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    Controlled surface chemical gradients
    71.
    发明申请
    Controlled surface chemical gradients 失效
    受控表面化学梯度

    公开(公告)号：US20040224303A1

    公开(公告)日：2004-11-11

    申请号：US10814995

    申请日：2004-03-31

    Applicant: Eidgenossische Technische Hochschule Zurich

    Inventor： Nicholas D. Spencer ,  Sara Maria Morgenthaler ,  Seunghwan Lee

    IPC: C12Q001/00

    CPC classification number: B82Y30/00 ,  B01L3/5088 ,  B05D1/283 ,  B05D5/00 ,  B82Y40/00 ,  G01N13/02 ,  G01N33/5005 ,  G01N33/5029 ,  G01N33/52 ,  G01N2610/00

    Abstract: A simple and reproducible preparative method for the fabrication of surface-chemical gradients is described herein. Surface-chemical gradient films are prepared by using a liquid front in relative motion to the substrate (e.g. immersion by a linear-motion drive or the use of a spreading droplet) to gradually expose substrate samples to very dilute solutions of adsorbates. As demonstrated by XPS, the self-assembled monolayer gradients produced in this way display a high packing density. This method can be used in the preparation of other gradients of various chemical or biochemical functionalities in one or two dimensions. Such gradients can be used in a wide variety of applications in such diverse areas as cell motility studies, nanotribology research, and high-throughput screening.

    Abstract translation: 本文描述了用于制造表面化学梯度的简单且可重现的制备方法。 通过使用与基底相对运动的液体前沿（例如通过线性运动驱动的浸入或使用扩散液滴）来制备表面化学梯度膜，以逐渐将底物样品暴露于非常稀的吸附物溶液。 如XPS所证明的，以这种方式生产的自组装单层梯度显示出高的堆积密度。 该方法可用于制备一维或二维各种化学或生物化学功能的其他梯度。 这种梯度可以用于各种领域，例如细胞运动性研究，纳米技术研究和高通量筛选。

    Method of self-assembly and optical applications of crystalline colloidal patterns on substrates
    72.
    发明申请
    Method of self-assembly and optical applications of crystalline colloidal patterns on substrates 失效
    结晶胶体图案在基底上的自组装和光学应用的方法

    公开(公告)号：US20040053009A1

    公开(公告)日：2004-03-18

    申请号：US10660588

    申请日：2003-09-12

    Inventor： Geoffrey Alan Ozin ,  San Ming Yang ,  Hernan Miguez

    IPC: B32B003/28 ,  B05D005/12 ,  B05D001/32 ,  B05D001/18 ,  C23C016/00 ,  B05D003/02

    CPC classification number: B32B9/00 ,  B05D1/283 ,  B32B3/30 ,  B82Y15/00 ,  B82Y20/00 ,  B82Y30/00 ,  B82Y40/00 ,  G02B6/1225 ,  G02B6/13 ,  Y10S977/779 ,  Y10S977/883 ,  Y10T428/24355 ,  Y10T428/24372 ,  Y10T428/24479 ,  Y10T428/2457 ,  Y10T428/24579 ,  Y10T428/2462

    Abstract: This invention describes methods of synthesis and applications of planarized photonic crystals. Provided are simple, quick, reproducible and inexpensive methods that combine self-assembly and lithography to achieve the first examples of vectorial control of thickness, structure, area, topology, orientation and registry of colloidal crystals that have been patterned in substrates for use in lab-on-chip and photonic chip technologies. 1-, 2 and 3-D colloidal crystals patterned either on or within substrates can be used for templating inverted colloidal crystal replica patterns made of materials like silicon as well as building micron scale structural defects in such colloidal crystals. These photonic crystals can form the basis of a range of optical devices that may be integrated within photonic chips and coupled to optical fibers and/or waveguides to enable development of highly compact planarized optically integrated photonic crystal devices and circuits for use in future all-optical computers and optical telecommunication systems.

