Abstract:
A method and apparatus for spectral identification of a material based on a spectral signature. The method is ideally suited for thin film substrate characterization, as found in semiconductor wafer and optical thin film processing.
Abstract:
Optical characteristic measuring systems and methods such as for determining the color or other optical characteristics of teeth are disclosed. Perimeter receiver fiber optics preferably are spaced apart from a source fiber optic and receive light from the surface of the object/tooth being measured. Light from the perimeter fiber optics pass to a variety of filters. The system utilizes the perimeter receiver fiber optics to determine information regarding the height and angle of the probe with respect to the object/tooth being measured. Under processor control, the optical characteristics measurement may be made at a predetermined height and angle. Various color spectral photometer arrangements are disclosed. Translucency, fluorescence, gloss and/or surface texture data also may be obtained. Audio feedback may be provided to guide operator use of the system. The probe may have a removable or shielded tip for contamination prevention. A method of producing dental prostheses based on measured data also is disclosed. Measured data also may be stored and/or organized as part of a patient data base. Such methods and implements may be desirably utilized for purposes of detecting and preventing counterfeiting or the like. Preferably, a two stage spectral separation is utilized, preferably utilizing a diffraction grating and interference filters.
Abstract:
An optical device includes an imaging device for imaging an incident beam onto a focal surface, and a support element which includes at least one side having a shape corresponding to the focal surface, where the side is located on the focal surface. The invention also includes a sensor array in close contact with the side of the support element having the shape of the focal surface.
Abstract:
A spectrometer measures a spectrum of a light beam supplied from a light source so as to obtain fine information and coarse information of the spectrum easily. This spectrometer has a holographic grating, an Echelle grating, a rotation stage and a line sensor. In the case where a single pass beam is to be detected, a control processing unit controls the rotation stage so as to rotate the Echelle grating from the Littrow arrangement by a predetermined angle null1. On the other hand, in the case where a double pass beam is to be detected, the control processing unit controls the rotation stage so as to rotate the Echelle grating from the Littrow arrangement by a predetermined angle null2.
Abstract:
A disc serving as a spatial radiation modulator has dispersed radiation filters thereon. Each filter has a transmittance or reflectance modulation function of the form sin2(mnullnullpnull/4), where m is a positive integer and p has one of the four values 0, 1, 2, 3. A radiation beam including selected wavelength components is diffracted into an elongated image dispersed according to wavelength. Different wavelength components are focused onto different filters on the modulator and are encoded by correspond filters. Since the modulation functions of the filters are orthogonal to one another, it is possible to extract the amplitude of each wavelength component after it has been encoded or modulated by corresponding filter from the total detected signal during one measurement.
Abstract:
An apparatus for ascertaining properties of a light beam, comprises a means for splitting a measured beam out from the light beam and comprises at least one detector that at least partially receives the measured beam. A polarization-influencing means is arranged in the beam path of the measured beam in order to enhance reliability and reproducibility.
Abstract:
To provide a modified-color generation and display method using computer graphic, including measuring the spectral reflectance of an original color by using a spectrophotometer, obtaining the modified spectral reflectance of a modified color by changing the measured spectral reflectance, and displaying the computer graphic of the modified color on a monitor.
Abstract:
A system for calibrating a spectrophotometer includes a spectrophotometer, including a network communication interface, operating in a plurality of modes and producing and implementing diagnostic information. A network communicates with the spectrophotometer via the network communication interface. A remote processor is enabled to communicate with the spectrophotometer directly via the network communication interface. Alternatively, a spectrophotometer having a thin client is disclosed that can operate independently of a local PC.
Abstract:
A compact spectrometer that is relatively free of spatial and spectral image distortions. The spectrometer includes one or more slit elements located at an object plane, a first optical sub-system having at least one refractive optical element, one or more dispersive elements located substantially at a center plane, a second optical sub-system having at least one refractive optical element, and one or more one detecting elements located at substantially an image plane. The first optical sub-system is capable of substantially collimating, at the center plane, electromagnetic radiation originating from the one or more slit elements. The second optical sub-system is, in one embodiment, substantially symmetric to said first optical sub-system, the center plane being the plane of symmetry. The second optical sub-system is capable of imaging the substantially collimated electromagnetic radiation from the center plane onto the image plane. Another embodiment has a reflective dispersive element, and the first optical sub-system is also the second optical sub-system, acting as a dual optical sub-system.
Abstract:
The present invention provides a thin film property measuring method using a spectroscopic ellipsometer. With the measuring method, a model including a combination of the film thickness, complex refractive index, or the like, of each layer is formed, and fitting is made for the measured spectra and the spectra calculated based upon the model, with the model and the incident angle being modified over a predetermined number of repetitions, thereby determining the structure, the wavelength dependency of the dielectric constant, and the composition ratio, of a thin film including a compound semiconductor layer on a substrate. Furthermore, new approximate calculation is employed in the present invention, thereby enabling the concentration of the atom of interest contained in polycrystalline compound semiconductor to be calculated.