THIN-FILM DEVICES AND FABRICATION
    71.
    发明专利

    公开(公告)号:CA2972240A1

    公开(公告)日:2016-06-30

    申请号:CA2972240

    申请日:2015-12-24

    Applicant: VIEW INC

    Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

    THIN-FILM DEVICES AND FABRICATION
    72.
    发明专利

    公开(公告)号:HK1202643A1

    公开(公告)日:2015-10-02

    申请号:HK15103111

    申请日:2015-03-27

    Applicant: VIEW INC

    Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

    IMPROVED OPTICAL DEVICE FABRICATION

    公开(公告)号:HK1200972A1

    公开(公告)日:2015-08-14

    申请号:HK15101183

    申请日:2015-02-04

    Applicant: VIEW INC

    Abstract: Transparent conductive coatings are polished using particle slurries in combination with mechanical shearing force, such as a polishing pad. Substrates having transparent conductive coatings that are too rough and/or have too much haze, such that the substrate would not produce a suitable optical device, are polished using methods described herein. The substrate may be tempered prior to, or after, polishing. The polished substrates have low haze and sufficient smoothness to make high-quality optical devices.

    THIN-FILM DEVICES AND FABRICATION
    74.
    发明专利

    公开(公告)号:SG11201402879XA

    公开(公告)日:2014-07-30

    申请号:SG11201402879X

    申请日:2012-12-10

    Applicant: VIEW INC

    Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

    COUNTER ELECTRODE FOR ELECTROCHROMIC DEVICES
    75.
    发明公开

    公开(公告)号:EP3323016A1

    公开(公告)日:2018-05-23

    申请号:EP16824923

    申请日:2016-07-07

    Applicant: VIEW INC

    CPC classification number: G02F1/1523

    Abstract: The embodiments herein relate to electrochromic stacks, electrochromic devices, and methods and apparatus for making such stacks and devices. In various embodiments, an anodically coloring layer in an electrochromic stack or device is fabricated to include a heterogeneous structure, for example a heterogeneous composition and/or morphology. Such heterogeneous anodically coloring layers can be used to better tune the properties of a device.

    ELECTROCHROMIC DEVICES
    80.
    发明公开

    公开(公告)号:EP3137941A4

    公开(公告)日:2017-12-27

    申请号:EP15785437

    申请日:2015-05-01

    Applicant: VIEW INC

    CPC classification number: G02F1/1523 G02F1/1508 G02F1/1525 G02F2001/1555

    Abstract: Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically-insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically-insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices. In various embodiments, a counter electrode is fabricated to include a base anodically coloring material and one or more additives.

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