公开(公告)号：JPH11228637A

公开(公告)日：1999-08-24

申请号：JP5269398

申请日：1998-02-19

Applicant: JSR CORP

Inventor： KAJITA TORU ,  SUWA MITSUFUMI ,  IWAZAWA HARUO ,  YAMAMOTO MASASHI

IPC: C08F222/06 ,  C08F232/08

Abstract: PROBLEM TO BE SOLVED: To obtain the subject copolymer having alicyclic groups and acid- cleavable polar organic groups, having high radiation penetrability, excellent dry etching resistance, excellent adhesivity, etc., and useful for optical materials, electronic materials, etc. SOLUTION: This polar norbornene derivative/maleic anhydride copolymer comprises repeating units of formula I (X and Y are each H or a 4-20C acid- cleavable organic group; A and B are each H or a 1-4C alkyl) preferably in an amount of 60-40 mol.% and repeating units of formula II preferably in an amount of 40-60 mol.%, and has a polystyrene-converted weight-average mol.wt. of 1,000-1,000,000. The copolymer is obtained by radically copolymerizing at least one kind of norbornene derivative of formula III [for example, 8-t- butoxycarbonyltetracyclo(4.4.0.1 , .1 , )dodeca-3-ene] with maleic anhydride and, if necessary, one or more other copolymerizable unsaturated compound [for example, bicyclo(2.2.1)hept-2-enel.

公开(公告)号：JPH11202491A

公开(公告)日：1999-07-30

申请号：JP1829098

申请日：1998-01-16

Applicant: JSR CORP

Inventor： SUWA MITSUFUMI ,  IWAZAWA HARUO ,  YAMAMOTO MASASHI ,  KAJITA TORU

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin compsn. having high transparency to radiation and satisfactory dry etching resistance as a chemical amplification type resist. SOLUTION: The radiation sensitive resin compsn. contains a polymer contg. repeating units derived from a norbornene deriv. typified by 8-t- butoxycarbonyltetracyclo[4,4,0,1 ,1 ]norbornene, a radiation sensitive acid generating agent and an androstane-17-carboxylic-ester compd. typified by t- butoxycarbonylmethyl deoxycholate. In the formula, A and B are each H or an acid dissociable

公开(公告)号：JPH10232490A

公开(公告)日：1998-09-02

申请号：JP34733097

申请日：1997-12-03

Applicant: JSR CORP

Inventor： SUWA MITSUFUMI ,  IWAZAWA HARUO ,  KAJITA TORU ,  IWANAGA SHINICHIRO

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide the positive or negative radiation sensitive resin composition especially high in sensitivity and superior in resolution and pattern profiles and the like. SOLUTION: The positive photoresist resin composition contains (A) a compound represented by the formula [in which each of R and R is an alkyl group; R is a hydroxy or -OR group; R is a univalent organic group; (a) is an integer of 4-7; and (b) is an integer of 1-7] and (B1) a resin having an acid-dissociable group, or (A) and (B2) an alkali-soluble resin and an alkali- solubility controller. The negative photoresist resin composition contains (A) and (C) an alkali-soluble resin and (D) a cross-linking agent.

公开(公告)号：JP2012194290A

公开(公告)日：2012-10-11

申请号：JP2011057284

申请日：2011-03-15

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： TAKASE HIDEAKI ,  ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/027 ,  G02B5/20 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a cured film capable of forming a cured film having excellent surface curability and deep curability even in the case of using an ultraviolet curing apparatus of an ultraviolet LED curing system while suppressing sublimation of a photopolymerization initiator.SOLUTION: A method for forming a cured film comprises (1) a step of coating a radiation-sensitive resin composition on a substrate to form a coated film, (2) a step of exposing the coated film through a photomask, (3) a step of developing the exposed coated film and (4) a step of heating the developed coated film. The radiation sensitive resin composition contains [A] an alkali-soluble resin, [B] a polymerizable compound having an ethylenically unsaturated bond, [C] a photopolymerization initiator and [D] an acid generator, and in the above step (2), the coated film is exposed using an ultraviolet LED as a light source.

Abstract translation: 解决问题的方法：即使在使用紫外线LED固化系统的紫外线固化装置的同时抑制升华的紫外线固化装置的情况下，提供一种能够形成具有优异的表面固化性和深度固化性的固化膜的固化膜的方法 光聚合引发剂。 解决方案：一种形成固化膜的方法包括（1）在基材上涂布辐射敏感性树脂组合物以形成涂膜的步骤，（2）通过光掩模使涂布膜曝光的步骤（ 3）显影曝光的涂膜的步骤和（4）加热显影的涂膜的步骤。 辐射敏感性树脂组合物含有[A]碱溶性树脂，[B]具有烯属不饱和键的聚合性化合物，[C]光聚合引发剂和[D]酸产生剂，在上述步骤（2）中， 使用紫外线LED作为光源曝光涂膜。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2009204864A

