公开(公告)号：EP1580170A4

公开(公告)日：2011-12-28

申请号：EP03775963

申请日：2003-11-28

Applicant: SHINETSU QUARTZ PROD

Inventor： SATO TATSUHIRO ,  KAITOU TAKAHIRO ,  FUJINOKI AKIRA ,  KATO TOSHIYUKI ,  SEGAWA TOHRU; ,  YOSHIDA NOBUMASA

IPC: C03C3/06 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

公开(公告)号：EP3390307A2

公开(公告)日：2018-10-24

申请号：EP16822148.9

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： OTTER, Matthias ,  LEHMANN, Walter ,  HÜNERMANN, Michael ,  NIELSEN, Nils Christian ,  WHIPPEY, Nigel Robert ,  GROMANN, Boris ,  KPEBANE, Abdoul-Gafar ,  KAYSER, Thomas

IPC: C03B20/00 ,  C03C3/06 ,  C03B37/012 ,  C03C1/02 ,  C03B19/10 ,  C03B17/04

CPC classification number: C03B19/106 ,  C03B17/04 ,  C03B19/1095 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2207/32 ,  C03B2207/36 ,  C03C1/022 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/54 ,  C03C2203/10 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/50

Abstract: The invention relates to a method for producing a silica glass article, involving method steps i.) providing a silica granulate, the providing involving at least the steps of: I. providing silica powder; and II. processing the silica powder so as to obtain a silica granulate, the silica granulate having a larger particle diameter than the silica powder, the processing involving the following steps: 1) processing the silica powder to obtain a silica granulate I that has a first carbon content w C(1), 2) treating silica granulate I with a reactant so as to obtain a silica granulate II having another carbon content, w C(2), which is lower than the first carbon content w C(1); ii.) forming a glass melt from the silica granulate, and iii.) forming a silica glass article from at least some of the glass melt. The invention further relates to a silica glass article that can be obtained by said method. The invention also relates to an optical waveguide, an illuminant and a molded article, each of which can be obtained by further processing the silica glass article. The invention finally relates to a silica granulate II that can be obtained as an intermediate product in the disclosed method.

公开(公告)号：EP3390290A2

公开(公告)日：2018-10-24

申请号：EP16812960.9

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： OTTER, Matthias ,  HÜNERMANN, Michael ,  NIELSEN, Nils Christian ,  WESSELY, Frank ,  SCHREIBER, Andreas ,  ROOS, Björn ,  SCHEICH, Gerrit

IPC: C03B19/06 ,  C03C3/06 ,  C03B20/00 ,  C03B19/10

CPC classification number: C03B19/066 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C1/022 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/10 ,  C03C2204/04

Abstract: The invention relates to a method for producing a silica glass article, involving method steps i.) providing a silica granulate made of a pyrogenically produced silica powder, ii.) forming a glass melt from the silica granulate, iii.) forming a silica glass article from at least some of the glass melt, iv.) comminuting the silica glass article so as to obtain silica glass grains, v.) processing the silica glass article to obtain a preform, and vi.) forming an opaque silica glass article from the preform. The invention further relates to an opaque silica glass article that can be obtained by said method. The invention also relates to a reactor and an arrangement, each of which can be obtained by further processing the opaque silica glass article.

公开(公告)号：EP2048121A1

公开(公告)日：2009-04-15

申请号：EP08164123.5

申请日：2008-09-11

Applicant: Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co.,Ltd.

Inventor： Sato, Tatsuhiro ,  Yoshida, Nobumasa

IPC: C03C3/06 ,  C03C23/00 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03C4/02 ,  C03C4/082 ,  C03C23/008 ,  C03C2201/02 ,  C03C2201/26 ,  C03C2203/54 ,  Y10T428/261

Abstract: To provide a black synthetic quartz glass with a transparent layer, which has high emissivity in the far infrared region, has excellent light-shielding properties, maintains the same degree of purity as synthetic quartz glass in terms of metal impurities, has high-temperature viscosity characteristics comparable to natural quartz glass, can undergo high-temperature processing like welding, and does not release carbon from its surface; together with a method for the production thereof.
A porous silica glass body containing hydroxyl groups is subjected to a gas phase reaction in a volatile organosilicon compound atmosphere at a temperature between 100°C and 1200°C and, following the reaction, evacuation is commenced and, on reaching a degree of vacuum exceeding 10 mmHg (1343 Pa), heatingis carried out at a temperature between 1200°C and 2000°C to produce a compact glass body.

