公开(公告)号：WO2014017264A1

公开(公告)日：2014-01-30

申请号：PCT/JP2013/068200

申请日：2013-07-03

Applicant: 株式会社 日立ハイテクノロジーズ

Inventor： 神宮　孝広

IPC: H01L21/02 ,  G01N21/956

CPC classification number: G01N21/9501 ,  G01N21/01 ,  G01N21/88 ,  G01N21/94 ,  G01N2201/063 ,  H01L21/67288

Abstract: 検査装置では光に対してウェハを回転させながら直線的に移動させることで検査を行う。ウェハを回転させるとウェハの外周部での気流の流速は速くなり、この外周部の気流はウェハ周辺の雰囲気に含まれる異物がウェハに付着する原因に成り得る。このような異物がウェハに付着すると、この異物も欠陥として検出されてしまい、半導体製造工程の歩留まりや清浄度を正しく評価できなくなってしまう。よって、ウェハ周辺の雰囲気に含まれる異物の付着は極力ウェハに付着させないことが望ましい。さらに、このような異物の付着はウェハの回転速度の高速化、ウェハの大口径化等によりさらに顕著になることが予想される。従来技術では、この点に関する配慮が十分ではなかった。本発明は、基板を回転させながら、基板の上方より外周部に気流等の媒体を供給し、基板の外部で供給された媒体を排気することを特徴とする。

Abstract translation: 在检查装置中，通过使晶片在旋转时相对于光线性线性移动来进行检查。 如果晶片旋转，则晶片外周的气流的流量变得更快，并且外周的气体流动可能是附着在晶片周围的晶片周围的气氛中的异物的原因。 如果这种异物附着在晶片上，则这种异物也被检测为缺陷，并且不能正确地评估半导体制造工艺中的产率和清洁度。 因此，对于晶片周围的气氛中含有的异物的粘附，优选对晶片的粘附力尽可能小。 此外，通过晶片的旋转速度的增加，晶圆的大直径的增加等，预测这种异物的粘附性将变得更加显着。 在现有技术中，已经给出了足够的考虑。 本发明的特征在于，在旋转基板的同时从基板的上方向外周供给介质，例如气流，并且将已经供给到基板的外部的介质排出。

公开(公告)号：JP6410618B2

公开(公告)日：2018-10-24

申请号：JP2015008109

申请日：2015-01-19

Applicant: 株式会社ニューフレアテクノロジー

Inventor： 廣野 方敏 ,  小川 力 ,  藤原 剛

IPC: G01B11/30 ,  G03F1/84 ,  H01L21/027 ,  H01L21/66 ,  G01N21/956

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/063 ,  G03F1/84

公开(公告)号：JPWO2017090516A1

公开(公告)日：2018-09-13

申请号：JP2016084194

申请日：2016-11-18

Applicant: 日本電気株式会社

Inventor： 田中 聡寛

IPC: G01N21/39 ,  G01N21/3504

CPC classification number: G01N21/3504 ,  G01N21/39 ,  G01N2201/061 ,  G01N2201/063 ,  G01N2201/0833

Abstract: 簡単な構成で低コストに多地点のガス検知を行うために、ガス検知装置は、光波長変調器によってパルス光が変調されて生成された、波長が時間的に変化するパルス光を第1の光信号として伝送路に出力する送信手段と、大気中を伝搬させた第1の光信号を第2の光信号として出力するセンサヘッドから出力された第2の光信号を受光して電気信号に変換し、電気信号の振幅の時間的変化に基づいて、大気中に含まれる所定の種類のガスをセンサヘッド毎に検知し、ガスの検知の結果を出力する受信手段と、を備える。

公开(公告)号：JP6011638B2

公开(公告)日：2016-10-19

申请号：JP2014549795

申请日：2013-11-19

Applicant: コニカミノルタ株式会社

Inventor： 長嶋 義幸 ,  ▲鶴▼谷 克敏

IPC: G01N21/27

CPC classification number: G01N21/21 ,  G01N21/251 ,  G01N2201/063 ,  G01N33/32

公开(公告)号：US12025570B2

公开(公告)日：2024-07-02

申请号：US17621237

申请日：2021-11-25

Applicant: Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.

Inventor： Yali Liu ,  Yongzhen Jia

IPC: G01N21/95 ,  G01N21/88

CPC classification number: G01N21/9515 ,  G01N21/8851 ,  G01N2021/8887 ,  G01N2021/9513 ,  G01N2201/063

Abstract: The present application provides a detection method of a crease degree of a screen and a visual detection device, the detection method includes: providing detection rays and obliquely irradiating the detection rays onto a surface to be measured of a folding screen; acquiring detection rays reflected by the surface to be measured of the folding screen to obtain a corresponding light source reflection image; analyzing the light source reflection image to obtain an evaluation index of an crease degree of the folding screen; and evaluating the crease degree of the folding screen.

