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公开(公告)号：JPH02160698A
公开(公告)日：1990-06-20
申请号：JP31572388
申请日：1988-12-14
Applicant: TORAY INDUSTRIES
Inventor： GOTO TETSUYA , KONDO TOSHIYUKI , IWAMOTO MASAO
Abstract: PURPOSE:To enable simple production of a single crystal of a surface shape of a desired pattern by setting a substance of a specific reversed pattern in the contact with the growth face of the organic single crystal base. CONSTITUTION:A single crystal of organic compound such as 4'- nitrobenzylidene-3-acetoamino-4-methoxyaniline which is used as a base for vapor-phase homoepitaxial growth is produced by the Bridgemann or Czochralsky method. A substance of the reverse grain pattern such as a photoresist layer inhibiting the organic gas from contacting and depositing on the growth face in the vapor-phase growth is provided. Then, the same organic compound as that of the single crystal base is deposited on the single crystal base by a vapor-phase so that the single crystal is allowed to grow in a pattern to produce a single crystal of patternized organic single crystal.
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公开(公告)号：JPH02160697A
公开(公告)日：1990-06-20
申请号：JP31572288
申请日：1988-12-14
Applicant: TORAY INDUSTRIES
Inventor： GOTO TETSUYA , KONDO TOSHIYUKI , IWAMOTO MASAO
Abstract: PURPOSE:To produce an organic single crystal under simple and intentional control of the place of single crystal growth and the growth orientation by using a single crystal of polydiacetylene derivative as a growth base crystal or a seed crystal. CONSTITUTION:A single crystal of a polydiacetylene derivative of poly[2,4- hexadiyne-1,6-diol bis(p-toluenesulfonate)] or poly[1,6-di(carbazolyl)-2,4-hexadiyne] is provided. In the production of a single crystal of an organic compound such as 4'-nitrobenzylidene-3-acetoamino-4-methoxyaniline, from vapor phase, liquid phase or melt phase, a peridiacetylene derivative is allowed to coexist and a single crystal of the organic compound is allowed to grow selectively on the growth surface along the crystal face matching to the lattice constant of the single crystal whereby an organic single crystal regulated in the growth orientation is obtained.
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公开(公告)号：JPS6438749A
公开(公告)日：1989-02-09
申请号：JP16711088
申请日：1988-07-05
Applicant: TORAY INDUSTRIES
Inventor： FUJITA TAKASHI , IWAMOTO MASAO
IPC: G03F7/00
Abstract: PURPOSE:To enable satisfactory development even if the contact of a plate material and developing soln. is short in time such as with an automatic developing machine by providing a silicone rubber layer contg. specific aminosilane on a photosensitive layer contg. the specific orthoquinone diazide compd. coated on a base. CONSTITUTION:The silicone rubber contg. 1-4.5wt.% aminosilane expressed by the formula is provided on the photosensitive layer contg. the orthoquinone diazide compd. which contains
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公开(公告)号：JPS6297207A
公开(公告)日：1987-05-06
申请号：JP23613285
申请日：1985-10-22
Applicant: TORAY INDUSTRIES
Inventor： IWAMOTO MASAO , AOYANAGI MUTSUO
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公开(公告)号：JPS61276395A
公开(公告)日：1986-12-06
申请号：JP11677385
申请日：1985-05-31
Applicant: TORAY INDUSTRIES
Inventor： IWAMOTO MASAO , AOYANAGI MUTSUO
IPC: H05K3/18
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Patent Agency Ranking
公开(公告)号：JPS618401B2
公开(公告)日：1986-03-14
申请号：JP4665276
申请日：1976-04-26
Applicant: Toray Industries
Inventor： SUZUKI MASAHARU , TANIGUCHI TAKASHI , IWAMOTO MASAO , SAITO TAKESHI , KOZUKA KOJI
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公开(公告)号：JPS61617B2
公开(公告)日：1986-01-09
申请号：JP13327678
申请日：1978-10-31
Applicant: TORAY INDUSTRIES
Inventor： FUJITA TAKASHI , IWAMOTO MASAO
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公开(公告)号：JPS6012622B2
公开(公告)日：1985-04-02
申请号：JP15670477
申请日：1977-12-27
Applicant: TORAY INDUSTRIES
Inventor： IWAMOTO MASAO
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公开(公告)号：JPS5617283A
公开(公告)日：1981-02-19
申请号：JP9262879
申请日：1979-07-23
Applicant: TORAY INDUSTRIES
Inventor： IWAMOTO MASAO
Abstract: PURPOSE:To enable an uniform coating, control of a coating amount and a desired pattern-design coating by a method wherein a coating agent is transferred onto a surface of a formbed of a photosensitive resin consisting of halftone dotts formed by a photomechanical processing method and is coated on a surface to be coated directly or indirectly. CONSTITUTION:Halftone dotts are formed on a photosensitive resin formbed (FUJI ''TORELIEF'' CS 83) of a nylon series by utilizing a plain net negative film of 133 lines and 10%, for example. A formbed having 10% of whole halftone dotts on a surface thereof is attached to an offset printing machine having a width of 60m/m. An emulsion-type acryl series colored paint is immersed into a damping water feeding device for the printing machine as a coating agent and is fed on a surface of the formbed through a damping water roller while the paint is transferred onto a blanket of the printing machine from the surface of the formbed to coat it on a coating paper which is a body to be coated subsequently.
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公开(公告)号：JPS5559466A
公开(公告)日：1980-05-02
申请号：JP13179778
申请日：1978-10-26
Applicant: TORAY INDUSTRIES
Inventor： FUJITA TAKASHI , IWAMOTO MASAO
Abstract: PURPOSE:To obtain the lithographic printing plate of good reproducibility of dots and superior printing resistance which does not require dampening water by laminating the specific photosensitive layer containing orthoquinone diazide compound, adhesive layer and silicone rubber layer on a substrate. CONSTITUTION:The photosensitive layer of about 0.5-5mu in thickness which is composed primarily of orthoquinone diazide compound (napthol quinone-1,2-diazide-5-sulfonic acid portion esterified matter of novolak resin of rate of esterification about 35-65% is desirable) and whose ethanol soluble component is 20wt% or less, the adhesive layer of about 10mmu to 0.5mu in thickness composed of aminosilane such as gamma-aminopropyl triethoxy silane and the silicone rubber (cold setting type is preferable) layer of about 0.5-10mu in thickness are laminated in this order on a substrate such as of aluminum plate, polyethylene terephthalate, or the like to provide the captioned printing plate. Here, polar organic solvents such as alcohols, ethers, etc. are used for the developing solution.
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