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公开(公告)号：JPH01293337A
公开(公告)日：1989-11-27
申请号：JP12392888
申请日：1988-05-23
Applicant: TOSOH CORP
Inventor： TODOKO MASAAKI , KIYOTA TORU , YAMAMOTO TAKASHI , NAGAOKA TSUNEKO
Abstract: PURPOSE:To improve definition and sensitivity by forming the above compsn. of a polymer consisting of a specific repeating unit, or a copolymer contg. said repeating unit, a compd. contg. an azide group, and a solvent. CONSTITUTION:This compsn. consists of the polymer consisting of the repeating unit expressed by the formula I, the copolymer contg. said repeating unit, the compd. contg. the azide group, and the solvent. The alkaline soluble polymer is a polymer contg. a hexafluoro-2-hydroxyl propyl group or is more specifically a p-(hexafluoro-2-hydroxyl propyl)styrene (HFS) polymer or a copolymer (HFS copolymer) of the HFS and other vinyl monomer. The compd. contg. the azide group is preferably a arom. azide compd. contg. at least >=1 azide groups in one molecule. The definition and sensitivity are thereby improved.
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公开(公告)号：JPH01217453A
公开(公告)日：1989-08-31
申请号：JP4229788
申请日：1988-02-26
Applicant: TOSOH CORP
Inventor： YAMAMOTO TAKASHI , KIYOTA TORU , TODOKO MASAAKI , NAGAOKA KEIKO
Abstract: PURPOSE:To form a resist pattern with high accuracy by composing the title composition of a specified copolymer of a compd. contg. a norbornene skeleton and a specified maleic acid derivative, and a photosensitive agent. CONSTITUTION:The photosensitive composition is formed by mixing a compd. selected from the group comprising a naphthoquinone-1,2-diazide sulfonate, an azido compd., a diazomeldrumic acid compd. and an orthonitrobenzyl compd. as the photosensitive agent with the copolymer of bicyclo[2.2.1]hepto-2,5-diene, the compd. contg. the norbornene skeleton shown by formulas I and II and the maleic acid derivative shown by formula III. In the formula, R1-R3 are each hydrogen atom or 1-5C alkyl group, R4 and R5 are each hydrogen atom or 1-5C alkyl group, X is -O-, -NH- or -NR6- group, R6 is alkyl or aryl group. Thus, the fine photoresist pattern with the high accuracy can be formed.
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公开(公告)号：JPH01216345A
公开(公告)日：1989-08-30
申请号：JP4065188
申请日：1988-02-25
Applicant: TOSOH CORP
Inventor： MATSUMURA KOUZABUROU , KIYOTA TORU , YAMAMOTO TAKASHI , NAGAOKA KEIKO
Abstract: PURPOSE:To improve the sensitivity and the resolution of the title composition by incorporating a polyamidic acid ester having a specified repeating unit, a polymer contg. azido group and optionally, a sensitizing agent in the title composition. CONSTITUTION:The title composition incorporates 100pts.wt. of the polyamidic acid ester having the repeating unit shown by formula I, 1-100pts.wt. of the polymer contg. the azido group and optionally, the sensitizing agent. In formula I, R1 is a four valent org. group capable of forming a carbon aromatic ring group or a heterocyclic ring group, R2 is a two valent contg. one or more of carbon aromatic ring groups and/or heterocyclic ring groups in one molecular structure, R3 is a group having a carbon-carbon double bond capable of crosslinking with active rays, etc. Thus, the photosensitive resin composition capable of forming a relief-pattern having the high sensitivity and the excellent definition is obtd.
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公开(公告)号：JPH01216344A
公开(公告)日：1989-08-30
申请号：JP4064988
申请日：1988-02-25
Applicant: TOSOH CORP
Inventor： MATSUMURA KOUZABUROU , KIYOTA TORU , YAMAMOTO TAKASHI , NAGAOKA KEIKO
Abstract: PURPOSE:To obtain a photosensitive polymer composition with high sensitivity and good resolution by incorporating a polymer having a specified repeating unit as a main component, an aromatic bisazide compd. and optionally a sensitizing agent and a compd. capable of polymerizing with light, in the title composition. CONSTITUTION:100pts.wt. of the polymer contg. a repeating unit shown by formula I as the main component, 0.1-100pts.wt. of the aromatic bisazide compd. shown by formula II, and optionally, the sensitizing agent and the compd. having an ethylenic unsatd. binding and capable of polymerizing with the light are incorporated in the composition. In formulas I and II, R1 and R2 are each a carbon ring group or a heterocyclic ring group, R3 is a group contg. a cross- linkable azide compd., R4 is hydrogen atom or a lower alkyl group, etc. Thus, the photosensitive polymer composition with high sensitivity and good resolution is obtd.
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Patent Agency Ranking
公开(公告)号：JPH01216343A
公开(公告)日：1989-08-30
申请号：JP4065088
申请日：1988-02-25
Applicant: TOSOH CORP
Inventor： MATSUMURA KOUZABUROU , KIYOTA TORU , YAMAMOTO TAKASHI , NAGAOKA KEIKO
Abstract: PURPOSE:To obtain a photosensitive polymer composition with high sensitivity and good resolution by incorporating a polymer having a specified repeating unit as a main component, a photoinitiator having the high sensitivity against energy rays and optionally, a sensitizing agent and a compd. capable of polymerizing with light in the title material. CONSTITUTION:100pts.wt. of the polymer having the repeating unit shown by formula I as the main component, 0.1-100pts.wt. of the photoinitiator having the high sensitivity against the energy rays, and optionally, the sensitizing agent and the compd. having an ethylenic unsatd. binding and capable of polymerizing with the light are incorporated in the composition. In formula I, R1 and R2 are a carbon ring group or a heterocyclic ring group, R3 is a group contg. a crosslinkable azide compd. Thus, the photosensitive polymer composition with high sensitivity and good resolution is obtd.
