公开(公告)号：US5802137A

公开(公告)日：1998-09-01

申请号：US596188

申请日：1996-02-15

Applicant: Stephen W. Wilkins

Inventor： Stephen W. Wilkins

IPC: G01N23/04 ,  G01N23/05 ,  G01N23/205 ,  G01N23/207 ,  G01T1/29 ,  G01T1/36 ,  G03B42/02 ,  G21K1/06 ,  G21K1/02

CPC classification number: A61B6/484 ,  G01N23/04 ,  G01N23/05 ,  G01N23/205 ,  G01N23/207 ,  G01T1/2914 ,  G01T1/36 ,  G03B42/02 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/062 ,  G21K2201/068 ,  G21K2207/005

Abstract: An x-ray or neutron optic configuration includes a plurality of single crystal portions (25) formed with respective spaced x-ray or neutron reflection faces (21,22,23) formed at predetermined asymmetry angles to a Bragg diffraction plane in the respective crystal portion. The crystal portions are interconnected (25) to maintain a first and second (21,22) of these faces spaced apart for receipt of a sample (8) between them and to allow small adjustments of the relative angle of the faces about the normal to the plane of diffraction while maintaining the normals to the Bragg planes for the first and second faces (21,22) substantially in the plane of diffraction. First face (21) is arranged to be a monochromator and collimator with respect to x-rays or neutrons of appropriate wavelength incident reflected through the sample for receipt by the second face (22), which thereby serves as an analyzer face.

Abstract translation: PCT No.PCT / AU94 / 00480 Sec。 371日期：1996年2月15日 102（e）日期1996年2月15日PCT 1994年8月16日PCT PCT。 第WO95 / 05725号公报 日期1995年2月23日X射线或中子光学配置包括多个单晶部分（25），其形成有以与布拉格衍射的预定不对称角度形成的相应的间隔开的x射线或中子反射面（21,22,23） 在相应的晶体部分中。 晶体部分互连（25）以保持这些面的第一和第二（21,22）间隔开，以便在它们之间接收样品（8），并允许小面积相对于法线相对角度 衍射平面，同时维持基本上在衍射平面中的第一和第二面（21,22）的布拉格平面的法线。 第一面（21）被配置为相对于通过样品反射的x射线或适当波长的中子的单色仪和准直器，由第二面（22）接收，从而用作分析器面。

公开(公告)号：US5684852A

公开(公告)日：1997-11-04

申请号：US736680

申请日：1996-10-25

Applicant: Toshihisa Tomie

Inventor： Toshihisa Tomie

IPC: G02B3/00 ,  G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/067

Abstract: An X-ray lens includes a plurality of hollow cylinders of prescribed radius bored in a lens material piece having a phase lag coefficient appropriate for the wavelength of the X-rays to be focused such that the axes of the hollow cylinders are parallel and perpendicularly intersect a straight array axis.

Abstract translation: X射线透镜包括多个在透镜材料片上钻孔的具有规定半径的中空圆柱体，该中空圆柱体具有适于待聚焦的X射线波长的相位滞后系数，使得中空圆柱体的轴线平行并垂直相交 直线阵列轴。

公开(公告)号：US5594773A

公开(公告)日：1997-01-14

申请号：US389503

申请日：1995-02-16

Applicant: Toshihisa Tomie

Inventor： Toshihisa Tomie

IPC: G02B3/00 ,  G21K1/06 ,  G21K1/00

CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/067

Abstract: An X-ray lens includes a plurality of hollow cylinders of prescribed radius bored in a lens material piece having a phase lag coefficient appropriate for the wavelength of the X-rays to be focused such that the axes of the hollow cylinders are parallel and perpendicularly intersect a straight array axis.

