VERFAHREN ZUR HERSTELLUNG VON POLYACETALEN, IHRE VERWENDUNG UND DIE HERGESTELLTE POLYACETALE
    54.
    发明授权
    VERFAHREN ZUR HERSTELLUNG VON POLYACETALEN, IHRE VERWENDUNG UND DIE HERGESTELLTE POLYACETALE 失效
    用于生产聚缩醛,使用和生产的聚缩醛

    公开(公告)号:EP0656914B1

    公开(公告)日:1997-01-08

    申请号:EP93917793.7

    申请日:1993-08-16

    CPC classification number: C11D3/3711 B01F17/0028 C08G2/18 C08G4/00

    Abstract: A process for the production of polyacetals by the copolymerisation of glyoxylic acid esters with cyclic formals derived from dioles, homopolymers of formaldehyde, trioxepane or mixture of these compounds, in which up to 50 wt % of this group of monomers may be replaced by other conventional copolymerisable monomers like epoxides, aldehydes with at least 2 C atoms, tetrahydrofurane and/or C2 to C4 olefines, in the presence of anionic or cationic polymerisation initiators and possibly the hydrolysis of the glyoxyl acid esters polymerised into the copolymer, use of the polyacetal carboxylates thus obtainable as an additive in low-phosphate and phosphate-free washing and cleaning agents, as a water treatment agent and as a dispersant for finely divided substances, and polyacetals which are obtainable by the anionically or cationically initiated copolymerisation of glyoxyl acid esters with cyclic formals derived from diols and possibly the introduction of stable final groups and possibly hydrolysis of the ester groups of the glyoxyl acid esters polymerised into the copolymers.

    VERFAHREN ZUR HERSTELLUNG VERNICKELTER FORMTEILE
    57.
    发明授权
    VERFAHREN ZUR HERSTELLUNG VERNICKELTER FORMTEILE 失效
    用于生产镍饰件。

    公开(公告)号:EP0610236B1

    公开(公告)日:1995-09-20

    申请号:EP92919740.8

    申请日:1992-09-21

    CPC classification number: C25D3/18

    Abstract: The production of nickel-plated castings by the galvanic separation of nickel from aqueous-acid baths containing as the essential component one or more nickel salts, one or more inorganic acids and one or more brighteners, in which the brighteners used are cyclic ammonium compounds (I) in which the N atom is a component of a pyridine, quinoline or isoquinoline ring system which can also carry one or two C1 to C4-alkyl-substituted constituents and: R?1 and R2¿ are hydrogen or C¿1? to C4-alkyl; A is a group of the formula -CO-R?3¿, -CO-O-R3, -CO-CH?2-CO-O-R3¿ or -O-R3, wherein: R3 is C1 to C12-alkyl, C5 to C8-cycloalkyl, C7 to C4-alkyl radicals, C1 to C4-alkoxy radicals, halogen atoms, hydroxyl groups, phenyl radicals or C1 to C4-alkoxy carbonyl groups; m is a number from 0 to 10; n is a number from 2 to 4; and p is 0 or 1, and X- is an n-valent inorganic or organic anion promoting water-solubility; with the proviso that if p = 0 and A = -CO-O-C¿1? - C12-alkyl, m may not be 1, 2 or 3 and in the same case R?1¿ is not hydrogen if m = 0.

    VERFAHREN ZUR HERSTELLUNG VERNICKELTER FORMTEILE
    58.
    发明授权
    VERFAHREN ZUR HERSTELLUNG VERNICKELTER FORMTEILE 失效
    用于生产镍饰件。

    公开(公告)号:EP0621908B1

    公开(公告)日:1995-09-06

    申请号:EP93902188.7

    申请日:1993-01-14

    CPC classification number: C25D3/14

    Abstract: Production of nickel-plated mouldings by the galvanic separation of nickel from aqueous-acidic baths containing as the essential components one or more nickel salts, one or more inorganic acids and at least two brighteners, in that the brightener consists of amixture of: A) 2 to 98 % wt. of one or more cyclic N-allyl or N-vinyl ammonium compounds (I) in which the N-atom is a component of a pyridine, quinoline or isoquinoline ring system which can also carry one or two C1 to C4-alkyl substituents or halogen atoms, R?1, R3 and R4¿ are hydrogen or C¿1? to C4-alkyl, R?2¿ is hydrogen or methyl, m is a number from 0 to 4, n is a number from 1 to 4 and X- is an n-valent inorganic or organic anion which promotes solubility in water; and B) 98 to 2 % wt. of one or more acetylenically unsaturated compounds (II): R?4-C=C-R5¿ in which the radicals R?4 and R5¿ are the same or different and are hydroxyl, sulpho, amino, C¿1? to C4-alkylamino or di(C1 to C4-alkyl)amino-substitued C1 to C4-alkyl, in which hydroxyl groups can be caused to react with 1 to 10 mol of a C1 to C4-alkylene oxide or a mixture of such alkylene oxides and one of the radicals R?4 or R5¿ may also be hydrogen or C¿1? to C4-alkyl.

Patent Agency Ranking