公开(公告)号：US07592063B2

公开(公告)日：2009-09-22

申请号：US11514997

申请日：2006-09-05

Applicant: Yoshiaki Ikuta ,  Shinya Kikugawa

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa

IPC: B32B3/00 ,  B32B17/06 ,  B32B18/00 ,  B32B3/16 ,  C03C3/112 ,  C03C3/06 ,  C03C10/16 ,  G01N23/00

CPC classification number: C03B19/1453 ,  C03B2201/03 ,  C03B2201/12 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  Y10T428/166 ,  Y10T428/249969 ,  Y10T428/252

Abstract: For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface. The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.

Abstract translation: 对于在其表面上具有细凹凸图案的基板，石英玻璃基板的垂直方向上的凸凹图案的尺寸被控制为以极高的精度和整个基板表面均匀。 使石英玻璃基板具有至多40℃的假想温度分布和小于400ppm的卤素浓度，并且使石英玻璃基板的表面的蚀刻速率均匀，由此， 在石英玻璃基板的垂直方向上的凸凹图案被控制为具有良好的精度和整个基板表面的均匀。

公开(公告)号：US07497095B2

公开(公告)日：2009-03-03

申请号：US10824337

申请日：2004-04-13

Applicant: Tatsuhiro Sato

Inventor： Tatsuhiro Sato

IPC: C03B11/00

CPC classification number: C03C23/008 ,  C03B32/00 ,  C03B2201/03 ,  C03C15/00 ,  C03C23/0075 ,  C30B35/00 ,  H01L21/673

Abstract: The invention provides a method for producing a quartz glass jig for use in semiconductor industries, which enables increasing the surface layer cleanliness simply and surely at low cost; it also provides a quartz glass jig improved in surface layer cleanliness. The inventive means for resolution are a method comprising processing a quartz glass raw material into a desired shape by a treatment inclusive of fire working, annealing for stress removal, and cleaning treatment to obtain the final product, the method is characterized by that it comprises performing gas phase etching step and gas phase purification step on the surface layer of the quartz glass jig after applying the annealing treatment for stress removal but before the cleaning treatment, wherein the gas phase purification step is carried out continuously after the gas phase etching step.

Abstract translation: 本发明提供一种用于制造半导体工业中使用的石英玻璃夹具的方法，其能够简单且可靠地以低成本提高表面层清洁度; 它还提供了改善表面清洁度的石英玻璃夹具。 本发明的解决方法是一种方法，其包括通过包括消防工作，应力消除退火和清洁处理的处理将石英玻璃原料处理成所需形状以获得最终产品，其特征在于，其包括执行 气相蚀刻工序和气相纯化工序，在进行应力消除后的退火处理之后，在清洗处理之前，在气相蚀刻工序之后连续进行气相纯化工序。

公开(公告)号：US07299658B2

公开(公告)日：2007-11-27

申请号：US10559086

申请日：2004-05-21

Applicant: Yasuo Ohama ,  Takayuki Togawa ,  Shigeo Mizuno

Inventor： Yasuo Ohama ,  Takayuki Togawa ,  Shigeo Mizuno

IPC: C03B11/08 ,  C30B35/00

CPC classification number: C03B19/095 ,  C03B2201/03 ,  C30B15/10 ,  Y02P40/57 ,  Y10S65/08 ,  Y10S117/90 ,  Y10T117/10

Abstract: A quartz glass crucible for use in pulling up a silicon single crystal, wherein it has, at least in the curved portion thereof, a three-layer structure comprising a transparent inner layer being composed of a synthetic quartz glass and having a low Al concentration, a transparent or nontransparent intermediate layer being composed of a natural quartz glass or a mixture of natural and synthetic quartz glasses and having a high Al concentration, and a nontransparent outer layer being composed of a natural quartz glass and having an Al concentration higher than that of the intermediate layer. The quartz glass crucible is reduced in the deformation of the transparent inner layer, and allows the suppression of the change in the amount of dissolution of the quartz glass crucible associated with the pull-up of a single crystal and the achievement of the uniform oxygen concentration in the longitudinal direction of a single crystal.