公开(公告)号：US5524040A

公开(公告)日：1996-06-04

申请号：US169656

申请日：1993-12-17

Applicant: Ercan E. Alp ,  Timothy M. Mooney ,  Thomas Toellner

Inventor： Ercan E. Alp ,  Timothy M. Mooney ,  Thomas Toellner

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/062

Abstract: A 4-bounce dispersive crystal monochromator reduces the bandpass of synchrotron radiation to a 10-50 meV range without sacrificing angular acceptance. The monochromator includes the combination of an asymmetrical channel-cut single crystal of lower order reflection and a symmetrical channel-cut single crystal of higher order reflection in a nested geometric configuration. In the disclosed embodiment, a highly asymmetrically cut (.alpha.=20) outer silicon crystal (4 2 2) with low order reflection is combined with a symmetrically cut inner silicon crystal (10 6 4) with high order reflection to condition a hard x-ray component (5-30 keV) of synchrotron radiation down to the .mu.eV-neV level. Each of the crystals is coupled to the combination of a positioning inchworm and angle encoder via a respective rotation stage for accurate relative positioning of the crystals and precise energy tuning of the monochromator.

Abstract translation: 4反弹色散式单色仪将同步加速器辐射的带通降低到10-50meV范围，而不牺牲角接收。 单色器包括嵌套几何配置中低阶反射的不对称通道切割单晶和高阶反射的对称通道切割单晶的组合。 在所公开的实施例中，具有低阶反射的高度非对称切割的（α= 20）外硅晶体（4 2 2）与具有高阶反射的对称切割的内部硅晶体（106 6）组合以调节硬x- 射线成分（5-30 keV）的同步辐射降至mu eV-neV水平。 每个晶体经由相应的旋转台耦合到定位蚯蚓和角度编码器的组合，用于晶体的精确相对定位和单色仪的精确能量调谐。

公开(公告)号：US5454021A

公开(公告)日：1995-09-26

申请号：US149351

申请日：1993-11-09

Applicant: Kunio Nakajima ,  Shuzo Sudo

Inventor： Kunio Nakajima ,  Shuzo Sudo

IPC: C22C5/04 ,  C23C14/06 ,  G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/06

Abstract: An x-ray mirror material of high reflectance with a surface roughness which is very small and a high film density, the material being a Pt alloy film provided as a mirror surface for reflecting x-ray radiation. The composition of the mirror material is expressed by the general formula: Pt.sub.1-x M.sub.x. This material is deposited on a substrate surface which has been polished to a level form, where M is at least one substance selected from Mo, Ru, Rh, Pd, Ta, W, and Au, and x satisfies the formula: 0.005.ltoreq..times..ltoreq.0.10.

Abstract translation: 具有非常小的表面粗糙度和高膜密度的高反射率的x射线镜材料，该材料是作为用于反射x射线辐射的镜面的Pt合金膜。 镜面材料的组成由通式Pt1-xMx表示。 该材料沉积在已经被抛光到水平形式的基底表面上，其中M是选自Mo，Ru，Rh，Pd，Ta，W和Au中的至少一种物质，并且x满足下式： = x

公开(公告)号：WO2016170658A1

公开(公告)日：2016-10-27

申请号：PCT/JP2015/062433

申请日：2015-04-23

Applicant: ギガフォトン株式会社

Inventor： 佐藤　功一 ,  植野　能史 ,  薮　隆之

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G21K2201/06 ,  H01S3/10 ,  H05G2/005 ,  H05G2/006

Abstract: ＥＵＶ光生成装置の動作の安定性を向上させ得る。　ドロップレット検出器は、チャンバ内に出力されレーザ光が照射されると極端紫外光が生成されるドロップレットに照明光を照射する光源部と、前記照明光を受光し光量の変化を検出する受光部と、１つの前記ドロップレットに照射された前記照明光の前記光量が低下する第１タイミングと前記照明光の前記光量が増加する第２タイミングとに基づいて、前記チャンバ内の所定位置で前記ドロップレットが検出されたことを示すドロップレット検出信号を出力するタイミング決定回路と、を備えてもよい。

Abstract translation: 本发明的目的是提高EUV辐射发生器的操作稳定性。 该液滴检测器可以包括将照射光照射到产生极紫外辐射的液滴上的光源，当在其内部输出的激光照射在其上时; 光接收单元，其接收照明光并检测光强度的变化; 以及定时确定电路，其基于照射到液滴上的照射光的光强度的第一定时和第二定时输出表示在室内的预定位置处已检测到液滴的液滴检测信号， 照明光强度增加。

公开(公告)号：WO2014070996A1

公开(公告)日：2014-05-08

申请号：PCT/US2013/067721

申请日：2013-10-31

Applicant: CARL ZEISS X-RAY MICROSCOPY, INC.

