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    SCINTILLATOR PANEL AND RADIATION DETECTOR
    67.
    发明公开
    SCINTILLATOR PANEL AND RADIATION DETECTOR 有权
    SZINTILLATORTAFEL UND STRAHLUNGSDETEKTOR

    公开(公告)号：EP2141708A1

    公开(公告)日：2010-01-06

    申请号：EP08722861.5

    申请日：2008-03-26

    Applicant: Kabushiki Kaisha Toshiba ,  Toshiba Electron Tubes & Devices Co., Ltd.

    Inventor： YOSHIDA, Atsuya ,  HORIUCHI, Hiroshi

    IPC: G21K4/00 ,  G01T1/20 ,  H01L27/14 ,  H04N5/32

    CPC classification number: G01T1/202 ,  C09K11/613 ,  C09K11/7733 ,  G21K4/00 ,  G21K2201/06

    Abstract: A reflective resin sheet 13 is bonded to one face of a supporting substrate 12 transmitting a radiation ray and a resin sheet 14 of the same material as that of the reflective resin sheet 13 to the other face of the supporting substrate 12. A phosphor layer 15 converting a radiation ray into visible light is formed additionally on the reflective resin sheet 13 formed on one face of the supporting substrate 12. The phosphor layer 15 is enclosed with an additional moisture-proof layer 17 and the reflective resin sheet 13. It is possible to obtain a scintillator panel 11 higher in sensitivity characteristics, stabilized in quality and more cost-effective by placing the reflective resin sheet 13 between the supporting substrate 12 and the phosphor layer 15.

    Abstract translation: 将反射树脂片13接合到将反射树脂片13的材料的透射线和树脂片14的支持基板12的一面接合到支撑基板12的另一面。荧光体层15 在形成在支撑基板12的一个面上的反射树脂片13上附加地形成将放射线转换成可见光。荧光体层15被附加防潮层17和反射树脂片13包围。 通过将反射树脂片13放置在支撑基板12和荧光体层15之间来获得灵敏度特性更高，质量稳定，成本更高的闪烁面板11。

    DEVICE FOR OBTAINING AN IMAGE OF AN OBJECT USING A STREAM OF NEUTRAL OR CHARGED PARTICLES AND A LENS FOR CONVERTING THE SAID STREAM OF NEUTRAL OR CHARGED PARTICLES
    68.
    发明授权
    DEVICE FOR OBTAINING AN IMAGE OF AN OBJECT USING A STREAM OF NEUTRAL OR CHARGED PARTICLES AND A LENS FOR CONVERTING THE SAID STREAM OF NEUTRAL OR CHARGED PARTICLES 失效
    器具，用于产生与中性流的使用对象物的图像或带电粒子以及透镜，中性或带电粒子变换电流

    公开(公告)号：EP0724150B8

    公开(公告)日：2006-02-01

    申请号：EP94927878.2

    申请日：1994-08-11

    Applicant: Kumakhov, Muradin Abubekirovich

    Inventor： Kumakhov, Muradin Abubekirovich

    IPC: G01N23/04 ,  G21K1/06

    CPC classification number: B82Y10/00 ,  G01N23/04 ,  G21K1/06 ,  G21K1/062 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/068

    Abstract: The device according to the first invention is intended for use in the creation of an image of an object using radiation which passes through the object, is scattered by it or generated within it. A lens is provided between the radiation source and the object positioning system, or between that system and an image-forming system which registers the intensity distribution of the radiation incident on it, or in both these spaces. This lens is designed in accordance with the second invention and converts the particle stream (focusing of divergent or quasi-parallel rays, formation of quasi-parallel rays from divergent rays, monochromatization, spatial separation of particles of different energies in an initial non-monochromatic stream, etc.). The lens comprises a set of channels for radiation transport (primarily in the form of vitreous mono- and polycapillaries) and is distinguished by an arrangement of the channels in its cross section which is in keeping with axial symmetry (reflectional, central, rotational); this results in a point of interference of the rays emerging from it. The channels can be grouped together in ordered and symmetrically configured modules (30), each of which in its turn can be formed by finer modules (31) of the same number, form and mutual configuration.

    Illumination optical system and exposure apparatus
    69.
    发明公开
    Illumination optical system and exposure apparatus 审中-公开
    Optisches Beleuchtungssystem und Belichtungsanlage

    公开(公告)号：EP1517339A2

    公开(公告)日：2005-03-23

    申请号：EP04001822.8

    申请日：2004-01-28

    Applicant: CANON KABUSHIKI KAISHA

    Inventor： Tsuji, Toshihiko c/o Canon Kabushiki Kaisha

    IPC: G21K1/00

    CPC classification number: G03F7/702 ,  G21K2201/06

    Abstract: An exposure apparatus includes an illumination optical system for illuminating a reflection mask that forms a pattern, by using light from a light source, wherein the illumination optical system includes a field stop that defines an illuminated area on the reflection mask, and has an opening, and an imaging system for introducing the light from the opening in the field stop into the reflection mask, the imaging system being a coaxial optical system, wherein a principal ray of the imaging system at a side of the reflection mask forming an inclination angle to a common axis of the coaxial optical system, the inclination angle being approximately equal to an angle between a principal ray of the projection optical system at the side of the reflection mask and a normal to a surface of the reflection mask.

    Abstract translation: 曝光装置包括：照明光学系统，用于通过使用来自光源的光来照射形成图案的反射掩模，其中所述照明光学系统包括限定所述反射掩模上的照明区域的场停止件，并且具有开口， 以及成像系统，用于将来自所述场停止器中的开口的光引入所述反射掩模中，所述成像系统是同轴光学系统，其中所述成像系统在所述反射掩模侧的主光线形成与所述反射掩模的倾斜角度 同轴光学系统的公共轴线，倾斜角度近似等于投影光学系统在反射掩模侧面的主光线与反射掩模表面法线之间的角度。

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