公开(公告)号：EP3333632A1

公开(公告)日：2018-06-13

申请号：EP16202927.6

申请日：2016-12-08

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh ,  KOOLEN, Armand, Eugene, Albert

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70625 ,  G03F7/7085 ,  H01L21/681 ,  H01L21/682

Abstract: Metrology apparatus and methods for measuring a structure formed on a substrate by a lithographic process are disclosed. In one arrangement an optical system illuminates the structure with radiation and detects radiation scattered by the structure. The optical system comprises a first dispersive element (121). The first dispersive element spectrally disperses scattered radiation exclusively from a first portion (41) of a pupil plane field distribution along a first dispersion direction (56). A second dispersive element 122, separated from the first dispersive element, spectrally disperses scattered radiation exclusively from a second portion 42 of the pupil plane field distribution, different from the first portion of the pupil plane field distribution, along a second dispersion direction 57.

公开(公告)号：EP4018264A1

公开(公告)日：2022-06-29

申请号：EP20749909.6

申请日：2020-08-05

Applicant: ASML Netherlands B.V. ,  IMEC VZW

Inventor： HASPESLAGH, Luc, Roger, Simonne ,  ROCHUS, Veronique ,  BRONDANI TORRI, Guilherme ,  PANDEY, Nitesh ,  GOORDEN, Sebastianus, Adrianus

IPC: G03F7/20 ,  G02B26/08 ,  G02B7/18 ,  H02N2/00

公开(公告)号：EP3786713A1

公开(公告)日：2021-03-03

申请号：EP19194973.4

申请日：2019-09-02

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh ,  KONIJNENBERG, Alexander Prasetya

IPC: G03F7/20

Abstract: Disclosed is a method of measuring a structure, and associated metrology device and computer program. The method comprises obtaining an amplitude profile of scattered radiation relating to a measurement of a first structure on a first substrate and obtaining a reference phase profile relating to a reference measurement of at least one reference structure on a reference substrate. The at least one reference structure is not the same structure as said first structure but is nominally identical in terms of at least a plurality of key parameters. The method further comprises determining a complex-valued field to describe the first structure from the amplitude profile and reference phase profile.

公开(公告)号：EP3623868A1

公开(公告)日：2020-03-18

申请号：EP18193998.4

申请日：2018-09-12

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/956

Abstract: Disclosed is a method and associated inspection apparatus for measuring a characteristic of interest relating to a structure on a substrate. The inspection apparatus uses measurement radiation comprising a plurality of wavelengths. The method comprises performing a plurality of measurement acquisitions of said structure, each measurement acquisition being performed using measurement radiation comprising a different subset of the plurality of wavelengths, to obtain a plurality of multiplexed measurement signals. The plurality of multiplexed measurement signals are subsequently de-multiplexed into signal components according to each of said plurality of wavelengths, to obtain a plurality of de-multiplexed measurement signals which are separated according to wavelength.

公开(公告)号：EP3410212A1

公开(公告)日：2018-12-05

申请号：EP17174269.5

申请日：2017-06-02

Applicant: ASML Netherlands B.V.

Inventor： RAVENSBERGEN, Janneke ,  PANDEY, Nitesh ,  ZHOU, Zili ,  KOOLEN, Armand Eugene Albert ,  GOORDEN, Sebastianus Adrianus ,  FAGGINGER AUER, Bastiaan Onne ,  MATHIJSSEN, Simon Gijsbert Josephus

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/95 ,  G01B11/02

CPC classification number: G03F7/70633 ,  G01B11/02 ,  G01N21/9501 ,  G03F7/70625

Abstract: A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.

