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    FILTERING APPARATUS
    72.
    发明申请
    FILTERING APPARATUS 审中-公开
    过滤装置

    公开(公告)号：WO1995025580A1

    公开(公告)日：1995-09-28

    申请号：PCT/GB1995000626

    申请日：1995-03-21

    Applicant: SCAPA GROUP PLC ,  JOHNSON, Joe

    Inventor： SCAPA GROUP PLC

    IPC: B01D46/42

    CPC classification number: B01D46/02 ,  B01D29/27 ,  B01D2271/02

    Abstract: A filtering apparatus comprises a bag or sleeve connected to a profiled resilient band (10, 20). The band is operative to sealingly engage an aperture (13, 26) in a further body (16, 27). The profiled band (10, 20) has a one piece construction.

    Abstract translation: 过滤装置包括连接到成型弹性带（10,20）的袋或套筒。 所述带可操作以密封地接合在另一主体（16,27）中的孔（13,26）。 型材带（10,20）具有一体式结构。

    PAPERMACHINE CLOTHING
    73.
    发明申请
    PAPERMACHINE CLOTHING 审中-公开
    PAPERMACHINE衣服

    公开(公告)号：WO1995016820A1

    公开(公告)日：1995-06-22

    申请号：PCT/GB1994002731

    申请日：1994-12-14

    Applicant: SCAPA GROUP PLC ,  VALENTINE, Craig ,  SAYERS, Ian, Christison

    Inventor： SCAPA GROUP PLC

    IPC: D21F03/02

    CPC classification number: D21F3/0227 ,  B29D29/00 ,  B29L2031/733

    Abstract: A method of making a shoe press belt comprises the step of feeding a base cloth (13) over a rotating drum (11) and applying a polymer coating to the base cloth (13), as the base cloth (13) is fed over the rotating drum (11). The polymer coating is impregnated with a fused silica or aramid thixotrope.

    Abstract translation: 制造靴形压榨带的方法包括以下步骤：将基布（13）送到旋转的滚筒（11）上并将聚合物涂层施加到基布（13）上，当基布（13）被馈送到 旋转鼓（11）。 聚合物涂层用熔融石英或芳族聚酰胺触变剂浸渍。

    PAPERMAKER'S FABRICS
    75.
    发明申请
    PAPERMAKER'S FABRICS 审中-公开

    公开(公告)号：WO1989012717A1

    公开(公告)日：1989-12-28

    申请号：PCT/GB1989000681

    申请日：1989-06-16

    Applicant: SCAPA GROUP PLC ,  SUDRE, Paul, Louis

    Inventor： SCAPA GROUP PLC

    IPC: D21F01/00

    CPC classification number: D21F1/0054

    Abstract: A method for the manufacture of a papermaker's fabric is proposed which involves the provision of a multiply fabric having fold regions (15, 16) at its respective ends and the removal of cross-machine direction yarns (14) in such fold regions thereby to create seam-forming loops (17, 18). The loops (17, 18) may be interdigitated directly to receive a pintle wire into engagement therewith and thus form a seam, or may receive a spiral for seam-forming purposes. The method is of application to flat-woven or endless woven structures, and is of use in the manufacture not only of papermaker's fabrics per se but also in the manufacture of base materials for use therein.

    PRESSURE SENSITIVE ADHESIVE TAPE
    76.
    发明授权
    PRESSURE SENSITIVE ADHESIVE TAPE 失效
    压敏胶带

    公开(公告)号：EP0839169B1

    公开(公告)日：2004-09-22

    申请号：EP96925866.4

    申请日：1996-07-29

    Applicant: SCAPA GROUP PLC

    Inventor： RICHARDSON, Peter, James ,  SALTHOUSE, Peter, William ,  PRESTON, Joseph ,  STEWART, Edward, John

    IPC: C09J7/02 ,  C08L23/02 ,  C09J123/02

    CPC classification number: C08L23/02 ,  C08L2666/04 ,  C09J7/243 ,  C09J7/245 ,  C09J123/02 ,  C09J2203/302 ,  C09J2423/006 ,  C09J2431/006 ,  Y10T428/28

