公开(公告)号：US07863591B2

公开(公告)日：2011-01-04

申请号：US12465118

申请日：2009-05-13

Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

IPC: G21K5/00

CPC classification number: G03F7/70916 ,  G01N21/15 ,  G03F7/70558

Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

Abstract translation: 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。

公开(公告)号：US20100259744A1

公开(公告)日：2010-10-14

申请号：US12680364

申请日：2008-09-26

Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Wouter Anthon Soer

Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Wouter Anthon Soer

IPC: G03B27/72

CPC classification number: G21K1/10 ,  G02B5/203 ,  G03F7/70191 ,  G03F7/70575 ,  G21K1/06 ,  G21K2201/067

Abstract: A lithographic spectral filter including a first filter element including a slit having an in plane length dimension arranged in a first direction; and a second filter element arranged at a subsequent position along an optical path of radiation of first and second wavelengths to the first filter element, the second filter element including a slit having an in plane length dimension arranged in a second direction transverse to the first direction, wherein the spectral filter is configured to reflect radiation of a first wavelength and allow transmission of radiation of a second wavelength, the first wavelength being larger than the second wavelength.

Abstract translation: 一种光刻频谱滤波器，包括：第一滤波器元件，包括具有沿第一方向布置的平面内长度尺寸的狭缝; 以及第二滤波器元件，其布置在沿着第一和第二波长的辐射的光路的后续位置处到所述第一滤波器元件，所述第二滤波器元件包括狭缝，所述狭缝具有沿横向于所述第一方向的第二方向布置的平面内长度尺寸 ，其中所述光谱滤光器被配置为反射第一波长的辐射并且允许第二波长的辐射的透射，所述第一波长大于所述第二波长。

公开(公告)号：US07771896B2

公开(公告)日：2010-08-10

申请号：US11643953

申请日：2006-12-22

Applicant: Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen

Inventor： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC: G03F1/00

CPC classification number: G03F7/70283 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/34 ,  G21K1/062 ,  G21K2201/067

Abstract: A patterning device for a photolithographic apparatus is used to form a patterned radiation beam, by imparting a cross-sectional pattern to the radiation beam during reflection from the patterning device. The patterning device comprises a layer of phase-change material that is capable of locally undergoing an induced structural phase change into respective ones of a plurality of stable and/or metastable states. Furthermore, the patterning device comprises a radiation reflective structure with periodically arranged layers adjacent to the layer of phase-change material. The radiation reflective structures do not partake in the phase changes. By locally changing the phase of the phase-change material, the reflectivity of the whole structure is modified, for example due to thickness changes in the layer of phase-change material that lead to destructive interference of different components of the reflected light or due to changes in surface roughness of the radiation reflective structure.

Abstract translation: 用于光刻设备的图案形成装置用于通过在从图案形成装置反射期间将辐射束赋予横截面图案来形成图案化的辐射束。 图案形成装置包括相变材料层，其能够局部地经历诱导的结构相变到多个稳定和/或亚稳态中的相应的相变状态。 此外，图案形成装置包括具有与相变材料层相邻的周期性排列的层的辐射反射结构。 辐射反射结构不参与相位变化。 通过局部改变相变材料的相位，整个结构的反射率被改变，例如由于相变材料层中的厚度变化导致反射光的不同分量的破坏性干扰或由于 辐射反射结构的表面粗糙度变化。

公开(公告)号：US20100181502A1

公开(公告)日：2010-07-22

申请号：US11634385

申请日：2006-12-06

Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

IPC: G21K5/02

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  H05G2/003 ,  H05G2/005

Abstract: A radiation source having self-shading electrodes is disclosed. Debris originating from the electrodes is reduced. The path from the electrodes to the EUV optics is blocked by part of the electrodes themselves (termed self-shading). This may significantly reduce the amount of electrode-generated debris.

Abstract translation: 公开了具有自阴影电极的辐射源。 源自电极的碎片减少。 从电极到EUV光学器件的路径被部分电极自身阻挡（称为自阴影）。 这可能会显着减少电极产生的碎片的数量。

公开(公告)号：US20100020304A1

公开(公告)日：2010-01-28

申请号：US12500198

申请日：2009-07-09

Applicant: Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

Inventor： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC: G03B27/72 ,  G02B27/42 ,  G02B5/28

CPC classification number: G03F7/702 ,  G03F7/70191 ,  G03F7/70575 ,  G21K1/10

Abstract: According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.