Abstract translation: 一种用于拉起单晶硅的石英玻璃坩埚，其中至少在其弯曲部分中具有由合成石英玻璃构成的具有低Al浓度的透明内层的三层结构， 透明或不透明的中间层由天然石英玻璃或天然和合成石英玻璃的混合物组成，具有高Al浓度，不透明的外层由天然石英玻璃组成，Al浓度高于 中间层。 石英玻璃坩埚在透明内层的变形中减少，并且抑制与单晶上拉相关联的石英玻璃坩埚的溶解量的变化，并且实现均匀的氧浓度 在单晶的纵向上。

公开(公告)号：US20060183624A1

公开(公告)日：2006-08-17

申请号：US11405584

申请日：2006-04-18

Applicant: Yoshio Katsuro ,  Keiji Yamahara ,  Takashi Yamaguchi ,  Yutaka Mori

Inventor： Yoshio Katsuro ,  Keiji Yamahara ,  Takashi Yamaguchi ,  Yutaka Mori

IPC: C03C3/06

CPC classification number: C03C1/006 ,  C03B19/01 ,  C03B19/09 ,  C03B19/1065 ,  C03B19/1095 ,  C03B2201/03 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2203/26

Abstract: Subjects for the invention are to obtain a quartz powder having a high purity and high quality and a process for producing the same and to obtain a glass molding formed by melting and molding the powder and extremely reduced in bubble inclusion. The invention provides a quartz powder, preferably a synthetic quartz powder obtained by the sol-gel method, which, upon heating from room temperature to 1,700° C., generates gases in which the amount of CO is 300 nl/g or smaller and the amount of CO2 is 30 nl/g or smaller.

公开(公告)号：US20060144327A1

公开(公告)日：2006-07-06

申请号：US10559086

申请日：2004-05-21

Applicant: Yasuo Ohama ,  Takayuki Togawa ,  Shigeo Mizuno

Inventor： Yasuo Ohama ,  Takayuki Togawa ,  Shigeo Mizuno

IPC: C30B11/00

CPC classification number: C03B19/095 ,  C03B2201/03 ,  C30B15/10 ,  Y02P40/57 ,  Y10S65/08 ,  Y10S117/90 ,  Y10T117/10

Abstract: A quartz glass crucible for use in pulling up a silicon single crystal, wherein it has, at least in the curved portion thereof, a three-layer structure comprising a transparent inner layer being composed of a synthetic quartz glass and having a low Al concentration, a transparent or nontransparent intermediate layer being composed of a natural quartz glass or a mixture of natural and synthetic quartz glasses and having a high Al concentration, and a nontransparent outer layer being composed of a natural quartz glass and having an Al concentration higher than that of the intermediate layer. The quartz glass crucible is reduced in the deformation of the transparent inner layer, and allows the suppression of the change in the amount of dissolution of the quartz glass crucible associated with the pull-up of a single crystal and the achievement of the uniform oxygen concentration in the longitudinal direction of a single crystal.

Abstract translation: 一种用于拉起单晶硅的石英玻璃坩埚，其中至少在其弯曲部分中具有由合成石英玻璃构成的具有低Al浓度的透明内层的三层结构， 透明或不透明的中间层由天然石英玻璃或天然和合成石英玻璃的混合物组成，具有高的Al浓度，不透明的外层由天然石英玻璃组成，Al浓度高于 中间层。 石英玻璃坩埚在透明内层的变形中减少，并且抑制与单晶上拉相关联的石英玻璃坩埚的溶解量的变化，并且实现均匀的氧浓度 在单晶的纵向上。

公开(公告)号：US06865327B2

公开(公告)日：2005-03-08

申请号：US10247100

申请日：2002-09-19

Applicant: Robert M. Atkins ,  Alice W. Liu ,  Poul Kristensen ,  Morten Østergaard Pedersen ,  Stig Nissen Knudsen ,  Jan Levin Nielsen ,  Jake Bromage ,  Kai H. Chang

Inventor： Robert M. Atkins ,  Alice W. Liu ,  Poul Kristensen ,  Morten Østergaard Pedersen ,  Stig Nissen Knudsen ,  Jan Levin Nielsen ,  Jake Bromage ,  Kai H. Chang

IPC: C03B37/014 ,  C03C13/04 ,  G02B6/02

CPC classification number: C03C13/045 ,  C03B37/014 ,  C03B2201/03 ,  C03B2201/07 ,  G02B6/02

Abstract: Applicants have discovered the existence of loss peaks in optical fiber transmission systems using wavelengths in the E-band and the L-band. Specifically, they have discovered the existence of narrow loss peaks at 1440 nm, 1583 nm and 1614 nm. Because the peaks are relatively narrow, they cannot be easily removed by conventional gain equalizers in long haul transmission systems, and although the peaks are relatively small, they can nonetheless cause transmission channels to drop out in amplified DWDM transmission systems. Applicants have further discovered that these loss peaks are due to carbon contamination of the transmission fiber. Thus optical fibers should be fabricated essentially free of carbon contamination. This means eliminating carbon-containing reagents in preform and tube-making processes.

