公开(公告)号：US07449264B2

公开(公告)日：2008-11-11

申请号：US11293593

申请日：2005-12-02

Applicant: Manish Chandhok ,  Michael Goldstein

Inventor： Manish Chandhok ,  Michael Goldstein

IPC: G03F1/00 ,  G01B9/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70283 ,  G03F7/70425 ,  G03F7/706

Abstract: Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location of best focus. A coma aberration may be introduced to compensate for a pattern shift.

Abstract translation: 可以在使用反射掩模的光刻系统中使用的镜面中引入像差，以补偿与反射掩模相关的不利的光学效应。 可以引入球面像差以补偿最佳聚焦位置的偏移。 可以引入彗形像差以补偿图案偏移。

公开(公告)号：US07372048B2

公开(公告)日：2008-05-13

申请号：US11196231

申请日：2005-08-02

Applicant: Michael Goldstein ,  Peter J. Silverman

Inventor： Michael Goldstein ,  Peter J. Silverman

IPC: H01J49/00

CPC classification number: G03F7/7005 ,  G03F7/201

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract translation: 用于极紫外（EUV）光刻系统的照明系统可以包括多个EUV光源。 当照射面罩时，系统可以组合来自多个源的光。

公开(公告)号：US07355268B2

公开(公告)日：2008-04-08

申请号：US11400076

申请日：2006-04-07

Applicant: Michael Goldstein

Inventor： Michael Goldstein

IPC: H01L23/58 ,  H01L29/06 ,  H01L29/12 ,  H01L27/148 ,  H01L29/74

CPC classification number: B81C1/00666 ,  B81B2201/042 ,  B81C2201/0167 ,  G02B5/0833 ,  G02B26/0833 ,  Y10S438/954

Abstract: An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

Abstract translation: 具有高反射器可调应力涂层的光学装置包括微机电系统（MEMS）平台，设置在MEMS平台上的反射镜和设置在反射镜上的多层涂层。 多层涂层包括沉积在Ag层上的银（Ag）层，二氧化硅层（SiO 2 SiO 2），沉积在SiO 2层上的本征硅（Si）层 以及沉积在Si层上的氮氧化硅层（SiO x x N y Y y）。 氮的浓度增加和/或降低以调节应力（例如，拉伸，无，压缩）。

公开(公告)号：US07326945B2

公开(公告)日：2008-02-05

申请号：US10661971

申请日：2003-09-11

Applicant: Michael Goldstein

Inventor： Michael Goldstein

IPC: G01N21/86 ,  G03B27/72

CPC classification number: G03F7/70558

Abstract: A dose transfer standard detector measures radiation intensity and dose in a lithography tool. The lithography tool may be an Extreme Ultraviolet lithography (EUVL) tool. The dose transfer standard detector may transmit intensity and dose data to a computer, which analyzes the data. Based on the analyzed data, the lithography tool may be calibrated.

Abstract translation: 剂量转移标准检测器测量光刻工具中的辐射强度和剂量。 光刻工具可以是极紫外光刻（EUVL）工具。 剂量转移标准检测器可将强度和剂量数据传输给计算机，该计算机分析数据。 基于分析的数据，可以校准光刻工具。

公开(公告)号：US20070235876A1

公开(公告)日：2007-10-11

申请号：US11394732

申请日：2006-03-30

Applicant: Michael Goldstein

Inventor： Michael Goldstein

IPC: H01L23/52

CPC classification number: H01L23/53238 ,  C23C18/1692 ,  C23C18/1844 ,  C23C18/34 ,  C23C18/40 ,  C23C18/44 ,  H01L21/288 ,  H01L21/76843 ,  H01L21/76873 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method of processing a substrate is described. A coupling agent and a metal ion solution are applied to the substrate. An activating solution is applied to activate metal ions of the metal ion solution to create a metal film out of the ions.

