Abstract:
Described herein is an optical device for presenting music information. The optical device identifies an indication that a music piece is to begin playback. The optical device identifies music information associated with the music piece. The optical device presents the music information in synchronization with playback of the music piece.
Abstract:
An ophthalmic lens is presented. The lens includes a toric optical zone and a phase-affecting, non-diffractive optical element for extending depth of focus of imaging.
Abstract:
A bridge plug assembly having a nickel titanium alloy flexible member that can be selectively radially expanded so its outer surface sealingly engages a surrounding tubular. The flexible member can comprise an annular membrane like member having coaxial rings on the opposing ends of the flexible member. The percentage of weight of nickel can range up to about 40 to about 58%, 55% or to about 60%.
Abstract:
An actuator adapted to actuate an element of an automobile, the actuator comprising at least one gear adapted to rotate eccentrically about a central axis during operation of the actuator.
Abstract:
An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).
Abstract:
A light condenser suitable for EUV lithography that includes reflective rings concentric to an optical axis. Each ring has a reflective surface to reflect light rays emanating from a light source so that the light rays converge towards a mask to produce Köhler illumination on the mask. The reflective surface has a curve segment that includes a section of a parabolic curve that is rotated relative to an optical axis and has a focal point at the light source.
Abstract:
An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.
Abstract:
According to one aspect of the invention, a method and apparatus for polarizing electromagnetic radiation is provided. The electromagnetic radiation may be divided into first and second portions, substantially all of the first portion may be linearly polarized in a first direction and substantially all of the second portion may be linearly polarized in a second direction, the first direction being substantially orthogonal to the second direction. The linear polarization of at least one of the first and second portions may be changed such that substantially all of both of the first and second portions are linearly polarized in a third direction. At least one of the first and second portions may be redirected such that substantially all of both the first and second portions are propagating in a fourth direction.
Abstract:
The present invention describes an apparatus comprising an optical array generating a distribution of partial coherence of light energy and an aperture to select a subset of said distribution of partial coherence.
Abstract:
A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a source to illuminate in a second hemisphere of the source; and a second surface shaped to reflect radiation in the second hemisphere of the source to an output plane.