Abstract translation: 申请人已经发现在使用E波段和L波段的光纤传输系统中存在损耗峰值。 具体来说，他们已经发现在1440nm，1583nm和1614nm处存在窄的损耗峰。 由于峰值相对较窄，它们不能通过长距离传输系统中的常规增益均衡器容易地去除，尽管峰值相对较小，但是它们仍可能使传输信道在放大的DWDM传输系统中丢失。 申请人进一步发现，这些损失峰值是由于传输纤维的碳污染。 因此，光纤应该基本上没有碳污染。 这意味着在预成型件和制管工艺中消除含碳试剂。

公开(公告)号：US20040237589A1

公开(公告)日：2004-12-02

申请号：US10824337

申请日：2004-04-13

Applicant: Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co., Ltd.

Inventor： Tatsuhiro Sato

IPC: C03C025/00

CPC classification number: C03C23/008 ,  C03B32/00 ,  C03B2201/03 ,  C03C15/00 ,  C03C23/0075 ,  C30B35/00 ,  H01L21/673

Abstract: The invention provides a method for producing a quartz glass jig for use in semiconductor industries, which enables increasing the surface layer cleanliness simply and surely at low cost; it also provides a quartz glass jig improved in surface layer cleanliness. The inventive means for resolution are a method comprising processing a quartz glass raw material into a desired shape by a treatment inclusive of fire working, annealing for stress removal, and cleaning treatment to obtain the final product, the method is characterized by that it comprises performing gas phase etching step and gas phase purification step on the surface layer of the quartz glass jig after applying the annealing treatment for stress removal but before the cleaning treatment, wherein the gas phase purification step is carried out continuously after the gas phase etching step.

Abstract translation: 本发明提供一种用于制造半导体工业中使用的石英玻璃夹具的方法，其能够简单且可靠地以低成本提高表面层清洁度; 它还提供了改善表面清洁度的石英玻璃夹具。 本发明的解决方法是一种方法，其包括通过包括消防工作，应力消除退火和清洁处理的处理将石英玻璃原料处理成所需形状以获得最终产品，其特征在于，其包括执行 气相蚀刻工序和气相纯化工序，在进行应力消除后的退火处理之后，在清洗处理之前，在气相蚀刻工序之后连续进行气相纯化工序。

公开(公告)号：US06550277B1

公开(公告)日：2003-04-22

申请号：US09709168

申请日：2000-11-10

Applicant: Bruno Uebbing ,  Jan Vydra

Inventor： Bruno Uebbing ,  Jan Vydra

IPC: C03B1906

CPC classification number: C03C4/0085 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/075 ,  C03C3/06 ,  C03C2201/06 ,  C03C2201/08 ,  C03C2201/23 ,  C03C2203/40 ,  Y10S65/08 ,  Y10S65/16 ,  Y10S501/905

Abstract: The invention concerns a quartz glass body for an optical component for the transmission of UV radiation with a wavelength of 250 nm and less, especially for a wavelength of 157 nm, as well as a process for the manufacture of the quartz glass body where fine quartz glass particles are formed by flame hydrolysis of a silicon compound, deposited and vitrified. Suitability of a quartz glass as represented by high base transmission and radiation resistance depends on structural properties caused by local stoichiometric deviations, and on the chemical composition. The quartz glass body according to the inventions is distinguished by a uniform base transmission (relative change of base transmission ≦1%) in the wavelength range from 155 nm to 250 nm (radiation penetration depth of 10 mm) of at least 80%, a low OH content (less than 10 ppm by weight) and a glass structure substantially free from oxygen defect centers. A quartz glass body of this kind is manufactured by a process which allows bulk embedding of hydrogen or oxygen into the glass network in that at least a two stage heat treatment takes place at temperatures ranging from 850° C. to 1600° C. before the vitrification, the last stage comprising sintering at a temperature between 1300° C. and 1600° C. in an atmosphere containing hydrogen or oxygen, or a nonflammable mixture of these substances.

