公开(公告)号：JPH0948838A

公开(公告)日：1997-02-18

申请号：JP8132896

申请日：1996-04-03

Applicant: MITSUI TOATSU CHEMICALS

Inventor： MOTOJIMA TOSHIHIRO ,  KARASAWA AKIO ,  TAKUMA HIROSUKE ,  YAMAGUCHI TERUHIRO

IPC: C08F299/02 ,  C08F290/00 ,  C08G59/04 ,  C08G59/14 ,  C08G59/17 ,  G03F7/027

Abstract: PROBLEM TO BE SOLVED: To obtain the subject resin which has a specific chemical structure and is very useful as a component for solder resists because of high hardness, moisture resistance, thermal resistance, and chemical resistance of the films after being cured as well as of high developability. SOLUTION: The objective compound having structure of the formula (R1 is H, an alkyl, nitro, etc.; R2 is H or methyl; (m) is 1-3; (n) is 0-10) is obtained, preferably, by making an epoxy resin produced by reaction of 6,6- dihydroxy-3,3,3',3'-tetramethyl-1,1'-spirobiindane with an epihalohydrin in the presence of a dehydrohalogenation catalyst react with acrylic acid and/or methacrylic acid. The reaction of the epoxy resin with the acrylic acid and/or methacrylic acid is preferably carried out in the presence of such a catalyst as triethylamine and such a polymerization inhibitor as hydroquinone in a diluent at 80-130 deg.C for 3-50hr.

公开(公告)号：JP2574059B2

公开(公告)日：1997-01-22

申请号：JP23576890

申请日：1990-09-07

Applicant: MITSUI TOATSU CHEMICALS

Inventor： ITO NAOTO ,  YAMADA YASUYUKI ,  KARASAWA AKIO ,  ENOMOTO TSUYOSHI

IPC: G03G5/06 ,  C09B35/033

公开(公告)号：JP2545650B2

公开(公告)日：1996-10-23

申请号：JP15043091

申请日：1991-06-21

Applicant: MITSUI TOATSU CHEMICALS

Inventor： KARASAWA AKIO ,  ITO NAOTO

IPC: C09B1/58 ,  G02B5/20 ,  G03F7/004 ,  H01L21/027 ,  H01L21/30 ,  H01L27/14

公开(公告)号：JPH08176051A

公开(公告)日：1996-07-09

申请号：JP32544494

申请日：1994-12-27

Applicant: MITSUI TOATSU CHEMICALS

Inventor： MOTOJIMA TOSHIHIRO ,  KARASAWA AKIO ,  TAKUMA HIROSUKE

IPC: G03F7/004 ,  C07C43/21 ,  C07C69/24 ,  C07C69/712 ,  C07C69/96 ,  C07D309/12 ,  C07F7/18 ,  G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To obtain new compound useful as a dissolution inhibitor of a photoresist, providing a positive type resist material for high energy rays, having excellent sensitivity and resolving power. CONSTITUTION: This compound is shown by formula I (R is a protective group readily eliminable under acidic conditions; R is H or an alkyl; (m) is 1 or 2; (n) is 1-3) such as 6,6'-bis(tert-butoxycarbonyloxy)-2,2',3,3'-tetrahydro-3,3,3',3'- tetramethyl-1,1'-spiro[1H-indane]. The compound is obtained by reacting a spirobiindanol derivative of formula II with a compound such as di-tert-butyl dicarbonate or dihydro-2H-pyrane to introduce an R1 -protecting group. Preferably 2-5mol of a compound to introduce the R1 -protecting group is used based on 1mol of the compound of formula II.

公开(公告)号：JPH08165335A

公开(公告)日：1996-06-25

申请号：JP20445695

申请日：1995-08-10

Applicant: MITSUI TOATSU CHEMICALS

Inventor： KARASAWA AKIO ,  YAMAGUCHI TERUHIRO ,  YAMAGUCHI KEISABURO ,  ISHIHARA HIROKO

IPC: G03F7/022 ,  B41M5/155 ,  C08G61/00 ,  G03F7/023 ,  G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To obtain an arom. hydroxycarboxylic acid resin which gives a high- sensitivity high-resolving-degree photoresist compsn. and is useful as a metal chelate resin excellent in flexibility and resistances to oxidation and water. CONSTITUTION: This resin is represented by the formula (wherein each A is independently an optionally substd. phenyl or naphthyl; R1 is Hor 1-4C alkyl; R2 is H, 1-10C alkyl, 1-10C alkoxy, nitro, or hydroxyl; l is an integer of 0-100; m is an integer of 0-20, provided when A is phenyl, m is not O; and n is an integer of 0-3).

公开(公告)号：JPH0848755A

公开(公告)日：1996-02-20

申请号：JP18365594

申请日：1994-08-04

Applicant: MITSUI TOATSU CHEMICALS

Inventor： YAMAGUCHI KEISABURO ,  KARASAWA AKIO ,  URAGAMI TATSUNOBU ,  YAMAGUCHI TERUHIRO

IPC: C08G61/02 ,  C08G61/00

Abstract: PURPOSE:To obtain a phenol-aralkyl resin excellent in heat resistance industrially at a low cost by reacting a mixed chloroxylene compsn. prepd. by a specific process with a phenol compd. at a specified ratio. CONSTITUTION:A phenol-aralkyl resin is produced by reacting a mixed chloroxylene compsn. with a phenol compd. in an equivalent ratio of the phenol compd. to the chloromethyl groups of the compsn. of 0.55-5. The compsn. is obtd. by subjecting xylene to free-radical chlorination and isolating the product by distillation and comprises 70-98wt.% alpha,alpha'-dichloroxylene and 2-30wt.% alpha,alpha- dichloroxylene and/or alpha,alpha,alpha'-trichloroxylene. Thus, the formerly discarded by- products, i.e., alpha,alpha-dichloroxylene and alpha,alpha,alpha'-trichloroxylene, are utilized and a phenol-aralkyl resin excellent in heat resistance is obtd. industrially at a low cost without causing any problem with resin quality.

