Abstract:
A method of chemical vapour deposition characterised in that it comprises: (A) producing a first gas stream comprising a Group III organometallic gas and a carrier gas; (B) producing a second gas stream comprising an elemental Group V metal gas from an elemental source and a carrier gas; and (C) supplying said gas streams to a reactor where they react to form a III-V semiconductor; and, optionally (D) supplying hydrogen gas to said reactor is disclosed. A chemical vapour deposition apparatus characterised in that it comprises: (A) first means (8) for producing a first gas stream comprising a Group III organometallic gas and a carrier gas; (B) second means (6) for producing a second gas stream comprising an elemental Group V metal gas from an elemental source and a carrier gas; and (C) a reactor (4) to which said gas streams are supplied where they react to form a III-V semiconductor; and, optionally, (D) third means for supplying hydrogen gas to said reactor is also disclosed. The present invention provides advantages over the prior art. The arsine, phosphine and trimethyl triethyl, or trialkyl arsine or trialkyl phosphine adducts of triethyl or trimethyl indium sources of the prior art are replaced by one or more pnictide (Group V) bubblers; that is, heated sources of elemental pnic- tides through which a carrier gas is allowed to flow. The elemental pnictide gas and the carrier gas are supplied in a stream as are a Group III organometallic gas, a carrier gas, and hydrogen to a chemical vapour deposition reactor where they react to form III-V semiconductors surface layers on a substrate. The carrier gas may be nitrogen, or a noble gas, such as argon. Alternatively, hydrogen may be used as the carrier gas so that the reaction is carried out in an exclusive hydrogen atmosphere. At least some of this hydrogen may be monoatomic hydrogen. The substrate may be a III-C semiconductor or glass. Products include layers of gallium arsenide, indium phosphide and alloys thereof, including gallium indium arsenide and gallium aluminium arsenide. Other ternary and quaternary III-V semiconductors are produced using appropriate combinations of sources of Group III organometallic gases and Group V elemental gases produced by bubblers. The products may be used in semiconductor devices including solar cells.
Abstract:
A four-component flame retardant combination is disclosed: (a) a dialkylalkanolaminoalkylphosphonate; (b) a poly(organophosphate/phosphonate; (c) a polyhalogenated aromatic flame retardant; and (d) alumina trihydrate. It can be used in hydroxy/epoxy-containing prepolymer compositions which are adapted to be reacted with polyisocyanate to form poly(oxazolidone/urethane) materials.
Abstract:
A number of processes for the formation of insoluble metal alkoxides are disclosed. In one embodiment, there is disclosed a two step process wherein a halide of an at least divalent metal is reacted with an appropriate alcohol in the first step. In the second step, the intermediate compound formed is then reacted with more alcohol, said alcohol forming part of a solvent system in which the final metal alkoxide formed is insoluble. In another embodiment, a two step process is disclosed wherein the intermediate formed in the first step is isolated, and then in the second step the intermediate is reacted with an appropriate alcohol to yield the final product. The final embodiment of the present invention comprises a one step process for the production of insoluble metal alkoxides wherein a halide of an at least divalent metal is reacted with an appropriate alcohol in the presence of an excess amount of a hydrogen halide acceptor in a solvent in which the hydrogen halide compound formed is soluble.
Abstract:
Optically active compounds having a chlorine atom attached to the chiral carbon atom such as 2-bromoaliphatic acids can be racemized without by-product formation by heat ing an acidified solution of the organic acid at a temperature sufficient to accomplish racemization, the solution being sub stantially devoid of ionized halogen other than bromine ions. The preferred acidifying agent is hydrobromic acid. The use of hydrochloric acid causes extensive by-product formation.
Abstract:
A process for the preparation of a mono-disperse metal oxide material characterised in that it comprises hydrolysing an alkoxide in the presence of a solvent at a temperature and pH necessary to produce a sol and super- critically treating the sol with an extraction fluid and adequate agitation to produce a mono-disperse metal oxide is disclosed. The present invention provides advantages over the prior art.
Abstract:
A process for preparing carboxylic acid salts by the reaction of carbon monoxide with substituted or unsubstituted aromatic halides or an aliphatic organic halide comprises the catalyst single phase carbonylation of the halide utilizing in addition to carbon monoxide, a palladium catalyst, an excess of tertiary phosphine, optionally an amine compound, with an alkali metal or alkaline earth metal base added during the reaction to form the salt.
Abstract:
@ Herbicidally active thiolcarbamates are employed in combination with a certain thiolcarbamate, thionocarbamate, thiolcarbamate sulfone, thiolcarbamate sulfoxide, dithiocarbamate or carbamate extender compound, the latter in sufficient quantity to minimize soil degradation and to prolong the soil life of the former. As a result, the herbicidal effectiveness of the thiolcarbamate herbicide is significantly enhanced and prolonged, rendering a single application or multiple applications of the herbicide effective over a longer period of time. Such herbicidal compositions can optionally contain a non-phytotoxic antidotally effective amount of thiolcarbamate herbicide antidote.