Inventor： FESER, Michael ,  LYON, Alan Francis

IPC: G21K7/00 ,  G21K1/06

CPC classification number: G21K1/00 ,  G21K1/06 ,  G21K7/00 ,  G21K2201/06 ,  G21K2201/067

Abstract: A compound x-ray lens and method of fabricating these lenses are disclosed. These compound lenses use multiple zone plate stacking to achieve a pitch frequency increase for the resulting combined zone plate. The compound equivalent zone plate includes a first zone plate (412a) having an initial pitch frequency stacked onto a second zone plate (412b) to form an equivalent compound zone plate. The equivalent zone plate has a pitch frequency that is at least twice the initial pitch frequency. Also, in one example, the equivalent zone plate has a mark-to-space ratio of 1:1.

Abstract translation: 公开了一种复合X射线透镜及其制造方法。 这些复合透镜使用多个区域板堆叠来实现所得到的组合区域板的俯仰频率增加。 化合物等效区域板包括具有堆叠在第二区域板（412b）上的初始间距频率以形成等效复合区域板的第一区域板（412a）。 等效区域板具有至少是初始俯仰频率的两倍的俯仰频率。 而且，在一个示例中，等效的带状板具有1：1的标记空间比。

公开(公告)号：WO2011149033A1

公开(公告)日：2011-12-01

申请号：PCT/JP2011/062149

申请日：2011-05-20

Applicant: CANON KABUSHIKI KAISHA ,  OUCHI, Chidane

Inventor： OUCHI, Chidane

IPC: A61B6/00 ,  G01N23/04 ,  G01N23/20 ,  G21K7/00

CPC classification number: G01N23/04 ,  A61B6/4291 ,  A61B6/484 ,  G01B11/2527 ,  G01J9/00 ,  G01J9/0215 ,  G01N2223/1016 ,  G01N2223/32 ,  G02B5/18 ,  G02B5/1814 ,  G02B5/1838 ,  G02B5/1842 ,  G02B5/1871 ,  G02B5/189 ,  G21K1/06 ,  G21K2201/06 ,  G21K2207/005

Abstract: Provided is an X-ray imaging apparatus having simple configuration and obtaining differential phase contrast images in two directions crossing each other without rotating the diffraction grating and the masking grating. The apparatus including: a diffraction grating diffracting X-rays; a masking grating masking portions rays and transmitting portions are two-dimensionally arranged to partially mask bright zones of the interference pattern; a moving device changing the relative position between the interference pattern and the masking grating; a detector detecting the intensity distribution of the X-rays transmitted through the masking grating; and a calculator calculating a differential phase contrast image or a phase contrast image of a subject, the calculator being configured to calculate the differential phase contrast image or the phase contrast image in each of two mutually crossing directions on the basis of results of detection performed a plurality of times by the detector.

Abstract translation: 本发明提供一种具有简单结构的X射线成像设备，并且在不旋转衍射光栅和掩蔽光栅的情况下彼此交叉的两个方向获得差分相位差图像。 该装置包括衍射光栅衍射X射线; 屏蔽光栅遮蔽部分光线和透射部分被二维布置以部分地掩蔽干涉图案的亮区; 移动装置改变干涉图案和掩蔽光栅之间的相对位置; 检测器，其检测透过所述掩蔽光栅的X射线的强度分布; 以及计算器，其计算对象的差分相位差图像或相位对比图像，所述计算器被配置为基于检测结果a计算两个相互交叉方向中的每一个中的差分相位对比图像或相位对比图像 多次由检测器。