Abstract translation: 描述了一种处理衬底的方法。 将偶联剂和金属离子溶液施加到基材上。 施加激活溶液以激活金属离子溶液的金属离子，以产生离子之外的金属膜。

公开(公告)号：US07199936B2

公开(公告)日：2007-04-03

申请号：US11386496

申请日：2006-03-21

Applicant: David L. Williams ,  James Kardach ,  Michael Goldstein

Inventor： David L. Williams ,  James Kardach ,  Michael Goldstein

IPC: G02B27/14 ,  G02B27/10 ,  G02B27/28 ,  G03B27/54

CPC classification number: G02B27/286 ,  G02B27/283 ,  G02F1/0136 ,  G02F1/09 ,  G03F7/70058 ,  G03F7/7055 ,  G03F7/70566

Abstract: According to one aspect of the invention, a method and apparatus for polarizing electromagnetic radiation is provided. The electromagnetic radiation may be divided into first and second portions, substantially all of the first portion may be linearly polarized in a first direction and substantially all of the second portion may be linearly polarized in a second direction, the first direction being substantially orthogonal to the second direction. The linear polarization of at least one of the first and second portions may be changed such that substantially all of both of the first and second portions are linearly polarized in a third direction. At least one of the first and second portions may be redirected such that substantially all of both the first and second portions are propagating in a fourth direction.

Abstract translation: 根据本发明的一个方面，提供了一种用于偏振电磁辐射的方法和装置。 电磁辐射可以被分成第一和第二部分，基本上所有的第一部分可以在第一方向上线性偏振，并且基本上所有的第二部分可以在第二方向上线性偏振，第一方向基本上与 第二个方向 可以改变第一和第二部分中的至少一个的线性极化，使得第一和第二部分的基本上全部都在第三方向上线性偏振。 第一部分和第二部分中的至少一个可以被重定向，使得第一部分和第二部分基本上全部都在第四方向上传播。

公开(公告)号：US07070832B2

公开(公告)日：2006-07-04

申请号：US10665313

申请日：2003-09-11

Applicant: Michael Goldstein

Inventor： Michael Goldstein

IPC: B05D1/32

CPC classification number: G03F1/82 ,  B08B7/0092 ,  B24C1/003 ,  B24C3/322 ,  G03F7/70866 ,  G03F7/70925 ,  Y10T428/31504

Abstract: Spraying a surface of a reticle with carbon dioxide snow cleans the surface and removes particles. Further spraying the surface of the reticle with carbon dioxide snow at a temperature below a carbon dioxide sublimation temperature forms a solid carbon dioxide layer on the surface. The solid carbon dioxide layer prevents particles from contacting the surface of the reticle. The solid carbon dioxide layer may be removed, and the reticle may be used in a extreme ultraviolet lithography tool.

Abstract translation: 用二氧化碳雪喷涂掩模版的表面清洁表面并除去颗粒。 在低于二氧化碳升华温度的温度下用二氧化碳雪进一步喷涂掩模版的表面，在表面上形成固体二氧化碳层。 固体二氧化碳层防止颗粒接触掩模版的表面。 可以去除固体二氧化碳层，并且掩模版可以用于极紫外光刻工具。

公开(公告)号：US20060103942A1

公开(公告)日：2006-05-18

申请号：US11314689

申请日：2005-12-20

Applicant: David Williams ,  James Kardach ,  Michael Goldstein

Inventor： David Williams ,  James Kardach ,  Michael Goldstein

IPC: G02B27/12

CPC classification number: G02B27/286 ,  G02B27/283 ,  G02F1/0136 ,  G02F1/09 ,  G03F7/70058 ,  G03F7/7055 ,  G03F7/70566

Abstract: According to one aspect of the invention, a method and apparatus for polarizing electromagnetic radiation is provided. The electromagnetic radiation may be divided into first and second portions, substantially all of the first portion may be linearly polarized in a first direction and substantially all of the second portion may be linearly polarized in a second direction, the first direction being substantially orthogonal to the second direction. The linear polarization of at least one of the first and second portions may be changed such that substantially all of both of the first and second portions are linearly polarized in a third direction. At least one of the first and second portions may be redirected such that substantially all of both the first and second portions are propagating in a fourth direction.

公开(公告)号：US07034320B2

公开(公告)日：2006-04-25

申请号：US10394412

申请日：2003-03-20

Applicant: Peter J. Silverman ,  Michael Goldstein

Inventor： Peter J. Silverman ,  Michael Goldstein

IPC: G03F7/207

CPC classification number: G03F7/70175

Abstract: A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a source to illuminate in a second hemisphere of the source; and a second surface shaped to reflect radiation in the second hemisphere of the source to an output plane.

公开(公告)号：US20060082750A1

公开(公告)日：2006-04-20

申请号：US11293593

申请日：2005-12-02

Applicant: Manish Chandhok ,  Michael Goldstein

Inventor： Manish Chandhok ,  Michael Goldstein

IPC: G03B27/52

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70283 ,  G03F7/70425 ,  G03F7/706

Abstract: Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location of best focus. A coma aberration may be introduced to compensate for a pattern shift.