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51.发明公开METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS AND SYNTHETIC QUARTZ GLASS ARTICLE 审中-公开用于生产合成石英玻璃UNDGEGENSTAND合成石英玻璃
公开(公告)号：EP1580170A1
公开(公告)日：2005-09-28
申请号：EP03775963.6
申请日：2003-11-28
Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.
Inventor： SATO, Tatsuhiro Shin-Etsu Quartz Products Co., Ltd , KAITOU, Takahiro , FUJINOKI, Akira Shin-Etsu Quartz Products Co.,Ltd. , KATO, Toshiyuki Shin-Etsu Quartz Products Co.,Ltd. , SEGAWA, Tohru; Shin-Etsu Quartz Products Co., Ltd. , YOSHIDA,Nobumasa Shin-Etsu Quartz Products Co.Ltd.
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/24 , C03C2201/02 , C03C2201/11 , C03C2201/23 , C03C2201/24 , C03C2201/26
Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm -1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.
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公开(公告)号：JP5312313B2
公开(公告)日：2013-10-09
申请号：JP2009501148
申请日：2008-01-17
Applicant: 信越石英株式会社
CPC classification number: C03B19/1453 , C03B2201/20 , C03C3/06 , C03C2201/23 , C03C2201/26 , C03C2203/40 , C03C2203/44
Abstract: This invention provides a black synthetic quartz glass, which has a high level of emissivity in a far infrared region, has excellent light shielding properties, can maintain the same metal impurity level as a synthetic quartz glass, has high-temperature viscosity properties comparable with natural quartz glass, and, at the same time, has electroconductive properties on its surface, and a process for producing the black synthetic quartz glass. The black synthetic quartz glass has an emissivity of not less than 0.8 in a far infrared region, a light transmittance of not more than 10% at 200 to 10000 nm in a thickness of 1 mm, a total metal impurity concentration of not more than 1 ppm, and a viscosity of not less than 10 11.7 poise at 1280°C. Preferably, the content of carbon is more than 30 ppm and not more than 50000 ppm and the concentration of hydroxyl group is not more than 10 ppm.
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公开(公告)号：JP4048998B2
公开(公告)日：2008-02-20
申请号：JP2003110033
申请日：2003-04-15
Applicant: ウシオ電機株式会社
CPC classification number: C03C4/0085 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/26
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公开(公告)号：KR100653861B1
公开(公告)日：2006-12-05
申请号：KR1020057007709
申请日：2003-11-28
Applicant: 신에쯔 세끼에이 가부시키가이샤
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/24 , C03C2201/02 , C03C2201/11 , C03C2201/23 , C03C2201/24 , C03C2201/26
Abstract: 첫 번째로, 불순물이 적고 천연 석영 유리와 동등 이상의 고온 점도 특성을 가지고, 고온 환경하에서도 변형하기 어려운 합성 석영 유리의 제조 방법, 특히 발포가 없고 치밀한 고내열성 합성 석영 유리의 제조 방법을 제공한다.
두 번째로, 본 발명의 제조 방법에 의하여 용이하게 얻어지는 고내열성 합성 석영 유리체, 특히 발포가 없고 치밀하며, 적외선 흡수율 및 방출율이 높고, 또 알칼리금속 확산 방지 효과가 대단히 높은 투명 또는 흑색 유리체를 제공한다.
245nm의 흡수 계수가 0.05cm
-1 이상인 고내열성 석영 유리체를 제조하는 방법으로, 실리카 다공질체를 환원 처리한 후, 소성해서 치밀한 유리체로 하도록 했다.