公开(公告)号：JPH06220339A

公开(公告)日：1994-08-09

申请号：JP811793

申请日：1993-01-21

Applicant: MITSUI TOATSU CHEMICALS

Inventor： KARASAWA AKIO ,  ITO NAOTO

IPC: C09B25/00 ,  G02B5/20

Abstract: PURPOSE:To obtain a yellow dye comprising a specific quinophthalone compound and its tautomer, excellent in transmittance characteristics, heat resistance, light resistance and moisture resistance and useful for liquid crystal televisions, etc. CONSTITUTION:This yellow dye comprises a quinophthalone compound of formula I {R -R are (substituted)1-20C alkyl, (substituted)cycloalkyl, halogen, H; R , R are H, group of formula II [R , R are (substituted)1-20C alkyl, (sabstituted)cycloalkyl, halogen, H; R , R are (substituted)1-20C alkyl, (substituted)aryl, H; (n) is 1-3]} and its tautomer.

公开(公告)号：JPH04312558A

公开(公告)日：1992-11-04

申请号：JP7882191

申请日：1991-04-11

Applicant: MITSUI TOATSU CHEMICALS

Inventor： OGUCHI TAKAHISA ,  KARASAWA AKIO ,  ITO NAOTO

IPC: C07C217/92 ,  G03G5/06

Abstract: PURPOSE:To provide a new triarylamine compound easily producible at a low cost and useful as an organic photo-conductor for an electrophotographic photoreceptor, having high sensitivity and durability and giving low fluctuation of potential between light region and dark region in the formation of a continu ous image by the repeated charging and exposure. CONSTITUTION:The triarylamine compound of formula I (R1 is H or methyl), e.g. the compound of formula II. The compound can be produced by reacting an aryl halide (e.g. p-iodotoluene) with a compound of formula III in the presence of a base (e.g anhydrous potassium carbonate) of an amount nearly equal to the amount of the compound of formula III using copper powder as a catalyst in a solvent having a high boiling point (e.g. o-dichlorobenzene) under a flow of an inert gas (e.g. nitrogen) under stirring at 100-300 deg.C for 5-50hr. An electrophotographic photoreceptor containing the above compound in the photosensitive layer on an electrically conductive substrate can be widely utilized in the application fields of electrophotography such as laser printer, CRT printer and electronic photoengraving system in addition to electrophotographic copying machine.

公开(公告)号：JPH04233547A

公开(公告)日：1992-08-21

申请号：JP41536290

申请日：1990-12-28

Applicant: MITSUI TOATSU CHEMICALS

Inventor： ITO NAOTO ,  KARASAWA AKIO ,  OGUCHI TAKAHISA

IPC: C09B56/00 ,  C07C211/43 ,  G03G5/06

Abstract: PURPOSE:To obtain an electrophotographic sensitive material having high sensitivity and excellent resistance to plate wear and ozone resistance by incorporating a specified compsn. as a charge transfer material. CONSTITUTION:A charge transfer material expressed by formula I is incorporated into the photosensitive layer. In formula I, R , R are independently methyl group, ethyl group, etc., R , R are hydrogen atom, methyl group, and Y is hydrogen atom. Namely, this comspn. is a triphenylbenzene deriv. having diarylamine at 4'-position, to which R is introduced as a substd. group at the 0-position of aryl group in order to improve the sensitivity and R is introduced as a substd. group for the P-position in order to improve the durability. Thereby, the obtd. electrophotographic sensitive material has high sensitivity, excellent resistance to plate wear and ozone resistance, and small variation of potential in bright area and dark area.

公开(公告)号：JPH04229869A

公开(公告)日：1992-08-19

申请号：JP41469690

申请日：1990-12-27

Applicant: MITSUI TOATSU CHEMICALS

Inventor： KARASAWA AKIO ,  ITO NAOTO ,  OGUCHI TAKAHISA

IPC: G03G5/06 ,  C09B35/06 ,  C09B35/378 ,  C09B35/50

Abstract: PURPOSE:To provide such a sensitizer that is sufficient in sensitivity and excellent in durability by containing a specific azo compound in a photosensitive layer on a conductive supporter as charge generating matter. CONSTITUTION:A photosensitive layer 4 consisting of charge generating matter 2 and charge conveying matter 3 is installed on a conductive supporter 1. In brief, an azo compound being expressed in a formula (I) is contained in this photosensitive layer 4 on the supporter 1 as the charge generating matter 2. In the formula (I), Ar shows an aromatic hydrocarbon ring or aromatic heterocyclic ring of substitution or nonsubstitution coupleable via a coupling radical, R shows an alkyl group, the aromatic hydrocarbon ring or the aromatic heterocyclic ring of substitution or nonsubstitution, and n shows 2-4 integers. In this connection, as for the aromatic hydrocarbon ring, benzene, naphthalene, anthracene, etc., are enumerated. When there is a substituent, a methyl group, ethylene group, a propyl group, etc., are enumerated as well.