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公开(公告)号:JP2533302B2
公开(公告)日:1996-09-11
申请号:JP20798186
申请日:1986-09-05
Applicant: CANON KK
Inventor: SEKIMURA NOBUYUKI , TAKAO HIDEAKI , KAMIO MASARU , MURATA TATSUO , TAMURA MIKI
IPC: G02B5/20 , G02F1/133 , G02F1/1333 , G02F1/1335 , G02F1/137 , G02F1/141
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公开(公告)号:JPH05100112A
公开(公告)日:1993-04-23
申请号:JP8923392
申请日:1992-03-16
Applicant: CANON KK
Inventor: TAKAO HIDEAKI , KAMIO MASARU , MURATA TATSUO , SEKIMURA NOBUYUKI
IPC: G02B5/20 , G02F1/1335
Abstract: PURPOSE:To provide the color filter substrate which is free from a difference in the film thickness of color filter layers and the liquid crystal element which prevents the generation of orientation detects. CONSTITUTION:This color filter substrate is constituted by having the color filters which consist of colored resins formed by dispersing coloring materials into a low-temp. curing type polyimide resins having photosensitive groups within the molecules and have nearly the same film thickness on a substrate 2 and successively laminating a protective layer 9 and transparent electrode 5 of a pattern shape on the color filters. This liquid crystal element is constituted by using this substrate. Light shielding layers 10 are provided at nearly the same thickness as the thickness of respective picture elements in the recesses between the picture elements of the color filters.
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公开(公告)号:JPH0257287B2
公开(公告)日:1990-12-04
申请号:JP27694084
申请日:1984-12-26
Applicant: CANON KK
Inventor: KAMIO MASARU , MOTOI YASUKO , TAKAO HIDEAKI
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公开(公告)号:JPH0257286B2
公开(公告)日:1990-12-04
申请号:JP15866184
申请日:1984-07-31
Applicant: CANON KK
Inventor: FUKAYA MASAKI , KOMATSU TOSHUKI , SHOJI TATSUMI , KAMIO MASARU , SEKIMURA NOBUYUKI
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公开(公告)号:JPH0224848A
公开(公告)日:1990-01-26
申请号:JP17381588
申请日:1988-07-14
Applicant: CANON KK
Inventor: KAMIO MASARU
IPC: B29C43/18 , B29K101/10 , B29L17/00 , G11B7/26
Abstract: PURPOSE:To eliminate the intrusion of bubbles into a photosetting resin and defects of patterns and to prevent waving and warping of a substrate by dropping the liquid drops of the above-mentioned resin to both of a stamper mold and the substrate and curing the resin under pressurization after point contact. CONSTITUTION:The liquid drops of the photosetting resin 8 are dropped onto the surface of the transparent resin substrate 1 and the stamper mold 7 having rugged patterns. The mold 7 and the substrate 1 are superposed in such a manner that both the liquid drops of the resin 8 come into contact with the same, then the mold and the substrate are superposed on each other and are pressurized to spread the liquid drops to cause tight adhesion. The surface is then irradiated with UV rays 9 to cure the resin 8. The optical card substrate 10 with track grooves transferred with the rugged patterns of the stamper mold is obtd. when the mold 7 is removed after the resin 8 cures.
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公开(公告)号:JPS63191104A
公开(公告)日:1988-08-08
申请号:JP2246187
申请日:1987-02-04
Applicant: CANON KK
Inventor: TAKAO HIDEAKI , TAMURA MIKI , KAMIO MASARU , MURATA TATSUO , SEKIMURA NOBUYUKI
IPC: G02B5/20 , G02F1/133 , G02F1/1335 , H01L27/14 , H04N9/07
Abstract: PURPOSE:To permit efficient pattern formation with smaller exposing energy and to prevent deterioration of the coloring material itself at the time of exposing by dispersing the coloring material gradually more from the surface part to the bottom part of a colored resin layer. CONSTITUTION:The coloring material 9 is distributed and disposed in the colored resin layer 8 gradually more from the surface part to the bottom part thereof. The light absorption by the coloring material in the upper part of the colored resin layer 2 at the time of exposing is, therefore, smaller than with the color filter formed by distributing the coloring material 9 randomly in a photosensitive resin. The larger quantity of the light is thereby made to arrive at the bottom of the colored resin layer 8 and the uniform photosetting over the entire part of the colored resin 8 with the smaller exposure is permitted; in addition, the photodeterioration of the coloring material 9 itself at the time of exposing is reduced.