公开(公告)号：US11749571B2

公开(公告)日：2023-09-05

申请号：US17462916

申请日：2021-08-31

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Sheng He Huang ,  Chung-Pin Chou ,  Shiue-Ming Guo ,  Hsuan-Chia Kao ,  Yan-Cheng Chen ,  Sheng-Ching Kao ,  Jun Xiu Liu

IPC: H01L21/66 ,  G01N21/95 ,  G02B27/14

CPC classification number: H01L22/12 ,  G01N21/9501 ,  G01N2201/063 ,  G02B27/14

Abstract: In a method of inspection of a semiconductor substrate a first beam of light is split into two or more second beams of light. The two or more second beams of light are respectively transmitted onto a first set of two or more first locations on top of the semiconductor substrate. In response to the transmitted two or more second beams of light, two or more reflected beams of light from the first set of two or more first locations are received. The received two or more reflected beams of light are detected to generate two or more detected signals. The two or more detected signals are analyzed to determine whether a defect exists at the set of the two or more first locations.

公开(公告)号：US10012583B2

公开(公告)日：2018-07-03

申请号：US14648577

申请日：2013-09-11

Applicant: KONICA MINOLTA, INC.

Inventor： Yoshiyuki Nagashima ,  Katsutoshi Tsurutani

IPC: G01N21/21 ,  G01N21/25 ,  G01N33/32

CPC classification number: G01N21/21 ,  G01N21/251 ,  G01N33/32 ,  G01N2201/063

Abstract: A reflection property measuring device comprising illumination light and reflected light polarizing plates held by a holder in a mutually superposed state in a thickness direction thereof, wherein the holder has a fittingly-holding portion for setting a held posture, and each of the polarizing plates has a fitting portion fittable to the fittingly-holding portion. The fitting portions of the polarizing plates are provided at positions allowing the polarizing plates to be held by the holder in respective postures where polarizing directions thereof intersect orthogonally. A manufacturing method is disclosed for polarizing plates used in the device, wherein the illumination light and reflected light polarizing plates are manufactured in such a manner as to be punched out from the same polarizing plate material.

公开(公告)号：US09897790B2

公开(公告)日：2018-02-20

申请号：US14996717

申请日：2016-01-15

Applicant: NIKON CORPORATION

Inventor： Hiroaki Nakayama ,  Yumiko Ouchi

IPC: F21V9/16 ,  G02B21/06 ,  G01N21/64 ,  G02B21/00 ,  G02B21/36 ,  G02B27/58 ,  G02B21/16

CPC classification number: G02B21/06 ,  G01N21/64 ,  G01N21/6428 ,  G01N2021/6439 ,  G01N2201/063 ,  G01N2201/0638 ,  G02B21/0032 ,  G02B21/0076 ,  G02B21/16 ,  G02B21/367 ,  G02B27/58

Abstract: A structured illumination device includes: a diffraction unit that diffracts light beams of a plurality of wavelengths that are emitted simultaneously or sequentially by a light source into a plurality of diffracted beams; and an optical system that forms interference fringes on a surface of a sample using the plurality of diffracted beams diffracted by the diffraction unit, the optical system including a first optical system and a second optical system that focuses the plurality of diffracted beams at positions on or near a pupil plane of the first optical system, and a magnification characteristic dY(λ) of the second optical system satisfying the condition of (fo·nw−afλ/P)≦dY(λ)≦(fo·NA−afλ/P), where a=1 (for M=1, 2) or a=2 (for M=3).

公开(公告)号：US20170363547A1

公开(公告)日：2017-12-21

申请号：US15673582

申请日：2017-08-10

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko Otani ,  Takehiro Tachizaki ,  Masahiro Watanabe ,  Shunichi Matsumoto

IPC: G01N21/88 ,  G01N21/95 ,  G01N21/21 ,  G01N21/47 ,  G01N21/94 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/063

Abstract: The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

公开(公告)号：US09638635B2

公开(公告)日：2017-05-02

申请号：US14649096

申请日：2013-11-29

Applicant: HORIBA JOBIN YVON SAS

Inventor： Olivier Acher ,  Simon Richard ,  Christian Brach ,  Viviane Millet ,  Sebastien Corde ,  Daphne Heran

IPC: G01J3/447 ,  G01N21/64 ,  G01J3/02 ,  G01J3/18 ,  G02B27/28 ,  G02B5/18

CPC classification number: G01N21/645 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/18 ,  G01J3/447 ,  G01N2201/063 ,  G01N2201/0633 ,  G02B5/1866 ,  G02B27/283

Abstract: A spectrometer (100) for analyzing the spectrum of an upstream light beam (1), includes an entrance slit (101) and collimating elements (110) suitable for generating, from the upstream light beam, a collimated light beam (10), characterized in that it also includes: a polarization-dependent diffraction grating (120) suitable for diffracting, at each wavelength (11, 12) of the spectrum of the upstream light beam, the collimated light beam into a first diffracted light beam (11, 12) and a second diffracted light beam (21, 22); optical recombining elements (130) including a planar optical reflecting surface (130) perpendicular to the grating and suitable for deviating at least the second diffracted light beam; and focussing elements (140) suitable for focussing, at each wavelength, the first diffracted light beam and the second diffracted light beam onto one and the same focussing area (141).