公开(公告)号：US07217942B2

公开(公告)日：2007-05-15

申请号：US10644745

申请日：2003-08-21

Applicant: Hideki Tanaka

Inventor： Hideki Tanaka

IPC: H01L21/00

CPC classification number: H01J37/32935 ,  G01N21/68 ,  G01N2201/0227 ,  G01N2201/023

Abstract: In a plasma processing apparatus that forms plasma from a process gas by supplying the process gas into a processing container and applying high-frequency power to an electrode provided inside the processing container on which a workpiece is placed and executes specific plasma processing on the processing surface of the workpiece, apparatus state parameter data indicating a state of the plasma processing apparatus are obtained through measurement executed by a parameter measuring instrument, optical data are obtained through measurement executed by an optical measuring instrument and electrical data are obtained through measurement executed by an electrical measuring instrument. A means for plasma leak judgment judges that a plasma leak has occurred if there is a fluctuation in the data.

Abstract translation: 在等离子体处理装置中，通过将处理气体供给到处理容器中并将高频电力施加在设置有工件的处理容器内部的电极上，从而从处理气体形成等离子体，并对处理面进行特定的等离子体处理 通过由参数测量仪器执行的测量获得指示等离子体处理装置的状态的装置状态参数数据，通过光学测量仪器执行的测量获得光学数据，并且通过由电气执行的测量获得电气数据 测量仪器。 用于等离子体泄漏判定的装置判断如果数据有波动，则发生等离子体泄漏。

公开(公告)号：US20060203244A1

公开(公告)日：2006-09-14

申请号：US11434606

申请日：2006-05-15

Applicant: David Nilson ,  Brad Rice ,  Tamara Troy

Inventor： David Nilson ,  Brad Rice ,  Tamara Troy

IPC: G01N21/25

CPC classification number: G01N21/6456 ,  G01N2021/1787 ,  G01N2021/6471 ,  G01N2021/6484 ,  G01N2201/0227 ,  G01N2201/0826

Abstract: A dual illumination system is disclosed for use with an imaging apparatus. The imaging apparatus defines a light-tight imaging compartment with an interior wall having a view port extending into the imaging compartment. This view port enables data acquisition of a biological specimen contained in the imaging compartment. The dual illumination system includes a first illumination assembly configured to direct structured light onto a first side of the specimen to enable structured light and surface topography measurements thereof. A second illumination assembly then directs light at the specimen wherein diffused fluorescent light emanates from a surface thereof for receipt through the view port to acquire fluorescence data of the specimen. The combination of structured light imaging and fluorescence imaging enables 3D diffuse tomographic reconstructions of fluorescent probe location and concentration.

公开(公告)号：US07068370B2

公开(公告)日：2006-06-27

申请号：US11151218

申请日：2005-06-13

Applicant: Allan Rosencwaig ,  Lanhua Wei

Inventor： Allan Rosencwaig ,  Lanhua Wei

IPC: G01J4/00

CPC classification number: H01L21/02046 ,  G01N21/211 ,  G01N21/9501 ,  G01N2201/0227 ,  G01N2201/023 ,  H01L21/02054 ,  H01L21/67028 ,  H01L21/67115 ,  H01L22/20

Abstract: A method for improving the measurement of semiconductor wafers is disclosed. In the past, the repeatability of measurements was adversely affected due to the unpredictable growth of a layer of contamination over the intentionally deposited dielectric layers. Repeatability can be enhanced by removing this contamination layer prior to measurement. This contamination layer can be effectively removed in a non-destructive fashion by subjecting the wafer to a cleaning step. In one embodiment, the cleaning is performed by exposing the wafer to microwave radiation. Alternatively, the wafer can be cleaned with a radiant heat source. These two cleaning modalities can be used alone or in combination with each other or in combination with other cleaning modalities. The cleaning step may be carried out in air, an inert atmosphere or a vacuum. Once the cleaning has been performed, the wafer can be measured using any number of known optical measurement systems.