Abstract translation: 为了提供在远红外区域具有高发射率的透明层的黑色合成石英玻璃，具有优异的遮光性，在金属杂质方面保持与合成石英玻璃相同的纯度，具有高温粘度 与天然石英玻璃相当的特性，可以进行焊接等高温处理，不会从表面释放碳; 以及其生产方法。 含有羟基的多孔二氧化硅玻璃体在100℃〜1200℃的温度下在挥发性有机硅化合物气氛中进行气相反应，反应开始后，达到真空度以上 在10mmHg（1343Pa）的温度下，在1200℃〜2000℃的温度下进行加热，得到紧凑的玻璃体。

公开(公告)号：EP1625433A1

公开(公告)日：2006-02-15

申请号：EP04709909.8

申请日：2004-02-10

Applicant: 3M Innovative Properties Company

Inventor： DOWER, William V., ,  VISWANATHAN, Nirmal K., ,  PAOLUCCI, Dora M., ,  BARRERA, Michael D.,

IPC: G02B6/12 ,  C03C25/60 ,  C03C25/62 ,  C03C3/06

CPC classification number: G02B6/02114 ,  C03C3/06 ,  C03C13/045 ,  C03C13/047 ,  C03C25/607 ,  C03C25/6226 ,  C03C2201/21 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/31 ,  C03C2201/60

Abstract: The present invention relates to increasing the photosensitivity of optical fibers. One aspect of the present invention comprises a method for rapidly diffusing hydrogen or deuterium into an optical fiber from a gas mixture having a low total hydrogen content to generate changes in the refractive index of the optical fiber. The resulting photosensitive fiber may be used to create optical devices including Bragg gratings and Bragg grating-based devices.

公开(公告)号：EP1240114B1

公开(公告)日：2005-12-07

申请号：EP00993506.5

申请日：2000-12-14

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： WERDECKER, Waltraud ,  FABIAN, Heinz ,  GERTIG, Udo ,  LEIST, Johann ,  GÖBEL, Rolf

IPC: C03C3/06 ,  C03C1/02 ,  C03B19/10

CPC classification number: C03C1/026 ,  C03B19/1065 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/80 ,  C03C2203/10 ,  C03C2203/54

Abstract: The invention relates to a method for the production of opaque quartz glass wherein a blank is made from synthetic SiO2 crystals and heated to form a blank body made of opaque quartz glass at a given vitrification temperature. A method for the production of pure, opaque quartz glass is disclosed wherein said quartz glass has a homogeneous pore distribution and a high density, a high viscosity and a lower tendency to devitrify. According to the invention, the SiO2 crystals are formed from an at least partially porous agglomerate of SiO2 primary particles (21; 31) having a specific surface (according to BET) between 1.5 m /g and 40 m /g with a stamping density of at least 0.8 g/cm . SiO2 granulate (21; 31) suitable for use in performing the procedure is characterized in that it is composed of an at least partially porous agglomerate of SiO2 primary particles and has a specific surface (according to BET) between 1.5 m /g and 40 m /g in addition to a stamping density of at least 0.6 g/cm .