    Abstract translation: 本发明描述了平面化光子晶体的合成和应用方法。 提供了简单，快速，可再现和便宜的方法，其组合自组装和光刻以实现已经在用于实验室的基板中图案化的胶体晶体的厚度，结构，面积，拓扑，取向和注册表的矢量控制的第一示例 芯片和光子芯片技术。 图案化在衬底上或衬底内的1，2和3-D胶体晶体可用于模板化由硅材料制成的反胶体晶体复制图案以及在这种胶体晶体中构建微米级结构缺陷。 这些光子晶体可以形成一系列光学器件的基础，光学器件可以集成在光子芯片中并且耦合到光纤和/或波导，以便能够开发用于将来全光学的高度紧凑的平面化的光学集成光子晶体器件和电路 计算机和光通信系统。

    Sonication of monolayer films
    74.
    发明申请
    Sonication of monolayer films 失效
    单层膜的超声处理

    公开(公告)号：US20010000330A1

    公开(公告)日：2001-04-19

    申请号：US09731499

    申请日：2000-12-07

    Inventor： Timothy A. Strodtbeck

    IPC: B05D001/18 ,  B05C003/02

    CPC classification number: B82Y30/00 ,  B05D1/283 ,  B05D3/12 ,  B82Y40/00

    Abstract: A process and apparatus for processing a monolayer film and transferring the monolayer film to a substrate are provided. In accordance with one embodiment of the present invention, a process for transferring a monolayer film to a substrate is provided comprising the steps of: (i) providing a water-based carrier media defining an upper surface; (ii) introducing process particles on the upper surface of the carrier media, wherein the molecules are dissolved in a solvent and the particles and the solvent are insoluble in the carrier media; (iii) evaporating the solvent such that a non-cohesive monolayer film of the particles is formed on the upper surface of the carrier media; (iv) decreasing a degree of void incorporation in the monolayer film of particles by compressing a dimension of the non-cohesive film along the upper surface of the carrier media, and sonicating the carrier media to form micro-bubbles in the carrier media, wherein the compression and the sonication contribute to a decreased degree of void incorporation in the film of process particles; and (v) transferring the film of particles to a surface of the substrate. The steps of compressing and sonicating may be executed concurrently.

    Abstract translation: 提供了用于处理单层膜并将单层膜转移到基底的方法和设备。 根据本发明的一个实施方案，提供了将单层膜转移到基底的方法，包括以下步骤：（i）提供限定上表面的水基载体介质; （ii）在载体介质的上表面上引入工艺颗粒，其中分子溶解在溶剂中，颗粒和溶剂不溶于载体介质中; （iii）蒸发溶剂，使得在载体介质的上表面上形成颗粒的非粘性单层膜; （iv）通过沿所述载体介质的上表面压缩所述非粘性膜的尺寸，并超声处理所述载体介质以在所述载体介质中形成微气泡，从而降低所述单层膜中的空隙结合度，其中 压缩和超声处理有助于在工艺颗粒的膜中降低空隙掺入程度; 和（v）将颗粒膜转移到基材的表面。 压缩和声波处理的步骤可以同时执行。

    Method and apparatus for producing molecular film
    75.
    发明授权
    Method and apparatus for producing molecular film 有权
    生产分子膜的方法和装置

    公开(公告)号：US06183558B2

    公开(公告)日：2001-02-06

    申请号：US09294297

    申请日：1999-04-19

    Applicant: Tadashi Otake ,  Norihisa Mino ,  Tohru Nakagawa ,  Mamoru Soga ,  Kazufumi Ogawa ,  Takaiki Nomura ,  Yasuo Takebe

    Inventor： Tadashi Otake ,  Norihisa Mino ,  Tohru Nakagawa ,  Mamoru Soga ,  Kazufumi Ogawa ,  Takaiki Nomura ,  Yasuo Takebe

    IPC: B05C108

    CPC classification number: B82Y30/00 ,  B05D1/283 ,  B05D3/0486 ,  B82Y40/00

    Abstract: A method for forming a molecular film includes the steps of: coating a surface of a substrate having active hydrogen atoms on its surface with a coating solution containing a silane-based compound having at least one reactive group selected from the group consisting of a chloro group, an alkoxy group and an isocyanate group; and effecting an elimination reaction between the active hydrogen atoms on the surface of the substrate and reactive groups of the silane-based compound, thereby covalently bonding the silane-based compounds to the surface of the substrate. The substrate is supplied to a chamber in which an atmosphere is maintained at a low water vapor density. The surface of the substrate is coated with a coating solution containing the silane-based compound and a solvent by using a transfer element. A dehydrochlorination reaction is effected between the active hydrogen atoms and the chloro groups of the silane-based compounds. Thereafter, any coating solution containing unreacted silane-based compounds after coating is removed inside or outside the chamber.

