258

Abstract: PROBLEM TO BE SOLVED: To provide an improved type drive device for at least partially compensating for the relative displacement between an object to be driven and an actuator for driving it. SOLUTION: The positioning device for positioning an object comprises a first actuator and a connector, arranged in between the first actuator and the object. The connector includes an elastic member and a second actuator connected to the elastic member, in series. The first actuator is configured and arranged, such that a force applies onto the connector in a first direction and the second actuator is controlled, such that the distance in the first direction between the first object and the object is kept substantially constant. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种改进型驱动装置，用于至少部分地补偿待驱动物体和用于驱动它的致动器之间的相对位移。 解决方案：用于定位物体的定位装置包括布置在第一致动器和物体之间的第一致动器和连接器。 连接器包括串联连接到弹性构件的弹性构件和第二致动器。 第一致动器被构造和布置成使得力沿第一方向施加到连接器上，并且第二致动器被控制，使得第一物体和物体之间的第一方向上的距离保持基本上恒定。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2002246309A

公开(公告)日：2002-08-30

申请号：JP2002029340

申请日：2002-02-06

Applicant: ASML NETHERLANDS BV

Inventor： BOONMAN MARCUS EMILE JOANNES ,  MULKENS JOHANNES CATHARINUS HU ,  BUTLER HANS

IPC: G03F7/22 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a system and method for controlling lithographic projection system, by which focal points over the whole exposure area can be further improved. SOLUTION: In the lithographic projection system, a focal surface is adjusted by using a manipulator which can be used by a projection lens system, so that the shape of the surface matches that of the surface of a wafer in the exposure area, as much as possible. The form control of the focal surface can be integrated with leveling control which decides the height and inclination of the surface of the wafer.