公开(公告)号：JPS61159574A

公开(公告)日：1986-07-19

申请号：JP28144884

申请日：1984-12-31

Applicant: SONY CORP

Inventor： NODA JITSUYA ,  MORITA YASUSHI

IPC: H05B6/80 ,  C23C16/455 ,  C23C16/46 ,  H01L21/205

Abstract: PURPOSE:To enable a vapor phase reaction by high frequency induction heating under reduced pressure by dividing a vertical reactor for a vapor phase reaction by high frequency induction heating into a vapor phase reaction part and a high frequency coil part and by airtightly isolating the parts from each other. CONSTITUTION:The vertical reactor for the vapor phase reaction by the high frequency induction heating is divided into a reaction furnace 1 in which the vapor phase reaction is carried out and a part in which the high frequency coil 2 is placed at the outside of the furnace 1. Even when the furnace 1 is evacuated, the coil 2 part is kept under desired pressure, so the abnormal discharge under reduced pressure is prevented. Since no metal enter the furnace 1 from the coil 2, the contamination of a wafer or the like by contaminants is prevented.