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    METHOD FOR MAKING A PLANAR SUSPENDED MICROSTRUCTURE, USING A SACRIFICIAL LAYER OF POLYMER MATERIAL AND RESULTING COMPONENT
    61.
    发明申请
    METHOD FOR MAKING A PLANAR SUSPENDED MICROSTRUCTURE, USING A SACRIFICIAL LAYER OF POLYMER MATERIAL AND RESULTING COMPONENT 审中-公开
    使用聚合物材料的牺牲层和导致组分制备平面悬挂微结构的方法

    公开(公告)号：WO2004056698A3

    公开(公告)日：2004-11-11

    申请号：PCT/FR0303789

    申请日：2003-12-18

    Applicant: COMMISSARIAT ENERGIE ATOMIQUE ,  ROBERT PHILIPPE ,  MICHEL FRANCE ,  MAEDER-PACHURKA CATHERINE ,  SILLON NICOLAS

    Inventor： ROBERT PHILIPPE ,  MICHEL FRANCE ,  MAEDER-PACHURKA CATHERINE ,  SILLON NICOLAS

    IPC: B81B3/00 ,  B81C1/00

    CPC classification number: B81C1/00611 ,  B81C2201/0108 ,  B81C2201/0125 ,  H01L2924/01082

    Abstract: The invention concerns a method which consists in successively depositing a polymeric sacrificial layer (2), depositing, on at least part of the substrate (1) and the front surface of the sacrificial layer (2), an embedding layer (6), with a thickness greater than that of the sacrificial layer (2) and performing planarization such that the front surfaces of the sacrificial layer (2) and of the embedding layer (6) form a common planar surface. A forming layer (3) of a suspended structure (5) is deposited on the front face of the common planar surface. The planarization can include chemical mechanical polishing and etching the embedding layer (6). Etching the sacrificial layer (2) can be performed by means of a mask, formed on the front surface of a polymer material layer, removed during the planarization step.

    Abstract translation: 本发明涉及一种方法，其包括连续地沉积聚合物牺牲层（2），在基底（1）的至少一部分和牺牲层（2）的前表面上沉积嵌入层（6），其中 厚度大于所述牺牲层（2）的厚度并且执行平坦化，使得所述牺牲层（2）和所述嵌入层（6）的所述前表面形成共同的平坦表面。 悬浮结构（5）的形成层（3）沉积在共同平面的正面上。 平面化可以包括化学机械抛光和蚀刻嵌入层（6）。 蚀刻牺牲层（2）可以通过在平坦化步骤期间去除的聚合物材料层的前表面上形成的掩模来执行。

    A METHOD FOR INTEGRATING MICROPARTICLES INTO MEMS
    62.
    发明申请
    A METHOD FOR INTEGRATING MICROPARTICLES INTO MEMS 审中-公开
    将微波集成到MEMS中的方法

    公开(公告)号：WO03081968A8

    公开(公告)日：2004-05-13

    申请号：PCT/US0308176

    申请日：2003-03-18

    Applicant: CALIFORNIA INST OF TECHN ,  TAI YU-CHONG ,  HE QING

    Inventor： TAI YU-CHONG ,  HE QING

    IPC: B01L3/00 ,  B81B3/00 ,  B81B7/00 ,  G01N30/56 ,  G01N30/60 ,  H05K3/02 ,  B05D1/12 ,  B05D1/36 ,  B05D3/12 ,  B44C1/22 ,  C23F1/00 ,  D06L3/12 ,  H05K3/10 ,  C03C1/22

    CPC classification number: B81C1/00333 ,  B01L3/502707 ,  B01L2200/0668 ,  B01L2200/12 ,  B01L2300/0896 ,  B81C1/00182 ,  B81C1/00476 ,  B81C2201/0108 ,  B82Y30/00 ,  G01N30/6095 ,  G01N2030/562 ,  G01N2030/6056

    Abstract: A method for integrally fabricated MEMs devices with include micro or nanoparticles by providing a mixture (16) of sacrificial material (12) and a multiplicity of particles (10), disposing the mixture (16) on a substrate (14), fabricating a MEMs structure on the substrate (14) including at least part of the mixture (16), so that at least some of the mixture (16) is enclosed in the MEMs structure, removing the sacrificial material (12), and leaving at least some of the multiplicity of particles (10) substantially free and enclosed in the MEMs structure. The step of fabricating a MEMs structure is quite general and is contemplated as including one or a multiplicity of additional steps for creating some type of structure in which the particles (10), which may be microbeads or nanobeads, are included.