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公开(公告)号：JPH01173026A
公开(公告)日：1989-07-07
申请号：JP33490387
申请日：1987-12-28
Applicant: TOSOH CORP
Inventor： MATSUMURA KOUZABUROU , KIYOTA TORU , YAMAMOTO TAKASHI , NAGAOKA KIYOUKO
Abstract: PURPOSE:To increase the difference in solubility between an exposed part and unexposed part and to obtain a compsn. having high resolution by constituting the compsn. of a heat resistant photosensitive material of a polymer essentially consisting of a prescribed repeating unit, a specific arom. bisazide compd. and a polymer compsn. of a diene monomer contg. carbon double bonds. CONSTITUTION:The compsn. of the heat resistant photosensitive material is constituted of 100pts.wt. polymer essentially consisting of the repeating unit expressed by formula I, 0.1-100pts.wt. arom. bisazide compd. expressed by formula II and the polymer compsn. obtd. by polymerizing the diene monomer contg. the carbon-carbon double bonds expressed by formula III and by adding a sensitizer at need thereto. The high definition is obtd. and the high sensitivity is attained by increasing the difference in the solubility between the exposed part and the unexposed part. In formula, R1, R2 are carbon cyclic group, heterocyclic group; R3 is a crosslinkable ethylenic double bond group; R4 is hydrogen, lower alkyl group, -OH, etc.; (n) is 0 or 1; R7 is a hydrogen atom, alkyl group or alkoxy group of 1-4C.
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公开(公告)号：JPS6449039A
公开(公告)日：1989-02-23
申请号：JP20515587
申请日：1987-08-20
Applicant: TOSOH CORP
Inventor： TSUTSUMI YOSHITAKA , KIYOTA TORU , MATSUMURA KOUZABUROU , NAGAOKA TSUNEKO , YANAGIHARA TOSHIMITSU
IPC: G03F7/039
Abstract: PURPOSE:To improve the dry etching durability of the titled pattern by using a specified halogen contg. polyacrylic acid ester derivative for a resist material. CONSTITUTION:The halogen contg. polyacrylic acid ester derivative shown by formula I is used for the resist material. In the formula, A is a constituting unit derived from a monomer having a copolymerizable double bond, X is a halogen atom or methyl group, (m) is a positive integer, (n) is 0 or a positive integer, (n/m) is 0-2, (m+n) is 20-20,000, Y1-Y5 are each fluorine or hydrogen atom, and at least one of the groups Y1-Y5 is fluorine atom. As the halogen contg. polyacrylic acid ester derivative, especially, the alpha-halogen derivative thereof contains a halogen atom at the alpha-position and at the ester part of said derivative, said derivative is liable to cause a disintegration reaction. As the result, the sensitivity of the titled pattern is improved. And, as the deviation contains a benzene ring, the dry-etching durability of the titled pattern is improved.
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公开(公告)号：JPS6368640A
公开(公告)日：1988-03-28
申请号：JP21148686
申请日：1986-09-10
Applicant: TOSOH CORP
Inventor： KIYOTA TORU , NAGASAWA YUJI
Abstract: PURPOSE:To obtain an anion-exchange membrane having a low membrane resistance and excellent alkali resistance, by reacting a film composed of a specified copolymer with a specified amine and reacting the film with an alkali metal hydroxide and an alkyl iodide in order. CONSTITUTION:A copolymer of formula III (wherein X is F or CF3; l is 0-5; m is 0 or 1; n is 1-5; and r and q is a positive number and r/q is 2-16) is produced by, e.g., copolymerizing tetrafluoroethylene with a comonomer of formulas I, II, etc. The copolymer is then molded into a film. The film is reacted with a compd. of formula IV (wherein r is 2-7; R1 and R2 are each a 1-5C alkyl) (e.g., dimethylamine), and then with an alkali metal hydroxide (e.g., lithium hydroxide) and an alkyl iodide (e.g., methyl iodide) in this order to obtain the desired anion-exchange membrane.
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公开(公告)号：JPS62240956A
公开(公告)日：1987-10-21
申请号：JP30770286
申请日：1986-12-25
Applicant: TOSOH CORP
Inventor： TSUTSUMI YOSHITAKA , KIYOTA TORU , AKEYAMA HIDEO , MATSUMURA KOUZABUROU , NAKAZAWA KEIKO
Abstract: PURPOSE:To enhance sensitivity and resolution to electron beams and X-rays by using a polymer composed of specified repeating units as a resist material. CONSTITUTION:The polymer to be used as the resist is composed of the repeating units represented by formula I in which R1 is methyl, fluorinated methyl, or the like; R2 is 3,5-difluorophenyl or the like; each of R3 and R4 is H, alkyl, or the like; and R5 is optionally fluorinated phenyl. This polymer is obtained by homopolymerizing alpha-substituted acrylate represented by formula II, which is obtain by reacting an alpha-substituted acrylic acid with a chlorinating agent, such as thionyl chloride, phosphorus pentachloride, or oxalyl chloride to synthesize the alpha-substituted acryloyl chloride, and further reacting it with alcohol having a benzene ring and containing an fluorine atom in the presence of a base, thus permitting the obtained resist material to be enhance in sensitivity and resolution to electron beams and X-ray, and superior in dry etching resistance.
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