고내열성 합성 석영 유리, 실리카 다공질체, 환원 처리, 치밀한 유리체, 발포, 고온 점도 특성, 석영 유리 지그, 투명 석영 유리, 흑색 석영 유리, 실라잔, 휘발성 규소화합물-
公开(公告)号：KR1020170061091A
公开(公告)日：2017-06-02
申请号：KR1020160158467
申请日：2016-11-25
Applicant: 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지
IPC: C03C3/076 , C04B35/64 , C04B35/626 , C04B35/14 , C03C4/00
CPC classification number: C03C3/06 , B05D3/007 , B05D7/50 , C03B19/066 , C03B2201/20 , C03B2201/30 , C03B2201/58 , C03C4/082 , C03C14/004 , C03C2201/26 , C03C2201/30 , C03C2203/22 , C03C2214/30
Abstract: 본발명은, 규산함량이높고제1 농도의추가성분을지닌재료의제1 층, 제1 층에연결된제2 층으로서, 규산함량이높고제1 농도와는상이한제2 농도의추가성분을지닌재료의제2 층을갖고, 제1 농도및 제2 농도가 0 이상인복합체를제조하는공지의방법을, 기계적으로및 열적으로안정된복합체가저비용으로제조될수 있고넓은면적의접합연결부가용접에의해실현될수 있는방식으로최적화하기위해서,제1 분산제와, 이에분산된, 제1 SiO입자및 제1 농도의추가성분을함유하는제1 슬러리매스를사용하여, 자유표면을갖는제1 슬러리층을제조하는단계,제2 분산제와, 이에분산된, 제2 SiO입자및 제1 농도와는상이한제2 농도의추가성분을함유하는제2 슬러리매스를제공하는단계,제1 슬러리층의자유표면에제2 슬러리매스를도포함으로써복합체중간제품을형성시키는단계, 및복합체중간제품을가열하면서복합체를형성시키는단계를 포함하는방법을제안한다.
Abstract translation: 本发明的材料具有高的二氧化硅含量，用第二浓度为耦合到所述第一层的第二层，材料的与附加组分的第一层，高二氧化硅含量比的第一浓度不同的第一浓度的附加组分 具有第二建设性层，第一浓度和第二浓度的已知的方法是小于制造复合0，机械和热稳定的复合以低成本制造它可以通过连接大面积的焊接接合部来实现 为了优化这样的方式，第一分散剂，使用含有第一SiO2颗粒和分散在其上的第一密度的另外的组分的第一浆料质量，以制备具有自由表面的第一浆料层， 提供包含第二分散剂，分散于其中的第二SiO 2颗粒和不同于第一浓度的第二浓度的第二组分的第二浆料物质;在第一浆料层的自由表面上的第二浆料物质， 要形成一个复合中间产品，并且 并加热重量重量产品形成一个复杂的。
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Patent Agency Ranking
公开(公告)号：KR1020050062784A
公开(公告)日：2005-06-27
申请号：KR1020057007709
申请日：2003-11-28
Applicant: 신에쯔 세끼에이 가부시키가이샤
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/24 , C03C2201/02 , C03C2201/11 , C03C2201/23 , C03C2201/24 , C03C2201/26
Abstract: A method for producing a synthetic quartz glass having an absorbing coefficient at 245 nm of 0.05 cm-1 or greater, which comprises subjecting a porous silica material to a reducing treatment, and then firing the resultant product, to thereby form a dense glass article; and a transparent or black synthetic quartz glass which has a reduced content of impurities, exhibits a high temperature viscosity characteristics being the same as or superior to those of a natural quartz glass, is less prone to deformation even in a high temperature atmosphere, exhibits high absorbance and high emission rate for an infrared ray, and exhibits extremely high effect for the prevention of diffusion of an alkali metal, in particular, a dense and highly heat-resistant synthetic quartz glass containing no bubbles. The method allows the production of the above synthetic quartz glass with ease.
