公开(公告)号：JP2006328547A

公开(公告)日：2006-12-07

申请号：JP2006222235

申请日：2006-08-17

Applicant: Seiko Epson Corp ,  セイコーエプソン株式会社

Inventor： IDE TSUGIO ,  NEHASHI SATOSHI ,  ISHIDA MASAYA ,  SHIMODA TATSUYA ,  KATSUYAMA TAKANOBU

IPC: C25D19/00 ,  C25D17/06

Abstract: PROBLEM TO BE SOLVED: To provide a microfabrication device where the utilizing efficiency of materials is high and the size of which can be reduced.
SOLUTION: The processor is provided with: a stylet; a first carrying mechanism capable of carrying the stylet; a fluidized body coating mechanism capable of coating the face to be worked with a fluidized body; a second carrying mechanism capable of carrying the fluidized body coating mechanism; an energy feeding apparatus capable of applying fixed voltage to the space between the stylet and the fluidized body; and a controlling apparatus of controlling the first carrying mechanism, the fluidized body coating mechanism, the second carrying mechanism and the energy feeding apparatus. The controlling apparatus can carry the fluidized body coating mechanism by a control signal Sx2, a control signal Sy2 and a control signal Sz2.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种微细加工装置，其中材料的利用效率高并且其尺寸可以降低。

解决方案：处理器配有：探针; 能携带探针的第一承载机构; 流化体涂覆机构，其能够用流化体涂覆待加工的表面; 能够承载流化体涂覆机构的第二承载机构; 能够向管心针与流化体之间的空间施加固定电压的能量馈送装置; 以及控制第一输送机构，流化体涂覆机构，第二输送机构和能量输送装置的控制装置。 控制装置可以通过控制信号Sx2，控制信号Sy2和控制信号Sz2携带流化体涂覆机构。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2002215065A

公开(公告)日：2002-07-31

申请号：JP2001336830

申请日：2001-11-01

Applicant: SEIKO EPSON CORP

Inventor： ISHIDA MASAYA ,  FURUSAWA MASAHIRO ,  MORII KATSUYUKI ,  YOKOYAMA OSAMU ,  MIYASHITA SATORU ,  SHIMODA TATSUYA

IPC: H05B33/10 ,  G09F9/30 ,  H01L21/336 ,  H01L27/28 ,  H01L27/32 ,  H01L29/786 ,  H01L51/05 ,  H01L51/50 ,  H05B33/26 ,  H01L51/00 ,  H05B33/14

Abstract: PROBLEM TO BE SOLVED: To realize an organo-electroluminescence device whose manufacturing cost is lower, and electronic equipment. SOLUTION: This device has a structure in which a transparent conductive film 11, a light emission layer 13, an insulating film 12 which is provided at surroundings of the light emission layer 13, a cathode-layer pattern 14, an interlayer insulating film 20, a drain 31 and a source 30 which are provided by being confronted with each other, an organic semiconductor layer 32, a gate insulating film 34, a gate line 33, an interlayer insulating film 20a and a source line 35 are laminated in order on a transparent substrate 10. Then, the part of an organo-electroluminescence element including the light emission layer 13 is driven by the gate line, the drain 31 and the source 30 constituting an organic thin film transistor. As a result, since this device can be manufactured by using an ink jet process or the like without necessitating a special device such as vacuum chamber by adopting constitution for driving the organo- electroluminescence element with the organic thin film transistor in this device, the cost of this device is reduced.

公开(公告)号：JP2002026473A

公开(公告)日：2002-01-25

申请号：JP2000207389

申请日：2000-07-07

Applicant: SEIKO EPSON CORP

Inventor： SHIMODA TATSUYA ,  MIYASHITA SATORU ,  INOUE SATOSHI ,  ISHIDA MASAYA

IPC: H05B33/02 ,  H01L51/50 ,  H05B33/14 ,  H05K1/02

Abstract: PROBLEM TO BE SOLVED: To realize a board for current driven elements such as organic EL light emitting elements, capable of feeding the emitting elements with sufficient power voltages. SOLUTION: Before a unit block 1 having a transistor 11 for driving current driven elements such as organic EL light emitting elements is fitted into a recess formed in a board 3, a power source wiring pattern 2 for feeding a power to the transistor 11 is formed in advance. This allows the power source wiring pattern 2 to be made thick enough to feed the current driven elements with sufficient power voltages.

公开(公告)号：JP2001288578A

公开(公告)日：2001-10-19

申请号：JP2000099968

申请日：2000-03-31

Applicant: SEIKO EPSON CORP

Inventor： FUJIMORI NATSUO ,  ISHIDA MASAYA

IPC: B41J2/01 ,  C23C18/18 ,  C23C18/31 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a new thin film patterning technique for depositing thin films not based on a resist and a bank and combined with an ink jetting technique. SOLUTION: Organic molecular film patterns are deposited on the surface of a substrate 11, the organic molecular film patterns are fed with solution for depositing thin films by an ink jetting method, and based on the organic molecular film patterns, metallic thin film patterns (12, 13a and 13b) are obtained.