公开(公告)号：WO2017103123A3

公开(公告)日：2017-08-24

申请号：PCT/EP2016081448

申请日：2016-12-16

Applicant: HERAEUS QUARZGLAS

Inventor： WHIPPEY NIGEL ROBERT ,  GROMANN BORIS ,  SÖHN MATTHIAS

IPC: C03B20/00 ,  C03B5/06 ,  C03B17/04 ,  C03B19/10 ,  C03B37/012 ,  C03C3/06 ,  F27D7/02

CPC classification number: C03B20/00 ,  C03B5/06 ,  C03B17/04 ,  C03B19/108 ,  C03B37/01211 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/40

Abstract: The invention relates to a method for producing a silica glass body, comprising the method steps: i.) providing silicon dioxide particles ii.) forming a glass melt from the silicon dioxide particles in a furnace and iii.) forming a silica glass body from at least one portion of the glass melt, wherein the furnace has a gas outlet, through which gas can be removed from the furnace and the dew point of the gas exiting the furnace through the gas outlet is less than 0°C. The invention also relates to a silica glass body that can be obtained by said method. In addition, the invention relates to a light guide, a lighting means and a shaped article, each of which can be obtained by further processing the silica glass body. The invention further relates to the adjustment of the dew point at the outlet of a furnace, comprising: providing a starting material in the furnace; operating said furnace, a gas flow being conducted through the furnace; and varying the residual moisture of the starting material or the gas exchange rate of the gas flow.

Abstract translation: 本发明涉及一种方法，用于制造石英玻璃体包括如下工艺步骤i。）提供的二氧化硅颗粒，二。）形成由二氧化硅粒子的熔融玻璃在烘箱中和iii）从所述熔融玻璃的至少一部分上形成石英玻璃体，炉内的气体出口 通过它从炉中取出气体，当气体通过气体出口离开炉的露点低于0℃时 本发明还涉及通过该方法可获得的石英玻璃体。 此外，本发明涉及一种光导，一种照明装置和一种成型体，每种光导体都可以通过对石英玻璃体进一步加工而获得。 本发明还涉及到露点在包括提供在所述炉中的输入材料，炉的操作中，其中，气体流通过烘箱，并改变起始材料的残留水分或气体流的气体交换率的炉子的出口处的调整。

公开(公告)号：WO2017103171A1

公开(公告)日：2017-06-22

申请号：PCT/EP2016/081525

申请日：2016-12-16

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： OTTER, Matthias ,  LEHMANN, Walter ,  HÜNERMANN, Michael ,  NIELSEN, Nils Christian ,  WHIPPEY, Nigel Robert ,  GROMANN, Boris ,  KPEBANE, Abdoul-Gafar ,  KAYSER, Thomas

IPC: C03B20/00 ,  C03C12/00 ,  C03B19/10 ,  C03B37/012 ,  C03C3/06 ,  C03B19/06

CPC classification number: C03B19/106 ,  C03B17/04 ,  C03B19/066 ,  C03B19/108 ,  C03B19/1095 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/44 ,  C03C2203/54

Abstract: Die Erfindung betrifft ein Verfahren zum Herstellen eines Quarzglaskörpers beinhaltend die Verfahrensschritte i.) Bereitstellen eines Siliziumdioxidgranulats, ii.) Bilden einer Glasschmelze aus dem Siliziumdioxidgranulat und iii.) Bilden eines Quarzglaskörpers aus zumindest einem Teil der Glasschmelze, wobei das Bereitstellen die Schritte I. Erzeugen eines Siliziumdioxidpulvers mit mindestens zwei Teilchen hergestellt aus einer Silizium-Chlor-Verbindung, II. Kontaktieren des Siliziumdioxidpulvers mit Ammoniak unter Erhalt eines behandelten Siliziumdioxidpulvers und III. Granulieren des behandelten Siliziumdioxidpulvers zu einem Siliziumdioxidgranulat beinhaltet, und wobei der Chlorgehalt des Siliziumdioxidpulvers höher ist als der Chlorgehalt des Siliziumdioxidgranulats. Die Erfindung betrifft weiterhin einen Quarzglaskörper, der durch dieses Verfahren erhältlich ist. Die Erfindung betrifft auch ein Verfahren zum Herstellen eines Siliziumdioxidgranulats. Weiterhin betrifft die Erfindung einen Lichtleiter, ein Leuchtmittel und einen Formkörper, die jeweils durch Weiterverarbeiten des Quarzglaskörpers erhältlich sind.

