公开(公告)号：JPH01173026A

公开(公告)日：1989-07-07

申请号：JP33490387

申请日：1987-12-28

Applicant: TOSOH CORP

Inventor： MATSUMURA KOUZABUROU ,  KIYOTA TORU ,  YAMAMOTO TAKASHI ,  NAGAOKA KIYOUKO

IPC: G03F7/037 ,  C08K5/01 ,  C08K5/28 ,  C08L79/08 ,  G03F7/032

Abstract: PURPOSE:To increase the difference in solubility between an exposed part and unexposed part and to obtain a compsn. having high resolution by constituting the compsn. of a heat resistant photosensitive material of a polymer essentially consisting of a prescribed repeating unit, a specific arom. bisazide compd. and a polymer compsn. of a diene monomer contg. carbon double bonds. CONSTITUTION:The compsn. of the heat resistant photosensitive material is constituted of 100pts.wt. polymer essentially consisting of the repeating unit expressed by formula I, 0.1-100pts.wt. arom. bisazide compd. expressed by formula II and the polymer compsn. obtd. by polymerizing the diene monomer contg. the carbon-carbon double bonds expressed by formula III and by adding a sensitizer at need thereto. The high definition is obtd. and the high sensitivity is attained by increasing the difference in the solubility between the exposed part and the unexposed part. In formula, R1, R2 are carbon cyclic group, heterocyclic group; R3 is a crosslinkable ethylenic double bond group; R4 is hydrogen, lower alkyl group, -OH, etc.; (n) is 0 or 1; R7 is a hydrogen atom, alkyl group or alkoxy group of 1-4C.

公开(公告)号：JPH01172455A

公开(公告)日：1989-07-07

申请号：JP32997387

申请日：1987-12-28

Applicant: TOSOH CORP

Inventor： YAMAMOTO TAKASHI ,  KIYOTA TORU ,  MATSUMURA KOUZABUROU ,  NAGAOKA KIYOUKO

IPC: C08K5/27 ,  C08L79/08 ,  G03F7/012 ,  G03F7/038

Abstract: PURPOSE:To obtain the title composition excellent in sensitivity and resolution, crosslinkable without any additive such as a photopolymerization initiator and useful as a heat-resistant photopolymer material for semiconductors, by mixing a specified polyamic acid ester with an azide polymer and, optionally, a sensitizer etc. CONSTITUTION:100pts.wt. polyamic acid ester (A) having repeating units of formula I (wherein R1 is a tetravalent organic group composed of a carboaromatic ring group, a heteroaromatic ring group or the like, R2 is a bivalent organic group containing at least one of said ring groups in the structure, R3 is a group having a -C=C- group crosslinkable with an actinic radiation or the like, and the main chain is ortho or peri to the -COOR3 groups) and having an MW of 1,000-100,000 is mixed with 1-100pts.wt. azide polymer (B) of formula II (wherein R4 is a bivalent organic group containing an aromatic ring group in the structure, and the azide group is directly bonded to the aromatic ring group) and an MW of 100-1,000,000 and, optionally, at most 20pts.wt. photopolymerization initiator, sensitizer, etc.