A METHOD OF MANUFACTURE OF MICRO COMPONENTS, AND COMPONENTS FORMED BY SUCH A PROCESS
    74.
    发明公开
    A METHOD OF MANUFACTURE OF MICRO COMPONENTS, AND COMPONENTS FORMED BY SUCH A PROCESS 审中-公开
    用于生产微型元件,并通过这种方法生产的部件

    公开(公告)号:EP3134916A1

    公开(公告)日:2017-03-01

    申请号:EP15782575.3

    申请日:2015-04-22

    Abstract: A method of forming a multi-level component having a first surface portion a first level and a second surface portion of a second level different to the level of the first level, said method including the steps of forming at least one arrangement of micro trenches or an arrangement of micro pillars having a micro trench therebetween in a predetermined arrangement in a mask material by one or more lithography processes, wherein one or more of said micro trenches have a first aspect ratio and one or more of said micro trenches have a second aspect ratio different from said first aspect ratio; applying one or more etching processes to a surface of a component upon which said mask is applied, wherein the component is etched by an aspect ratio dependent etch (ARDE) process so as to form an arrangement of micro trenches and micro pillars between adjacent micro trenches; wherein one or more micro trenches corresponding to the micro trenches of the first aspect ratio is etched a first level from said surface of the component, and wherein one or more micro trenches corresponding to the micro trenches of the second aspect ratio is etched at a second level from said surface of the component and at different level to said fist level; and (iii) removing said arrangement of micro pillars from said component by a removal process; wherein upon removal of said micro pillars a first surface portion is formed at said first level and a second surface portion is formed at said second level, wherein the second surface portion is at a different level to that of the of the first surface portion.

    Abstract translation: 形成多级组件的方法包括:通过光刻工艺形成在掩模材料以预定排列微沟槽中的至少一个装置的步骤。 另一个步骤包括将一个或多个蚀刻工艺,以在其上掩模施加部件的表面。 所述微沟槽具有第一或第二不同的纵横比。 在所述施加步骤中,部件是通过在纵横比相关刻蚀(ARDE)工艺来蚀刻,从而形成微沟槽和相邻的微沟槽之间的微柱的布置。 另一个步骤包括通过去除工艺除去从组件微柱的布置。 因此,存在雅丁对上述方法与在第一级和与第一电平不同的电平进一步的另外的部分的第一部分的多级组件。

    SILICON HAIRSPRING
    75.
    发明公开
    SILICON HAIRSPRING 审中-公开
    SILICIUMSPIRALFEDER

    公开(公告)号:EP3056948A1

    公开(公告)日:2016-08-17

    申请号:EP16155566.9

    申请日:2016-02-12

    CPC classification number: C30B29/06 C30B33/12 G04B1/145 G04B17/066 G04B17/227

    Abstract: Slicon hairspring (100a) as a torque-restoring element for an oscillator for a mechanical timepiece and having an oscillator frequency, said torque restoring element comprising a spiral spring body (110a) having a number N turnings with an inner terminal end for engagement with a rotational inertial element via a collet, and an outer terminal end for engagement with a stationary cock element, and having a width (140a), a height (150a) and a total arc length; wherein the spiral spring body (110a) includes a core (180a) formed from mono-crystalline silicon wafer oriented along the crystallographic axis; and wherein the spiral spring body (110a) includes at least one peripheral coating (190a) of a material having a thermal elastic constant different from that of the core (180a) of the spiral spring body (110a) so as to maintain the oscillator frequency of an oscillator including the torque-restoring element substantially insensitive to variations of ambient temperature.

    Abstract translation: 斜面游丝(100a)作为用于机械钟表的振荡器的扭矩恢复元件并且具有振荡器频率,所述扭矩恢复元件包括螺旋弹簧体(110a),该螺旋弹簧体(110a)具有内部终端,用于与 旋转惯性元件,以及用于与固定旋塞元件接合的外终端,并且具有宽度(140a),高度(150a)和总弧长度; 其中所述螺旋弹簧体(110a)包括由沿着所述结晶轴取向的单晶硅晶片形成的芯(180a) 并且其中所述螺旋弹簧体(110a)包括具有与所述螺旋弹簧体(110a)的所述芯(180a)的热弹性常数不同的热弹性常数的材料的至少一个周边涂层(190a),以便保持所述振荡器频率 包括基本上对环境温度变化不敏感的扭矩恢复元件的振荡器。

    Stress-Relief Elastic Structure of Hairspring Collet
    76.
    发明公开
    Stress-Relief Elastic Structure of Hairspring Collet 有权
    Elastische Entspannungsstruktur einerHaarfederspannbüchse

    公开(公告)号:EP2755093A2

    公开(公告)日:2014-07-16

    申请号:EP14151118.8

    申请日:2014-01-14

    CPC classification number: G04B17/345

    Abstract: A hairspring collet for a hairspring for interference engagement and an interference fit with the cylindrical outer surface of the staff of a balance wheel for a timepiece movement, said hairspring collet portion comprising a plurality of circumferentially extending elastically deformable interconnected arm portions, the arm portions forming an annulus having a central axis and providing an aperture therebetween, wherein each arm portion including a curved concave engagement portion for engagement with the outer surface of a staff of a balance wheel, wherein each engagement portion has substantially the same radius of curvature as each other and are equally spaced from said central axis at a first distance and wherein said first distance is less than the radius of the staff of the balance wheel; said engagement portions have a radius of curvature such that upon deformation of the arm portions and engagement with the outer surface of said staff the engagement portions substantially conform with the outer surface of said staff and an interference fit is formed therebetween, wherein stress induced from said interference fit is transferred and distributed from along the engagement portions to the arm portions adjacent the engagement portions and distributed therein; and wherein the interference fit of the engagement portions with the staff substantially prevents relative movement between the hairspring collet and the staff of the balance wheel upon application of load from a hairspring in use in a timepiece movement.

    Abstract translation: 一种用于干扰接合的游丝的游丝夹头和与用于钟表运动的摆轮的工作人员的圆柱形外表面的过盈配合,所述游丝夹头部分包括多个周向延伸的可弹性变形的互连臂部分,所述臂部分形成 具有中心轴线并在其间提供孔的环,其中每个臂部分包括用于与摆轮的工作人员的外表面接合的弯曲凹入接合部分,其中每个接合部分具有彼此基本相同的曲率半径 并且在第一距离处与所述中心轴线等距间隔,并且其中所述第一距离小于所述摆轮的所述工作人员的半径; 所述接合部分具有曲率半径,使得当臂部分变形并且与所述人员的外表面接合时,接合部分基本上与所述人员的外表面一致,并且在其间形成过盈配合,其中由所述 过盈配合从接合部分转移并分布到邻近接合部分的臂部分并分布在其中; 并且其中所述接合部分与所述人员的所述过盈配合基本上防止在使用手表运动中施加来自游丝的负载时,游丝夹头和摆轮的人员之间的相对运动。

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