Abstract translation: 本发明涉及一种用于传输波长为250nm以下，特别是波长为157nm的紫外线的光学部件的石英玻璃体，以及用于制造石英玻璃体的方法，其中精细的石英 通过硅化合物的火焰水解形成玻璃颗粒，沉积并玻璃化。 由高碱性透射和耐辐射性表示的石英玻璃的适用性取决于由局部化学计量偏差引起的结构特性以及化学成分。 根据本发明的石英玻璃体的特征在于在155nm至250nm（辐射穿透深度为10mm）的波长范围内的均匀的基底透射率（基底透射率的相对变化<= 1％）为至少80％ 低OH含量（小于10ppm重量）和基本上不含氧缺陷中心的玻璃结构。 这种石英玻璃体是通过允许将氢气或氧气大量嵌入玻璃网络的方法来制造的，因为至少在两个阶段之间的热处理在850℃至1600℃之间的温度下进行 玻璃化，最后阶段包括在含有氢气或氧气的气氛中在1300℃和1600℃之间的温度下烧结，或这些物质的不可燃混合物。

公开(公告)号：US20030005724A1

公开(公告)日：2003-01-09

申请号：US10169191

申请日：2002-06-28

Inventor： Kunio Sugiyama ,  Shuichi Tada ,  Jinichi Omi ,  Tadahiro Nakada ,  Hiroshi Morita ,  Masaki Kusuhura ,  Hiroyuki Watanabe ,  Hirofumi Uehara ,  Keiko Sanpei

IPC: C03B008/02

CPC classification number: C03B19/1065 ,  C01B33/16 ,  C03B2201/03 ,  C03B2201/04 ,  C03C1/006

Abstract: A hydrous silica gel is dehydrated by freezing, thawing, and removing water separated by thawing, thereby yielding silica particles. In addition, the silica particles thus formed is washed and fired, thereby producing a synthetic quartz glass power. A water glass is dealkalized, an oxidizing agent and an acid are added, the mixture thus formed is passed through a hydrogen type cation exchange resin, the aqueous silica solution thus formed is then gelled, and the gelled material is then washed and fired, thereby producing a synthetic quartz powder. Silica is sequentially held for a predetermined time at each temperature range of 150 to 400null C., 500 to 700null C., and 1,100 to 1,300null C., thereby producing a quartz glass.

Abstract translation: 通过冷冻，解冻和除去通过解冻分离的水来脱水水合硅胶，从而产生二氧化硅颗粒。 此外，将由此形成的二氧化硅颗粒进行洗涤和烧制，从而产生合成石英玻璃粉末。 将水玻璃脱碱，加入氧化剂和酸，使形成的混合物通过氢型阳离子交换树脂，然后将由此形成的二氧化硅水溶液凝胶化，然后将凝胶材料洗涤并烧制，由此 生产合成石英粉。 在150〜400℃，500〜700℃，1100〜1300℃的各温度范围内依次保持二氧化硅预定时间，生成石英玻璃。

公开(公告)号：US06376401B1

公开(公告)日：2002-04-23

申请号：US09387773

申请日：1999-09-01

Applicant: Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

Inventor： Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

IPC: C03B2000

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2203/44

Abstract: A synthetic silica glass having a high transmittance for vacuum ultraviolet rays, for example F2 excimer laser beam with a wavelength of 157 nm, a high uniformity and a high durability and useful for ultraviolet ray-transparent optical glass materials is produced from a high-purity silicon compound, for example silicon tetrachloride, by heat treating an accumulated porous silica material at a temperature not high enough to convert the porous silica material to a transparent silica glass in an inert gas atmosphere for a time sufficient to cause the OH groups to be condensed and removed from the glass, and exhibits substantially no content of impurities other than OH group a difference between highest and lowest fictional temperatures of 50° C. or less and a transmittance of 157 nm ultraviolet rays through a 10 mm optical path of 60% or more, and optically a OH group content of 1 to 70 ppm, a Cl content less than 1 ppm, a total content of impurity metals of 50 ppb or less, a content of each individual impurity metal less than 10 ppb, and an ultraviolet ray-transmittance at 172 to 200 nm of 40% or more even after the glass is exposed to an irradiation of ultraviolet rays at 160 to 300 nm for one hour.

Abstract translation: 对于真空紫外线具有高透射率的合成二氧化硅玻璃，例如波长为157nm的F2准分子激光束，高均匀性和高耐久性并且可用于紫外线透明光学玻璃材料由高纯度 硅化合物，例如四氯化硅，通过在不足够高的温度下热处理积聚的多孔二氧化硅材料，以在惰性气体气氛中将多孔二氧化硅材料转化为透明的石英玻璃足以使OH基团冷凝的时间 并且从玻璃中除去，并且基本上不含OH基团中的杂质含量，最高和最低虚构温度之间的差别为50℃或更低，通过10mm光路的157nm紫外线的透射率为60％或 更多地，光学地含有1至70ppm的OH基含量，小于1ppm的Cl含量，50ppb以下的杂质金属的总含量， 即使玻璃暴露于160〜300nm的紫外线照射1小时，每一种杂质金属小于10ppb，而在172〜200nm的紫外线透射率为40％以上。