Abstract translation: 根据本发明的一个方面，光谱纯度滤光器包括孔径，孔被布置成衍射第一波长的辐射并且允许第二波长的辐射的至少一部分透射通过孔，第二 辐射的波长比辐射的第一波长短，其中孔的直径大于20μm。

公开(公告)号：US08665420B2

公开(公告)日：2014-03-04

申请号：US13060581

申请日：2009-07-29

Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

IPC: G03B27/72 ,  G03B27/54

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062

Abstract: A spectral purity filter is configured to reflect extreme ultraviolet radiation. The spectral purity filter includes a substrate, and an anti-reflective coating on a top surface of the substrate. The anti-reflective coating is configured to transmit infrared radiation. The filter also includes a multi-layer stack configured to reflect extreme ultraviolet radiation and to substantially transmit infrared radiation.

Abstract translation: 光谱纯度滤光器被配置为反射极紫外辐射。 光谱纯度滤光器包括基板和在基板顶表面上的抗反射涂层。 抗反射涂层被配置为透射红外辐射。 该滤波器还包括配置成反射极紫外辐射并基本上透射红外辐射的多层叠层。

公开(公告)号：US08416391B2

公开(公告)日：2013-04-09

申请号：US12809427

申请日：2008-12-19

Applicant: Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

Inventor： Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

IPC: G03B27/54 ,  G21G4/00

CPC classification number: H05G2/003 ,  H05G2/005

Abstract: A radiation source is configured to generate radiation. The radiation source includes a first electrode and a second electrode configured to produce an electrical discharge during use to generate radiation-emitting plasma from a plasma fuel. The radiation source also includes a fuel supply configured to supply a plasma fuel to a fuel release area that is associated with the first electrode and the second electrode, and a fuel release configured to induce release of fuel, supplied by the fuel supply, from the fuel release area. The fuel release area is spaced-apart from the first electrode and from the second electrode.

Abstract translation: 辐射源被配置成产生辐射。 辐射源包括第一电极和第二电极，其被配置为在使用期间产生放电以从等离子体燃料产生辐射发射等离子体。 辐射源还包括配置成将等离子体燃料供应到与第一电极和第二电极相关联的燃料释放区域的燃料供应，以及燃料释放装置，其被配置为引起由燃料供应源供应的燃料的释放 燃油释放区。 燃料释放区域与第一电极和第二电极间隔开。

公开(公告)号：US20130010363A1

公开(公告)日：2013-01-10

申请号：US13617705

申请日：2012-09-14

Applicant: Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

Inventor： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC: G02B27/42

CPC classification number: G03F7/702 ,  G03F7/70191 ,  G03F7/70575 ,  G21K1/10

Abstract: According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.

Abstract translation: 根据本发明的一个方面，光谱纯度滤光器包括孔径，孔被布置成衍射第一波长的辐射并且允许第二波长的辐射的至少一部分透射通过孔，第二 辐射的波长比辐射的第一波长短，其中孔径的直径大于20μm。

公开(公告)号：US20130010275A1

公开(公告)日：2013-01-10

申请号：US13634179

申请日：2011-02-03

Applicant: Viacheslav Medvedev ,  Vadim Yevgenyevich Banine ,  Vladimir Mihailovitch Krivtsun ,  Wouter Anthon Soer ,  Andrei Mikhailovich Yakunin

Inventor： Viacheslav Medvedev ,  Vadim Yevgenyevich Banine ,  Vladimir Mihailovitch Krivtsun ,  Wouter Anthon Soer ,  Andrei Mikhailovich Yakunin

IPC: G02B5/28 ,  G03B27/72

CPC classification number: G03F7/70575 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061

Abstract: A reflector includes a multi layer mirror structure configured to reflect radiation at a first wavelength, and one or more additional layers. The absorbance and refractive index at a second wavelength of the multi layer mirror structure and the one or more additional layers, and the thickness of the multi layer mirror structure and the one or more additional layers, are configured such that radiation of the second wavelength which is reflected from a surface of the reflector interferes in a destructive manner with radiation of the second wavelength which is reflected from within the reflector.

Abstract translation: 反射器包括被配置为反射第一波长的辐射和一个或多个附加层的多层反射镜结构。 在多层反射镜结构和一个或多个附加层的第二波长处的吸光度和折射率以及多层反射镜结构和一个或多个附加层的厚度被配置为使得第二波长的辐射 从反射器的表面反射以破坏性的方式干扰从反射器内反射的第二波长的辐射。

公开(公告)号：US08345223B2

公开(公告)日：2013-01-01

申请号：US12919741

申请日：2009-02-24

Applicant: Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

Inventor： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

IPC: G03B27/54 ,  G03B27/42 ,  G02B27/14

CPC classification number: G02B5/208 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/22 ,  G02B5/26 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.

Abstract translation: 光学元件包括第一层，其包括第一材料，并且被配置为对于第一波长的辐射基本上是反射的，并且对于第二波长的辐射基本上是透明的。 光学元件包括第二层，其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。 光学元件包括第三层，其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射的反射从第二层的顶表面 第二层面向第一层。 为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。