    Abstract translation: 一种通过提供牺牲材料（12）的混合物（16）和多个颗粒（10），将混合物（16）设置在基底（14）上的，用于整体制造的MEM装置的方法，其包括微型或纳米颗粒，制造MEM 包括至少部分混合物（16）的衬底（14）上的结构，使得混合物（16）中的至少一些被封闭在MEM结构中，去除牺牲材料（12），并且留下至少一些 基本上游离并包围在MEMs结构中的颗粒（10）的多样性。 制造MEMs结构的步骤是相当普遍的，并且被设想为包括用于产生某些类型的结构的一个或多个附加步骤，其中可以包括可以是微珠或纳米珠的颗粒（10）。

    MICRO ELECTRO-MECHANICAL SYSTEM APPARATUS AND METHOD
    63.
    发明申请
    MICRO ELECTRO-MECHANICAL SYSTEM APPARATUS AND METHOD 审中-公开
    微电子机械系统设备及方法

    公开(公告)号：WO03095356A2

    公开(公告)日：2003-11-20

    申请号：PCT/US0313439

    申请日：2003-04-29

    Applicant: MOTOROLA INC

    Inventor： LANE SPENCER A ,  JONNALAGADDA KRISHNA ,  ELIACIN MANES

    IPC: B81B3/00 ,  H01H59/00 ,  B81B

    CPC classification number: B81C1/00182 ,  B81B2201/045 ,  B81B2203/0315 ,  B81C2201/0108 ,  B81C2203/0136 ,  H01H59/0009 ,  H01H2001/0073

    Abstract: A meso-scale MEMS device having a movable member (51) is formed using standard printed wiring board and high density interconnect technologies and practices. In one embodiment, sacrificial material disposed about the movable member (51) is removed through openings (101, 102) as formed through a cover (91) to form a cavity (121) that retains and limits the freedom of movement of the movable member (51). The movable member can support a reflective surface (224) to thereby provide a mechanism that will support a projection display and/or image scanner (such as a bar code scanner).

    Abstract translation: 使用标准印刷线路板和高密度互连技术和实践形成具有可移动部件（51）的中尺度MEMS器件。 在一个实施例中，围绕可移动构件（51）设置的牺牲材料通过通过盖（91）形成的开口（101,102）去除以形成空腔（121），其保持并限制可移动构件 （51）。 可移动构件可以支撑反射表面（224），从而提供将支撑投影显示和/或图像扫描器（例如条形码扫描器）的机构。

    Method of manufacturing a micro structure and optical pattern forming sacrificial film forming composition
    69.
    发明专利
    Method of manufacturing a micro structure and optical pattern forming sacrificial film forming composition 有权
    制造形成组合物的薄膜的微结构和光学图案的方法

    公开(公告)号：JP2012018390A

    公开(公告)日：2012-01-26

    申请号：JP2011113622

    申请日：2011-05-20

    Applicant: Shin Etsu Chem Co Ltd ,  信越化学工業株式会社

    Inventor： KATO HIDETO ,  KANBARA HIROSHI ,  TAKAHATA TOMOYOSHI ,  HIRANO SADANORI

    IPC: G03F7/023 ,  B81C1/00 ,  G03F7/004 ,  G03F7/40

    CPC classification number: C09D163/04 ,  B81C1/00619 ,  B81C2201/0108 ,  G03F7/0226 ,  G03F7/0236 ,  G03F7/30 ,  G03F7/40 ,  G03F7/70466

    Abstract: PROBLEM TO BE SOLVED: To provide a sacrificial film pattern having a highly accurate planar shape and a suitable sidewall shape, as well as excellent heat resistance.SOLUTION: A method of manufacturing a micro structure comprises: (i) a step for forming a sacrificial film pattern on a substrate; (ii) a step for forming an inorganic material film on the sacrificial film pattern; and (iii) a step for forming space having a shape of the sacrificial film pattern. In the method, the step (i) includes: (A) a process for forming a sacrificial film using an optical pattern forming sacrificial film forming composition containing either one of a cresol novolac resin or a 1,2-naphthoquinonediazidesulfonate ester compound and a crosslinking agent; (B) a process for irradiating the sacrificial film with a first high energy line; (C) a process for forming a positive sacrificial film pattern by developing; and (D) a process for irradiating the sacrificial film with a second high energy line pattern and heating thereby forming a crosslinkage between cresol novolac resins.

    Abstract translation: 要解决的问题：提供具有高精度平面形状和合适侧壁形状的牺牲膜图案以及优异的耐热性。 解决方案：制造微结构的方法包括：（i）在衬底上形成牺牲膜图案的步骤; （ii）在牺牲膜图案上形成无机材料膜的步骤; 和（iii）形成具有牺牲膜图案形状的空间的步骤。 在该方法中，步骤（i）包括：（A）使用含有甲酚酚醛清漆树脂或1,2-萘醌二叠氮化物磺酸酯化合物之一的光学图案形成牺牲膜形成组合物形成牺牲膜的方法和交联 剂; （B）用第一高能线照射牺牲膜的方法; （C）通过显影形成正牺牲膜图案的工艺; 和（D）用第二高能线图案照射牺牲膜并加热的方法，从而在甲酚酚醛清漆树脂之间形成交联。 版权所有（C）2012，JPO＆INPIT

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