66.
    发明专利
    未知

    公开(公告)号:NO975601L

    公开(公告)日:1998-06-05

    申请号:NO975601

    申请日:1997-12-03

    Applicant: BASF AG

    Abstract: Modification of the cross-flow resistance of a diaphragm based on fibrous material comprises treating the diaphragm, during or after manufacture, with a dispersion of a component (I) containing fluorine and optionally a solution containing a zirconium dioxide (ZrO2) precursor. Preferably treatment is carried out during electrolysis. The amount of (I) used is 0.1-30 wt.% w.r.t. the fibrous material of the diaphragm and the amount applied is 30-500 g/m diaphragm surface area.

    68.
    发明专利
    未知

    公开(公告)号:DE19547759A1

    公开(公告)日:1997-06-26

    申请号:DE19547759

    申请日:1995-12-20

    Applicant: BASF AG

    Abstract: The present invention relates to stabilised hydroxylamine solutions containing as stabilizer at least one compound of general formula (I) R R N -A-NR R or salts thereof. In said formula (I): A stands for alkylene, alkenylene, alkinylene, cycloalkylene, cycloalkenylene, arylene, o-, m- or p-xylylene, or a five- or six-member saturated or unsaturated heterocycle with a nitrogen atom, the groups in question can have 1, 2 or 3 substituents selected independently of one another from among alkyl, alkoxy or hydroxyl, or stands for the group -X-[-NR-B-]-n- wherein B and X stand for -CH2CH2- or -CH2CH2CH2-, n stands for a number between 10 and 50,000, R stands for H, alkyl, an ethylene or propylene group substituted with OH, NH2, NHCOR or COOH, CSSH, CH2CN or CH2PO3H2 or represents a bridge with a nitrogen atom of another polyethyleneimine or polypropyleneimine chain, said bridge being formed by -[-NR-B-]-o- or CH2 CHOH CH2-[-O CH2 CH2-]-p-CH2 CHOH CH2-, o and p independently of one another standing for 1-15, R stands for H, C1-C18 alkyl or CHR COR , R standing for a C12-C18 alkyl group, R , R , R , R independently of one another stand for H, CH2COOH, CH2PO3H2, alkyl, acyl, CH2CH2OH, CH2CH2NH2 or (a) in which R stands for OH, SH, NH2, CN, COOH, alkyl or alkoxy. Excepted from the disclosure are ethylenediamino-tetraacetic acid and N-hydroxyethylenediamino-triacetic acid and the salts thereof.

Patent Agency Ranking