Abstract:
PURPOSE: A method for fabricating an MIM(Metal Insulator Metal) device of a liquid crystal display is provided to form upper and lower electrodes of the same metal material to reduce stress applied to a ductile plastic substrate and prevent deformation of the plastic substrate and cracking of the lower electrode. CONSTITUTION: A lower electrode(102) is formed of a ductile metal on a transparent substrate(100). A photoresist pattern is selectively formed on the transparent substrate to expose the surface of the lower electrode, and an insulating layer(104) is formed on the lower electrode. The photoresist pattern is removed. A photoresist pattern is selectively formed on the transparent substrate having the insulating layer to expose the insulating layer and a predetermined portion of the substrate, and the same ductile metal as the lower electrode is deposited on the overall surface of the substrate. The photoresist pattern and the ductile metal layer formed on the photoresist pattern are lifted off, to form an upper electrode(106) on the insulating layer and the substrate.
Abstract:
The present invention relates to a transparent electronic device having 2D transition metal dichalcogenides with multi-layers, an optoelectronic device, and a transistor device. Preferably, the present invention relates to form a channel layer between transparent layers by forming a multilayer which consisting of at least three layers of a single transition metal dichalcogenide. For this, a transparent electronic device using transition metal dichalcogenides with multi-layers includes electrodes made of a transparent conductive material, and a channel region which is formed between the electrodes by the transition metal dichalcogenides.
Abstract:
PURPOSE: A supporting structure for a flexible substrate and a flexible substrate supporting method are provided to easily attach and detach the flexible substrate by using a supporting unit which is divided into a plurality of parts. CONSTITUTION: A support layer(120) is formed on an elastic layer(110). The support layer is formed to be separated into multiple support units(121) as the elastic layer extends and shrinks. The support layer supports a flexible substrate(10). The elastic layer is formed to be extended and shrunk in a transverse direction. The multiple support units are formed to be separated in a transverse direction as the elastic layer extends and shrinks in a transverse direction.
Abstract:
PURPOSE: A thin film transistor array panel for an X-ray detector and a method for manufacturing a thin film transistor on a substrate are provided to simplify a process and stably drive a device by applying a device of a top gate structure to a TFT backplane panel. CONSTITUTION: A thin film transistor(120) has a top gate structure and is formed in each pixel region defined on a base substrate(110). The thin film transistor includes a source electrode(122B) and a drain electrode(122A) formed on the same layer as the source electrode. A photoelectric conversion device(140) is electrically connected to the thin film transistor. The photoelectric conversion device includes a pixel electrode(142), a photoconductor layer(144), and a bias electrode(146).
Abstract:
PURPOSE: A method of manufacturing oxide semiconductor thin film transistor and semiconductor equipment are provided to reduce a contact resistance between source and drain semiconductor channel layers by using air pressure plasma processing. CONSTITUTION: A gate insulating film(114) where a channel layer(116) composed of an oxide semiconductor is formed is made on a substrate to cover a gate electrode. The surface of a generated channel layer is processed with use of air pressure plasma. A source and drain electrodes are respectively formed on both sides of the surface processed channel layer. A protective film(120) covering the generated source and drain electrodes and channel layer is formed.
Abstract:
다양한 분야에 사용가능한 MgO 쉘 구조체를 제조할 수 있는 MgO 쉘 구조체 제조 방법이 제안된다. 제안된 MgO 쉘 구조체 제조 방법에서는 고분자 입자 및 나노미터 수준의 MgO 입자를 혼성화하고, 혼성화된 입자에 Mg(OH) 2 를 형성하기 위하여 수화시킨 후, 수화된 입자를 소성하여 MgO 쉘 구조체를 제조한다. MgO 입자, 고분자, 쉘
Abstract:
PURPOSE: An organic thin film transistor and a manufacturing method thereof are provided to form an organic semiconductor channel with high crystallization and high charge mobility by forming an organic semiconductor layer, with a requested shape and size, on a channel region. CONSTITUTION: A gate electrode is formed on a substrate. A gate insulating layer(130) is formed on the gate electrode. A source electrode, a drain electrode, and a data electrode are formed on the gate insulation layer. A self-assembly monolayer(160) is formed on the upper side of the source electrode and the drain electrode. The channel region is removed to expose a part of the source electrode and the drain electrode. An organic semiconductor layer(170) is formed on the channel region.
Abstract:
본 발명은 광 감지 센서 및 그의 제조 방법에 관한 것으로, 광을 감지할 수 있는 비정질 실리콘 박막 트랜지스터와; 상기 비정질 실리콘 박막 트랜지스터에서 발생된 전하를 저장할 수 있는 스토리지 캐패시터와; 상기 스토리지 캐패시터에 저장된 전하를 이동시키도록, 스위칭하는 다결정 실리콘 박막 트랜지스터로 구성된 광 감지 센서로 구성된다. 따라서, 본 발명은 높은 전하 이송 특성을 갖는 다결정 실리콘을 이용하여 스위치용 트랜지스터를 구성함으로써, 스위치용 트랜지스터의 크기를 줄일 수 있고 센서용 트랜지스터의 크기를 증가시킬 수 있어 센싱 특성을 향상시킬 수 있는 효과가 있다. 지문, 센서, 박막, 트랜지스터, 다결정, 비정질
Abstract:
본 발명은 다결정 실리콘 박막 트랜지스터의 제조 방법에 관한 것으로, 덮개층을 사용하여 방향성 거대 결정립을 형성함으로써, 전하 이동도를 증가시킬 수 있어, 소자의 동작 속도를 증가시킬 수 있는 효과가 있다. 결정립, 거대, 방향, 덮개, 에너지, 차단, 무반사