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公开(公告)号:JPS63182626A
公开(公告)日:1988-07-27
申请号:JP1492387
申请日:1987-01-23
Applicant: CANON KK
Inventor: TAKAO HIDEAKI , TAMURA MIKI , KAMIO MASARU , MURATA TATSUO , SEKIMURA NOBUYUKI
IPC: G02F1/1335 , G02F1/1337 , G02F1/137 , G02F1/141
Abstract: PURPOSE:To prevent generation of orientation defects and to provide the titled element which can sufficiently exhibit high responsiveness and memory effect characteristic by specifying the value of the ratio between the film thickness of color filters of respective picture elements and spacings between the respective picture elements adjacent to each other. CONSTITUTION:This ferroelectric liquid crystal element 1 is formed with the color filters of the respective picture elements to nearly the same film thickness. The film thickness of the color filters of the respective picture elements, designated as d(mum), and the spacings between the respective picture elements adjacent to each other, designated as d(mum), are specified to 0
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公开(公告)号:JPS63155104A
公开(公告)日:1988-06-28
申请号:JP30169686
申请日:1986-12-19
Applicant: CANON KK
Inventor: TAKAO HIDEAKI , TAMURA MIKI , KAMIO MASARU , MURATA TATSUO , SEKIMURA NOBUYUKI
IPC: G02B5/20 , G02F1/1335 , H01L27/14 , H04N9/07
Abstract: PURPOSE:To obtain a color filter having high adhesion in stable processes by arranging plural coloring materials in a colored resin layer from the upper part toward the lower part in the order of increasing light absorbing characteristics in the exposure wavelength range so as to uniformly photoset the whole colored resin layer. CONSTITUTION:Plural coloring materials are arranged in a colored resin layer from the upper part toward the lower part in the order of increasing light absorbing characteristics in the exposure wavelength range. Arom. polyamide resin or polyimide resin having photosensitive groups in the molecule is used as a photosensitive resin forming the colored resin layer. The quantity of light absorbed by the coloring material in the upper part of the colored resin layer during exposure is made smaller than the quantity of light absorbed by conventional coloring materials arranged at random in a photosensitive resin layer, so a larger quantity of light reaches the lower part of the colored resin layer and the whole colored resin layer can be uniformly photoset with a reduced quantity of light for exposure.
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公开(公告)号:JPS63129322A
公开(公告)日:1988-06-01
申请号:JP27535386
申请日:1986-11-20
Applicant: CANON KK
Inventor: KAMIO MASARU , TAKAO HIDEAKI , MURATA TATSUO , TAMURA MIKI , SEKIMURA NOBUYUKI
IPC: G02B5/20 , G02F1/1335 , G02F1/1337
Abstract: PURPOSE:To prevent generation of orientation defects by forming a flat color filter having no spacings between picture elements on a substrate. CONSTITUTION:A colored resin film 66' of a 3rd color is coated and formed on a substrate 61, on which the 1st and 2nd colored resin layers 62, 63 of two colors having low transmissivity to sensing wavelength light are formed, by using a photosensitive polyamino resin liquid compound with a prescribed ratio of a coloring material having a transmission characteristic to the sensing wavelength light of the photosensitive polyamide resin. The colored resins are then exposed by the sensing wavelength light 65 having the sensitivity of the photosensitive colored resin from the substrate 61 side to photoset the pattern part. The colored resin film 66' formed with the photoset part is developed to form the colored resin layer 66 of the 3rd color to a pattern shape, by which the color filter having no spacings between the colored resin layers is formed. The generation of the orientation defects is thereby prevented.
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公开(公告)号:JPS63129320A
公开(公告)日:1988-06-01
申请号:JP27535186
申请日:1986-11-20
Applicant: CANON KK
Inventor: KAMIO MASARU , MURATA TATSUO , TAKAO HIDEAKI , TAMURA MIKI , SEKIMURA NOBUYUKI
IPC: G02B5/20 , G02F1/1335 , G02F1/1337
Abstract: PURPOSE:To prevent a defect in orientation from being caused by forming a flat color filter of a thin film on a substrate without any gap between picture elements. CONSTITUTION:Resist films 63 and 67 of positive type photoresist are formed on the substrate 61 where the 1st and the 2nd pigment films 62 and 66 are formed and exposed to photosensitive wavelength light through the substrate 61, and development is carried out to form resist patterns 63' and 67' provided with the resist films on the 1st and the 2nd pigment films 62 and 66. Then the 3rd pigment layer 38 with transmission characteristics to the photosensitive wavelength light of the positive type resist is formed and developed, and the resist patterns 63' and 67' are removed to form the 3rd pigment film 68 which is patterned, thereby forming the pigment films 62, 66, and 68 of respective picture elements of a color filter flatly without any gap. Thus, a defect in orientation is prevented from being caused.
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