Abstract translation: 公开了一种改善半导体晶片测量的方法。 在过去，由于在有意沉积的介电层上的污染层的不可预测的增长，测量的重复性受到不利影响。 在测量之前，通过去除这个污染层可以提高重复性。 通过使晶片进行清洁步骤，可以非破坏性地有效地去除该污染层。 在一个实施例中，通过将晶片暴露于微波辐射来进行清洁。 或者，可以用辐射热源清洁晶片。 这两种清洁方式可以单独使用或彼此组合使用或与其他清洁模式组合使用。 清洁步骤可以在空气，惰性气氛或真空中进行。 一旦执行了清洁，就可以使用任何数量的已知光学测量系统测量晶片。

公开(公告)号：US06985222B2

公开(公告)日：2006-01-10

申请号：US10423379

申请日：2003-04-25

Applicant: Hsi-Kuei Cheng ,  Chu-Chang Chen ,  Ting-Chun Wang ,  Szu-An Wu ,  Ying-Lang Wang ,  Hsien-Ping Feng

Inventor： Hsi-Kuei Cheng ,  Chu-Chang Chen ,  Ting-Chun Wang ,  Szu-An Wu ,  Ying-Lang Wang ,  Hsien-Ping Feng

IPC: G01N21/88

CPC classification number: G01N21/55 ,  G01N21/8422 ,  G01N2201/0227

Abstract: A system and method for detecting chamber leakage by measuring the reflectivity of an oxidized thin film. In a preferred embodiment, a method of detecting leaks in a chamber includes providing a first monitor workpiece, placing the first monitor workpiece in the chamber, and forming at least one film on the first monitor workpiece. The reflectivity of the least one film of the first monitor workpiece is measured, wherein the reflectivity indicates whether there are leaks in the at least one seal of the chamber. In another embodiment, the method includes providing a second monitor workpiece, placing the second monitor workpiece in the chamber, and forming at least one film on the second monitor workpiece. The reflectivity of the at least one film of the second monitor workpiece is measured, and the second monitor workpiece film reflectivity is compared to the first monitor workpiece film reflectivity.

Abstract translation: 通过测量氧化薄膜的反射率来检测室泄漏的系统和方法。 在优选实施例中，检测腔室泄漏的方法包括提供第一监测工件，将第一监测器工件放置在腔室中，以及在第一监测器工件上形成至少一个膜。 测量第一监视器工件的至少一个膜的反射率，其中反射率指示在室的至少一个密封件中是否有泄漏。 在另一个实施例中，该方法包括提供第二监视器工件，将第二监视器工件放置在腔室中，以及在第二监视器工件上形成至少一个膜。 测量第二监测工件的至少一个膜的反射率，并将第二监测工件膜反射率与第一监测工件膜反射率进行比较。

公开(公告)号：US20050219535A1

公开(公告)日：2005-10-06

申请号：US11155078

申请日：2005-06-17

Applicant: David Nilson ,  Brad Rice ,  Tamara Troy

Inventor： David Nilson ,  Brad Rice ,  Tamara Troy

IPC: A01K1/03 ,  A22B3/00 ,  A61M16/00 ,  A61M16/10 ,  A61M16/18 ,  A61M16/20 ,  G01N21/64

CPC classification number: G01N21/6456 ,  A01K1/031 ,  A61M16/104 ,  A61M16/18 ,  A61M16/202 ,  A61M2016/0039 ,  G01N2021/1787 ,  G01N2021/6463 ,  G01N2021/6471 ,  G01N2021/6484 ,  G01N2201/0227 ,  G01N2201/0826

Abstract: A macroscopic fluorescence illumination assembly is provided for use with an imaging apparatus with a light-tight imaging compartment. The imaging apparatus includes an interior wall defining a view port extending into the imaging compartment to enable viewing of a specimen contained therein. The illumination assembly includes a specimen support surface sized and dimensioned for receipt in the imaging compartment, and oriented to face toward the view port of the imaging apparatus. The support surface is substantially opaque and defines a window portion that enables the passage of light there through. The window portion is selectively sized and dimensioned such that the specimen, when supported atop the support surface, can be positioned and seated over the window portion in a manner forming a light-tight seal substantially there between. The illumination assembly further includes an excitation light source, and a bundle of fiber optic strands having proximal ends thereof in optical communication with the light source. The distal ends of the strands terminate proximate the window portion of the support surface. The distal ends each emit a respective beam of light originating from the light source which are then collectively directed toward the window portion and into a bottom side of the specimen wherein the diffused light passes there through and exits a topside thereof for receipt through the view port to view the fluorescence of the specimen.