    Abstract translation: 形成分子膜的方法包括以下步骤：用包含具有至少一个选自氯基团的反应性基团的硅烷基化合物的涂布溶液在其表面上涂覆具有活性氢原子的基材的表面 ，烷氧基和异氰酸酯基; 并且进行基板表面上的活性氢原子与硅烷类化合物的反应性基团之间的消除反应，从而将硅烷类化合物共价键合到基板的表面。 将基板供给到气氛保持在低水蒸汽密度的室中。 通过使用转印元件，将含有硅烷系化合物和溶剂的涂布液涂布在基材的表面上。 在活性氢原子和硅烷基化合物的氯基之间进行脱氯化氢反应。 此后，在室内或室外除去涂布后含有未反应的硅烷类化合物的任何涂布溶液。

    A method for treating a silica-coated substrate
    76.
    发明公开
    A method for treating a silica-coated substrate 审中-公开
    Verfahren zur Behandlung eines Silika-beschichteten Metallsubstrats

    公开(公告)号：EP2034052A1

    公开(公告)日：2009-03-11

    申请号：EP07115765.5

    申请日：2007-09-05

    Applicant: OCAS N.V. - Onderzoekscentrum voor Aanwending van Staal

    Inventor： Siau, Sam ,  Van den Berg, Otto

    IPC: C23C28/00 ,  B05D7/24

    CPC classification number: C23C28/04 ,  B05D1/185 ,  B05D1/283 ,  B05D1/60 ,  B05D5/08 ,  B05D7/14 ,  B05D2350/63 ,  B82Y30/00 ,  B82Y40/00 ,  C23C26/00 ,  C23C28/00

    Abstract: The present invention is related to a method for treating a silica-coated substrate, comprising the steps of :
    - providing a substrate having a silica layer on its surface,
    - modifying an accessible surface of said silica layer by bringing the substrate into contact with at least one silazane agent so as to obtain a covalently bound single molecular layer on said accessible surface.
    Monofunctional or polyfunctional silazane agents can be used in the method. The invention is equally related to a substrate comprising a silica layer provided with a single molecular silane-modified layer.

    Abstract translation: 本发明涉及一种用于处理二氧化硅涂覆的基底的方法，包括以下步骤： - 在其表面上提供具有二氧化硅层的基底， - 通过使基底与基底接触而改变所述二氧化硅层的可接近表面 至少一种硅氮烷剂，以便在所述可接近表面上获得共价结合的单分子层。 在该方法中可以使用单官能或多官能的硅氮烷剂。 本发明同样涉及包含设置有单分子硅烷改性层的二氧化硅层的基材。

    METHOD FOR PATTERNING A SUBSTRATE SURFACE
    78.
    发明公开
    METHOD FOR PATTERNING A SUBSTRATE SURFACE 有权
    工艺用于生产图案衬底表面

    公开(公告)号：EP1675802A1

    公开(公告)日：2006-07-05

    申请号：EP04770195.8

    申请日：2004-10-07

    Applicant: Koninklijke Philips Electronics N.V.

    Inventor： Burdinski, Dirk, Philips I.P. & Standards ,  Sharpe, Ruben B.A., Philips I.P. & Standards

    IPC: B81C1/00 ,  G03F7/00 ,  B82B3/00 ,  B05D1/28

    CPC classification number: B82Y30/00 ,  B05D1/283 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: An elastomeric stamp (10) is provided, which has a bulk surface (12) from which protruding features (14, 14') extend. A barrier layer (20) covers the bulk surface (12) and the protruding features (14, 14'). After applying an ink solution to the elastomeric stamp (10) and drying the elastomeric stamp (10), the elastomeric stamp (10) is brought into contact with a surface (42) of a first substrate (40). The surface (42) of the first substrate (40) has a high affinity with the ink molecules (32), which is utilized to effectively remove the ink molecules (32) from the contact surfaces (16, 16') of the protruding features (14, 14'). Subsequently, the elastomeric stamp (10) is brought into contact with the surface (52) of a second substrate (50). Ink molecules 32 are transferred from the edges (18, 18') of the protruding features (14, 14') to the surface (52) of a second substrate (50), thus forming an ink pattern in the form of a self­assembled monolayer on this surface (52). The patterning method of the present invention allows for the formation of high-definition ink patterns on a substrate (50) using a wide variety of inks.

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