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    Assembly comprising sensor for determining at least one of tilt and height of substrate, its method and lithographic projection apparatus
    1.
    发明专利
    Assembly comprising sensor for determining at least one of tilt and height of substrate, its method and lithographic projection apparatus 有权
    装配传感器用于确定底板和底板的高度，其方法和平面投影装置

    公开(公告)号：JP2008016860A

    公开(公告)日：2008-01-24

    申请号：JP2007209612

    申请日：2007-08-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BRINKHOF RALPH ,  BOONMAN MARCUS EMILE JOANNES ,  DE NIVELLE MARTIN JULES MARIE-

    IPC: G03F7/20 ,  H01L21/027 ,  G01B11/02 ,  G01B11/26 ,  G03F9/00

    CPC classification number: G03F9/7026 ,  G03F9/7034 ,  G03F9/7046

    Abstract: PROBLEM TO BE SOLVED: To provide an assembly having a sensor for determining at least one of tilt and height of a surface of a substrate by a lithographic projection apparatus. SOLUTION: The substrate (W; 11) is movable along at least one path substantially parallel to the surface of the substrate with respect to the sensor. The lithographic projection apparatus (1) has an exposure scanning direction (y). The assembly is constructed to continuously move the substrate along at least one path with respect to the sensor and to provide measured data concerning at least one of the data of the tilt and height along at least the one path. The assembly has a memory (10) for storing the measurement data so that the lithographic projection apparatus uses the substrate above thereafter during exposure. At least a portion of the at least one path of the substrate has an angle to the exposure scanning direction. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种具有用于通过光刻投影装置确定基板的表面的倾斜度和高度中的至少一个的传感器的组件。 解决方案：基板（W; 11）能够相对于传感器沿基本上平行于基板的表面的至少一个路径移动。 光刻投影装置（1）具有曝光扫描方向（y）。 该组件被构造成沿着至少一个相对于传感器的路径连续地移动衬底，并且提供关于沿至少一个路径的倾斜和高度的数据中的至少一个的测量数据。 组件具有用于存储测量数据的存储器（10），使得光刻投影设备在曝光期间使用其上方的衬底。 衬底的至少一个路径的至少一部分具有与曝光扫描方向的角度。 版权所有（C）2008，JPO＆INPIT

    Lithography apparatus and method for manufacturing device
    6.
    发明专利
    Lithography apparatus and method for manufacturing device 有权
    LITHOGRAPHY设备和制造设备的方法

    公开(公告)号：JP2007150288A

    公开(公告)日：2007-06-14

    申请号：JP2006298498

    申请日：2006-11-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： OTTENS JOOST JEROEN ,  BOONMAN MARCUS EMILE JOANNES ,  CASTENMILLER THOMAS JOSEPHUS M ,  JEUNINK ANDRE BERNARDUS

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

    CPC classification number: G03F7/70783 ,  G03F7/707 ,  H01L21/682 ,  Y10S269/903

    Abstract: PROBLEM TO BE SOLVED: To provide an article support which allows every kind of deformation induced by a heat load or the like of an article supported by itself during a lithography process. SOLUTION: The article support which is constructed for supporting a reticle (a first article) or a wafer (a second article) includes several protrusions for support on each of which the article is set when in use and which is constructed in such a way as to demarcate a support region for providing a flat surface on which they support the article, to enable the expansion and contraction of at least a part of the article by the support region when the article is subjected to the heat load in this way and to reduce the accumulation of mechanical stress in the article and a position sensor which is constructed in such a way as to determine a displacement position offset in one direction of the article on a flat surface of its support region for a certain period. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种制品支撑件，其允许在光刻工艺期间由其自身支撑的物品的热负载等引起的各种变形。 解决方案：构造用于支撑掩模版（第一制品）或晶片（第二制品）的物品支撑件包括用于在使用时在每个构件上设置制品的几个突起，并且其构造为 用于划定支撑区域以提供它们支撑制品的平坦表面的方式，以便在制品以这种方式承受热负荷时能够通过支撑区域使制品的至少一部分膨胀和收缩 并且减少制品中的机械应力累积和位置传感器，其以这样的方式构造，以便确定在其支撑区域的平坦表面上的物品的一个方向上的位移偏移一段时间。 版权所有（C）2007，JPO＆INPIT

    Lithography device executing feed-forward focus control, and method of manufacturing device
    7.
    发明专利
    Lithography device executing feed-forward focus control, and method of manufacturing device 有权
    执行进给聚焦控制的算法设备和制造设备的方法

    公开(公告)号：JP2005236296A

    公开(公告)日：2005-09-02

    申请号：JP2005040321

    申请日：2005-02-17

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： BUTLER HANS ,  BOONMAN MARCUS EMILE JOANNES ,  VAN DEN BIGGELAAR PETRUS MARIN

    IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

    CPC classification number: G03F9/7034 ,  G03F9/7003 ,  G03F9/7015

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography device which has an improved focus control system. SOLUTION: The lithography device comprises servo units which position board holders, sensor units which determine the distance of at least one positional point on the surface of a board from a reference surface, a memory unit which stores the surface information of the board, on the basis of each distance of at least one positional point on the surface of the board from the reference distance, and computing units which determine a feed-forward setting point signal, on the basis of the memorized surface information. The feed-forward setting signal is supplied in forward direction to the servo units to position the board holders. COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种具有改进的聚焦控制系统的光刻设备。 解决方案：光刻设备包括定位板固定器的伺服单元，确定板的表面上的至少一个位置点与参考表面的距离的传感器单元，存储板的表面信息的存储单元 基于基准距离上的板的表面上的至少一个位置点的每个距离，以及基于存储的表面信息来确定前馈设定点信号的计算单元。 前馈设置信号以正向方式提供给伺服单元以定位电路板支架。 版权所有（C）2005，JPO＆NCIPI

    9.
    发明专利
    未知

    公开(公告)号：DE602005001870D1

    公开(公告)日：2007-09-20

    申请号：DE602005001870

    申请日：2005-02-17

    Applicant: ASML NETHERLANDS BV

    Inventor： BUTLER HANS ,  BOONMAN MARCUS EMILE JOANNES ,  VAN DEN BIGGELAAR PETRUS MARIN

    IPC: G03F7/20 ,  H01L21/027 ,  G03F9/00

    Abstract: The present invention discloses a lithographic apparatus a lithographic apparatus with an improved focus control system. The lithographic apparatus includes an illumination system (IL) configured to provide a beam of radiation (PB), a first support structure (MT) configured to support a patterning device (MA) that imparts the beam of radiation with a desired pattern in its cross-section, a second support structure (WT) that includes a substrate holder for holding a substrate (W), a projection system (PL) configured to project the patterned beam of radiation onto a target portion (C) on a surface of the substrate, and a servo unit (PW) configured to position the substrate holder. The apparatus further includes a sensor unit (LS) configured to determine a distance of at least one location point on the surface of the substrate relative to a reference plane (REF), a memory unit configured to store surface information of the substrate based on respective distances of corresponding the at least one location point on the substrate surface, and a calculating unit configured to determine a feed-forward set-point signal based on the stored surface information, such that the feed-forward set-point signal is forwardly fed to the servo unit in order to position the substrate holder.

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