Abstract translation: 提供了一种宏观荧光照明组件，用于与具有不透光成像室的成像装置一起使用。 该成像设备包括限定了一个视图端口的内壁，该视图端口延伸到成像室中以使得能够观察其中容纳的样本。 照明组件包括尺寸和尺寸适于接收在成像室中的样本支撑表面，并且被定向成面向成像设备的视口。 支撑表面基本上是不透明的，并且限定了能够使光通过的窗口部分。 窗口部分被选择性地定尺寸和尺寸使得当被支撑在支撑表面上方时，样本可以以基本上在其之间形成不透光密封的方式被定位和安置在窗口部分上。 照明组件还包括激发光源，以及一束光纤束，其光纤束的近端与光源光学连通。 股线的末端终止于支撑表面的窗口部分。 远端各自发出源自光源的相应光束，然后将它们共同指向窗口部分并进入样本的底侧，其中漫射光通过其并穿过其顶侧并通过观察端口接收 以观察样品的荧光。

公开(公告)号：US06714300B1

公开(公告)日：2004-03-30

申请号：US09294869

申请日：1999-04-20

Applicant: Allan Rosencwaig ,  Lanhua Wei

Inventor： Allan Rosencwaig ,  Lanhua Wei

IPC: G01J400

CPC classification number: H01L21/02046 ,  G01N21/211 ,  G01N21/9501 ,  G01N2201/0227 ,  G01N2201/023 ,  H01L21/02054 ,  H01L21/67028 ,  H01L21/67115 ,  H01L22/20

Abstract: A method for improving the measurement of semiconductor wafers is disclosed. In the past, the repeatability of measurements was adversely affected due to the unpredictable growth of a layer of contamination over the intentionally deposited dielectric layers. Repeatability can be enhanced by removing this contamination layer prior to measurement. This contamination layer can be effectively removed in a non-destructive fashion by subjecting the wafer to a cleaning step. In one embodiment, the cleaning is performed by exposing the wafer to microwave radiation. Alternatively, the wafer can be cleaned with a radiant heat source. These two cleaning modalities can be used alone or in combination with each other or in combination with other cleaning modalities. The cleaning step may be carried out in air, an inert atmosphere or a vacuum. Once the cleaning has been performed, the wafer can be measured using any number of known optical measurement systems.

公开(公告)号：WO2017033499A1

公开(公告)日：2017-03-02

申请号：PCT/JP2016/063244

申请日：2016-04-27

Applicant: 日本フェンオール株式会社

Inventor： 井口　雅雄 ,  渋谷　忠之 ,  沼尾　寛伺 ,  舛本　慎太郎

IPC: G08B17/10 ,  G08B17/107 ,  G01N21/53

CPC classification number: G01N21/53 ,  G01N2201/0227 ,  G08B17/10 ,  G08B17/107

Abstract: 　光電式煙感知器(1)は、回路基板(20)を収容した回路収容室(18)を有する防爆構造型の筐体(3)と、筐体(3)に設けられ、防爆指定区域(Z)に通じた流入室(45)と、流入室(45)に設けられた発光部(55)と、流入室(45)に設けられた受光部(56)と、を具備している。発光部(55)は、発光素子(58)が発した光を流入室(45)に導く第１の導光体(59)と、第１の導光体(59)を取り囲んで保持するとともに回路収容室(18)に通じた第１の支持部(57)と、を含む。受光部(56)は、流入室(45)内で発光素子(58)が発した光を受けるとともに当該光を受光素子(78)に導く第２の導光体(79)と、第２の導光体(79)を取り囲んで保持するとともに回路収容室(18)に通じた第２の支持部(77)と、を含む。第１の支持部(57)および第２の支持部(77)は、回路収容室(18)から流入室(45)に向かう火炎の逸走を妨げるように構成されている。

Abstract translation: 光电式烟雾传感器（1）具有：防爆结构型壳体（3），具有容纳电路板（20）的电路容纳室（18）; 流入室（45），其设置在所述壳体（3）上并与所述防爆指定区域（z）连通地连接; 设置在流入室（45）上的发光单元（55）; 以及设置到流入室（45）的光接收单元（56）。 发光单元（55）包括：将从发光元件（58）发射的光引导到流入室（45）的第一导光体（59）; 以及围绕并保持所述第一导光体（59）并且可连接地连接到所述电路容纳室（18）的第一支撑部（57）。 光接收单元（56）包括：第二导光体（79），其接收从流入室（45）中的发光元件（58）发射的光并将光引导到光接收元件（78）; 以及围绕并保持所述第二导光体（79）并且可连通地连接到所述电路容纳室（18）的第二支撑部（77）。 第一支撑部（57）和第二支撑部（77）被构造成防止从电路容纳室（18）喷射到流入室（45）的火焰逸出。

公开(公告)号：WO2009029446A1

公开(公告)日：2009-03-05

申请号：PCT/US2008/073659

申请日：2008-08-20

Applicant: THE CURATORS OF THE UNIVERSITY OF MISSOURI ,  LARSEN, David, W. ,  XU, Zhi

Inventor： LARSEN, David, W. ,  XU, Zhi

IPC: G01J3/42

CPC classification number: G01J3/02 ,  G01J3/0262 ,  G01J3/0286 ,  G01J3/0291 ,  G01J3/42 ,  G01J3/45 ,  G01J2003/425 ,  G01N21/274 ,  G01N21/31 ,  G01N2021/3137 ,  G01N2201/0227 ,  G01N2201/127

Abstract: Increasing signal to noise ratio in optical spectra obtained by spectrophotometers. An interferometer introduces interference effects into a source light beam. A dual beam configuration splits the source beam having the interference effects into a reference beam and a sample beam. The reference beam interacts with a reference substance and is detected by a reference detector. The sample beam interacts with a sample substance and is detected by a sample detector. An optical spectra of the sample is based on the difference between the detected reference beam and the detected sample beam.