公开(公告)号：WO2009064495A3

公开(公告)日：2009-07-02

申请号：PCT/US2008012847

申请日：2008-11-17

Applicant: FULLER MICHAEL KEITH

Inventor： FULLER MICHAEL KEITH

IPC: A61B6/08

CPC classification number: G01N23/223 ,  A61B6/00 ,  A61B6/4092 ,  A61B6/482 ,  A61B6/484 ,  G01N23/04 ,  G01N2223/076 ,  G21K2201/06

Abstract: A system for observing the internal features of an object, such that the object's internal absorption, refraction, reflection and/or scattering properties are visualized, is disclosed. An embodiment may include one or more beams of penetrating radiation, an object with internal features to be imaged, a single or an array of radiation optics, and a detection system for capturing the resultant shadowgraph images. The beam(s) of radiation transmitted through the object typically originate from a line-shaped source(s), which has high spatial purity along the narrow axis, and low spatial purity in the perpendicular, long axis. In the long axis, radiation optic(s) capture and focus diverging rays exiting from the object to form a high resolution image of the object, without which optic(s) the shadowgraph would have blurring in this axis. Such shadowgraph is naturally well defined in the opposite axis of narrow beam origin and can reveal an object's refraction, reflection and/or scattering properties along that axis. An embodiment may also include discriminators (stops, phase shifters, analyzer crystals, etc.) in the beam exiting the object. An embodiment may also include mechanisms for scanning whereby a two-dimensional or three-dimensional image of a large object is made possible. An embodiment may also include an image of an object's internal features being derived from an analysis of the radiation and/or radiation waveform exiting the object.

Abstract translation: 公开了一种用于观察物体的内部特征的系统，使得物体的内部吸收，折射，反射和/或散射特性被可视化。 一个实施例可以包括一个或多个穿透辐射束，具有要成像的内部特征的物体，单个或一组辐射光学器件，以及用于捕获所得到的阴影图像的检测系统。 透过物体的辐射束通常来源于沿着窄轴具有高空间纯度和垂直长轴的空间纯度低的线状源。 在长轴上，辐射光学器件捕获并聚焦从物体出射的发散光线，以形成物体的高分辨率图像，而没有这些光学元件的阴影图将在该轴上具有模糊。 这样的阴影图自然界定在窄波束起源的相反轴线上，并且可以沿着该轴显示物体的折射，反射和/或散射特性。 实施例还可以包括离开物体的光束中的鉴别器（停止点，移相器，分析器晶体等）。 一个实施例还可以包括用于扫描的机构，从而可以实现大对象的二维或三维图像。 实施例还可以包括物体的内部特征的图像，其从离开物体的辐射和/或辐射波形的分析得到。

公开(公告)号：WO2009032609A1

公开(公告)日：2009-03-12

申请号：PCT/US2008/074274

申请日：2008-08-26

Applicant: RIGAKU INNOVATIVE TECHNOLOGIES, INC. ,  KIM, Bonglea

Inventor： KIM, Bonglea

IPC: G01N23/00 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70008 ,  G21K1/02 ,  G21K2201/06

Abstract: A system (10) for x-ray optical alignment. The system includes an x-ray source (12), an optic (14), a collimation element (20), and alignment sensors (22). The x-ray source generates an x-ray beam (16) that is directed by the optic at a sample (s). The collimation element is located between the optic and the sample to define the profile of the x-ray beam. The sensors receive the x-ray beam from the optic and generated signal indicative of the system alignment. The sensors may be located on a surface (24) of the collimation element facing the optic. The inner edge of the sensors may be located at equal intervals radially about the collimation element and may form an aperture (21) having a symmetric shape.

Abstract translation: 一种用于X射线光学对准的系统（10）。 该系统包括x射线源（12），光学元件（14），准直元件（20）和对准传感器（22）。 x射线源产生由光学元件在样本处引导的X射线束（16）。 准直元件位于光学元件和样品之间以限定X射线束的轮廓。 传感器从光学器件接收X射线束并产生指示系统对准的信号。 传感器可以位于面向光学元件的准直元件的表面（24）上。 传感器的内边缘可以围绕准直元件径向相等的间隔定位并且可以形成具有对称形状的孔（21）。