公开(公告)号：JP2001284289A

公开(公告)日：2001-10-12

申请号：JP2000098158

申请日：2000-03-31

Applicant: SEIKO EPSON CORP

Inventor： ISHIDA MASAYA ,  FURUSAWA MASAHIRO

IPC: G03F7/38 ,  B05D1/40 ,  B05D7/04 ,  H01L21/28 ,  H01L21/288 ,  H01L21/316 ,  H01L21/3205 ,  H01L29/06

Abstract: PROBLEM TO BE SOLVED: To provide a patterning means which has precision of micron order and forms a good functional thin film in a simple process. SOLUTION: A lyophilic part and a liquid-repellant part are formed in a prescribed pattern by using an organic film (14) on a substrate surface, and a functional thin film (13) is formed selectively in a lyophilic part on the substrate by a spin coating method.

公开(公告)号：JP2000302592A

公开(公告)日：2000-10-31

申请号：JP10580799

申请日：1999-04-13

Applicant: SEIKO EPSON CORP

Inventor： ISHIDA MASAYA

IPC: C30B29/04

Abstract: PROBLEM TO BE SOLVED: To selectively and stably form a thin film such as diamond thin film with low power consumption. SOLUTION: The thin film formation process using this device comprises: immersing a substrate S in a solution 141 containing an organic solvent; setting the relative distance from an electrode 111 to the substrate S to a specified length or shorter; and in that state, applying voltage to between the electrode 111 and the substrate S while changing the relative positions of the electrode 111 and the substrate S to each other, wherein since by moving the electrode 111 close to the surface of the substrate S, energy is effectively supplied to a prescribed region to enable promotion of electrolysis, a structural body D which is a diamond thin film, can be formed on the surface of the substrate S.

公开(公告)号：JP2000299191A

公开(公告)日：2000-10-24

申请号：JP10580499

申请日：1999-04-13

Applicant: SEIKO EPSON CORP

Inventor： ISHIDA MASAYA ,  KANEKO TAKEO

IPC: H05B33/26 ,  H01L51/50 ,  H05B33/12 ,  H05B33/14

Abstract: PROBLEM TO BE SOLVED: To provide an electroluminescent element capable of preventing oxidization and improving durability and reliability. SOLUTION: A negative electrode 11 of this electroluminescent element is formed of material having electron affinity not more than 0.5 eV, such as diamond thin film or the like. The diamond thin film has negative electron affinity, readily emits electrons, is hardly oxidized, and is very stable chemically. Therefore, it is very suitable for the negative electrode 11 of the electroluminescent element and a display element which are preferred to be free from quality degradation.

公开(公告)号：JP2000282266A

公开(公告)日：2000-10-10

申请号：JP9410299

申请日：1999-03-31

Applicant: SEIKO EPSON CORP

Inventor： ISHIDA MASAYA

IPC: H01J37/30 ,  C23C18/31 ,  C23F4/00 ,  G01B21/30 ,  G01N37/00 ,  G01Q60/18 ,  G01Q60/24 ,  G01Q80/00 ,  G01N13/16

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing an ultrafine structure of a high aspect ratio with superior productivity. SOLUTION: The fine structure can be manufactured by carrying out the following steps in the order named: a preliminary step where an extra thin film 12 of an organic compound having

公开(公告)号：JPH10284766A

公开(公告)日：1998-10-23

申请号：JP8655897

申请日：1997-04-04

Applicant: SEIKO EPSON CORP ,  MASUDA HIDEKI

Inventor： ISHIDA MASAYA ,  NEHASHI SATOSHI ,  IDE TSUGIO ,  MASUDA HIDEKI

IPC: G11B5/39 ,  H01F1/00 ,  H01F10/00 ,  H01F10/08 ,  H01F10/32 ,  H01F41/26 ,  H01L43/08

Abstract: PROBLEM TO BE SOLVED: To realize a large magnetoresistive ratio by a practical low magnetic field by dispersing a large number of needle-like magnetic members in a base material. SOLUTION: A base material 12 on which an electrode is formed is plated in permalloy plating bath, and needle-like permalloy is formed in holes of the base material. Plating is performed under the condition that the temperature of plating solution is about 25 deg.C and pH is about 4. By using a coil, a magnetic field is applied vertically to a film surface in the course of plating. The length of the needle-like permalloy can be adjusted by plating time. A specimen in which permalloy is embedded is formed. The length of a needle-like magnetic member 11 is 1 μm. A metallic electrode formed on the single surface of the base material 12 is eliminated, and finally a magnetoresistive element is obtained. Numerous needle-like magnetic members 11 are dispersed in the base material 12. The respective members 11 are almost in parallel with each other and arranged at nearly equal intervals. Thereby a magnetoresistive effect element 11, wherein a large magnetoresistivity is realized at a practical low magnetic field, can be obtained.

公开(公告)号：JPH06302037A

公开(公告)日：1994-10-28

申请号：JP8484893

申请日：1993-04-12

Applicant: SEIKO EPSON CORP

Inventor： ISHIDA MASAYA

IPC: G11B11/10 ,  G11B11/105

Abstract: PURPOSE:To enable high reliable reproduction of information even when a magneto-optical recording medium is used over a long period of time. CONSTITUTION:Information is recorded or reproduced by the magneto-optical recorder after the magnetized directions of a part of a recording film are made to be uniform in one direction by an initializing magnetic field 15 prior to recording or reproducing information. When recording or reproducing is not performed, the initializing magnetic field 15 is not impressed. When recording and reproducing is not performed in the case of a permanent magnet used for a magnetic field impressing means, this permanent magnet is withdrawn from the magneto-optical recording medium 11. Then, the magnetic field impressing means is provided in the disk cartridge, and a means capable of moving the magnetic field impressing means from the outside of the disk cartridge is provided.