公开(公告)号：EP3333631A1

公开(公告)日：2018-06-13

申请号：EP16202508.4

申请日：2016-12-06

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh ,  ZHOU, Zili

IPC: G03F7/20

CPC classification number: G03F7/70591 ,  G03F7/70633

Abstract: Methods of measuring a target formed by a lithographic process, a metrology apparatus and a polarizer assembly are disclosed. The target comprises a layered structure having a first periodic structure in a first layer and a second periodic structure in a second layer. The target is illuminated with polarized measurement radiation. Zeroth order scattered radiation from the target is detected. An asymmetry in the first periodic structure is derived using the detected zeroth order scattered radiation from the target. A separation between the first layer and the second layer is such that the detected zeroth order scattered radiation is independent of overlay error between the first periodic structure and the second periodic structure. The derived asymmetry in the first periodic structure is used to derive the correct overlay value between the first periodic structure and the second periodic structure.

公开(公告)号：EP4260121A1

公开(公告)日：2023-10-18

申请号：EP21811329.8

申请日：2021-11-15

Applicant: ASML Netherlands B.V.

Inventor： AKBULUT, Duygu ,  HASPESLAGH, Luc, Roger, Simonne ,  PANDEY, Nitesh ,  VAN DER WOORD, Ties, Wouter ,  BRONDANI TORRI, Guilherme ,  GOORDEN, Sebastianus, Adrianus ,  KLEIN, Alexander, Ludwig ,  OVERKAMP, Jim, Vincent ,  YEGEN, Halil, Gökay YEGEN ,  OSORIO OLIVEROS, Edgar, Alberto

IPC: G02B26/08 ,  G02B5/08 ,  G02B5/09 ,  G02B26/12 ,  G03F7/20

公开(公告)号：EP3783439A1

公开(公告)日：2021-02-24

申请号：EP19192986.8

申请日：2019-08-22

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh

IPC: G03F7/20 ,  G01M11/02

Abstract: Disclosed is a detection apparatus for a metrology device operable to measure a parameter of interest from scattered radiation having been scattered from a sample. The detection device comprises a detector (D) comprising an array of pixels (DDP). The array of pixels comprises imaging pixels for detecting an image from which the parameter of interest is determined, and direction detecting pixels for detecting the angle of incidence of said scattered radiation on said detector.

公开(公告)号：EP3783436A1

公开(公告)日：2021-02-24

申请号：EP19192284.8

申请日：2019-08-19

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh ,  MATHIJSSEN, Simon Gijsbert Josephus ,  BHATTACHARYYA, Kaustuve ,  DEN BOEF, Arie Jeffrey

IPC: G03F7/20 ,  G01J3/36 ,  G01N21/95 ,  G01N21/956 ,  G02B5/20 ,  G02B27/10 ,  G02B27/12

Abstract: Disclosed is an illumination and detection apparatus for a metrology tool, and associated method. The apparatus comprises an illumination arrangement operable to produce measurement illumination comprising a plurality of discrete wavelength bands and comprising a spectrum having no more than a single peak within each wavelength band. The detection arrangement comprises a detection beamsplitter to split scattered radiation into a plurality of channels, each channel corresponding to a different one of said wavelength bands; and at least one detector for separate detection of each channel.

公开(公告)号：EP3528047A1

公开(公告)日：2019-08-21

申请号：EP18156625.8

申请日：2018-02-14

Applicant: ASML Netherlands B.V.

Inventor： PANDEY, Nitesh ,  ZHOU, Zili ,  VAN DER ZOUW, Gerbrand ,  DEN BOEF, Arie, Jeffrey ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  KOOLEN, Armand, Eugene, Albert ,  CRAMER, Hugo, Augustinus Joseph ,  HINNEN, Paul, Christiaan ,  VAN WEERT, Martinus, Hubertus, Maria ,  TSIATMAS, Anagnostis ,  WANG, Shu-jin ,  FAGGINGER AUER, Bastiaan, Onne ,  VERMA, Alok

IPC: G03F7/20

Abstract: A inspection apparatus, method, and system associated therewith are described herein. In a non-limiting embodiment, a inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, and the illumination beam being polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization; generate image data representing an image of each of the feature(s) based on the intensity data; and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.