    Abstract: PURPOSE: To obtain a polyolefin resin composition excellent in heat and aging resistances and useful for films for self-adhesive tape substrates of good workability by mixing a base comprising a specified olefin resin with a high-mol. wt. hindered phenol antioxidant and a zinc compound.CONSTITUTION: A resin composition prepared by mixing 100 pts. wt. resin base comprising at least one member selected from among a polyethylene, an ethylene/vinyl acetate copolymer, an ethylene/alkyl acrylate copolymer, an ethylene/alpha-olefin copolymer and a mixture thereof with 0.1-10 pts. wt. high-mol. wt hindered phenol antioxidant and 1-20 pts. wt. zinc compound. Examples of the zinc compound to be used are desirably inorganic compounds and include zinc borate and zinc oxide. As the high-mol. wt. hindered phenol antioxidant, one having a mol. wt. of 500 or above is particularly desirable from the viewpoint of nonblooming properties, etc.

    BELT FOR POLISHING SEMICONDUCTORS
    77.
    发明公开
    BELT FOR POLISHING SEMICONDUCTORS 有权
    半导体抛光带

    公开(公告)号：EP1126952A1

    公开(公告)日：2001-08-29

    申请号：EP99950961.5

    申请日：1999-10-22

    Applicant: SCAPA GROUP PLC

    Inventor： LOMBARDO, Brian

    IPC: B24D11/00 ,  B24B37/04 ,  B24B21/04

    CPC classification number: B24B37/11 ,  B24B21/04 ,  B24D11/005 ,  B24D11/06

    Abstract: An improved belt for mechanical polishing of semiconductor wafers, which belt maintains a substantially flat surface in the span between its mounting surfaces. The belt has at least one polymer layer including a polishing layer, and at least one woven or non-woven supporting layer. The symmetrical properties of the belt are arranged to achieve a balance between down-cupping and up-cupping forces exerted on the belt in the span between its mounting in order to prevent the edges of the belt cupping up or down.

    TISSUE MARKING FABRIC
    78.
    发明公开
    TISSUE MARKING FABRIC 审中-公开
    包布纸标记

    公开(公告)号：EP1108086A1

    公开(公告)日：2001-06-20

    申请号：EP99940402.3

    申请日：1999-08-24

    Applicant: SCAPA GROUP PLC

    Inventor： HAY, Stewart

    IPC: D21F11/00 ,  D21F1/00

    CPC classification number: D21F11/006 ,  D21F1/0027 ,  D21F1/0036

    Abstract: A tissue marking fabric comprises at least two warp yarn systems (5, 6) and one or two weft yarn systems (3, 4). The warp yarn systems are interlaced at spaced intervals, and extensive floats are provided either in the upper weft yarn system (3) extending in the cross-machine direction, or in the upper warp yarn system (14).

    Woven fabrics
    80.
    发明公开
    Woven fabrics 审中-公开
    组织

    公开(公告)号：EP0964089A3

    公开(公告)日：2000-10-18

    申请号：EP99304551.7

    申请日：1999-06-10

    Applicant: SCAPA GROUP PLC

    Inventor： Garon, Michel ,  Ross, Gilbert ,  Boily, Robert

    IPC: D03D11/00 ,  D21F1/00

    CPC classification number: D21F1/0054 ,  D21F1/0036

    Abstract: A woven fabric comprises at least two layers (10,12) of cross-machine direction yarns, one layer (10) having yarns (11) of larger dimensions, e.g. diameter, and the other layer (12) having yarns (13) of smaller dimensions and/or 'shaped' (i.e. of non-circular cross-section). A seaming spiral (18) is connected to the fabric by a seam binding yarn (19) secured by at least some machine-direction yarns being looped about the seam binding yarn (19). The final yarn (14) of the layer of smaller dimensioned or shaped yarns (13) is displaced towards the opposite side of the fabric. The last two larger dimensioned yarns (15,16) may be displaced towards the smaller dimensioned or shaped yarn layer (12), and the third yarn (17) of the larger dimensioned yarn layer may have an intermediate diameter.

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