公开(公告)日：2009-09-10

申请号：JP2008046790

申请日：2008-02-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HAMADA KENICHI ,  ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/023 ,  C08F212/14 ,  C08F220/04 ,  C08F220/28 ,  C08F222/04 ,  G02B1/04 ,  G02B3/00 ,  G03F7/022 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which has high radiation sensitivity and enables a patterned thin film excellent in adhesion to be easily formed. SOLUTION: The radiation-sensitive resin composition includes: [A] a copolymer of (a1) at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a2) a copolymer of an unsaturated compound comprising at least one selected from the group consisting of unsaturated compounds having an oxetanyl group and unsaturated compounds having the oxetanyl group; and [B] a 1,2-quinonediazide compound having a specific structure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有高辐射灵敏度的辐射敏感性树脂组合物，并且能够容易地形成粘附性优异的图案化薄膜。 解决方案：辐射敏感性树脂组合物包括：[A]（a1）选自不饱和羧酸和不饱和羧酸酐中的至少一种的共聚物和（a2）不饱和化合物的共聚物，其包含 选自由具有氧杂环丁烷基的不饱和化合物和具有氧杂环丁烷基的不饱和化合物组成的组中的至少一种; 和[B]具有特定结构的1,2-醌二叠氮化合物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007126647A

公开(公告)日：2007-05-24

申请号：JP2006273676

申请日：2006-10-05

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAJITA TORU ,  KAWAMOTO TATSUYOSHI ,  MATSUMOTO TATSU

IPC: C08L101/06 ,  C08K5/1525 ,  C08L63/00 ,  C09D7/12 ,  C09D201/06 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a curable resin composition forming a protective film having excellent adhesiveness to a substrate or an underlying or an upper layer, suppressing formation of sublimates during baking of a step of forming the film, satisfying high heat resistance and high surface hardness and having excellent load resistance while heating and performances flattening the difference in level of a color filter formed on the underlying substrate. SOLUTION: A radiation-sensitive resin composition comprises (A) a polymer polymerized in the presence of a specific thiocarbonylthio compound by living radical polymerization and having ≤1.7 ratio (Mw/Mn) of the weight-average molecular weight (Mw) to the number-average molecular weight (Mn) and expressed in terms of polystyrene measured by a gel permeation chromatography and (B) a cationically polymerizable compound. (A) The polymer has carboxy groups or oxiranyl groups or oxetanyl groups. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决问题的方案：提供形成对基材或下层或上层具有优异粘合性的保护膜的固化性树脂组合物，抑制在形成膜的步骤的烘烤期间升华的形成，满足高耐热性 并具有高的表面硬度，并且在加热时具有优异的负载电阻，并使性能平坦化形成在下面的基底上的滤色器的水平差。 解决方案：辐射敏感性树脂组合物包含（A）通过活性自由基聚合在特定硫代羰基硫代化合物存在下聚合的聚合物，其重均分子量（Mw）≤1.7（Mw / Mn） 至数均分子量（Mn），以凝胶渗透色谱法测定的聚苯乙烯换算，（B）阳离子聚合性化合物。 （A）聚合物具有羧基或环氧乙烷基或氧杂环丁烷基。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007102071A

公开(公告)日：2007-04-19

申请号：JP2005294721

申请日：2005-10-07

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAJITA TORU ,  KAWAMOTO TATSUYOSHI ,  MATSUMOTO TATSU

IPC: G03F7/038 ,  C08F2/38 ,  G02B1/04 ,  G02B3/00 ,  G03F7/023

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition, having high radiation sensitivity and a development margin that can form proper pattern profile, even after the lapse of the optimum developing time in a developing step, capable of easily forming a patterned thin film that is superior in adhesion, capable of reducing a sublimate generated in baking, and of being suitable for forming an interlayer insulation film and microlenses. SOLUTION: The radiation-sensitive resin composition contains (A) a polymer having carboxyl and epoxy groups, wherein the ratio (Mw/Mn) of the weight average molecular weight (Mw) of the polymer (expressed in terms of polystyrene) to the number average molecular weight (Mn) (expressed in terms of polystyrene) measured by gel permeation chromatography is ≤1.7, and (B) a 1,2- quinonediazido compound. A living radical polymerization for producing the polymer (A) is a polymerization that uses a specific thiocarbonyl thio compound as a molecular weight control agent. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：即使在显影步骤中经过最佳显影时间之后，提供具有高辐射敏感性和显影边缘的辐射敏感性树脂组合物，其能够容易地形成 一种图案化的薄膜，其粘合性优异，能够减少烘烤中产生的升华，并且适于形成层间绝缘膜和微透镜。 解决方案：辐射敏感性树脂组合物含有（A）具有羧基和环氧基的聚合物，其中聚合物的重均分子量（Mw）（以聚苯乙烯换算）的比（Mw / Mn） 通过凝胶渗透色谱法测定的数均分子量（Mn）（以聚苯乙烯表示）为≤1.7，（B）1,2-醌二叠氮化合物。 用于制备聚合物（A）的活性自由基聚合是使用特定硫代羰基硫代化合物作为分子量控制剂的聚合。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007102070A