Abstract translation: 一种制造在245nm下的吸收系数为0.05cm -1以上的合成石英玻璃的制造方法，其特征在于，将多孔二氧化硅材料进行还原处理，然后烧成所得产物，从而形成致密的玻璃制品。 和具有降低的杂质含量的透明或黑色合成石英玻璃，显示与天然石英玻璃相同或优于其的高温粘度特性即使在高温气氛中也不易变形，显示出高的 对于红外线的吸光度和高发射率，并且对于防止碱金属的扩散，特别是不含气泡的致密且高耐热的合成石英玻璃的扩散具有极高的效果。 该方法容易地生产上述合成石英玻璃。
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公开(公告)号：EP3390304A1
公开(公告)日：2018-10-24
申请号：EP16819513.9
申请日：2016-12-16
Applicant: Heraeus Quarzglas GmbH & Co. KG
Inventor： OTTER, Matthias , WITTRIN, Mirko , WILDE, Markus
CPC classification number: C03B19/108 , C03B17/04 , C03B19/106 , C03B37/0128 , C03C1/026 , C03C3/06 , C03C2201/11 , C03C2201/23 , C03C2201/26 , C03C2201/32 , C03C2201/50 , C03C2203/10 , F26B3/12
Abstract: The invention relates to a method for producing a silica glass article, involving method steps i.) providing a silica granulate, ii.) forming a glass melt from the silica granulate, and iii.) forming a silica glass article from at least some of the glass melt, step i.) comprising step I. providing a silica powder and step II. processing the powder to obtain a silica granulate, the processing involving spray drying a silica suspension using a nozzle. The nozzle has a contact surface to the suspension composed of glass, plastic or a combination thereof. The invention further relates to a silica glass article that can be obtained by said method. The invention also relates to the production of a silica granulate. The invention finally relates to an optical waveguide, an illuminant and a molded article, each of which can be obtained by further processing the silica glass article.
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公开(公告)号：EP3390303A2
公开(公告)日：2018-10-24
申请号：EP16816656.9
申请日：2016-12-16
Applicant: Heraeus Quarzglas GmbH & Co. KG
Inventor： WHIPPEY, Nigel Robert , GROMANN, Boris , SÖHN, Matthias
CPC classification number: C03B20/00 , C03B5/06 , C03B17/04 , C03B19/108 , C03B37/01211 , C03B2201/07 , C03B2201/23 , C03C3/06 , C03C2201/11 , C03C2201/23 , C03C2201/26 , C03C2201/32 , C03C2201/50 , C03C2203/40
Abstract: The invention relates to a method for producing a silica glass body, comprising the method steps: i.) providing silicon dioxide particles ii.) forming a glass melt from the silicon dioxide particles in a furnace and iii.) forming a silica glass body from at least one portion of the glass melt, wherein the furnace has a gas outlet, through which gas can be removed from the furnace and the dew point of the gas exiting the furnace through the gas outlet is less than 0°C. The invention also relates to a silica glass body that can be obtained by this method. In addition, the invention relates to a light guide, a lighting means and a shaped body, each of which can be obtained by subsequent processing of the silica glass body.
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公开(公告)号：EP3390296A2
公开(公告)日：2018-10-24
申请号：EP16809881.2
申请日：2016-12-16
Applicant: Heraeus Quarzglas GmbH & Co. KG
Inventor： OTTER, Matthias , LEHMANN, Walter , HÜNERMANN, Michael , NIELSEN, Nils Christian , WHIPPEY, Nigel Robert , GROMANN, Boris , KPEBANE, Abdoul-Gafar , SÖHN, Matthias
IPC: C03B20/00 , C03C3/06 , C03B37/012 , C03B19/10 , C03B17/04
CPC classification number: C03B20/00 , C03B17/04 , C03B19/106 , C03B19/1095 , C03B37/01211 , C03C1/022 , C03C3/06 , C03C12/00 , C03C2201/02 , C03C2201/11 , C03C2201/26 , C03C2201/32 , C03C2201/54 , C03C2203/10 , C03C2203/40 , C03C2203/44 , C03C2203/50
Abstract: The invention relates to a method for producing a silica glass article, involving method steps i.) providing a silica granulate which is made from pyrogenic silica powder and has a BET surface area ranging from 20 to 40 m2/g, ii.) forming a glass melt from the silica granulate in a furnace, and iii.) forming a silica glass article from at least some of the glass melt, the furnace including at least a first chamber and another chamber which are connected to one another by a passage, the temperature in the first chamber being lower than the temperature in the other chamber. The invention further relates to a silica glass article that can be obtained by said method. The invention also relates to an optical waveguide, an illuminant and a molded article, each of which can be obtained by further processing the silica glass article.
