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公开(公告)号:ZA7401172B
公开(公告)日:1975-01-29
申请号:ZA7401172
申请日:1974-02-22
Applicant: HOECHST AG
Inventor: KINSTMANN R , GRANZER E
IPC: A61K31/47 , C07D217/22 , C07D217/24 , C07D221/20 , C07D
CPC classification number: C07D221/20 , A61K31/47 , C07D217/22 , C07D217/24
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公开(公告)号:ZA739328B
公开(公告)日:1974-10-30
申请号:ZA739328
申请日:1973-12-07
Applicant: HOECHST AG
IPC: C07D233/60 , C07D235/06 , C07D521/00 , C07D49/36
Abstract: Compounds of the formula IN WHICH R1 and R2 each stands for a hydrogen atom or together they stand for the group -CH=CH-CH=CH- which may carry one or more lower alkyl, halogeno-alkyl or alkoxy groups, halogen atoms or NO2-groups, and R3 and R4, independently of one another, each stands for a hydrogen atom, a lower alkyl, halogeno-alkyl, alkoxy or halogeno-alkoxy group, a halogen atom or NO2 or together they stand as a -CH=CH-CH=CH- group with the benzene nucleus for the naphthyl group, AND PHYSIOLOGICALLY ACCEPTABLE ACID ADDITION SALTS THEREOF, PROCESS FOR PREPARING THEM AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM AS ACTIVE SUBSTANCE.
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公开(公告)号:ZA7209141B
公开(公告)日:1973-09-26
申请号:ZA7209141
申请日:1972-12-28
Applicant: HOECHST AG
IPC: C07D233/54 , C07D233/64 , C07D235/12 , C07D235/18 , C07D235/20 , C07D
CPC classification number: C07D233/64 , C07C2603/18 , C07D235/12 , C07D235/18 , C07D235/20
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公开(公告)号:ZA725997B
公开(公告)日:1973-07-25
申请号:ZA725997
申请日:1972-08-31
Applicant: HOECHST AG
Inventor: KUNSTANN R , GRANZER E , SEIDL G
IPC: C07D217/22 , C07D217/24 , C07D221/20 , C07D317/58 , C07D491/056 , C07D
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