公开(公告)日：2007-04-19

申请号：JP2005294720

申请日：2005-10-07

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAJITA TORU ,  KAWAMOTO TATSUYOSHI ,  MATSUMOTO TATSU

IPC: G03F7/038 ,  G02F1/1339

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high sensitivity and high resolution, capable of easily forming a patterned thin film that is superior in various performances such as pattern profile, compressive strength, rubbing resistance and adhesion to a transparent substrate, and capable of suppressing generation of a sublimate in baking, spacers formed from the composition, and to provide a method for forming the spacers. SOLUTION: The radiation-sensitive resin composition contains (A) a polymer having carboxyl and epoxy groups, wherein the ratio (Mw/Mn) of the weight average molecular weight (Mw) of the polymer (expressed in terms of polystyrene) to the number average molecular weight (Mn) (expressed in terms of polystyrene) measured by gel permeation chromatography is ≤1.7, (B) a polymerizable unsaturated compound and (C) a radiation-sensitive polymerization initiator. A living radical polymerization for producing the polymer (A) is a polymerization that uses a specific thiocarbonyl thio(disulfide) compound as a molecular weight control agent. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决的问题：为了提供具有高灵敏度和高分辨率的辐射敏感性树脂组合物，能够容易地形成图案化薄膜，其在各种性能方面优异，例如图案轮廓，抗压强度，耐摩擦性和对 透明基材，并且能够抑制由烘焙产生的升华物，由组合物形成的间隔物，并提供形成间隔物的方法。 解决方案：辐射敏感性树脂组合物含有（A）具有羧基和环氧基的聚合物，其中聚合物的重均分子量（Mw）（以聚苯乙烯换算）的比（Mw / Mn） 通过凝胶渗透色谱法测定的数均分子量（Mn）（以聚苯乙烯表示）为≤1.7，（B）聚合性不饱和化合物和（C）辐射敏感性聚合引发剂。 用于制备聚合物（A）的活性自由基聚合是使用特定硫代羰基硫代（二硫化物）化合物作为分子量控制剂的聚合。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007100020A

公开(公告)日：2007-04-19

申请号：JP2005294722

申请日：2005-10-07

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAJITA TORU ,  KAWAMOTO TATSUYOSHI ,  MATSUMOTO TATSU

IPC: C08G59/32 ,  C08F2/38

Abstract: PROBLEM TO BE SOLVED: To provide a curable resin composition which can form an over coat having desired transparency, heat resistance, surface hardness, and adhesiveness, excellent in load withstanding property, even when heated, little in sublimate at the time of firing, and also excellent in the performance capability to eliminate the level difference of a color filter formed on an underlying substrate, and to provide an over coat formed by using the composition and a method for forming the over coat. SOLUTION: The curable resin composition contains (A) a polymer containing at least two epoxy groups in a molecule thereof and obtained by the living radical polymerization, (B) a cationic polymerizable compound except a polymerizable unsaturated compound constituting the component A, wherein, the living radical polymerization for producing the polymer A is carryied out by using a specified thiocarbonylthio compound as a molecular weight controlling agent. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种固化树脂组合物，其可以形成具有期望的透明度，耐热性，表面硬度和粘合性的外涂层，即使加热时耐负载性也优异，在升华时几乎不升华 烧制，并且还具有优异的性能能力，以消除在下面的基底上形成的滤色器的水平差，并且提供通过使用该组合物形成的外涂层和形成外涂层的方法。 解决方案：固化性树脂组合物含有（A）分子中含有至少两个环氧基并通过活性自由基聚合得到的聚合物，（B）除了构成组分A的可聚合不饱和化合物以外的阳离子可聚合化合物， 其中，通过使用规定的硫代羰基硫代化合物作为分子量控制剂，进行聚合物A的制造用活性自由基聚合。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006195420A

公开(公告)日：2006-07-27

申请号：JP2005304769

申请日：2005-10-19

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： AKIIKE TOSHIYUKI ,  KAJITA TORU

IPC: G02B5/20 ,  C08G59/18 ,  C08K5/1539 ,  C08L83/04 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a composition to be used suitably for forming a protective film for an optical device, from which a highly-planarity hardened film, which has high surface hardness and various superior resistances such as heat resistance, pressure resistance, acid resistance, alkali resistance and sputtering resistance, can be formed even on a substrate having an uneven surface, and to provide the protective film. SOLUTION: This composition for forming the protective film of a color filter contains polyorganosiloxane, carboxylic anhydride and an agent from which an acid is generated by heating or photoirradiation. The polyorganosiloxane has ≤1,600 g/mol epoxy equivalent. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供适合用于形成用于光学器件的保护膜的组合物，由此可以获得具有高表面硬度和各种优异电阻（例如耐热性，压力）的高度平坦化的硬化膜 可以在具有不平坦表面的基板上形成电阻，耐酸性，耐碱性和耐溅射性，并提供保护膜。 用于形成滤色剂保护膜的组合物含有聚有机硅氧烷，羧酸酐和通过加热或光照射产生酸的试剂。 聚有机硅氧烷具有≤1,600g/ mol环氧当量。 版权所有（C）2006，JPO＆NCIPI