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71.发明专利Method of forming transparent conductive film and transparent conductive film 审中-公开形成透明导电膜和透明导电膜的方法
公开(公告)号：JP2006047720A
公开(公告)日：2006-02-16
申请号：JP2004229009
申请日：2004-08-05
Applicant: Kurita Seisakusho:Kk , Sumitomo Osaka Cement Co Ltd , 住友大阪セメント株式会社 , 株式会社栗田製作所
Inventor： NISHIMURA YOSHIMI , HISHIDA SHIGEJI , KINOSHITA NOBORU , OTSUKA TAKASHI
IPC: G09F9/30 , G02F1/1343 , H01B5/14 , H01B13/00
Abstract: PROBLEM TO BE SOLVED: To provide a method of forming a transparent conductive film which enables a transparent conductive film having a low resistance and a high visible light transmittance to be formed by irradiating a coating film with plasma in the atmosphere without requiring heat treatment or an evacuated atmosphere and is advantageous in mass productivity and cost because of the use of a coating method, and to provide the transparent conductive film.
SOLUTION: The method of forming a transparent conductive film is characterized in that a coating film 7 is formed by coating a substrate 6 with conductive paint, and reaction gas is introduced onto the coating film 7 under an atmospheric pressure to make the reaction gas into plasma P, and the coating film 7 is irradiated with the plasma P to be modified, whereby a transparent conductive film 9 is formed on the substrate 6.
COPYRIGHT: (C)2006,JPO&NCIPIAbstract translation: 要解决的问题：提供一种形成透明导电膜的方法，该透明导电膜能够通过在大气中照射等离子体而不需要热量来形成具有低电阻和高可见光透射率的透明导电膜 处理或抽空气氛，并且由于使用涂布方法而在批量生产率和成本方面有利，并且提供透明导电膜。 解决方案：形成透明导电膜的方法的特征在于通过用导电涂料涂覆基底6而形成涂膜7，并将反应气体在大气压下引入涂膜7上以进行反应 气体进入等离子体P，并且涂覆膜7被照射待改性的等离子体P，由此在基板6上形成透明导电膜9.版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2006010421A
公开(公告)日：2006-01-12
申请号：JP2004185849
申请日：2004-06-24
Applicant: Gunma Prefecture , Kurita Seisakusho:Kk , 株式会社栗田製作所 , 群馬県
Inventor： YAMAMOTO RYOICHI , HAYASHI HIROSHI , INOUE KAZUHISA
Abstract: PROBLEM TO BE SOLVED: To solve the problem of a conventional technology wherein a microminiature needle used for a liquid spray nozzle, a nozzle for an ink jet printer or a painless needle does not satisfy all of mechanical strength, chemical stability and a low price. SOLUTION: This microminiature needle is characterized by forming at least its tip part from hard amorphous carbon. This manufacturing method of the microminiature needle has at least a process for forming a master model of the microminiature needle in the first material, a process for forming a mold of the microminiature needle in the second material, a process for depositing a hard amorphous carbon film on the mold comprising the second material, and a process for exfoliating a mold comprising the hard amorphous carbon film and the second material from the mold comprising the second material on which the hard amorphous carbon film is formed. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 解决的问题为了解决用于液体喷嘴的微型针，喷墨打印机的喷嘴或无痛针的常规技术的问题不能满足机械强度，化学稳定性和 低价。
解决方案：该微型针的特征在于至少从硬的无定形碳形成其尖端部分。 微型针的这种制造方法至少具有形成第一材料中的微型针的主模型的方法，第二材料中形成微型针的模具的方法，沉积硬质无定形碳膜的方法 在包含第二材料的模具上，以及从包含形成硬质非晶碳膜的第二材料的模具剥离包含硬质非晶碳膜和第二材料的模具的方法。 版权所有（C）2006，JPO＆NCIPI
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73.发明专利Power supply circuit for plasma generation, plasma generator, plasma treatment device, and target 有权用于等离子体生成的电源电路，等离子体发生器，等离子体处理装置和目标
公开(公告)号：JP2005293854A
公开(公告)日：2005-10-20
申请号：JP2004102452
申请日：2004-03-31
Applicant: Daiken Kagaku Kogyo Kk , Kurita Seisakusho:Kk , Hiroshi Takigawa , 大研化学工業株式会社 , 株式会社栗田製作所 , 浩史 滝川
Inventor： TAKIGAWA HIROSHI , NISHIMURA YOSHIMI , HARADA AKIO
IPC: H05H1/46 , H01L21/304 , H05H1/30 , H05H1/36
Abstract: PROBLEM TO BE SOLVED: To realize a power supply circuit for plasma generation, and a plasma generator capable of smoothly obtaining a plenty of generated plasma without having the device larger-sized, as well as a plasma treatment device capable of putting a plenty of treated objects under plasma treatment at low cost and a target item having target quality passing the plasma treatment, with the use of such a plasma generator. SOLUTION: An LC series circuit serially connecting a capacitor C and a coil L is provided between one of the outputs of an alternate high-voltage generating circuit generating alternate high voltage to be impressed between each electrode for discharge generation consisting of two or more first electrodes and one or more second electrodes and the above first electrodes. When discharge is generated at one of the electrode pairs, voltage fall is restrained by the coil even if discharge of the capacitor is progressed, and discharge by the other electrode pair is induced without being intervened, so that a plenty of plasma can be smoothly generated with a common use of the alternate high-voltage generating circuit. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 要解决的问题：为了实现等离子体产生的电源电路以及能够平滑地获得大量产生的等离子体而不使装置尺寸更大的等离子体发生器，以及能够放置等离子体处理装置 通过使用这种等离子体发生器，以低成本等离子体处理的大量处理对象和具有通过等离子体处理的目标质量的目标物品。 解决方案：串联连接电容器C和线圈L的LC串联电路设置在产生交替高压的交替高压产生电路的输出之间，以在每个用于放电产生的电极之间施加电压，由两个或 更多的第一电极和一个或多个第二电极和上述第一电极。 当在一个电极对上产生放电时，即使电容器的放电进行，线圈也抑制了电压下降，并且由于其它电极对的放电而被引入而不被介入，从而可以平稳地产生大量的等离子体 通常使用交替的高压发生电路。 版权所有（C）2006，JPO＆NCIPI
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75.发明专利Electrode for plasma generation, plasma generator, and plasma treatment device 审中-公开用于等离子体生成的电极，等离子体发生器和等离子体处理装置
公开(公告)号：JP2005285520A
公开(公告)日：2005-10-13
申请号：JP2004097172
申请日：2004-03-29
Applicant: Daiken Kagaku Kogyo Kk , Kurita Seisakusho:Kk , Hiroshi Takigawa , 大研化学工業株式会社 , 株式会社栗田製作所 , 浩史 滝川
Inventor： TAKIGAWA HIROSHI , NISHIMURA YOSHIMI , HARADA AKIO
CPC classification number: H01J37/32009 , H01J37/32541 , H05H1/48 , H05H2001/488
Abstract: PROBLEM TO BE SOLVED: To provide a plasma-generating electrode capable of stably and surely generating discharge between opposing electrodes and continuously generating plasma with ease, and to provide a plasma generator and a plasma treatment device. SOLUTION: On the plasma-generating electrode 4 for generating plasma between electrodes 4a, 4b, sharp protrusions 4g facing each other are formed at least on one electrode 4a of the electrode A so as to generate a discharge between the protrusion 4g and the electrode 4b at another side, and to generate a plasma. The sharp protrusions 4g may be formed in any shape. If only any fluid is made to flow from a flow feeder 7, required air plasma or liquid plasma can be generated. If a matter to be treated is treated with the plasma, a plasma device such as a film-forming device, a processing device, and a powder treatment device can be constituted. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 解决的问题：提供能够稳定且可靠地在相对电极之间产生放电并且容易地连续产生等离子体的等离子体产生电极，并且提供等离子体发生器和等离子体处理装置。 解决方案：在用于在电极4a，4b之间产生等离子体的等离子体产生电极4上，在电极A的至少一个电极4a上形成彼此面对的尖锐突起4g，以便在突起4g和 电极4b在另一侧，并产生等离子体。 尖锐的突起4g可以形成为任何形状。 如果只有任何流体从流动进料器7流出，则可以产生所需的空气等离子体或液体等离子体。 如果用等离子体处理待处理的物体，则可以构成诸如成膜装置，加工装置和粉末处理装置之类的等离子体装置。 版权所有（C）2006，JPO＆NCIPI
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Patent Agency Ranking
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公开(公告)号：JP3663208B2
公开(公告)日：2005-06-22
申请号：JP2004237512
申请日：2004-08-17
Applicant: 株式会社栗田機械製作所
Inventor： 篤 高嶋
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公开(公告)号：JP2004323973A
公开(公告)日：2004-11-18
申请号：JP2004112718
申请日：2004-04-07
Applicant: Kurita Seisakusho:Kk , 株式会社栗田製作所
Inventor： NISHIMURA YOSHIMI , YATSUKA MITSUYASU
IPC: C23C16/27
Abstract: PROBLEM TO BE SOLVED: To thickly and uniformly deposit a DLC (Diamond Like Carbon) film on the surface of a base material such as a low melting point alloy, copper, brass or the like with high adhesion while suppressing the increase of the temperature rise in the base material itself.
SOLUTION: A high frequency power source 11 for plasma generation and a power source 12 for high voltage pulse generation are connected to a superimposition apparatus 9. Further, the superimposition apparatus 9 is connected to a base material 1 in a chamber 2 via a common feed through 8, a high frequency pulse is applied to the base material 1 from a high frequency power source 11 for plasma generation, and a negative high voltage pulse is applied to the base material 1 from the power source 12 for high voltage pulse generation in the plasma or afterglow plasma.
COPYRIGHT: (C)2005,JPO&NCIPI-
公开(公告)号：JP3530606B2
公开(公告)日：2004-05-24
申请号：JP30832894
申请日：1994-11-17
Applicant: 株式会社栗田機械製作所
Inventor： 克勝 垣内
IPC: B01D25/12
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