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    Method of and apparatus for modifying polarity of light
    2.
    发明授权
    Method of and apparatus for modifying polarity of light 失效
    修改光的极性的方法和装置

    公开(公告)号：US07760431B2

    公开(公告)日：2010-07-20

    申请号：US11123562

    申请日：2005-05-05

    Applicant: David L. Williams ,  Michael Goldstein ,  James P. Kardach

    Inventor： David L. Williams ,  Michael Goldstein ,  James P. Kardach

    IPC: G02B27/28

    CPC classification number: G02B27/286

    Abstract: A method of modifying polarity of light is provided. The light propagates through a first transverse plane and has known polarization states in respective cells of the first transverse plane. A first retardation compensator having respective waveplates matching the cells then changes the polarity of the light so that light propagating through a second transverse plane is circularly polarized across the entire second transverse plane. A second retardation compensator includes a plurality of quarter waveplates that change the polarization of the circularly polarized light, so that light passing through a third transverse plane is linearly polarized. The crystal alignment of the quarter waveplates and their shape and configuration are selected so that the direction of the polarization is normal to a radius from a single point.

    Abstract translation: 提供了改变光的极性的方法。 光通过第一横向平面传播并且在第一横向平面的相应单元中具有已知的偏振状态。 具有与单元匹配的各个波片的第一延迟补偿器然后改变光的极性，使得通过第二横向平面传播的光在整个第二横向平面上被圆偏振。 第二延迟补偿器包括改变圆偏振光的偏振的多个四分之一波片，使得穿过第三横向平面的光线性偏振。 选择四分之一波片的晶体对准及其形状和结构，使得偏振方向垂直于单个点的半径。

    Composite metal films and carbon nanotube fabrication
    3.
    发明申请
    Composite metal films and carbon nanotube fabrication 有权
    复合金属薄膜和碳纳米管制作

    公开(公告)号：US20070196575A1

    公开(公告)日：2007-08-23

    申请号：US11359165

    申请日：2006-02-21

    Applicant: Juan Dominguez ,  Valery Dubin ,  Florian Gstrein ,  Michael Goldstein

    Inventor： Juan Dominguez ,  Valery Dubin ,  Florian Gstrein ,  Michael Goldstein

    IPC: C23C16/00 ,  C01B31/02

    CPC classification number: B82Y40/00 ,  B82Y30/00 ,  C01B32/162 ,  Y10S977/742

    Abstract: Embodiments of the present invention provide methods for the fabrication of carbon nanotubes using composite metal films. A composite metal film is fabricated to provide uniform catalytic sites to facilitate the uniform growth of carbon nanotubes. Further embodiments provide embedded nanoparticles for carbon nanotube fabrication. Embodiments of the invention are capable of maintaining the integrity of the catalytic sites at temperatures used in carbon nanotube fabrication processes, 600 to 1100° C.

    Abstract translation: 本发明的实施例提供了使用复合金属膜制造碳纳米管的方法。 制造复合金属膜以提供均匀的催化位点以促进碳纳米管的均匀生长。 另外的实施方案提供用于碳纳米管制造的嵌入式纳米颗粒。 本发明的实施方案能够在碳纳米管制造工艺中使用的温度下维持催化部位的完整性，其温度为600至1100℃

    Compensation of reflective mask effects in lithography systems
    5.
    发明授权
    Compensation of reflective mask effects in lithography systems 失效
    光刻系统中反射掩模效应的补偿

    公开(公告)号：US07022443B2

    公开(公告)日：2006-04-04

    申请号：US10366583

    申请日：2003-02-12

    Applicant: Manish Chandhok ,  Michael Goldstein

    Inventor： Manish Chandhok ,  Michael Goldstein

    IPC: G03F7/20

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70283 ,  G03F7/70425 ,  G03F7/706

    Abstract: Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location of best focus. A coma aberration may be introduced to compensate for a pattern shift.

    Abstract translation: 可以在使用反射掩模的光刻系统中使用的镜面中引入像差，以补偿与反射掩模相关的不利的光学效应。 可以引入球面像差以补偿最佳聚焦位置的偏移。 可以引入彗形像差以补偿图案偏移。

    Extreme ultraviolet transition oscillator
    8.
    发明授权
    Extreme ultraviolet transition oscillator 失效
    极紫外线过渡振荡器

    公开(公告)号：US06903354B2

    公开(公告)日：2005-06-07

    申请号：US10371541

    申请日：2003-02-21

    Applicant: Michael Goldstein

    Inventor： Michael Goldstein

    IPC: H05G2/00 ,  A61N5/00

    CPC classification number: H05G2/00

    Abstract: Systems and techniques to generate extreme ultraviolet (EUV) illumination. An EUV system includes first layers, and second layers interleaved with the first layers, where the first layers and the second layers have a thickness selected to produce coherent transition radiation in an extreme ultraviolet wavelength region when an electron beam passes through the first layers and the second layers. The first and second layers may be built using thin film deposition techniques and etching techniques. The first layers may include metal, such as molybdenum. The second layers may include a dielectric material and may define regions of vacuum between the first layers, including possibly multiple regions of vacuum per layer.

    Abstract translation: 用于产生极紫外（EUV）照明的系统和技术。 EUV系统包括第一层和与第一层交错的第二层，其中当电子束通过第一层时，第一层和第二层具有被选择用于产生极紫外波长区域中的相干过渡辐射的厚度， 第二层。 可以使用薄膜沉积技术和蚀刻技术来构建第一和第二层。 第一层可以包括金属，例如钼。 第二层可以包括介电材料并且可以限定第一层之间的真空区域，包括每层可能具有多个真空区域。

    High reflector tunable stress coating, such as for a MEMS mirror
    9.
    发明授权
    High reflector tunable stress coating, such as for a MEMS mirror 有权

    公开(公告)号：US06730615B2

    公开(公告)日：2004-05-04

    申请号：US10079614

    申请日：2002-02-19

    Applicant: Michael Goldstein

    Inventor： Michael Goldstein

    IPC: H01L2131

    CPC classification number: B81C1/00666 ,  B81B2201/042 ,  B81C2201/0167 ,  G02B5/0833 ,  G02B26/0833 ,  Y10S438/954

    Abstract: An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

    Reflective spectral filtering of high power extreme ultra-violet radiation
    10.
    发明授权
    Reflective spectral filtering of high power extreme ultra-violet radiation 有权
    大功率极紫外辐射的反射光谱滤波

    公开(公告)号：US06671088B2

    公开(公告)日：2003-12-30

    申请号：US10406933

    申请日：2003-04-03

    Applicant: Michael Goldstein

    Inventor： Michael Goldstein

    IPC: F21V906

    CPC classification number: G03F7/70575 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/702

    Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

    Abstract translation: 在本发明的一个实施例中，蚀刻在镜面基板上的光栅结构具有光栅周期，从而在光路内衍射围绕第一波长的第一波段内的第一入射辐射。 沉积在光栅结构上的多层涂层反射在光路内的第一入射辐射在第一波段内，第二入射辐射在第二波段内反射第二波长。 在另一个实施例中，沉积在反射镜基板上的第一多层涂层在围绕第二波长的第二波段内围绕第一波长和第二入射辐射在第一波段内反射第一入射辐射。 光栅结构沉积在第一多层涂层上。 光栅结构被蚀刻以具有光栅周期，从而使光路中的第二入射辐射在第二波段内衍射。

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