公开(公告)号：WO2017103123A2

公开(公告)日：2017-06-22

申请号：PCT/EP2016/081448

申请日：2016-12-16

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： WHIPPEY, Nigel Robert ,  GROMANN, Boris ,  SÖHN, Matthias

IPC: C03B20/00 ,  C03C3/06 ,  C03B37/012 ,  F27D7/02

CPC classification number: C03B20/00 ,  C03B5/06 ,  C03B17/04 ,  C03B19/108 ,  C03B37/01211 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/40

Abstract: Die Erfindung betrifft ein Verfahren zum Herstellen eines Quarzglaskörpers beinhaltend die Verfahrensschritte i.) Bereitstellen von Siliziumdioxidpartikeln, ii.) Bilden einer Glasschmelze aus den Siliziumdioxidpartikeln in einem Ofen und iii.) Bilden eines Quarzglaskörpers aus zumindest einem Teil der Glasschmelze, wobei der Ofen einen Gasauslass aufweist, durch den Gas dem Ofen entnommen wird, wobei der Taupunkt des Gases beim Austritt aus dem Ofen durch den Gasauslass weniger als 0°C beträgt. Die Erfindung betrifft weiterhin einen Quarzglaskörper, der durch dieses Verfahren erhältlich ist. Weiterhin betrifft die Erfindung einen Lichtleiter, ein Leuchtmittel und einen Formkörper, die jeweils durch Weiterverarbeiten des Quarzglaskörpers erhältlich sind.

Abstract translation:

本发明涉及一种用于制造石英玻璃＆OUML;包括如下工艺步骤：i）提供二氧化硅rpers，ⅱ）在烘箱中形成从二氧化硅粒子的熔融玻璃和iii）形成的石英玻璃与OUML; ... Rpers 是从熔融玻璃的至少一部分上，具有由气体到炉中取出的气体出口处的炉中，在从通过气体出口炉子出口的气体的露点是关于BEAR GT小于0℃。 本发明还涉及一种石英玻璃＆OUML;主体，可以通过此方法获得BEAR是ltlich。 此外，本发明涉及一种光导，发光装置和模制体，其每一个都可以通过进一步处理石英玻璃体

公开(公告)号：WO2017103114A2

公开(公告)日：2017-06-22

申请号：PCT/EP2016/081437

申请日：2016-12-16

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： OTTER, Matthias ,  LEHMANN, Walter ,  HÜNERMANN, Michael ,  NIELSEN, Nils Christian ,  WHIPPEY, Nigel Robert ,  GROMANN, Boris ,  KPEBANE, Abdoul-Gafar

IPC: C03B20/00 ,  C03C3/06 ,  C03B37/012

CPC classification number: C03B37/01211 ,  C03B5/06 ,  C03B17/04 ,  C03B19/106 ,  C03B20/00 ,  C03C1/022 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/10

Abstract: Die Erfindung betrifft ein Verfahren zum Herstellen eines Quarzglaskörpers beinhaltend die Verfahrensschritte i.) Bereitstellen eines Siliziumdioxidgranulats, ii.) Bilden einer Glasschmelze aus dem Siliziumdioxidgranulat in einem Ofen und iii.) Bilden eines Quarzglaskörpers aus zumindest einem Teil der Glasschmelze, wobei der Ofen einen hängenden Sintertiegel beinhaltet. Die Erfindung betrifft weiterhin einen Quarzglaskörper, der durch dieses Verfahren erhältlich ist. Weiterhin betrifft die Erfindung einen Lichtleiter, ein Leuchtmittel und einen Formkörper, die jeweils durch Weiterverarbeiten des Quarzglaskörpers erhältlich sind.

Abstract translation:

本发明涉及一种用于制造石英玻璃＆OUML;包括如下工艺步骤：i）提供一Siliziumdioxidgranulats rpers，ii）形成在玻璃从Siliziumdioxidgranulat在烘箱中熔化和iii）形成的石英玻璃与OUML; ... Rpers 至少一部分玻璃熔体，该炉包括烧结坩埚。 本发明还涉及通过该方法可获得的石英玻璃体。 此外，本发明涉及一种光导，发光装置和模制体，其每一个都可以通过进一步处理石英玻璃体