Abstract translation: 通过分光光度计获得的光谱增加信噪比。 干涉仪将干扰效应引入源光束。 双光束配置将具有干涉效应的源光束分解成参考光束和样本光束。 参考光束与参考物质相互作用，并由参考检测器检测。 样品束与样品物质相互作用，并由样品检测器检测。 样品的光谱基于检测到的参考光束和检测到的样品光束之间的差异。

公开(公告)号：WO2004025261A3

公开(公告)日：2004-07-01

申请号：PCT/US0328755

申请日：2003-09-16

Applicant: WELLDOG INC ,  POPE JOHN ,  COX RICK ,  BUTTRY DANIEL

Inventor： POPE JOHN ,  COX RICK ,  BUTTRY DANIEL

IPC: G01N1/10 ,  G01N21/27 ,  G01N21/64 ,  G01N21/65 ,  G01N33/18 ,  G01V9/00 ,  G01N21/00

CPC classification number: G01N33/1886 ,  G01N1/10 ,  G01N21/274 ,  G01N21/64 ,  G01N21/65 ,  G01N33/1833 ,  G01N2201/0218 ,  G01N2201/0227 ,  G01V9/007

Abstract: In this way, plumes of oil and gas in the oceanic water column can be detected from a substantial distance using a highly sensitive sensor (2) and then characterized thoroughly using a less sensitive sensor (3).

Abstract translation: 以这种方式，可以使用高灵敏度的传感器（2）从大量的距离检测海洋水柱中的油和气的羽流，然后使用不太敏感的传感器（3）彻底地表征。

公开(公告)号：WO2004025239A2

公开(公告)日：2004-03-25

申请号：PCT/US2003/025588

申请日：2003-08-15

Applicant: NORCOM SYSTEMS INC.

Inventor： NEWMAN, John, W. ,  THAYER, Steve

IPC: G01M

CPC classification number: G01M3/363 ,  G01N2201/0227 ,  G03H1/0443

Abstract: A system and method for leak testing a plurality of hermetic electronic devices of the type that have an internai chamber that is isolated from ambient conditions by a seal structure is advantageously designed to be able to calculate the leak rate of each individual device in a marner that is independent of structural manufacturing variances that typically exist within a sampling of such devices. The method preferably involves positioning a plurality of the hermetic electronic devices within a test area, and then stimulating the hermetic electronic devices with a modulated input of energy, such as by varying the ambient pressure about the devices. A property such as the physical position of one portion of a lid of each of the hermetic electronic devices is then sensed. The sensed property is one that is known to change as a first function of the modulated input of energy and also as a second function of pressure conditions within the hermetically sealed internal chamber. The first and second functions are linearly independent of each other. By comparing the stimulation of the devices to the sensed property and by discriminating using the two known functions a leak rate is determined for each individual device that is substantially independent of variances, such as differences in lid thickness that may exist between the different devices. Accordingly, an accurate determination of leak rate may be made with a minimum of calibration.

Abstract translation: 用于泄漏测试多个具有通过密封结构与环境条件隔离的内部室的类型的密封电子设备的系统和方法有利地设计成能够计算每个单独设备的泄漏率， 独立于通常存在于这种设备的采样内的结构制造差异。 该方法优选地包括将多个密封电子设备定位在测试区域内，然后利用调制的能量输入来刺激密封电子设备，例如通过改变围绕设备的环境压力。 然后感测诸如每个密封电子设备的盖子的一部分的物理位置的属性。 感测的特性是已知的作为调制的能量输入的第一函数而变化的属性，并且还作为密封的内部腔室内的压力条件的第二函数。 第一和第二功能彼此线性独立。 通过将装置的刺激与感测到的属性进行比较，并且通过使用两个已知功能进行区分，确定每个单独装置的泄漏率基本上不依赖于方差，例如可能存在于不同装置之间的盖厚度的差异。 因此，可以用最小的校准来进行泄漏率的精确确定。