公开(公告)号：US09366972B2

公开(公告)日：2016-06-14

申请号：US14701236

申请日：2015-04-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

IPC: G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

Abstract translation: 光刻投影装置包括用于保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案来图案化辐射束; 投影系统，用于将图案化的光束投影到基板的目标部分上; 衬底台，其被配置为保持所述衬底，所述衬底台包括支撑表面，以支撑所述投影系统与所述衬底和位于所述衬底台上的物体中的至少一个之间的中间板，并且不与所述衬底台中的至少一个接触 基材和物体; 以及液体供应系统，用于在投影系统和至少一个基板和物体之间的空间中提供待投射光束的液体。

公开(公告)号：US20150261102A1

公开(公告)日：2015-09-17

申请号：US14701236

申请日：2015-04-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

Abstract translation: 光刻投影装置包括用于保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案来图案化辐射束; 投影系统，用于将图案化的光束投影到基板的目标部分上; 衬底台，其被配置为保持所述衬底，所述衬底台包括支撑表面，以支撑所述投影系统与所述衬底和位于所述衬底台上的物体中的至少一个之间的中间板，并且不与所述衬底台中的至少一个接触 基材和物体; 以及液体供应系统，用于在投影系统和至少一个基板和物体之间的空间中提供待投射光束的液体。

公开(公告)号：US09128390B2

公开(公告)日：2015-09-08

申请号：US14542263

申请日：2014-11-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H02P25/06

CPC classification number: G03F7/70725 ,  G03F7/70716 ,  G05B19/418 ,  H02P25/06 ,  Y02P90/04

Abstract: A multi-stage system includes a stator including a plurality of electric coils; a first stage including a first magnet assembly, the first stage moveable relative to the stator; a second stage including a second magnet assembly, the second stage moveable relative to the stator; a controller configured to position the first and the second stage relative to the stator by activating, respectively, a first subset of the plurality of electric coils to interact with the first magnet assembly and a second subset of the plurality of electric coils to interact with the second magnet assembly, the controller adapted to prevent at least one electric coil, to be simultaneously shared by the first and the second subset to position the first and the second stage on the stator, from activating.

Abstract translation: 多级系统包括：定子，其包括多个电线圈; 第一级包括第一磁体组件，所述第一级可相对于所述定子移动; 第二级包括第二磁体组件，所述第二级相对于所述定子可移动; 控制器，被配置为通过分别激活多个电线圈的第一子集来与第一磁体组件和多个电线圈的第二子集相互作用来相对于定子来定位第一和第二阶段， 第二磁体组件，所述控制器适于防止至少一个电线圈被所述第一和第二子集同时共享以将所述第一和第二平台定位在所述定子上，从而不启动。

公开(公告)号：US20140293251A1

公开(公告)日：2014-10-02

申请号：US14305110

申请日：2014-06-16

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Hendrik Koevoets ,  Marco Hendrikus Hermanu Oude Nijhuis ,  Robertus Leonardus Tousain ,  Marc Wilhelmus Maria Van Der Wijst ,  Cornelius Adrianus Lambertus De Hoon

IPC: G03F9/00

CPC classification number: G03F9/7096 ,  G03F7/70516 ,  G03F7/7055

Abstract: A projection system is provided that includes a sensor system that measures at least one parameter that relates to the physical deformation of a frame that supports the optical elements within the projection system, and a control system that, based on the measurements from the sensor system, determines an expected deviation of the position of the beam of radiation projected by the projection system that is caused by the physical deformation of the frame.

Abstract translation: 提供一种投影系统，该投影系统包括测量与支撑投影系统内的光学元件的框架的物理变形有关的至少一个参数的传感器系统;以及控制系统，其基于来自传感器系统的测量结果， 确定由框架的物理变形引起的由投影系统投射的辐射束的位置的预期偏差。

公开(公告)号：US20140043596A1

公开(公告)日：2014-02-13

申请号：US14059296

申请日：2013-10-21

Applicant: ASML Netherlands B.V. ,  Carl Zeiss SMT GmbH

Inventor： Juergen Fischer ,  Ulrich Schoenhoff ,  Bernhard Geuppert ,  Hans Butler ,  Robertus Johannes Marinus De Jongh

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70825 ,  G03F7/709

Abstract: An arrangement actuates an element in a microlithographic projection exposure apparatus. The arrangement includes first and second actuators and first and second mechanical couplings. The first and second actuators are coupled to the element via corresponding ones of the first and second mechanical couplings for applying respective forces to the element which is regulatable in at least one degree of freedom. The first and second actuators have first and second actuator masses, respectively, and the first actuator mass and the first mechanical coupling conjointly define a first mass-spring system operating as a first low-pass filter. The second actuator mass and the second mechanical coupling conjointly define a second mass-spring system operating as a second low-pass filter. The first and second mass-spring systems have first and second natural frequencies deviating from each other by a maximum deviation equal to 10% of the largest of the first and second natural frequencies.

Abstract translation: 一种布置致动微光刻投影曝光装置中的元件。 该装置包括第一和第二致动器以及第一和第二机械联接器。 第一和第二致动器通过第一和第二机械联接器中的相应的一个耦合到元件，用于向至少一个自由度可调节的元件施加相应的力。 第一和第二致动器分别具有第一和第二致动器质量块，并且第一致动器质量块和第一机械耦合联合地限定作为第一低通滤波器操作的第一质量弹簧系统。 第二致动器质量和第二机械耦合联合地限定作为第二低通滤波器操作的第二质量弹簧系统。 第一和第二质量弹簧系统具有第一和第二固有频率彼此偏离最大偏差等于第一和第二固有频率中最大值的10％。