公开(公告)号：DE4111283A1

公开(公告)日：1992-10-15

申请号：DE4111283

申请日：1991-04-08

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BINDER HORST ,  FUNHOFF DIRK DR

IPC: C08K5/42 ,  C08K5/51 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

公开(公告)号：DE3869799D1

公开(公告)日：1992-05-14

申请号：DE3869799

申请日：1988-01-22

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BINDER HORST

IPC: G03C1/72 ,  C08F20/34 ,  C08F30/08 ,  C08F220/26 ,  C08F220/36 ,  C08F222/22 ,  C08F230/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/095 ,  G03F7/11 ,  H01L21/027 ,  H01L21/30

Abstract: New copolymers (I) contain: (a) 5-50 (mole)% alpha-(o-nitro(het)aryl)-(ar)alkyl unsatd. carboxylate ester(s) of formula (II), where A = an opt. substd. 5-14 membered aromatic or hetero-aromatic ring system; X = H, 1-8C alkyl, opt. substd. aryl or aralkyl; Y = a 2-6C ethylenically unsatd. gp.; (b) 95-50% copolymerisable olefinically unsatd. organic cpd(s). (III) contg. Si; (c) 0-20% copolymerisable 3-6C olefinically unsatd. carboxylic acid(s) (IV) and (d) 0-25% other olefinically unsatd. organic comonomer(s) (V) forming homopolymers transparent at 250-400 nm, so that (I) have a Si content of over 6 wt.%. (II) can be prepd. by reacting the acid chloride with o-nitrocarbinols or by direct acid-catalysed esterification (see e.g. DE 2150691)

公开(公告)号：AT74611T

公开(公告)日：1992-04-15

申请号：AT88100892

申请日：1988-01-22

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BINDER HORST

IPC: G03C1/72 ,  C08F20/34 ,  C08F30/08 ,  C08F220/26 ,  C08F220/36 ,  C08F222/22 ,  C08F230/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/095 ,  G03F7/11 ,  H01L21/027 ,  H01L21/30

公开(公告)号：AU604932B2

公开(公告)日：1991-01-03

申请号：AU1861288

申请日：1988-07-01

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS ,  BINDER HORST

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L61/08 ,  C08L61/10 ,  C08L25/18 ,  C08L33/10 ,  C08K5/36 ,  C08K5/49 ,  C08K5/54 ,  C08K5/55 ,  C08K5/59 ,  C08K5/00 ,  G03C1/73 ,  G03F7/30

Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

公开(公告)号：DE3841437A1

公开(公告)日：1990-06-13

申请号：DE3841437

申请日：1988-12-09

Applicant: BASF AG

Inventor： NGUYEN KIM SON DR ,  HOFFMANN GERHARD DR ,  SCHWALM REINHOLD DR ,  BINDER HORST ,  SCHUHMACHER RUDOLF DR

IPC: B41M5/26 ,  G03F7/004 ,  G03F7/039 ,  G11B7/00 ,  G11B7/004 ,  G11B7/24

公开(公告)号：DE3827567A1

公开(公告)日：1990-02-22

申请号：DE3827567

申请日：1988-08-13

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BINDER HORST

IPC: G03F7/32

Abstract: The invention relates to an aqueous developer solution for positively acting photoresists and also to a development process. The water-soluble basic compound contained in the developer solution is a compound of the general formula (I): … … where R to R are mutually identical or different and are H, OH, hydroxyalkyl, alkoxy or alkyl. … They are suitable for the development of positively acting photoresists.

公开(公告)号：DE3725134A1

公开(公告)日：1989-02-09

申请号：DE3725134

申请日：1987-07-29

Applicant: BASF AG

Inventor： STEININGER HELMUT DR ,  BINDER HORST

IPC: B41M5/26 ,  G11B7/24 ,  G11B7/241 ,  G11B7/244 ,  G11B7/246 ,  G11B7/253 ,  G11B7/2534 ,  G11B7/257 ,  G11B7/2578 ,  G11B7/26

Abstract: A recording material which has… a) a dimensionally stable, optically transparent substrate which is composed of plastics and has a structured surface,… b) an intermediate layer which is present thereon, is insoluble in organic solvents and acts as a diffusion barrier with respect to the latter and, on said intermediate layer,… c) an amorphous, thermally alterable recording layer which can be produced by application from a solution and drying and contains dyes, and the intermediate layer (b) of which… b1) is 5 to 95 nm thick and, based in each case on (b), consists of… b2) 88 to 99.5% by weight of oxides and/or hydrated oxides of one or more of the elements from the group consisting of titanium, zirconium, hafnium, thorium, vanadium, niobium, tantalum, tungsten, aluminium, gallium, indium, silicon, germanium and tin and of… b3) 0.5 to 12% by weight of hydrocarbon radicals, and… b4) can be produced by dissolving an alkoxide or several alkoxides of one or more of the above-mentioned elements in a polar liquid medium essentially containing C1- to C6-alkanols, applying this solution to the surface of the substrate (a) and heating the moist layer obtained in this manner in the presence of water at 50 to 120 DEG C for 5 minutes to 2 hours, and a process for the production of the recording material.

公开(公告)号：AU1861288A

公开(公告)日：1989-01-05

申请号：AU1861288

申请日：1988-07-01

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BOETTTCHER ANDREAS ,  BINDER HORST

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L61/08 ,  C08L61/10 ,  C08L25/18 ,  C08L33/10 ,  G03C1/727 ,  C08K5/36 ,  C08K5/49 ,  C08K5/54 ,  C08K5/55 ,  C08K5/59 ,  C08K5/00 ,  G03F7/26

Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

公开(公告)号：DE102004060122A1

公开(公告)日：2006-06-14

申请号：DE102004060122

申请日：2004-12-13

Applicant: BASF AG

Inventor： JOKISCH CARL ,  BRUCHMANN BERND ,  WOELFERT ANDREAS ,  BEY OLIVER ,  BAYER ALEXANDER ,  BINDER HORST

IPC: C07D251/30

Abstract: Preparation of pale yellow isocyanurate group (I) containing polyisocyanate based on (cyclo)aliphatic isocyanate with a free isocyanate groups (10-25 wt.%) and a remaining monomer (less than 1 wt.%) comprises partial trimerization of (cyclo)aliphatic isocyanate in the presence of at least one catalyst (where the (cyclo)aliphatic isocyanate with less bromine (less than 15 mg/kg) is used for trimerisation).

公开(公告)号：DE102004060121A1

公开(公告)日：2006-06-14

申请号：DE102004060121

申请日：2004-12-13

Applicant: BASF AG

Inventor： JOKISCH CARL ,  BRUCHMANN BERND ,  WOELFERT ANDREAS ,  BEY OLIVER ,  BAYER ALEXANDER ,  BINDER HORST ,  WAGNER EVA

IPC: C07D251/30

Abstract: Continuous method for partial oligomerisation of isocyanates comprises using at least a catalyst (a), which exhibits a content of hydrolyzable halogen of less than 1 wt.%. An independent claim is also included for a preparation of polyisocyanate comprising reacting tertiary amine with an epoxide or an alkyl or a aralkylhalogenide, -sulfate or -carbonate; optionally purifying the obtained reaction mixture with a total content of halogen of less than 1 wt.%; optionally dissolving or dispersing the obtained reaction mixture with a solvent; mixing the quaternary ammonium salt from the above steps with at least an isocyanate; converting the obtained reaction mixture; terminating the reaction; and distillatively purifying the obtained reaction mixture for separating the reacted isocyanate.