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60.发明公开VERFAHREN ZUR HERSTELLUNG EINES VERBUNDKÖRPERS AUS HOCHKIESELSÄUREHALTIGEM WERKSTOFF 有权由含高含量材料生产复合材料体的方法
公开(公告)号：EP3173386A1
公开(公告)日：2017-05-31
申请号：EP15196193.5
申请日：2015-11-25
Applicant: Heraeus Quarzglas GmbH & Co. KG
Inventor： SCHENK, Christian , WESSELY, Frank , SCHEICH, Gerrit
CPC classification number: C03C3/06 , B05D3/007 , B05D7/50 , C03B19/066 , C03B2201/20 , C03B2201/30 , C03B2201/58 , C03C4/082 , C03C14/004 , C03C2201/26 , C03C2201/30 , C03C2203/22 , C03C2214/30
Abstract: Um bekannte Verfahren zur Herstellung eines Verbundkörpers mit einer ersten Schicht aus hochkieselsäurehaltigem Werkstoff mit einer Zusatzkomponente in einer ersten Konzentration, verbunden mit einer zweiten Schicht aus hochkieselsäurehaltigem Werkstoff mit einer Zusatzkomponente in einer von der ersten Konzentration abweichenden zweiten Konzentration, wobei die erste und die zweite Konzentration größer oder gleich Null ist, dahingehend zu optimieren, dass ein mechanisch und thermisch stabiler Verbundkörpers kostengünstig hergestellt werden kann und großflächige Fügeverbindungen durch Verschweißen realisierbar sind, wird erfindungsgemäß ein Verfahren vorgeschlagen, das folgende Verfahrensschritte umfasst:
(a) Herstellen eines eine freie Oberfläche aufweisenden ersten Schlickerschicht unter Einsatz einer ersten Schlickermasse, die ein erstes Dispergiermittel und darin dispergiert erste SiO 2 -Teilchen und die Zusatzkomponente in einer ersten Konzentration enthält, (b) Bereitstellen einer zweiten Schlickermasse, die ein zweites Dispergiermittel und darin dispergiert zweite SiO 2 -Teilchen und die Zusatzkomponente in einer zweiten Konzentration enthält, die sich von der ersten Konzentration unterscheidet, (c) Bildung eines Verbundkörper-Vorprodukts durch Auftragen der zweiten Schlickermasse auf die freie Oberfläche der ersten Schlickerschicht, und (d) Erhitzen des Verbundkörper-Vorprodukts unter Bildung des Verbundkörpers.Abstract translation: 已知的方法用于生产具有与第一浓度的掺合物组分的高二氧化硅材料的第一层的复合体，具有很高的二氧化硅材料的，在一个方向上从所述第一浓度的第二浓度，其中所述第一和第二浓度偏离的混合物成分的第二层结合 大于或等于零，以优化机械和热稳定的复合体，能够以低成本生产并大关节可通过焊接来实现的效果，一个方法是根据本发明所提出的方法，包括以下步骤：（a）制备具有第一自由表面 使用含有第一分散剂并在其中分散第一SiO 2颗粒和第一浓度的添加剂组分的第一滑块的滑动层，（b）制备 t设定的第二淤浆质量，其中含有第二分散剂和分散于其中的第二SiO 2颗粒，并且其中从所述第一浓度不同的第二浓度的添加剂组分，（c）形成由涂布第二浆料质量的自由表面的复合体前体 第一浆料层，和（d）加热复合材料前体以形成复合材料。
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